Patents by Inventor Wen-Zhan Zhou

Wen-Zhan Zhou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12025917
    Abstract: A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: July 2, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang, Ho-Yung David Hwang
  • Publication number: 20230384680
    Abstract: A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
    Type: Application
    Filed: August 4, 2023
    Publication date: November 30, 2023
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang, Ho-Yung David Hwang
  • Publication number: 20220074668
    Abstract: A controller includes a non-transitory computer readable medium configured to store information related to a target temperature of a wafer, a target temperature of a heating element, a temperature of the wafer, and a temperature of the heating element. The controller further includes a processor connected to the non-transitory computer readable medium, the processor configured to generate at least one heating signal during a baking process to adjust a duration of an entirety of the baking process in response to the temperature of the wafer and the temperature of the heating element.
    Type: Application
    Filed: November 16, 2021
    Publication date: March 10, 2022
    Inventors: Tzung-Chen WU, Heng-Jen LEE, Ho-Yung David HWANG, Wen-Zhan ZHOU
  • Patent number: 11204200
    Abstract: A method includes supporting a wafer on a heating element, wherein the heating element is located in a baking chamber. The method further includes heating the wafer for a first duration using the heating element. The method further includes measuring a temperature of the heating element and a temperature of the wafer during the first duration to obtain temperature information. The method further includes adjusting an amount of heat provided by the heating element during the first duration, wherein the adjusting of the amount of heat includes decreasing the amount of heat provided by the heating element as a rate of change of the temperature information versus time increases.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: December 21, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tzung-Chen Wu, Wen-Zhan Zhou, Heng-Jen Lee, Ho-Yung David Hwang
  • Publication number: 20200124967
    Abstract: A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
    Type: Application
    Filed: December 17, 2019
    Publication date: April 23, 2020
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang, Ho-Yung David Hwang
  • Patent number: 10558120
    Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
    Type: Grant
    Filed: November 8, 2017
    Date of Patent: February 11, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang, Ho-Yung David Hwang
  • Patent number: 10274839
    Abstract: A method for controlling semiconductor production through use of a Focus Exposure Matrix (FEM) model includes taking measurements of characteristics of a two-dimensional mark formed onto a substrate, the two-dimensional mark including two different patterns along two different cut-lines, and comparing the measurements with a FEM model to determine focus and exposure conditions used to form the two-dimensional mark. The FEM model was created using measurements taken of corresponding two-dimensional marks formed onto a substrate under varying focus and exposure conditions.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: April 30, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Chen-Ming Wang, Kai-Hsiung Cheng, Chih-Ming Ke, Ho-Yung David Hwang
  • Publication number: 20180306514
    Abstract: A method includes supporting a wafer on a heating element, wherein the heating element is located in a baking chamber. The method further includes heating the wafer for a first duration using the heating element. The method further includes measuring a temperature of the heating element and a temperature of the wafer during the first duration to obtain temperature information. The method further includes adjusting an amount of heat provided by the heating element during the first duration, wherein the adjusting of the amount of heat includes decreasing the amount of heat provided by the heating element as a rate of change of the temperature information versus time increases.
    Type: Application
    Filed: June 25, 2018
    Publication date: October 25, 2018
    Inventors: Tzung-Chen WU, Wen-Zhan ZHOU, Heng-Jen LEE, Ho-Yung David HWANG
  • Patent number: 10006717
    Abstract: An adaptive baking system includes a baking chamber configured to receive a wafer, and a heating element configured to support the wafer. The adaptive baking system further includes a controller configured to receive temperature information related to the heating element and the wafer, wherein the controller is further configured to adjust an amount of heat provided by the heating element during a baking process in response to the temperature information.
