Abstract: A fusible link for a semiconductor device comprises an insulating substrate and a conductive line pair on the surface of the insulating substrate, with the conductive line pair having spaced ends. A polymer is disposed over the insulating substrate and between the conductive line pair ends. The polymer is capable of being changed from a non-conductive to a conductive state upon exposure to an energy beam. Preferably, the polymer comprises a polyimide, more preferably, a polymer/onium salt mixture, most preferably, a polyaniline polymer doped with a triphenylsufonium salt. The link may further comprise a low k nanopore/nanofoam dielectric material adjacent the conductive line ends.

Abstract: An interconnection structure preferably including one or more conductors that have a central region filled with an insulator, and a method of fabricating such an interconnection structure for preferably making an electrical connection to the conductor(s). The method preferably includes the steps of depositing and patterning a first insulator over a substrate to form an aperture opening to the substrate; depositing and polishing a first conductor to leave the first conductor in the aperture; depositing and patterning a second insulator to form an opening through the second insulator and a recess in the aperture; depositing one or more second conductors to line the opening and the recess, and to form a central region of the interconnection structure; depositing a third insulator to at least partially fill the central region; and making an electrical connection to the second conductor(s).

Abstract: A fusible link for a semiconductor device comprises an insulating substrate and a conductive line pair on the surface of the insulating substrate, with the conductive line pair having spaced ends. A polymer is disposed over the insulating substrate and between the conductive line pair ends. The polymer is capable of being changed from a non-conductive to a conductive state upon exposure to an energy beam. Preferably, the polymer comprises a polyimide, more preferably, a polymer/onium salt mixture, most preferably, a polyaniline polymer doped with a triphenylsufonium salt. The link may further comprise a low k nanopore/nanofoam dielectric material adjacent the conductive line ends.

Abstract: Circuit for detecting error transients in logic circuits due to atomic events or other non-recurring noise sources includes a first circuit coupled to a data line for sensing a first signal on the data line at a first point in time (T1) and a second circuit coupled to the data line for sensing the first signal on the data line at a second point in time (T2) such that a time difference between T1 and T2 is small enough so that the first signal is still present on the data line in the absence of a perturbation event and such that the time difference between T1 and T2 is large enough so that any such perturbation event is resolved. A compare circuit coupled to the first and second circuits compares the sensing of the first signal by the first and second circuits, and generates an error signal in response to a non-compare.

Abstract: An interconnection structure preferably including one or more conductors that have a central region filled with an insulator, and a method of fabricating such an interconnection structure for preferably making an electrical connection to the conductor(s). The method preferably includes the steps of depositing and patterning a first insulator over a substrate to form an aperture opening to the substrate; depositing and polishing a first conductor to leave the first conductor in the aperture; depositing and patterning a second insulator to form an opening through the second insulator and a recess in the aperture; depositing one or more second conductors to line the opening and the recess, and to form a central region of the interconnection structure; depositing a third insulator to at least partially fill the central region; and making an electrical connection to the second conductor(s).

Abstract: A semiconductor device (102) having a plurality of diodes (100) with alterable electrical conductivity by a source of energy (30), e.g., a laser, external to the semiconductor device. The diodes are formed and energy is applied to alter the electrical conductivity at least 10%, and preferably by several orders of magnitude. Certain embodiments (20, 40 and 50) are formed so as to function as anti-fuses, while another embodiment (60) functions as a fuse. The diodes may be formed as planar diodes (20, 40, 50 and 60) or as lateral diodes (70).

Abstract: A circuit for enabling a controlled transistor in response to an ablated fusible link. The fusible link is configured so that no d.c. potential resides on the link once it has been ablated. A source of alternating voltage is capacitively coupled to the fusible link and maintains the fusible link from reconnection due to dendrite formation once it is ablated. An a.c. to d.c. voltage converter is used to signal the change in condition of the fusible link, thus, actuating a control transistor of a redundant circuit element in a replacement operation.

Abstract: Soft error immunity of a storage cell is greatly increased by division of a storage node into at least two portions and location of those portions on opposite sides of an isolation structure, such as a well of a conductivity type opposite to that of the substrate in which transistors of the memory cell may also be formed. The isolation structure thus limits collection of charge to only one of the portions of the storage node and reduces charge collection efficiency to a level where a critical amount of charge cannot be collected in all but a statistically negligible number of cases when such charge is engendered by impingement by ionizing radiation, such as energetic alpha particles. The layout of the memory cell having this feature also advantageously provides a simplified topology for the formation of additional ports comprising word line access transistors and bit lines.