Patents by Inventor Wen Pin Liu
Wen Pin Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11688356Abstract: An electronic paper display and a driving method thereof are provided. The electronic paper display includes an electronic paper display panel, a touch panel and a processing circuit. The touch panel outputs a first touch coordinate of a current touch and a second touch coordinate of a next touch. The processing circuit executes a filter module and a line drawing module. The filter module outputs a first measured position data and a first predicted position data to the line drawing module. The line drawing module drives the electronic paper display panel to display a first predicted track. The filter module outputs a second measured position data to the line drawing module. The line drawing module determines whether a second track display coordinate corresponding to the second measured position data is equal to the first predicted display coordinate to correct the first predicted track.Type: GrantFiled: March 30, 2022Date of Patent: June 27, 2023Assignee: E Ink Holdings Inc.Inventors: Shu-Cheng Liu, Hsiao-Lung Cheng, Pei-Lin Tien, Chi-Mao Hung, Wen-Pin Liu
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Patent number: 11654461Abstract: A plasma ashing method is provided. The plasma ashing method includes analyzing the process status of each of a number of semiconductor substrate models undergoing a tested plasma ash process by a residue gas analyzer. The tested plasma ash processes for the semiconductor substrate models utilize a plurality of tested recipes. The plasma ashing method further includes selecting one of the tested recipes as a process recipe for a plasma ash process.Type: GrantFiled: May 21, 2021Date of Patent: May 23, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chun-Jen Hsiao, Ya-Ping Chen, Chien-Hung Lin, Wen-Pin Liu, Chin-Wen Chen
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Publication number: 20220223113Abstract: An electronic paper display and a driving method thereof are provided. The electronic paper display includes an electronic paper display panel, a touch panel and a processing circuit. The touch panel outputs a first touch coordinate of a current touch and a second touch coordinate of a next touch. The processing circuit executes a filter module and a line drawing module. The filter module outputs a first measured position data and a first predicted position data to the line drawing module. The line drawing module drives the electronic paper display panel to display a first predicted track. The filter module outputs a second measured position data to the line drawing module. The line drawing module determines whether a second track display coordinate corresponding to the second measured position data is equal to the first predicted display coordinate to correct the first predicted track.Type: ApplicationFiled: March 30, 2022Publication date: July 14, 2022Applicant: E Ink Holdings Inc.Inventors: Shu-Cheng Liu, Hsiao-Lung Cheng, Pei-Lin Tien, Chi-Mao Hung, Wen-Pin Liu
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Patent number: 11320930Abstract: An electronic paper display and a driving method thereof are provided. The electronic paper display includes an electronic paper display panel, a touch panel and a processing circuit. The electronic paper display panel is configured to display a display screen with a background in a first color. The touch panel is integrated with the electronic paper display panel and configured to output a first touch coordinate of a current touch. The processing circuit is configured to drive the electronic paper display panel to display a first touch track having a second color and corresponding to the first touch coordinate and a previous touch coordinate. The processing circuit further drives, according to the first touch track and a previous touch track, the electronic paper display panel to display a predicted track having a third color.Type: GrantFiled: February 22, 2021Date of Patent: May 3, 2022Assignee: E Ink Holdings Inc.Inventor: Wen-Pin Liu
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Publication number: 20220057883Abstract: An image signal input method is suitable for a touch electronic device. The touch electronic device includes a touch reflective display panel having a plurality of pixels. The image signal input method includes inputting a full-frame signal to the touch reflective display panel when the touch electronic device is in the non-handwriting mode to update the pixels of the touch reflective display panel. When the touch electronic device is in the handwriting mode, a movement track of an object on the touch reflective display panel is sensed. According to the movement track, a local frame signal is input to the touch reflective display panel to update some of the pixels of the touch reflective display panel corresponding to the movement track.Type: ApplicationFiled: July 15, 2021Publication date: February 24, 2022Inventors: Hsiao-Yuan CHEN, Wen-Pin LIU
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Publication number: 20210318775Abstract: An electronic paper display and a driving method thereof are provided. The electronic paper display includes an electronic paper display panel, a touch panel and a processing circuit. The electronic paper display panel is configured to display a display screen with a background in a first color. The touch panel is integrated with the electronic paper display panel and configured to output a first touch coordinate of a current touch. The processing circuit is configured to drive the electronic paper display panel to display a first touch track having a second color and corresponding to the first touch coordinate and a previous touch coordinate. The processing circuit further drives, according to the first touch track and a previous touch track, the electronic paper display panel to display a predicted track having a third color.Type: ApplicationFiled: February 22, 2021Publication date: October 14, 2021Applicant: E Ink Holdings Inc.Inventor: Wen-Pin Liu
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Publication number: 20210268555Abstract: A plasma ashing method is provided. The plasma ashing method includes analyzing the process status of each of a number of semiconductor substrate models undergoing a tested plasma ash process by a residue gas analyzer. The tested plasma ash processes for the semiconductor substrate models utilize a plurality of tested recipes. The plasma ashing method further includes selecting one of the tested recipes as a process recipe for a plasma ash process.Type: ApplicationFiled: May 21, 2021Publication date: September 2, 2021Inventors: Chun-Jen HSIAO, Ya-Ping CHEN, Chien-Hung LIN, Wen-Pin LIU, Chin-Wen CHEN
