Patents by Inventor Werner H. Mueller
Werner H. Mueller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5648535Abstract: A process for the production of N-acylaminophenols by the concurrent hydrogenation of a nitrophenol to an aminophenol and the acylation of the aminophenol with acyl anhydride takes place on a continuous basis in a stirred tank reactor in which liquid product is continuously withdrawn from the reactor. Of particular interest is the manufacture of acetaminophen, N-acetyl-p-aminophenol by continuous reaction of p-ntirophenol, hydrogen and acetic anhydride.Type: GrantFiled: May 26, 1995Date of Patent: July 15, 1997Assignee: Hoechst Celanese Corp.Inventors: James A. Foster, Werner H. Mueller, Debra A. Ryan, Hartmut Wiezer
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Patent number: 5616807Abstract: A process for the production of N-alkyl anilines by the concurrent hydrogenation of a nitrobenzene to an aniline and the acylation of the aniline with acyl anhydride takes place on a continuous basis in a stirred tank reactor in which liquid product is continuously withdrawn from the reactor.Type: GrantFiled: May 16, 1995Date of Patent: April 1, 1997Assignee: Hoechst Celanese Corp.Inventors: James A. Foster, Werner H. Mueller, Debra A. Ryan
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Patent number: 5466869Abstract: A catalytic process for preparing 4-hydroxyacetophenone oxime by reacting 4-hydroxyacetophenone with NH.sub.3 and H.sub.2 O.sub.2 in the liquid phase, in the presence of a catalyst substantially consisting of a titanium-containing molecular sieve such as a highly crystalline substance, containing SiO.sub.2 and having a zeolitic structure.Type: GrantFiled: October 31, 1994Date of Patent: November 14, 1995Assignee: Hoechst Celanese CorporationInventors: Kenneth G. Davenport, Roger A. Sheldon, Joel Le Bars, Werner H. Mueller
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Patent number: 5405987Abstract: The present invention pertains to a method of preparing substituted and unsubstituted N-hydroxy-2-aminobutane diacid derivatives which can be dehydrated to 2-aminobut-2-ene dioic acid derivatives, which can be subsequently converted to pyridine and quinoline derivatives.Type: GrantFiled: March 28, 1991Date of Patent: April 11, 1995Assignee: Hoechst Celanese CorporationInventors: Varadaraj Elango, Donald R. Larkin, John R. Fritch, Michael P. Bodman, Werner H. Mueller, Bernard F. Gupton, John C. Saukaitis
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Patent number: 5322948Abstract: The present invention pertains to a method of preparing substituted and unsubstituted N-hydroxy-2-aminobutane diacid derivatives. The invention also pertains to the use of N-hydroxy-2-aminoethane derivatives (including the N-hydroxy-2-aminobutane diacid derivatives) in the preparation of pyridine derivatives.Type: GrantFiled: January 2, 1992Date of Patent: June 21, 1994Assignee: Hoechst Celanese CorporationInventors: Varadaraj Elango, Donald R. Larkin, John R. Fritch, Michael P. Bodman, Werner H. Mueller, Bernard F. Gupton, John C. Saukaitis
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Patent number: 5240819Abstract: This invention is that of high temperature polyamides containing the hexafluoroisopropylidene group. The high temperature polyamides of the invention and photo or radiation sensitizers provide improved high temperature positive resists which can be developed in aqueous alkaline developer and thermally anneal to form heat resistant, polyoxazole relief structures suitable for use in microelectronic and printing applications. The positive photoresists of the invention have improved solubility in coating solvents and improved photospeed. The polyamides of the invention can be prepared by conventional condensation reactions; e.g. the condensation of a diamine and diacid chloride. In addition the polyamides of this invention provide high temperature protective coatings with superior adhesion properties in applications other than the photoresist area.Type: GrantFiled: March 11, 1991Date of Patent: August 31, 1993Assignee: Hoechst Celanese CorporationInventors: Werner H. Mueller, Dinesh N. Khanna, Bernd Hupfer
