Abstract: A double-sided digital lithography or exposure system and method are provided. The system includes a first optical engine 110 for exposing a front side of a substrate 910, a second optical engine 120 for exposing the back side of the substrate 910, a control system 710 for generating a first exposure pattern and a second exposure pattern aligned on the front and back surfaces of the substrate 910 based on the position information of the first optical engine 110 and the second optical engine 120, and controlling the first optical engine 110 and the second optical engine 120 to expose the front and back surfaces of the substrate 910 with the first exposure pattern and the second exposure pattern.

Abstract: A new type of fine metal mask (FMM) used in OLED production and the method of manufacturing it, wherein the FMM includes a frame made of a metal substrate with a plurality of through holes, a layer of fine mask electroformed on the surface of the frame so that said fine mask and said frame are seamlessly integrated, said fine mask is divided into a pattern area and a border area, and the pattern area corresponds to the through holes on the frame, and the method of manufacturing such an FMM comprising the steps of: A. providing a metal substrate by cutting an invar alloy or stainless steel plate to a desired size; B. providing an fine mask by adding a photoresist layer on the metal substrate, exposing a desired pattern onto said photoresist layer, and electroforming a metal base layer and a metal layer with a low thermal expansion coefficient; and C.

Abstract: A maskless exposure system that has multiple maskless optical engines arranged in an (N×M) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.

Abstract: A double-sided maskless exposure system and method consists of light sources which includes two light wavelength segments, maskless optical engines in which a 2D spatial light modulation (spatial light modulator) device, such as DMD, is generating a plurality of pixel array of the pattern, vision system, moving substrate and computer control system. The double-sided maskless exposure system at least includes two maskless optical engines with auto-calibration function which can correct any alignment error in-line. Each optical engine is for each side of the substrate. The optical engines are aligned each other in pairs and are simultaneously patterning on each side of the moving substrate. The system also includes a manipulator for moving, stepping or scanning the optical engines, relative to the substrate so that it can create a contiguous whole image on the both sides of the subject.

Abstract: A new type of fine metal mask (FMM) used in OLED production and the method of manufacturing it, wherein the FMM includes a frame made of a metal substrate with a plurality of through holes, a layer of fine mask electroformed on the surface of the frame so that said fine mask and said frame are seamlessly integrated, said fine mask is divided into a pattern area and a border area, and the pattern area corresponds to the through holes on the frame, and the method of manufacturing such an FMM comprising the steps of: A. providing a metal substrate by cutting an invar alloy or stainless steel plate to a desired size; B. providing an fine mask by adding a photoresist layer on the metal substrate, exposing a desired pattern onto said photoresist layer, and electroforming a metal base layer and a metal layer with a low thermal expansion coefficient; and C.

Abstract: A maskless exposure system that has multiple maskless optical engines arranged in an (N×M) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.

Abstract: A double-sided maskless exposure system and method consists of light sources which includes two light wavelength segments, maskless optical engines in which a 2D spatial light modulation(spatial light modulator) device, such as DMD, is generating a plurality of pixel array of the pattern, vision system, moving substrate and computer control system. The double-sided maskless exposure system at least includes two maskless optical engines with auto-calibration function which can correct any alignment error in-line. Each optical engine is for each side of the substrate. The optical engines are aligned each other in pairs and are simultaneously patterning on each side of the moving substrate. The system also includes a manipulator for moving, stepping or scanning the optical engines, relative to the substrate so that it can create a contiguous whole image on the both sides of the subject.

Abstract: An “image writing” and “image reading” system and method for providing a pattern to a subject such as a wafer is provided or an image to an image sensor such as CCD. The system includes a pixel panel, such as a digital mirror device or a liquid crystal display or other SLM, for generating for creating a plurality of sub-image array of the pattern in “image writing” case. The pixel elements are simultaneously divided to a sub-image array on the subject by a lens system. The system also includes a stage for moving, stepping or scanning the pixel panel, relative to the subject so that it can create a contiguous whole image on the subject.

Abstract: An “image writing” and “image reading” system and method for providing a pattern to a subject such as a wafer is provided or an image to an image sensor such as CCD. The system includes a pixel panel, such as a digital mirror device or a liquid crystal display or other SLM, for generating for creating a plurality of sub-image array of the pattern in image writing? case. The pixel elements are simultaneously divided to a sub-image array on the subject by a lens system.

Abstract: A method and system is provided for moving a substrate relative to a pixel panel in a digital photolithography system. The method can be used for performing photolithography on a substrate, the substrate having a first portion with a first design resolution and a second portion with a second design resolution. The method includes scanning the first portion of the substrate, having the first design resolution, at a first speed and scanning the second portion of the substrate, having the second design resolution, at a second speed, different from the first.

