Abstract: The disclosure relates to ankle foot orthosis including foot plate, lower leg piece, first and second connecting parts, and pin. The first connecting part is connected to the foot plate, the second connecting part is connected to the lower leg piece, the first connecting part has an engagement portion, the second connecting part has a groove and an opening connected to the groove, the first connecting part is pivotably engaged with the second connecting part, the pin is detachably disposed on the first connecting part of the first pivoting mechanism, and the second connecting part has a first stopper and a second stopper spaced apart from each other. The first pivoting mechanism has a first detachable state; when the first pivoting mechanism is in first detachable state, the engagement portion is located at the opening and is detachable from the groove via the opening.

Abstract: The invention provides a gate driving circuit for an in-cell touch panel to improve the issue wherein the undesired falling time of a pre-stage shift register and the undesired rising time of a next-stage shift register during a touch sensing period, in which the undesired falling time and the undesired rising time are caused by the output signal of the shift register cannot be correctly transmitted to the pre-stage shift register and the next-stage shift register during the touch sensing period.

Abstract: A process for chemical mechanical polishing a substrate containing tungsten is disclosed to reduce static corrosion rate and inhibit dishing of the tungsten and erosion of underlying dielectrics. The process includes providing a substrate; providing a polishing composition, containing, as initial components: water; an oxidizing agent; alginate; a dicarboxylic acid, a source of iron ions; a colloidal silica abrasive; and, optionally a pH adjusting agent; providing a chemical mechanical polishing pad, having a polishing surface; creating dynamic contact at an interface between the polishing pad and the substrate; and dispensing the polishing composition onto the polishing surface at or near the interface between the polishing pad and the substrate; wherein some of the tungsten (W) is polished away from the substrate, static corrosion rate is reduced, dishing of the tungsten (W) is inhibited as well as erosion of dielectrics underlying the tungsten (W).

Abstract: A process for chemical mechanical polishing a substrate containing tungsten to reduce static corrosion rate and inhibit dishing of the tungsten and erosion of underlying dielectrics is disclosed. The process includes providing a substrate; providing a polishing composition, containing, as initial components: water; an oxidizing agent; xanthan gum; a dicarboxylic acid, a source of iron ions; a colloidal silica abrasive; and, optionally a pH adjusting agent; optionally a surfactant; providing a chemical mechanical polishing pad, having a polishing surface; creating dynamic contact at an interface between the polishing pad and the substrate; and dispensing the polishing composition onto the polishing surface at or near the interface between the polishing pad and the substrate; wherein some of the tungsten (W) is polished away from the substrate, static corrosion rate is reduced, dishing of the tungsten (W) is inhibited as well as erosion of dielectrics underlying the tungsten (W).

Abstract: A process for chemical mechanical polishing a substrate containing tungsten is disclosed to reduce corrosion rate and inhibit dishing of the tungsten and erosion of underlying dielectrics. The process includes providing a substrate; providing a polishing composition, containing, as initial components: water; an oxidizing agent; nonionic polyacrylamide; a dicarboxylic acid, a source of iron ions; a colloidal silica abrasive having a negative zeta potential; and, optionally, a pH adjusting agent; providing a chemical mechanical polishing pad, having a polishing surface; creating dynamic contact at an interface between the polishing pad and the substrate; and dispensing the polishing composition onto the polishing surface at or near the interface between the polishing pad and the substrate; wherein some of the tungsten is polished away from the substrate, corrosion rate is reduced, dishing of the tungsten is inhibited as well as erosion of dielectrics underlying the tungsten.

Abstract: A method and apparatus for controlling a cellulosic pulp process for producing a pulp product having a desired pulp property is disclosed. The method involves illuminating an in-process portion of pulp using a first wavelength of light, and receiving a scattered light spectrum from the illuminated portion of pulp, the scattered light spectrum including spectral components that have been shifted in wavelength through interaction with a constituent of the illuminated portion of pulp. The method also involves filtering the scattered light spectrum to separate the spectral components, and identifying spectral features in the filtered scattered light spectrum that correspond to the pulp property. The method further involves generating a control signal for controlling the pulp process based on variations in the identified spectral features to cause the pulp property to fall within a desired range.

