Abstract: A system for performing digital lithography onto a subject is provided. The system utilizes pixel panels to generate pixel patterns. Mirrors are utilized to divert and align the pixel elements forming the patterns onto a subject. A gradient lens system positioned between the panels and the subject simultaneously directs the pixel elements to the subject. The pixel elements may overlapping, adjacent, or spaced as desired. The pixel elements may be directed to multiple surfaces simultaneously. One or more point array units may be utilized in the system to achieve higher resolution.

Abstract: A system for image-scanning a pixel-mask pattern onto a subject, such as a subject in digital photolithography, is provided. The system includes a pixel panel for generating a pixel pattern formed of pixel elements. A lens system positioned between the panel and the subject simultaneously directs the pixel elements to the subject. A mirror positioned between the panel and the subject enables the system to direct the pixel elements to a portion of the subject at any one time. A computing system may be used to generate the pixel elements and provide the pixel elements to the panel in a predetermined sequence.

Abstract: Method and apparatus are described for aligning a spherical-shaped semiconductor having an alignment mark, the device comprising a housing having a bore for receiving the spherical-shaped semiconductor; an optical sensing system and controller for ascertaining the position and orientation of the alignment mark; and rotatable vacuum rods for rotating the spherical-shaped semiconductor along at least two axes thereof, thereby rotating the alignment mark into a predetermined orientation.