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Patent number: 11020778Abstract: A photoresist removal method is provided. The photoresist removal method includes analyzing the process status of each of a number of semiconductor substrate models undergoing a tested plasma ash process by a residue gas analyzer. The tested plasma ash processes for the semiconductor substrate models utilize a plurality of tested recipes. The photoresist removal method further includes selecting one of the tested recipes as a process recipe based on the analysis results from the residue gas analyzer and at least one expected performance criterion. In addition, the photoresist removal method includes performing a plasma ash process on a semiconductor substrate according to the process recipe to remove a photoresist layer from the semiconductor substrate.Type: GrantFiled: July 4, 2019Date of Patent: June 1, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chun-Jen Hsiao, Ya-Ping Chen, Chien-Hung Lin, Wen-Pin Liu, Chin-Wen Chen
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Publication number: 20200016635Abstract: A photoresist removal method is provided. The photoresist removal method includes analyzing the process status of each of a number of semiconductor substrate models undergoing a tested plasma ash process by a residue gas analyzer. The tested plasma ash processes for the semiconductor substrate models utilize a plurality of tested recipes. The photoresist removal method further includes selecting one of the tested recipes as a process recipe based on the analysis results from the residue gas analyzer and at least one expected performance criterion. In addition, the photoresist removal method includes performing a plasma ash process on a semiconductor substrate according to the process recipe to remove a photoresist layer from the semiconductor substrate.Type: ApplicationFiled: July 4, 2019Publication date: January 16, 2020Inventors: Chun-Jen HSIAO, Ya-Ping CHEN, Chien-Hung LIN, Wen-Pin LIU, Chin-Wen CHEN
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Patent number: 9639774Abstract: The present disclosure provides a method for determining an applicability of a specific processing device having a specific processing pattern. The method includes the following steps: locating a similarity index between the specific processing pattern and a reference processing pattern of a reference processing device; and confirming the applicability of the specific processing device if the similarity index is no less than a threshold. Besides, a method for assessing an applicability of a new processing pattern for a specific processing device, and a method for determining an applicability of an alternative processing path for a reference processing path are also provided.Type: GrantFiled: December 7, 2012Date of Patent: May 2, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Ching-Hsi Nan, Hann-Ru Chen, Yu-Hsiu Fu, Wen-Pin Liu
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Patent number: 9196215Abstract: A display device including an e-paper device and a power converter is provided. The e-paper device displays information. The power converter generates a plurality of output voltages respectively at a plurality of output terminals and provides the plurality of output voltages to the e-paper device. The power converter includes a transformer and a plurality of diodes. The transformer has a primary winding and a plurality of secondary windings. The diodes are electrically connected between the secondary windings and the output terminals for generating the output voltages, respectively.Type: GrantFiled: December 11, 2013Date of Patent: November 24, 2015Assignee: Delta Electronics, Inc.Inventors: Ming-Chih Chiu, Wen-Pin Liu, Rong Hsu
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Publication number: 20140161361Abstract: The present disclosure provides a method for determining an applicability of a specific processing device having a specific processing pattern. The method includes the following steps: locating a similarity index between the specific processing pattern and a reference processing pattern of a reference processing device; and confirming the applicability of the specific processing device if the similarity index is no less than a threshold. Besides, a method for assessing an applicability of a new processing pattern for a specific processing device, and a method for determining an applicability of an alternative processing path for a reference processing path are also provided.Type: ApplicationFiled: December 7, 2012Publication date: June 12, 2014Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ching-Hsi NAN, Hann-Ru Chen, Yu-Hsiu Fu, Wen-Pin Liu
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Publication number: 20140098081Abstract: A display device including an e-paper device and a power converter is provided. The e-paper device displays information. The power converter generates a plurality of output voltages respectively at a plurality of output terminals and provides the plurality of output voltages to the e-paper device. The power converter includes a transformer and a plurality of diodes. The transformer has a primary winding and a plurality of secondary windings. The diodes are electrically connected between the secondary windings and the output terminals for generating the output voltages, respectively.Type: ApplicationFiled: December 11, 2013Publication date: April 10, 2014Applicant: Delta Electonics, Inc.Inventors: Ming-Chih CHIU, Wen-Pin LIU, Rong HSU
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Patent number: 8534167Abstract: An open end wrench includes a jaw portion having first and second jaws. The first jaw includes a sliding groove slideably receiving a slide. When the jaw portion is not engaged with a workpiece, the slide is in a free position. When the jaw portion receives the workpiece but does not drive the workpiece, a buffering space is formed between an abutting end of the guiding slot and a guide fixed in the sliding groove. When the jaw portion drives the workpiece and deforms elastically, the body rotates relative to the workpiece, but the slide does not rotate together with the body due to the buffering space such that the end of the slide remains in surface contact with a face of the workpiece. Also, a buffering angle can be formed between a wrenching face on the slide and the face of the workpiece when the jaw portion receives the workpiece but does not drive the workpiece.Type: GrantFiled: December 1, 2010Date of Patent: September 17, 2013Inventor: Wen-Pin Liu