Abstract: A limb prosthesis including a palm, a forearm, an upper arm, an elbow joint and a wrist joint is provided. The palm has a first pivot and a first lock set. The upper arm has a socket. The elbow joint connects the forearm to the upper arm. The wrist joint includes a first connecting rod connected to the forearm. The first pivot rotatably penetrates through the first connecting rod. The first lock set is locked to the first pivot. A first wedge surface of the first lock set contacts a second wedge surface of the first connecting rod. By adjusting a distance between the first lock set and the first pivot, a magnitude of a forward force between the first wedge surface and the second wedge surface is adjusted, such that the palm is fixed relative to the first connecting rod or rotatable around an axial direction perpendicular to an extending direction of the forearm.

Abstract: The present invention provides a polishing roll capable of, for example, realizing three-dimensional polishing of hard materials such as sapphire glass at a high removal amount. The polishing roll is a cylindrical polishing roll capable of rotating about a central axis, characterized in that the polishing roll includes a core part serving as a central axis to which torque is applied, an intermediate part having a cross-section concentric with the core part, and a polishing part disposed on the outer peripheral surface of the intermediate part, and the intermediate part is made of a cushion material that is softer than the polishing part.

Abstract: A sample chip for electron microscope includes a first substrate having a film layer, a buffer layer, and a body layer, a spacing layer positioned below the first substrate, and a second substrate positioned below the spacing layer. The buffer layer is positioned on the film layer and has a buffer opening corresponding to an area of the film layer, the body layer is positioned on the buffer layer and has a body opening corresponding to the buffer opening of the buffer layer to expose the area of the film layer corresponding to the buffer opening, the body layer has a thickness of 10 ?m-800 ?m, and etching properties of the film layer, the buffer layer, and the body layer are different. A specimen accommodating space is defined in the spacing layer to correspond to the area of the film layer corresponding to the buffer opening.

Abstract: A neutron capture therapy system and a target for a particle beam generating device, which may improve the heat dissipation performance of the target, reduce blistering and extend the service life of the target. The neutron capture therapy system includes a neutron generating device and a beam shaping assembly. The neutron generating device includes an accelerator and a target, and a charged particle beam generated by acceleration of the accelerator interacts with the target to generate a neutron beam. The target includes an acting layer, a backing layer and a heat dissipating layer, the acting layer interacts with the charged particle beam to generate the neutron beam, the base layer supports the action layer, and the heat dissipating layer includes a tubular member composed of tubes arranged side by side.

Abstract: A display device including a panel having a gate driver is provided. The gate driver includes a multi-stage shift register. The N-th stage shift register includes a control module, a leakage compensation module, and an output module. The control module has a first terminal for receiving a first signal from the (N?M)-th stage shift register and a second terminal electrically connected to a node for transmitting a first signal to the node. The leakage compensation module has a third terminal electrically connected to the compensation voltage and a fourth terminal electrically connected to the node. The output module has a fifth terminal electrically connected to the node for receiving the first signal, and a sixth terminal for outputting a second signal of the N-th stage shift register for driving at least some parts of the pixel array. The compensation voltage charges the node during a touch sensing period.

Abstract: A card module includes a transceiver, multiple connector interfaces that are each matable with a system connector of a respective type, a detection mechanism and a switching component. The detection mechanism can detect any one of the multiple connector interfaces being mated with the system connector of the respective type. Based on the respective type of the mated system connector, the switching component implements a switch state to connected the mated system connector to the transceiver.

