Abstract: An optical interference color display comprising a transparent substrate, an inner-front optical diffusion layer, a plurality of first electrodes, a patterned support layer, a plurality of optical films and a plurality of second electrodes is provided. The inner-front optical diffusion layer is on the transparent substrate and the first electrodes are on the inner-front optical diffusion layer. The patterned support layer is on the inner-front optical diffusion layer between the first electrodes. The optical film is on the first electrodes and the second electrodes are positioned over the respective first electrodes. The second electrodes are supported through the patterned support layer. Furthermore, there is an air gap between the second electrodes and their respective first electrodes.

Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.

Abstract: An organic light emitting structure employs alkaline-earth metal between a cathode and an electron-transport layer. Such a structure may improve degraded luminescence of light emitting structure and enhance stability of element operation.

Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.

Abstract: An optical-interference type reflective panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple supporting layers are firstly formed. Then, a plurality of first conductive optical film stacks, spacing layers and multiple second conductive optical film stacks are sequentially formed on the substrate. Finally, once the spacing layers are removed, optical-interference regulators are formed. Since said supporting layers forming step is prior to the first conductive optical film stacks, a precise back-side exposing step is not necessary so that the making procedure of the panel is simplified.

Abstract: A method of fabricating a double side emitting organic light emitting diode (OLED) including the following steps is provided. First, a transparent substrate is provided. Then, a first transparent electrode and an organic light emitting layer are sequentially formed on the transparent substrate. Next, a second transparent electrode is formed on the organic light emitting layer. The method of forming the second transparent electrode includes the following steps. A first film composed of alkali metal compound or alkaline-earth metal compound is formed on the organic light emitting layer; a second film composed of metal material is formed on the first film and has a thickness between 20 angstroms and 50 angstroms; a third film composed of transparent conductive material is formed on the second film by using a plasma diffusion deposition process or an ionic thermal evaporation process.

Abstract: A humidity detection and power cut-off device for electronic equipment is provided. The device is connected between a battery (10) and a motherboard (40) of the electronic equipment and includes an auto protection device (20) and a moisture-triggered device (30). The auto protection device is connected between the battery and the power management module and is used to establish or cut off the connection between the battery and the power management module. The moisture-triggered device is used to detect the immediate ambient humidity and controls the auto protection device. If the moisture-triggered circuit detects that the immediate ambient humidity exceeds a predetermined critical humidity value, the moisture-triggered device outputs a trigger signal to the auto protection device. The trigger signal controls the auto protection circuit to cut off a connection between the battery and the power management module, thus to achieve waterproofing protecting for the electronic equipment.

Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.

Abstract: A keyboard with definable keystroke values is provided. The keyboard includes an output interface for connecting to a keyboard interface of a host computer; keycaps for receiving operational inputs; a signal generation unit for generating keystroke signals in response to the operational inputs on the keycaps; a storage unit; and a micro control unit (MCU). The MCU includes a defining module for defining keystroke mappings between keystrokes and keystroke values in a user-defined keystroke mode, and storing the keystroke mapping into the storage unit; and an output control module for receiving the keystroke signals from the signal generation unit, reading the corresponding mapped keystroke values from the keystroke mapping stored in the storage unit in the user-defined keystroke mode, and outputting the mapped keystroke values to the keyboard interface of the host computer through the output interface.

Abstract: A cleaning brush includes a rod, at least one cleaning cloth unit, and at least one plastic wire. The rod includes a passageway, a plurality of water outlets, and a water inlet. The passageway extends longitudinally in the rod and is in communication with the water inlet. The water outlets are defined in an outer circumference of the rod and in communication with the passageway. The water inlet is defined in an end of the rod. The cleaning cloth unit includes a cleaning cloth having opposite first and second sides. The cleaning cloth unit further includes a plastic core extending alternately between the first and second sides of the cleaning cloth. The plastic wire is wound around the plastic core to tightly tie the cleaning cloth unit to an outer circumference of the rod.