    Type: Grant
    Filed: March 7, 2014
    Date of Patent: June 26, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tzung-Chen Wu, Wen-Zhan Zhou, Heng-Jen Lee, Ho-Yung David Hwang
  • Publication number: 20180067395
    Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
    Type: Application
    Filed: November 8, 2017
    Publication date: March 8, 2018
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang, Ho-Yung David Hwang
  • Patent number: 9817315
    Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: November 14, 2017
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang, Ho-Yung David Hwang
  • Patent number: 9766554
    Abstract: A structure in semiconductor fabrication includes at least a first periodic asymmetric feature and a periodic asymmetric second feature. The first feature contains a plurality of periodically distributed first elements. The first feature has a first asymmetric profile such that the first feature no longer has the same first asymmetric profile when it is rotated by 180 degrees. The second feature contains a plurality of periodically distributed second elements. The second feature has a second asymmetric profile such that the second feature no longer has the same second asymmetric profile when it is rotated by 180 degrees. The second asymmetric profile is different from the first asymmetric profile.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: September 19, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yen-Liang Chen, Chih-Ming Ke, Kai-Hsiung Chen, Wen-Zhan Zhou
  • Patent number: 9690212
    Abstract: A method for controlling semiconductor production through use of a hybrid Focus Exposure Matrix (FEM) model includes taking measurements of a set of structures formed onto a substrate. The method further includes using a FEM model to determine focus and exposure conditions used to form the structure The model was created through use of measurements of structures formed on a substrate under varying focus and exposure conditions, the measurements being taken using both an optical measurement tool and a scanning electron microscope.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: June 27, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Yen-Liang Chen, Kai-Hsiung Chen, Chih-Ming Ke, Ho-Yung David Hwang
  • Publication number: 20160274456
    Abstract: A structure in semiconductor fabrication includes at least a first periodic asymmetric feature and a periodic asymmetric second feature. The first feature contains a plurality of periodically distributed first elements. The first feature has a first asymmetric profile such that the first feature no longer has the same first asymmetric profile when it is rotated by 180 degrees. The second feature contains a plurality of periodically distributed second elements. The second feature has a second asymmetric profile such that the second feature no longer has the same second asymmetric profile when it is rotated by 180 degrees. The second asymmetric profile is different from the first asymmetric profile.
    Type: Application
    Filed: May 20, 2015
    Publication date: September 22, 2016
    Inventors: Yen-Liang Chen, Chih-Ming Ke, Kai-Hsiung Chen, Wen-Zhan Zhou
  • Publication number: 20150261089
    Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
    Type: Application
    Filed: March 13, 2014
    Publication date: September 17, 2015
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang, Ho-Yung David Hwang
  • Publication number: 20150253083
    Abstract: An adaptive baking system includes a baking chamber configured to receive a wafer, and a heating element configured to support the wafer. The adaptive baking system further includes a controller configured to receive temperature information related to the heating element and the wafer, wherein the controller is further configured to adjust an amount of heat provided by the heating element during a baking process in response to the temperature information.
    Type: Application
    Filed: March 7, 2014
    Publication date: September 10, 2015
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMAPNY, LTD.
    Inventors: Tzung-Chen WU, Wen-Zhan ZHOU, Heng-Jen LEE, Ho-Yung David HWANG
  • Patent number: 9034720
    Abstract: A method and a device are provided for diffracting incident light from a lithographic scanner in an IC process flow. Embodiments include forming a diffraction grating in a first layer on a semiconductor substrate; and forming a plurality of lithographic alignment marks in a second layer, overlying the first layer, wherein the diffraction grating has a width and a length greater than or equal to a width and length, respectively, of the plurality of lithographic alignment marks.
    Type: Grant
    Filed: August 17, 2012
    Date of Patent: May 19, 2015
    Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
    Inventors: Hui Liu, Wen Zhan Zhou, Zheng Zou, Qun Ying Lin, Alex Kai Hung See
  • Patent number: 8987134
    Abstract: Semiconductor devices and methods of making thereof are disclosed. The semiconductor device includes a substrate prepared with a first dielectric layer formed thereon. The dielectric layer includes at least first, second and third contact regions. A second dielectric layer is disposed over the first dielectric layer. The device also includes at least first, second and third via contacts disposed in the second dielectric layer. The via contacts are coupled to the respective underlying contact regions and the via contacts do not extend beyond the underlying contact regions.
    Type: Grant
    Filed: June 6, 2013
    Date of Patent: March 24, 2015
    Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
    Inventors: Zhehui Wang, Kwee Liang Yeo, Hai Cong, Huang Liu, Wen Zhan Zhou
  • Publication number: 20140257761
    Abstract: A method for controlling semiconductor production through use of a hybrid Focus Exposure Matrix (FEM) model includes taking measurements of a set of structures formed onto a substrate. The method further includes using a FEM model to determine focus and exposure conditions used to form the structure The model was created through use of measurements of structures formed on a substrate under varying focus and exposure conditions, the measurements being taken using both an optical measurement tool and a scanning electron microscope.
    Type: Application
    Filed: May 24, 2013
    Publication date: September 11, 2014
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Yen-Liang Chen, Kai-Hsiung Chen, Chih-Ming Ke, Ho-Yung David Hwang
  • Publication number: 20140253901
    Abstract: A method for controlling semiconductor production through use of a Focus Exposure Matrix (FEM) model includes taking measurements of characteristics of a two-dimensional mark formed onto a substrate, the two-dimensional mark including two different patterns along two different cut-lines, and comparing the measurements with a FEM model to determine focus and exposure conditions used to form the two-dimensional mark. The FEM model was created using measurements taken of corresponding two-dimensional marks formed onto a substrate under varying focus and exposure conditions.
    Type: Application
    Filed: May 24, 2013
    Publication date: September 11, 2014
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Chen-Ming Wang, Kai-Hsiung Cheng, Chih-Ming Ke, Ho-Yung David Hwang