Abstract: A substrate carrier, includes: a unitary body fabricated from a single block of graphite, wherein the body comprises a back plate, and a pair of spaced apart, substantially parallel, side rails, wherein each of the side rails comprises: an inwardly facing surface extending outwardly of the back plate; a longitudinally extending selenium vapor bore formed therein, a top end of the selenium vapor bore being open and configured for coupling to a selenium supply container for receiving selenium vapor by gravity, a bottom end of the selenium vapor bore being closed; an inwardly directed selenium vapor channel; a plurality of selenium vapor outlets disposed between the selenium vapor bore and the inwardly directed selenium vapor channel so as provide a plurality of conduits between the selenium vapor bore and the selenium vapor channel; and, a longitudinally extending engagement slot formed in the inwardly facing surface of each side rail adjacent the back plate to engage and hold a substrate in proximity to the ba

Abstract: A motor control system includes an electric motor and inverter. The electric motor includes a stator, rotor, and winding structure. The stator includes an iron core with a plurality of slots formed therein along a radial direction of the stator. The winding structure has a plurality of hairpin wires with pins disposed in the slots. The winding structure is configured to provide a plurality of phase windings and each phase winding includes a plurality of motor windings. The inverter includes a switching controller configured to control the turning-on and turning-off of the motor windings of each phase winding of the winding structure. When the electric motor operates in a high-speed mode, the switching controller controls the turning-on and turning-off of the motor windings of each phase winding such that a number of the phase windings turned-on is ? less than a number of all the phase windings.

Abstract: A limb prosthesis including a palm, a forearm, an upper arm, an elbow joint and a wrist joint is provided. The palm has a first pivot and a first lock set. The upper arm has a socket. The elbow joint connects the forearm to the upper arm. The wrist joint includes a first connecting rod connected to the forearm. The first pivot rotatably penetrates through the first connecting rod. The first lock set is locked to the first pivot. A first wedge surface of the first lock set contacts a second wedge surface of the first connecting rod. By adjusting a distance between the first lock set and the first pivot, a magnitude of a forward force between the first wedge surface and the second wedge surface is adjusted, such that the palm is fixed relative to the first connecting rod or rotatable around an axial direction perpendicular to an extending direction of the forearm.

Abstract: A method of making a curved electrochromic film includes: disposing a UV curable adhesive layer between a first electrochromic member and a second electrochromic member to form an electrochromic film semi-product in flat form; arching the electrochromic film semi-product between the first and second bending members of a forming apparatus and by moving the first and second bending members toward each other; and curing the UV curable adhesive layer using a UV light source while the electrochromic film semi-product is arched. Forming apparatuses for forming a flat electrochromic film semi-product into a curved electrochromic film are also disclosed.

Abstract: The present application provides a method for rejuvenating cells, characterized in that providing a cell to culture in a composition for a suitable period of time of time, wherein the composition is obtained by adding a chitosan solution to a cultural environment. The present application further provides a composition for rejuvenating cells, comprising a chitosan solution in a cultural environment.

Abstract: An additive manufacturing method for a 3D object is provided and includes (a) providing a 3D digital model of the 3D object; (b) dividing the 3D digital model into repeat arrangement of at least one type of polyhedral 3D units and an X-Y plane is an acute angle or an obtuse angle; (c) cutting the 3D digital model along a Z-axis into a plurality of 2D slices; (d) defining a scanning path covering one of the 2D slices; (e) providing an energy beam to a material on a working plane along the scanning path to form a construction layer corresponding to the one of the 2D slices; and (f) repeating the steps (d) and (e) to build up the 3D object by adding a plurality of construction layers in sequence.

Abstract: A process for chemical mechanical polishing a substrate containing tungsten is disclosed to reduce corrosion rate and inhibit dishing of the tungsten and erosion of underlying dielectrics. The process includes providing a substrate; providing a polishing composition, containing, as initial components: water; an oxidizing agent; a thiolalkoxy compound; a dicarboxylic acid, a source of iron ions; a colloidal silica abrasive; and, optionally a pH adjusting agent; providing a chemical mechanical polishing pad, having a polishing surface; creating dynamic contact at an interface between the polishing pad and the substrate; and dispensing the polishing composition onto the polishing surface at or near the interface between the polishing pad and the substrate; wherein some of the tungsten (W) is polished away from the substrate, corrosion rate is reduced, dishing of the tungsten (W) is inhibited as well as erosion of dielectrics underlying the tungsten (W).

Abstract: A device includes a substrate, and an alignment mark including a conductive through-substrate via (TSV) penetrating through the substrate.