Abstract: A method for fabricating an organic electroluminescent device (OLED) includes the following steps. First, a substrate is provided. Next, an anode layer is formed on the substrate. Next, a buffer layer is formed on the anode layer, wherein the buffer layer include a CFx film (fluorinated carbon films) containing carbon-fluoride bonded molecules. Next, a treatment process is performed on the CFx film to convert the carbon-fluoride bonded molecules into carbon-carbon bonded molecules. A plurality of organic layers is formed on the buffer layer. A cathode layer is formed on the organic layer. Because the buffer layer has a better conductivity, the organic electroluminescent device (OLED) of the present invention has a better luminous efficiency.

Abstract: A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the openings. A photolithographic process patterns the photoresist layer to define a support with an arm. A second plate is formed on the sacrificial layer and posts. The arm's stress is released through a thermal process. The position of the arm is shifted and the distance between the first plate and the second plate is therefore defined. Finally, The sacrificial layer is removed.

Abstract: An optical interference display unit with a first electrode, a second electrode and support structures located between the two electrodes is provided. The second electrode has at least a first material layer and a second material layer. At least one material layer of the two is made from conductive material and the second conductive layer is used as a mask while an etching process is performed to etch the first material layer to define the second electrode.

Abstract: A cleaning brush includes a rod, at least one cleaning cloth unit, and at least one plastic wire. The rod includes a passageway, a plurality of water outlets, and a water inlet. The passageway extends longitudinally in the rod and is in communication with the water inlet. The water outlets are defined in an outer circumference of the rod and in communication with the passageway. The water inlet is defined in an end of the rod. The cleaning cloth unit includes a cleaning cloth having opposite first and second sides. The cleaning cloth unit further includes a plastic core extending alternately between the first and second sides of the cleaning cloth. The plastic wire is wound around the plastic core to tightly tie the cleaning cloth unit to an outer circumference of the rod.

Abstract: An optical-interference type display panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple first conductive optical film stacks, supporting layers and multiple second conductive optical film stacks are formed. The substrate further has a plurality of connecting pads consisting of a transparent conductive film of the first conductive optical film stacks. Since the transparent conductive film is made of indium tin oxide, these connecting pads have the excellent anti-oxidation ability at their surface.

Abstract: An optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.

Abstract: There is provided a reflection type/transflection type thin film transistor liquid crystal display, including an insulating substrate, a thin film transistor formed on the insulating substrate, a transparent electrode made of indium-tin-oxide formed on the thin film transistor and electrically contacted with a source region and a drain region of the thin film transistor, and a curved conducting structure with an inclination of 3 to 20 degrees formed on the transparent electrode.

Abstract: The method for fabricating reflector plate for a reflective liquid crystal display and the device is disclosed. The present invention includes the formation of a protection layer over the glass substrate having thin film transistors and a layer of transparent electrodes on top, followed by the formation of a layer of undulating resin over the protection layer. If the reflector plate to be produced is a semi-transmissive type, a light-transmitting region is created over the protection layer. Since the protection layer is created in advance of the undulating resin outgrowth, the present method can effectively prevent reflection from the exposure stage during the lithography process, thus the problem of abnormal pattern marks occurring on the reflective surface can be avoided, and the exposure time and the production yield are enhanced.

Abstract: The method of manufacturing an optical interference color display is described. A first electrode structure is formed over a substrate first. At least one first area, second area and third area are defined on the first electrode structure. A first sacrificial layer is formed over the first electrode structure of the first area, the second area and the third area. Moreover, a second sacrificial layer is formed over the first sacrificial layer inside the second area and the third area. In addition, a third sacrificial layer is formed over the second sacrificial layer inside the third area. The etching rates of all sacrificial layers are different. Then, a patterned support layer is formed over the first electrode structure. Next, a second electrode layer is formed and the sacrificial layers are removed to form air gaps. Therefore, the air gaps are effectively controlled by using the material having different etching rates.

Abstract: A method for fabricating an optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.