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Patent number: 5124489Abstract: Substituted phenethanol ethers are prepared by the catalytic reduction of corresponding substituted phenylglyoxal acetals. The catalytic reduction is carried out by reacting a substituted phenylglyoxal acetal with hydrogen in the presence of an acid catalyst and a metal catalyst. Certain substituted phenylglyoxal acetals, and more particularly, 4-hydroxyphenylglyoxal dialkyl acetals are prepared by reacting 4-hydroxyacetophenone with a primary or a secondary alkyl alcohol in the presence of a hydrogen ion (H+) source and a nitrosonium ion (NO+) source.Type: GrantFiled: September 6, 1991Date of Patent: June 23, 1992Assignee: Hoechst Celanese CorporationInventors: John R. Durrwachter, Michael Meier, Graham N. Mott, Werner H. Mueller
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Patent number: 5106720Abstract: A base developable negative acting photoresist composition which is thermally stable, provides high resolution at short exposure times and is capable of development by means of conventional aqueous alkaline developers. The present compositions comprise an alkali soluble hydroxylated polyamide and/or polyimide binder material, a photopolymerizable compound containing at least two ethylenically-unsaturated double bonds, and a light-sensitive photoinitiator.Type: GrantFiled: September 11, 1989Date of Patent: April 21, 1992Assignee: Hoechst Celanese CorporationInventors: Werner H. Mueller, Dinesh N. Khanna
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Patent number: 5107034Abstract: The invention provides a method for producing 4-(2'-methoxyethyl)phenol by brominating 4-hydroxyacetophenone to produce alpha-bromo-5-hydroxyacetophenone, and then causing a methoxide-bromide exchange to thereby produce alpha-methoxy-4-hydroxyacetophenone; and then conducting a single step reduction of alpha-methoxy-4-hydroxyacetophenone with at least two equivalents of hydrogen per equivalent of alpha-methoxy-4-hydroxyacetophenone in the presence of a hydrogenation catalyst to thereby directly produce 4-(2'-methoxyethyl)phenol.Type: GrantFiled: March 28, 1990Date of Patent: April 21, 1992Assignee: Hoechst Celanese CorporationInventors: Brad L. Smith, Werner H. Mueller, Heinz Strutz
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Patent number: 5085975Abstract: Polymerizable compounds comprising perfluoroalkyl groups, reproduction layers containing these compounds, and use of the reproduction layers for waterless offset printing. The novel polymerizable compounds comprise at least two acryloyl or methacryloyl groups and at least one perfluoroalkyl group which is linked to the molecule through a functional group, in particular, an ester or amide function. The compounds can be prepared, for example, from hydroxyl group-containing acrylates or methacrylates and perfluoroalkyl group-containing carboxylic acid chlorides, in the presence of an amine or from perfluoroalkyl group-containing carboxylic acid derivatives and reactive acryloyloxy or methacryloyloxy compounds. Oligomeric compounds can additionally be synthesized from the above-mentioned compounds by linking, for example, with diisocyanates.Type: GrantFiled: October 23, 1989Date of Patent: February 4, 1992Assignee: Hoechst AktiengesellschaftInventor: Werner H. Mueller
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Patent number: 5077378Abstract: This invention is that of high temperature polyamides containing the hexafluoroisopropylidene group. The high temperature polyamides of the invention and photo or radiation sensitizers provide improved high temperature positive resists which can be developed in aqueous alkaline developer and thermally anneal to form heat resistant, polyoxazole relief structures suitable for use in microelectronic and printing applications. The positive photoresists of the invention have improved solubility in coating solvents and improved photospeed. The polyamides of the invention can be prepared by conventional condensation reactions; e.g. the condensation of a diamine and diacid chloride. In addition the polyamides of this invention provide high temperature protective coatings with superior adhesion properties in applications other than the photoresist area.Type: GrantFiled: May 21, 1990Date of Patent: December 31, 1991Assignee: Hoechst Celanese CorporationInventors: Werner H. Mueller, Dinesh N. Khanna, Bernd Hupfer