Abstract: A method for losslessly transmitting data is provided. The data is separated into two or more portions and the second portion is subtracted from the first portion to find a difference. The first portion and the difference are transmitted, and then the second portion is reconstructed by adding the difference to the first portion. The data may comprise two or more images, with each image being a temporally displaced version of the preceding image. Each image may be divided into multiple areas, where the areas on each image correspond to the areas on the other images. A difference may be obtained by subtracting each area of an image from the corresponding area of the preceding image. The first image may then be transferred as a reference image along with the differences, and each image may be reconstructed by adding each difference to the corresponding area of the previous image.

Abstract: A system and method for extracting and manipulating image data is provided. A pixel panel is rotated so as to increase a resolution of a projected image. The rotation may be calculated so as to achieve a desired resolution. A portion of the image is retrieved from a memory and an address is calculated for either the portion or discrete bits in order to determine where the bits should appear on the pixel panel. The manipulated bits are transferred to a buffer, which may be a line or frame buffer, and from the buffer to the pixel panel. One or more shift registers may be used to shift the bits into the buffer.

Abstract: Attorney Docket No. 22397.324A method and system is provided for moving a substrate relative to a pixel panel in a digital photolithography system. The method can be used for performing photolithography on a substrate, the substrate having a first portion with a first design resolution and a second portion with a second design resolution. The method includes scanning the first portion of the substrate, having the first design resolution, at a first speed and scanning the second portion of the substrate, having the second design resolution, at a second speed, different from the first.

Abstract: A method for scaling a pixel location in a digital photolithography system by rotating a pixel panel is provided. The method determines the angle of rotation of the pixel panel relative to a subject and calculates the original location of the pixel to be scaled. The method calculates the desired location of the pixel and determines the angle through which the pixel panel should be rotated to align the pixel with the desired location in a first dimension. The scan rate of the pixel panel and the subject is altered to align the pixel with the desired location in a second dimension.

Abstract: A new and unique method for fabricating a microlens array is provided. First, a mask layer is applied to an optical substrate. One or more holes are then created in the mask layer so that corresponding first cavities can then be created in the substrate. Each of these first cavities has a predetermined depth and a first width. The mask layer is then removed so that one or more second cavities can be created in the substrate, the second cavities corresponding with the first cavities. Each of these second cavities has approximately the same predetermined depth as the corresponding first cavity and having a second width greater than the first width.

Abstract: Attorney Docket No. 22397.298A system and method for an imaging system is provided. The system utilizes multiple optic fibers arranged so that the input ends of the fibers are positioned around an oval and the output ends are positioned in a line. An axis runs through the center of the oval. One or more laser diodes or LEDs may be used to project light into the fibers. The diodes may be rotated around the axis to scan across the input end of each fiber or a redirection device, such as a parallel glass, may be used to scan the light from one or more stationary diodes across the input ends of the fibers.

Abstract: A system for image-scanning a pixel-mask pattern onto a subject, such as a subject in digital photolithography, is provided. The system includes a pixel panel for generating a pixel pattern formed of pixel elements. A lens system positioned between the panel and the subject simultaneously directs the pixel elements to the subject. A mirror positioned between the panel and the subject enables the system to direct the pixel elements to a portion of the subject at any one time. A computing system may be used to generate the pixel elements and provide the pixel elements to the panel in a predetermined sequence.

Abstract: A digital photolithography system is provided that is capable of making smooth diagonal components. The system includes a computer for providing a first digital pattern to a digital pixel panel, such as a deformable mirror device (DMD). The DMD is capable of providing a first plurality of pixel elements for exposure onto a plurality of wafer sites. After exposure, the wafer can be scanned a distance less than the site length. The DMD then receives a second digital pattern for exposing a second plurality of pixel elements onto the plurality of sites of the subject. The exposed second plurality of pixel elements overlaps the exposed first plurality of pixel elements. This overlapping allows incremental changes to be made in the image being exposed, thereby accommodating the creation of diagonal components.

Abstract: A laser diode array light source includes a plurality of semiconductor diodes attached to a first substrate, with each diode having an aperture for emitting an output of light positioned on a side of the diode, the side being generally perpendicular to the first substrate. A second substrate is positioned adjacent to the first substrate and includes a plurality of reflective surfaces for redirecting each of the outputs of light. In this way, the light from the plurality of diodes can be commonly directed to provide a directional light source.

Abstract: Disclosed is a method, system, and lense system for performing lithography on a substrate. The system includes a unique lense system for nonplanar substrates. The lense system includes a first lense section for receiving a pattern and producing a concave image of the pattern. The concave image can the be received by a second lense section for producing a nonplanar image of the pattern. The system also includes two light sources and a digital imaging device for projecting and exposing the pattern through the lense section and onto the substrate. Light from the first light source is used for exposing the pattern while light from second light source is used for receiving an alignment image. An image sensor, using the light from the second light source, detects an alignment image from the substrate. The alignment image is used to accommodate the projection of the pattern onto the substrate so that the pattern is properly aligned to the substrate.