Abstract: An acoustic device includes a first sound producing component and a back cavity structure. The first sound producing component has a first front side and a first back side, wherein the first sound producing component is a high frequency sound unit, and the first front side faces a sound propagating opening of the acoustic device. The back cavity structure is connected to the first back side of the first sound producing component. The first sound producing component produces a first acoustic wave from the first front side towards the sound propagating opening, and the first sound producing component produces a second acoustic wave from the first back side towards a back cavity of the back cavity structure. The back cavity structure is configured to flatten a peak or a dip of a frequency response of the first sound producing component.

Abstract: A method of manufacturing a semiconductor device having a first and second transistor of an ESD protection and internal circuit respectively. The method includes the steps of providing a substrate, forming gates of the first and second transistor on the substrate, depositing a mask layer and patterning the mask layer using one single mask to remove the mask layer on the gates, a portion of a drain region of the first transistor, and a source and drain region of the second transistor, implementing ESD implantation under the regions without the patterned mask layer, removing the mask layer and forming sidewall spacers of the gates, and implementing drain diffusion.

Abstract: The invention discloses an audio/video output adjusting system including a decoder, a memory unit, a parser and a processor. The decoder is used for decoding an inputted audio/video sequence as a digital sequence. The memory unit is used for storing a look-up table. The parser is used for receiving the digital sequence, determining a program type of the digital sequence according to the look-up table and outputting the digital sequence as a video sequence and an audio sequence. The processor is used for receiving the video sequence and the audio sequence and, according to the program type, selectively adjusting the video sequence and/or the audio sequence by a predetermined mode.

Abstract: A substrate used in a semiconductor device. The substrate includes a first wiring layer, a second wiring layer, and an interconnection-wiring layer. The first wiring layer includes a plurality of first pads, and the second wiring layer includes a plurality of second pads. The interconnection-wiring layer is set between the first and second wiring layer. In this case, at least one of the second pads that does not electrically connect to anyone of the first pads electrically connects to the interconnection-wiring layer. In another case, a shielding portion, which electrically connects the interconnection-wiring layer, is provided around the second pad that doesn't electrically connect to anyone of the first pads. Furthermore, this invention also discloses a semiconductor device including the substrate.

Abstract: An electrostatic discharge protection circuit. The electrostatic discharge (ESD) circuit utilizes inductors and resistors added to sources of multiple fingers of the NMOS transistor, which is triggered by some feedback circuit uniformly. When under an ESD zapping, a finger MOS transistor is trigger initially to snapback region owing to its layout or other causes, a voltage drop across the inductor or the resistor connected to the source of the finger MOS transistor is occurred and presented to gates of the other finger MOS transistors by the feedback circuit. Thus, the other finger MOS transistors are turned on.

Abstract: An ESD protection circuit with tunable gate-bias coupled between a first and second pads for receiving power supply voltages. The ESD protection circuit includes a diode, a resistor coupled between the cathode of the diode and the first pad, a capacitor coupled between the cathode of the diode and the second pad, a first transistor of a first conductivity type having a gate coupled to the cathode of the diode, a drain coupled to the anode of the diode and a source coupled to the second pad, a second transistor of a second conductivity type having a gate coupled to the cathode of the diode, a drain coupled to the anode of the diode and a source coupled to the first pad, and a third transistor of the first conductivity type having a gate coupled to the anode of the diode, a drain coupled to the first pad and a source coupled to the second pad.

Abstract: A method of manufacturing a semiconductor device having a first and second transistor of an ESD protection and internal circuit respectively. The method includes the steps of providing a substrate, forming gates of the first and second transistor on the substrate, depositing a mask layer and patterning the mask layer using one single mask to remove the mask layer on the gates, a portion of a drain region of the first transistor, and a source and drain region of the second transistor, implementing ESD implantation under the regions without the patterned mask layer, removing the mask layer and forming sidewall spacers of the gates, and implementing drain diffusion.

Abstract: A method of manufacturing a semiconductor device having a first and second transistor of an ESD protection and internal circuit respectively. The method includes the steps of providing a substrate, forming gates of the first and second transistor on the substrate, depositing a mask layer and patterning the mask layer using one single mask to remove the mask layer on the gates, a portion of a drain region of the first transistor, and a source and drain region of the second transistor, implementing ESD implantation under the regions without the patterned mask layer, removing the mask layer and forming sidewall spacers of the gates, and implementing drain diffusion.

Abstract: An low-voltage triggered PNP device for input signals with voltage level larger than VDD or less than VSS. The ESD protection device provides an ESD path from a first to a second node for protection of an internal circuit. The device comprises a substrate of a first conductivity type coupled to the first node, a first doped region of a second conductivity type in the substrate, wherein the first doped region is floated, a second doped region of the first conductivity type in the first doped region coupled to the second node, and a third doped region in the substrate, adjacent to the first doped region, to have a low trigger voltage.

Abstract: A method of manufacturing a semiconductor device having a first and second transistor of an ESD protection and internal circuit respectively. The method includes the steps of providing a substrate, forming gates of the first and second transistor on the substrate, depositing a mask layer and patterning the mask layer using one single mask to remove the mask layer on the gates, a portion of a drain region of the first transistor, and a source and drain region of the second transistor, implementing ESD implantation under the regions without the patterned mask layer, removing the mask layer and forming sidewall spacers of the gates, and implementing drain diffusion.

