Abstract: A method for forming a semiconductor device structure is provided. The method includes forming an interconnect structure over a substrate. The method further includes forming a passivation layer over the interconnect structure. The method further includes forming a conductive structure over the passivation layer, wherein the conductive structure includes a surrounding portion over the passivation layer, and a concave portion surrounded by the surrounding portion. A height of the surrounding portion is greater than a height of the concave portion calculated from a top surface of the passivation layer. The method further includes forming a liner over the conductive structure, wherein an oxygen-to-silicon ratio of the liner is lower than about 1.8.

Abstract: A method performed by a processing system including at least one processor includes collecting a set of data from a plurality of sensors that is monitoring a system, wherein the plurality of sensors includes sensors of a plurality of different modalities, detecting an instance of out-of-distribution data in the set of data by providing the set of data as an input to a machine learning model that generates as an output an indicator that the instance of out-of-distribution data is out-of-distribution with respect to the set of data, identifying a root cause for the instance of out-of-distribution data, and initiating an action to remediate the root cause of the instance of out-of-distribution data.

Abstract: Methods, apparatuses, and computer-readable medium for SRS are provided. An example UE may receive an SRS configuration and a downlink transmission scheduling an uplink transmission, the uplink transmission being scheduled on a CC, the SRS configuration comprising one or more additional SRS symbols relative to a first set of SRS symbols associated with an aperiodic trigger Type 1 or a periodic trigger Type 0, the one or more additional SRS symbols being scheduled on a destination CC at least one of the one or more additional SRS symbols overlapping at least partially with the uplink transmission. The example UE may drop or delay transmission of at least a part of an SRS in the one or more additional SRS symbols on the destination CC or at least a part of the uplink transmission on the source CC.

Abstract: The present disclosure provides an integrated circuit (IC) structure that includes a substrate having a circuit region and a chip corner region; IC devices formed on the substrate within the circuit region; a passivation layer formed over the IC devices; and a polyimide layer formed over the passivation layer, wherein the passivation layer and the polyimide layer include a stress-release pattern formed in the chip corner region.

Abstract: Aspects of the subject disclosure may include, for example, a device, having a processing system including a processor; and a memory that stores executable instructions that, when executed by the processing system, facilitate performance of operations of: collecting data traffic of one or more network devices of a user, wherein the data traffic is associated with multiple channels of interactions; building a channel-specific user signature and a cross-channel user signature of normal usage for the user based on the data traffic collected; detecting a change in a characteristic of the data traffic, wherein the change indicates fraudulent activity based on the channel-specific user signature and the cross-channel user signature; and issuing an alert of the fraudulent activity based on the change. Other embodiments are disclosed.

Abstract: Various aspects of methods, systems, and use cases include techniques for training or using a model to control a robot. A method may include identifying a set of action primitives applicable to a set of robots, receiving information corresponding to a task (e.g., a collaborative task), and determining at least one action primitive based on the received information. The method may include training a model to control operations of at least one robot of the set of robots using the received information and the at least one action primitive.

Abstract: A memory cell structure includes a transistor structure and a capacitor structure, where the capacitor structure includes a hydrogen absorption layer. The hydrogen absorption layer absorbs hydrogen, which prevents or reduces the likelihood of the hydrogen diffusing into an underlying metal-oxide channel of the transistor structure. In this way, the hydrogen absorption layer minimizes and/or reduces the likelihood of hydrogen contamination in the metal-oxide channel, which may enable a low current leakage to be achieved for the memory cell structure and reduces the likelihood of data corruption and/or failure of the memory cell structure, among other examples.

Abstract: An electronic device and a lens control method of optical image stabilization thereof are provided. The method is adapted to the electronic device. The electronic device includes a lens, and the method includes the following steps. An accumulated deviation angle of the electronic device is obtained according to a driving signal. A compensation angle is determined according to the accumulated deviation angle of the electronic device. The lens is controlled to move according to compensation angle.

Abstract: Methods, systems, and devices for wireless communication are described. A network node may transmit a first message using a first transmit power based on a first set of values corresponding to a set of power control parameters. The set of power control parameters may include an accumulated transmit power control parameter. The network node may receive a second message including information indicative of at least one of a second set of values corresponding to the set of power control parameters. The network node may transmit a third message using a second transmit power based on a value corresponding to the accumulated transmit power control parameter. The value may correspond to the accumulated transmit power control parameter, which may be based on a first difference between one or more of the first set of values from before the second message and one or more of the second set of values.

Abstract: Aspects of the subject disclosure may include, for example, capturing a first depiction of an exhibit environment, wherein the first depiction of the exhibit environment comprises an image of at least one artifact and an image of at least one interface element, and wherein the at least one interface element is located in the exhibit environment at a first location relative to the at least one artifact; obtaining a first user profile of a first user, wherein the first user profile comprises at least one first preference of the first user, and wherein the first user is located in a first remote environment; and facilitating a presenting of a first modified version of the first depiction of the exhibit environment in the first remote environment, wherein the first modified version moves the image of the at least one interface element to a second location relative to the at least one artifact, wherein the second location is different than the first location, and wherein the second location is selected based upon

Abstract: A method may include receiving current environment condition information associated with an extended reality device; receiving historical environment condition information associated with the extended reality device; based on current environment condition information and the historical environment condition information, determining one or more adjustments to meet a performance threshold for rendering objects on the an extended reality device or using the an extended reality device; and sending instructions to implement the one or more adjustments to meet the performance threshold for rendering objects on the extended reality device or using the extended reality device.

