Abstract: Embodiments relate to a method for representing data in a graphene-based memory device. The method includes applying a first voltage to a back gate of a graphene-based memory device and a second voltage to a first graphene layer of the graphene-based memory device. The graphene-based memory device includes the first graphene layer and a second graphene layer and a first insulation layer located between the first and second graphene layers. The first insulation layer has an opening between the first and second graphene layers. The back gate is located on an opposite side of the second graphene layer from the first insulation layer. The first graphene layer is configured to bend into the opening of the first insulation layer to contact the second graphene layer based on a first electrostatic force generated by the applying the first voltage to the back gate.

Abstract: A silicon nitride layer is provided on an uppermost surface of a graphene layer and then a hafnium dioxide layer is provided on an uppermost surface of the silicon nitride layer. The silicon nitride layer acts as a wetting agent for the hafnium dioxide layer and thus prevents the formation of discontinuous columns of hafnium dioxide atop the graphene layer. The silicon nitride layer and the hafnium dioxide layer, which collectively form a low EOT bilayer gate dielectric, exhibit continuous morphology atop the graphene layer.

Abstract: Embodiments relate to a method for representing data in a graphene-based memory device. The method includes applying a first voltage to a back gate of a graphene-based memory device and a second voltage to a first graphene layer of the graphene-based memory device. The graphene-based memory device includes the first graphene layer and a second graphene layer and a first insulation layer located between the first and second graphene layers. The first insulation layer has an opening between the first and second graphene layers. The back gate is located on an opposite side of the second graphene layer from the first insulation layer. The first graphene layer is configured to bend into the opening of the first insulation layer to contact the second graphene layer based on a first electrostatic force generated by the applying the first voltage to the back gate.

Abstract: A method of forming a semiconductor device includes forming a field-effect transistor (FET), and forming a fuse which includes a graphene layer and is electrically connected to the FET.

Abstract: A semiconductor device includes a field-effect transistor (FET), and a fuse which includes a graphene layer and is electrically connected to the FET.

Abstract: Semiconductor nano-devices, such as nano-probe and nano-knife devices, which are constructed using graphene films that are suspended between open cavities of a semiconductor structure. The suspended graphene films serve as electro-mechanical membranes that can be made very thin, from one or few atoms in thickness, to greatly improve the sensitivity and reliability of semiconductor nano-probe and nano-knife devices.

Abstract: Semiconductor nano-devices, such as nano-probe and nano-knife devices, which are constructed using graphene films that are suspended between open cavities of a semiconductor structure. The suspended graphene films serve as electro-mechanical membranes that can be made very thin, from one or few atoms in thickness, to greatly improve the sensitivity and reliability of semiconductor nano-probe and nano-knife devices.

Abstract: Semiconductor nano pressure sensor devices having graphene membrane suspended over cavities formed in a semiconductor substrate. A suspended graphene membrane serves as an active electro-mechanical membrane for sensing pressure, which can be made very thin, from about one atomic layer to about 10 atomic layers in thickness, to improve the sensitivity and reliability of a semiconductor pressure sensor device.

Abstract: A technique for a nanodevice is provided. A reservoir is separated into two parts by a membrane. A nanopore is formed through the membrane, and the nanopore connects the two parts of the reservoir. The nanopore and the two parts of the reservoir are filled with ionic buffer. The membrane includes a graphene layer and insulating layers. The graphene layer is wired to first and second metal pads to form a graphene transistor in which transistor current flowing through the graphene transistor is modulated by charges or dipoles passing through the nanopore.

Abstract: A technique for a nanodevice is provided. A reservoir is separated into two parts by a membrane. A nanopore is formed through the membrane, and the nanopore connects the two parts of the reservoir. The nanopore and the two parts of the reservoir are filled with ionic buffer. The membrane includes a graphene layer and insulating layers. The graphene layer is wired to first and second metal pads to form a graphene transistor in which transistor current flowing through the graphene transistor is modulated by charges passing through the nanopore.

Abstract: Semiconductor nano pressure sensor devices having graphene membrane suspended over open cavities formed in a semiconductor substrate. A suspended graphene membrane serves as an active electro-mechanical membrane for sensing pressure, which can be made very thin, from about one atomic layer to about 10 atomic layers in thickness, to improve the sensitivity and reliability of a semiconductor pressure sensor device.

Abstract: Embodiments relate to a method of forming a graphene-based memory device. The method includes forming a forming a first graphene layer on an first insulator layer, and forming a second insulation layer on the first graphene layer. The method further includes forming a second graphene layer on the second insulation layer and forming an opening in the second insulation layer to expose a portion of the first graphene layer and a portion of the second graphene layer and to suspend the exposed portion of the second graphene layer in the opening.

Abstract: A semiconductor structure which includes a substrate; a graphene layer on the substrate; a source electrode and a drain electrode on the graphene layer, the source electrode and drain electrode being spaced apart by a predetermined dimension; a nitride layer on the graphene layer between the source electrode and drain electrode; and a gate electrode on the nitride layer, wherein the nitride layer is a gate dielectric for the gate electrode.

Abstract: Embodiments relate to a graphene-based memory device. The graphene-based memory device includes a first graphene layer and a second graphene layer. A first insulation layer is located between the first and second graphene layers. The first insulation layer has an opening between the first and second graphene layers, and the first graphene layer is configured to bend into the opening to contact the second graphene layer based on a first electrostatic force.

Abstract: A silicon nitride layer is provided on an uppermost surface of a graphene layer and then a hafnium dioxide layer is provided on an uppermost surface of the silicon nitride layer. The silicon nitride layer acts as a wetting agent for the hafnium dioxide layer and thus prevents the formation of discontinuous columns of hafnium dioxide atop the graphene layer. The silicon nitride layer and the hafnium dioxide layer, which collectively form a low EOT bilayer gate dielectric, exhibit continuous morphology atop the graphene layer.

Abstract: Semiconductor nano-devices, such as nano-probe and nano-knife devices, which are constructed using graphene films that are suspended between open cavities of a semiconductor structure. The suspended graphene films serve as electro-mechanical membranes that can be made very thin, from one or few atoms in thickness, to greatly improve the sensitivity and reliability of semiconductor nano-probe and nano-knife devices.

Abstract: Semiconductor nano-devices, such as nano-probe and nano-knife devices, which are constructed using graphene films that are suspended between open cavities of a semiconductor structure. The suspended graphene films serve as electro-mechanical membranes that can be made very thin, from one or few atoms in thickness, to greatly improve the sensitivity and reliability of semiconductor nano-probe and nano-knife devices.

Abstract: A semiconductor structure which includes a substrate; a graphene layer on the substrate; a source electrode and a drain electrode on the graphene layer, the source electrode and drain electrode being spaced apart by a predetermined dimension; a nitride layer on the graphene layer between the source electrode and drain electrode; and a gate electrode on the nitride layer, wherein the nitride layer is a gate dielectric for the gate electrode.

Abstract: A three-dimensional integrated circuit includes a semiconductor device, an insulator formed on the semiconductor device, an interconnect formed in the insulator, and a graphene device formed on the insulator.

Abstract: A novel buried-channel graphene device structure and method for manufacture. The new structure includes a two level channel layer comprised of a buried-channel graphene layer with an amorphous silicon top channel layer. The method for making such structure includes the steps of depositing a graphene layer on a substrate, depositing an amorphous silicon layer on the graphene layer, converting the upper layer of the amorphous silicon layer to a gate dielectric by nitridation, oxidation or oxynitridation, while keeping the lower layer of the amorphous silicon layer to serve as part of the channel to form the buried-channel graphene device.