Abstract: A subtractor is connected between a p-channel bandgap reference unit and an n-channel bandgap reference unit. The subtractor includes two NPN transistors connected to the p-channel bandgap reference unit, and two PNP transistors connected to the n-channel bandgap reference unit. The subtractor takes the difference of the two currents produced by the p-channel and n-channel bandgap reference units and generates a temperature insensitive and curvature-compensated reference voltage of less than one volt across an output resistor.

Abstract: A subtractor is connected between a p-channel bandgap reference unit and an n-channel bandgap reference unit. The subtractor includes two NPN transistors connected to the p-channel bandgap reference unit, and two PNP transistors connected to the n-channel bandgap reference unit. The subtractor takes the difference of the two currents produced by the p-channel and n-channel bandgap reference units and generates a temperature insensitive and curvature-compensated reference voltage of less than one volt across an output resistor.

Abstract: The present invention relates to a device for protecting high frequency RF integrated circuits from ESD damage. The device comprises at least one varactor-LC circuit tank stacked to avoid the power gain loss by the parasitic capacitance of ESD circuit. The varactor-LC tank could be designed to resonate at the RF operating frequency to avoid the power gain loss from the parasitic capacitance of ESD circuit. Multiple LC-tanks could be stacked for further reduction in the power gain loss. A reverse-biased diode is used as the varactor for both purposes of impedance matching and effective ESD current discharging. Because the inductor is made of metal, both the inductor and the varactor can discharge ESD current when ESD condition happens. It has a high enough ESD level to prevent ESD discharge.

Abstract: Voltage dividing resistors (R1a, R1b, R2a, R2b) are connected in parallel with diode connected bipolar transistors (Q1, Q2) for splitting the voltage to the inputs of an operational amplifier (62, 82). Current is provided to this arrangement by current sources (I1, I2). When the supply voltage is about 0.85 volts, a temperature insensitive reference voltage of about 200 millivolts is available at the drain of a second transistor (M2, M2).

Abstract: A method of manufacturing a semiconductor device having a first and second transistor of an ESD protection and internal circuit respectively. The method includes the steps of providing a substrate, forming gates of the first and second transistor on the substrate, depositing a mask layer and patterning the mask layer using one single mask to remove the mask layer on the gates, a portion of a drain region of the first transistor, and a source and drain region of the second transistor, implementing ESD implantation under the regions without the patterned mask layer, removing the mask layer and forming sidewall spacers of the gates, and implementing drain diffusion.

Abstract: An ESD protection circuit with tunable gate-bias coupled between a first and second pads for receiving power supply voltages. The ESD protection circuit includes a diode, a resistor coupled between the cathode of the diode and the first pad, a capacitor coupled between the cathode of the diode and the second pad, a first transistor of a first conductivity type having a gate coupled to the cathode of the diode, a drain coupled to the anode of the diode and a source coupled to the second pad, a second transistor of a second conductivity type having a gate coupled to the cathode of the diode, a drain coupled to the anode of the diode and a source coupled to the first pad, and a third transistor of the first conductivity type having a gate coupled to the anode of the diode, a drain coupled to the first pad and a source coupled to the second pad.

Abstract: An electrostatic discharge protection circuit. The electrostatic discharge (ESD) circuit utilizes inductors and resistors added to sources of multiple fingers of the NMOS transistor, which is triggered by some feedback circuit uniformly. When under an ESD zapping, a finger MOS transistor is trigger initially to snapback region owing to its layout or other causes, a voltage drop across the inductor or the resistor connected to the source of the finger MOS transistor is occurred and presented to gates of the other finger MOS transistors by the feedback circuit. Thus, the other finger MOS transistors are turned on.

Abstract: A substrate used in a semiconductor device. The substrate includes a first wiring layer, a second wiring layer, and an interconnection-wiring layer. The first wiring layer includes a plurality of first pads, and the second wiring layer includes a plurality of second pads. The interconnection-wiring layer is set between the first and second wiring layer. In this case, at least one of the second pads that does not electrically connect to anyone of the first pads electrically connects to the interconnection-wiring layer. In another case, a shielding portion, which electrically connects the interconnection-wiring layer, is provided around the second pad that doesn't electrically connect to anyone of the first pads. Furthermore, this invention also discloses a semiconductor device including the substrate.

Abstract: A substrate used in a semiconductor device. The substrate includes a first wiring layer, a second wiring layer, and an interconnection-wiring layer. The first wiring layer includes a plurality of first pads while the second wiring layer includes a plurality of second pads. The interconnection-wiring layer is set between the first and second wiring layer. In this case, at least one of the second pads isn't electrically connected with anyone of the first pads, and other second pads that located adjacent to this second pad, which is not electrically connected with the first pads, electrically connect to the interconnection-wiring layer. Furthermore, this invention also discloses a semiconductor device including the substrate.

Abstract: An electrostatic discharge protection circuit. The electrostatic discharge protection circuit utilizes the non-uniform triggering of multi-finger gate-grounded NMOS. The source of the finger which has the potential to trigger on is coupled to the base terminal of all the parasitic bipolar transistor of all the other multi-finger gate-ground NMOS structures. Thus, the finger which has the potential to be triggered can be used as a triggering device to trigger the other finger devices during an ESD event. By using this method, the ESD protection NMOS or PMOS, realized with multi-finger layout structure, can be uniformally triggered on to discharge ESD current. Therefore, it can have a high ESD robustness in a small layout area.