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Patent number: 8408100Abstract: An open end wrench includes first and second jaws formed on a jaw portion. The first jaw includes an arcuate sliding groove having an arcuate sliding wall. A slide is received in the sliding groove and includes an arcuate sliding face slideable along the sliding wall. An arcuate guiding slot is formed in the slide. The sliding face, sliding wall and guiding slot are free of holes, grooves, and recesses. A guide is fixed in the sliding groove and received in the guiding slot. The guiding slot includes an abutting end and a pressing end. The abutting end is in contact with the guide when the slide is in an initial position not engaged with a workpiece. An elastic device has two ends respectively abutting the guide and the pressing end of the guiding slot for biasing the slide to the initial position.Type: GrantFiled: September 14, 2010Date of Patent: April 2, 2013Inventor: Wen-Pin Liu
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Patent number: 8408101Abstract: An open end wrench includes first and second jaws. The first jaw includes an arcuate sliding groove having an arcuate sliding wall. A slide is received in the sliding groove and includes an arcuate sliding face slideable along the sliding wall. An arcuate guiding slot is formed in the slide. A guide is fixed in the sliding groove and received in the guiding slot. The guiding slot includes an abutting end and a pressing end. The abutting end is in contact with the guide when the slide is in an initial position. A spring seat is mounted in the pressing end of the guiding slot. The spring seat includes a face pressing against the pressing end. An elastic element has two ends respectively abutting the guide and the other face of the spring seat for biasing the slide to the initial position.Type: GrantFiled: December 1, 2010Date of Patent: April 2, 2013Inventor: Wen-Pin Liu
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Patent number: 8239056Abstract: The present disclosure provides a semiconductor manufacturing method. The method includes providing product data of a product, the product data including a sensitive product parameter; searching existing products according to the sensitive product parameter to identify a relevant product from the existing products; determining an initial value of a processing model parameter to the product using corresponding data of the relevant product; assigning the initial value of the processing model parameter to a processing model associated with a manufacturing process; thereafter, tuning a processing recipe using the processing model; and performing the manufacturing process to a semiconductor wafer using the processing recipe.Type: GrantFiled: November 11, 2009Date of Patent: August 7, 2012Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chih-Wei Hsu, Yu-Jen Cheng, Wen-Pin Liu, Shun-Ping Wang, Shin-Rung Lu, Jo Fei Wang, Jong-I Mou, Andy Tsen, Chun-Hsien Lin
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Publication number: 20110277600Abstract: An open end wrench includes a jaw portion having first and second jaws. The first jaw includes a sliding groove slideably receiving a slide. When the jaw portion is not engaged with a workpiece, the slide is in a free position. When the jaw portion receives the workpiece but does not drive the workpiece, a buffering space is formed between an abutting end of the guiding slot and a guide fixed in the sliding groove. When the jaw portion drives the workpiece and deforms elastically, the body rotates relative to the workpiece, but the slide does not rotate together with the body due to the buffering space such that the end of the slide remains in surface contact with a face of the workpiece. Also, a buffering angle can be formed between a wrenching face on the slide and the face of the workpiece when the jaw portion receives the workpiece but does not drive the workpiece.Type: ApplicationFiled: December 1, 2010Publication date: November 17, 2011Inventor: Wen-Pin Liu
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Publication number: 20110277599Abstract: An open end wrench includes first and second jaws. The first jaw includes an arcuate sliding groove having an arcuate sliding wall. A slide is received in the sliding groove and includes an arcuate sliding face slideable along the sliding wall. An arcuate guiding slot is formed in the slide. A guide is fixed in the sliding groove and received in the guiding slot. The guiding slot includes an abutting end and a pressing end. The abutting end is in contact with the guide when the slide is in an initial position. A spring seat is mounted in the pressing end of the guiding slot. The spring seat includes a face pressing against the pressing end. An elastic element has two ends respectively abutting the guide and the other face of the spring seat for biasing the slide to the initial position.Type: ApplicationFiled: December 1, 2010Publication date: November 17, 2011Inventor: Wen-Pin Liu
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Publication number: 20110197720Abstract: An open end wrench includes first and second jaws formed on a jaw portion. The first jaw includes an arcuate sliding groove having an arcuate sliding wall. A slide is received in the sliding groove and includes an arcuate sliding face slideable along the sliding wall. An arcuate guiding slot is formed in the slide. The sliding face, sliding wall and guiding slot are free of holes, grooves, and recesses. A guide is fixed in the sliding groove and received in the guiding slot. The guiding slot includes an abutting end and a pressing end. The abutting end is in contact with the guide when the slide is in an initial position not engaged with a workpiece. An elastic device has two ends respectively abutting the guide and the pressing end of the guiding slot for biasing the slide to the initial position.Type: ApplicationFiled: September 14, 2010Publication date: August 18, 2011Inventor: Wen-Pin Liu