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Patent number: 5074891Abstract: An improved method of gas separation and novel polyimide membranes are disclosed and claimed. Membranes in accordance with the present invention include the condensation product of fluorinated diamines such as 2,2'-bis(3-aminophenyl)hexafluoropropane, 2,2'-bis(4-aminophenyl)hexafluoropropane and 2-(3-aminophenyl)-2'-(4-aminophenyl)hexafluoropropane with aromatic dianhydrides such as 3,3', 4,4' benzophenone tetracarboxylic acid dianhydride.Type: GrantFiled: July 27, 1989Date of Patent: December 24, 1991Assignee: Hoechst Celanese Corp.Inventors: Rachel S. Kohn, Sidney R. Jones, Werner H. Mueller
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Patent number: 5061784Abstract: Polyimides and polyamide-acids having improved solubility and processing characteristics and high glass transition temperatures are provided, having incorporated into the polymeric chain the novel aromatic dianhydride compound 4,4'-bis[2-(3,4-dicarboxyphenyl) hexafluoroisopropyl] diphenyl dianhydride. The polyamide-acids and polyimides are prepared by reacting the 12F-Diphenyl DA with aromatic or aliphatic diamines. It has been found that the polyimides of this invention have improved solubility characteristics, good dielectric properties while at the same time exhibiting relatively high glass transition temperatures, and superior thermal and thermo-oxidative stability. The polymers may be processed into films, fibers or compression molded or fabricated into composites at moderate temperatures and pressures.Type: GrantFiled: August 6, 1990Date of Patent: October 29, 1991Assignee: Hoechst Celanese CorporationInventors: Werner H. Mueller, Rohitkumar H. Vora
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Patent number: 5055550Abstract: This invention relates to new fluorine-containing polyimides, polyamide-acids/esters, polyamides, addition polyimides and imide oligomers which exhibit low melting points, better solubilities, low dielectric constants, superior thermal and thermal oxidative stability, and improved processing characteristics.The products of this invention are characterized by the fact that they are derived from 4,4'-bis[2-(3,4-(dicarboxyphenyl)hexafluoroisopropyl]diphenyl ether dianhydride.Type: GrantFiled: March 21, 1990Date of Patent: October 8, 1991Assignee: Hoechst Celanese Corp.Inventors: Werner H. Mueller, Dinesh N. Khanna, Rohitkumar H. Vora, Ruediger J. Erckel
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Patent number: 5047542Abstract: A novel method is disclosed for the preparation of 2,3-pyridine-dicarboxylates by the reaction of a ketoester such as dimethyl oxalacetate with an .alpha.,.beta.-unsaturated aldehyde or ketone such as 2-ethylacrolein and at least 1 molar equivalent of ammonium salt in suitable solvent.Type: GrantFiled: July 1, 1988Date of Patent: September 10, 1991Assignee: Hoechst Celanese CorporationInventors: B. Franklin Gupton, James H. Rea, Werner H. Mueller, John Saukaitis
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Patent number: 5037949Abstract: This invention relates to new fluorine-containing polyimides, polyamide-acids/esters, polyamides, addition polyimides and imide oligomers which exhibit low melting points, better solubilities, low dielectric constants, superior thermal and thermal oxidative stability, and improved processing characteristics.The products of this invention are characterized by the fact that they are derived from 4,4'-bis[2-(amino(halo)phenoxyphenyl)hexafluoroisopropyl]diphenyl ether.Type: GrantFiled: March 6, 1990Date of Patent: August 6, 1991Assignee: Hoechst Celanese Corp.Inventors: Werner H. Mueller, Dinesh N. Khanna, Rohitkumar H. Vora, Ruediger J. Erckel