Abstract: A device includes a first dielectric layer. A second dielectric layer is disposed over the first dielectric layer. The second dielectric layer and the first dielectric layer have different material compositions. A metal-insulator-metal (MIM) structure is embedded in the second dielectric layer. A third dielectric layer is disposed over the second dielectric layer. The third dielectric layer and the second dielectric layer have different material compositions. The first dielectric layer or the third dielectric layer may contain silicon nitride (SiN), the second dielectric layer may contain silicon oxide (SiO2).

Abstract: A method and semiconductor device including a substrate having one or more semiconductor devices. In some embodiments, the device further includes a first passivation layer disposed over the one or more semiconductor devices, and a metal-insulator-metal (MIM) capacitor structure formed over the first passivation layer. In some embodiments, the MIM capacitor structure includes a first conductor plate layer, an insulator layer on the first conductor plate layer, and a second conductor plate layer on the insulator layer. In some examples, the insulator layer includes a metal oxide sandwich structure.

Abstract: Aspects presented herein may enable a base station to perform demodulation reference signal (DMRS)-based channel sounding for a channel between the base station and a UE, such that the base station may configure a more suitable precoding for coherent UL multiple input multiple output (MIMO) transmission(s) of the UE without increasing communication overhead significantly or at all. In one aspect, a base station performs channel sounding for a channel based on a set of physical uplink shared channel (PUSCH) DMRS received from a UE via the channel. The base station selects a precoding to be used by the UE for a subsequent PUSCH transmission via the channel based on the channel sounding. The base station transmits, for the UE via a physical downlink control channel (PDCCH), a transmit precoder matrix indicator (TPMI) indicating the selected precoding, where the PDCCH schedules the subsequent PUSCH transmission for the UE.

Abstract: Aspects of the subject disclosure may include, for example, capturing a first depiction of an exhibit environment, wherein the first depiction of the exhibit environment comprises an image of at least one artifact and an image of at least one interface element, and wherein the at least one interface element is located in the exhibit environment at a first location relative to the at least one artifact; obtaining a first user profile of a first user, wherein the first user profile comprises at least one first preference of the first user, and wherein the first user is located in a first remote environment; and facilitating a presenting of a first modified version of the first depiction of the exhibit environment in the first remote environment, wherein the first modified version moves the image of the at least one interface element to a second location relative to the at least one artifact, wherein the second location is different than the first location, and wherein the second location is selected based upon

Abstract: A method includes providing a workpiece having a first conductive pad and a second conductive pad over a substrate, a topmost point of the second conductive pad is above that of the first conductive pad by a height difference, conformally forming a first etch stop layer on the first and the second conductive pads, forming a dielectric structure over the first etch stop layer, performing a planarization process to the dielectric structure, and after the performing of the planarization process, conformally depositing a dielectric layer over the workpiece, the dielectric layer including a first portion disposed directly over the first conductive pad and a second portion disposed directly over the second conductive pad, where a thickness difference between a thickness of the first portion of the dielectric layer and a thickness of the second portion of the dielectric layer is less than the height difference.

Abstract: A method may include receiving current environment condition information associated with an extended reality device; receiving historical environment condition information associated with the extended reality device; based on current environment condition information and the historical environment condition information, determining one or more adjustments to meet a performance threshold for rendering objects on the an extended reality device or using the an extended reality device; and sending instructions to implement the one or more adjustments to meet the performance threshold for rendering objects on the extended reality device or using the extended reality device.

Abstract: Certain aspects of the present disclosure provide techniques for indicating capability of a user equipment (UE) to support multiple sounding reference signals (SRSs) with a single subframe, with at least one of frequency hopping, different bandwidths, or antenna switching for the multiple SRSs in the same subframe.

Abstract: The invention provides an electronic device and a gain calibration method for an image stabilization function thereof. The method includes the following. The image stabilization function is activated. A first image is generated by using a first gain through an image capturing device, and a first blur degree of the first image is obtained. A second image is generated by using a second gain through the image capturing device, and a second blur degree of the second image is obtained. A reference blur degree corresponding to the second gain is determined according to the second blur degree. A calibrated gain for the image stabilization function is determined according to a linear relationship established between the first blur degree corresponding to the first gain and the reference blur degree corresponding to the second gain.

Abstract: A method of forming a semiconductor structure includes forming a seed layer on a substrate, forming a photoresist layer on the seed layer with a first opening wider than a second opening, performing an electroplating process with a first plating current to grow a bottom portion of a first metal line in the first opening and a bottom portion of a second metal line in the second opening, continuing the electroplating process with a second plating current that is larger than the first plating current to grow a top portion of the first metal line and a top portion of the second metal line, removing the photoresist layer to expose a portion of the seed layer, and removing the exposed portion of the seed layer.