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Patent number: 5021320Abstract: This invention is that of high temperature polyamides containing the hexafluoroisopropylidene group. The high temperature polyamides of the invention and photo or radiation sensitizers provide improved high temperature positive resists which can be developed in aqueous alkaline developer and thermally anneal to form heat resistant, polyoxazole relief structures suitable for use in microelectronic and printing applications. The positive photoresists of the invention have improved solubility in coating solvents and improved photospeed. The polyamides of the invention can be prepared by conventional condensation reactions; e.g. the condensation of a diamine and diacid chloride. In addition the polyamides of this invention provide high temperature protective coatings with superior adhesion properties in applications other than the photoresist area.Type: GrantFiled: July 7, 1989Date of Patent: June 4, 1991Assignee: Hoechst Celanese CorporationInventors: Werner H. Mueller, Dinesh N. Khanna, Bernd Hupfer
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Patent number: 5011753Abstract: Heat resistant, shapable, hydroxy and/or alkoxy-substituted polyamides derived from at least one diamine selected from unsubstituted and substituted 4,4'-bis[2-(4-amino-3-hydroxyphenyl)hexafluoroisopropyl)]diphenyl ether 4,4'-bis-[2-(3-amino-4-hydroxyphenyl)hexafluoroisopropyl]diphenyl ether and a dicarboxylic acid or a derivative thereof e.g. its acid halo or ester. The polyamides of the invention may be thermally cured to form polybenzoxazoles of higher heat resistance which are stable to hydrolytic, chemical and radiation attack.The polyamides of the invention may be formed into shaped articles by molding, extrusion and solvent casting processes preferably in the presence of a solvent or diluent and then optionally converted into heat resistant, insoluble polybenzoxazoles. These shaped articles are useful in aircraft, electronic and other commercial applications where heat, chemical and radiation resistance are desired in conjunction with good mechanical and electrical properties.Type: GrantFiled: February 7, 1990Date of Patent: April 30, 1991Assignee: Hoechst Celanese CorporationInventors: Werner H. Mueller, Dinesh N. Khanna
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Patent number: 4978742Abstract: Polyimides and polyamide-acids having improved solubility and processing characterisitcs are provided having incorporated into the polymeric chain as a novel aromatic diamine compound, 2-(3-aminophenyl)-2-(4-aminophenyl) hexafluoropropane (3,4'-6F Diamine). The polyamide-acids and polyimides are prepared by reacting the 3,4'-6F Diamine with aromatic tetracarboxylic acids or anhydrides thereof. It has been found that the polyimides of this invention have improved solubility characterisitics, low dielectric constants and improved thermal flow properties as a consequence of the meta/para positioning of the amino groups on the diamine, which renders these polymers more readily melt spinnable for the production of fibers. The polymers may also be compression molded and fabricated into composites at moderate temperatures and pressures. Solutions of the polyimides may be cast into films.Type: GrantFiled: September 30, 1988Date of Patent: December 18, 1990Assignee: Hoechst Celanese Corp.Inventors: Rohitkumar H. Vora, Werner H. Mueller
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Patent number: 4978738Abstract: High molecular weight polyimides are formed by polycondensation of 2,2-bis(4-aminophenyl) hexafluoropropane or 2,2-bis(3-aminophenyl) hexafluoropropane with one or more of bis-(3,4 dicarboxyphenyl) ether dianhydride; 3,3', 4,4' benzophenone tetracarboxylic acid dianhydride; 3,3', 4,4' diphenyl tetracarboxylic acid dianhydride and 2,2-bis(3,4 dicarboxyphenyl) hexafluoropropane dianhydride. Generally, the polymers of the present invention are characterized by a molecular weight of more than about 90,000.Type: GrantFiled: July 12, 1988Date of Patent: December 18, 1990Assignee: Hoechst Celanese Corp.Inventors: Werner H. Mueller, Rohitkumar H. Vora, Dinesh N. Khanna