Abstract: A pressure-regulating buoyant hydrodynamic pump is disclosed that floats adjacent to a surface of a body of water over which waves tend to pass. In response to wave-induced movements of the device, water is drawn into a mouth at a lower end of an injection tube, and water is ejected from a mouth at an upper end of the injection tube. The ejected water is deposited into an interior of the hollow buoy thereby augmenting a water reservoir therein. And water flows from the water reservoir to and through a water turbine, thereby energizing a generator, power electronics, and an electrical load. A novel water-turbine effluent buffering tube, or chamber, smooths pressure variations felt across the water turbine.

Abstract: Disclosed is an autonomous vessel comprising a hydrodynamic pump that converts the energy of ocean waves into electrical power when the vessel is floating adjacent to an upper surface of an ocean, and utilizes a portion of the generated electrical power produced to charge an electrical energy storage device. The vessel may submerge itself, and then propel itself beneath the water's surface, after which it may return to the surface and resume its production of electrical energy and recharge its electrical energy storage device.

Abstract: A process chamber system adapted for both vacuum process steps and steps at pressures higher than atmospheric pressure. The chamber door may utilize a double door seal which allows for high vacuum in the gap between the seals such that the sealing force provided by the high vacuum in the seal gap is higher than the opposing forces due to the pressure inside the chamber and the weight of the components.

Abstract: An aerial vehicle is described. The aerial vehicle comprises a communications system comprising an antenna and a processor coupled to the antenna, the processor being configured to establish a cellular network for transferring data with a mobile device.

Abstract: The present disclosure is directed to a phototherapeutic apparatus for focused UVB radiation and vitamin D synthesis and associated systems methods. In one embodiment a phototherapeutic apparatus can include a housing at least partially defining an irradiation zone, and an ultraviolet (UV) radiation source carried by the housing. The irradiation zone can be configured to accommodate at least a portion of a human patient. The phototherapeutic apparatus can further include a filter between the UV radiation source and the irradiation zone. The filter can be configured to at least substantially remove UV radiation outside of a predetermined spectrum centered at about 297 nm and having a bandwidth of at most 10 nm.

Abstract: The present disclosure is directed to a phototherapeutic apparatus for focused UVB radiation and vitamin D synthesis and associated systems methods. In one embodiment a phototherapeutic apparatus can include a housing at least partially defining an irradiation zone, and an ultraviolet (UV) radiation source carried by the housing. The irradiation zone can be configured to accommodate at least a portion of a human patient. The phototherapeutic apparatus can further include a filter between the UV radiation source and the irradiation zone. The filter can be configured to at least substantially remove UV radiation outside of a predetermined spectrum centered at about 297 nm and having a bandwidth of at most 10 nm.

Abstract: A device and method of spreading plasma which allows for plasma etching over a larger range of process chamber pressures. A plasma source, such as a linear inductive plasma source, may be choked to alter back pressure within the plasma source. The plasma may then be spread around a deflecting disc which spreads the plasma under a dome which then allows for very even plasma etch rates across the surface of a substrate. The apparatus may include a linear inductive plasma source above a plasma spreading portion which spreads plasma across a horizontally configured wafer or other substrate. The substrate support may include heating elements adapted to enhance the etching.

Abstract: A device and method of spreading plasma which allows for plasma etching over a larger range of process chamber pressures. A plasma source, such as a linear inductive plasma source, may be choked to alter back pressure within the plasma source. The plasma may then be spread around a deflecting disc which spreads the plasma under a dome which then allows for very even plasma etch rates across the surface of a substrate. The apparatus may include a linear inductive plasma source above a plasma spreading portion which spreads plasma across a horizontally configured wafer or other substrate. The substrate support may include heating elements adapted to enhance the etching.

Abstract: A process chamber system adapted for both vacuum process steps and steps at pressures higher than atmospheric pressure. The chamber door may utilize a double door seal which allows for high vacuum in the gap between the seals such that the sealing force provided by the high vacuum in the seal gap is higher than the opposing forces due to the pressure inside the chamber and the weight of the components.

Abstract: A device and method of spreading plasma which allows for plasma etching over a larger range of process chamber pressures. A plasma source, such as a linear inductive plasma source, may be choked to alter back pressure within the plasma source. The plasma may then be spread around a deflecting disc which spreads the plasma under a dome which then allows for very even plasma etch rates across the surface of a substrate. The apparatus may include a linear inductive plasma source above a plasma spreading portion which spreads plasma across a horizontally configured wafer or other substrate. The substrate support may include heating elements adapted to enhance the etching.

Abstract: A process chamber system adapted for both vacuum process steps and steps at pressures higher than atmospheric pressure. The chamber door may utilize a double door seal which allows for high vacuum in the gap between the seals such that the sealing force provided by the high vacuum in the seal gap is higher than the opposing forces due to the pressure inside the chamber and the weight of the components.

Abstract: A trap system adapted to trap polyimide or other vapors exiting from a process chamber. The vapors are routed from the process chamber through a heated exit line at low pressure and then cooled, resulting in condensation at a selected location. The condensed vapors accumulate in a liquid trap. A method of condensing polymer vapors in vacuum exit lines of process chambers, where the flow which may have vaporized polymer vapor is cooled to enhance condensation at a chosen location. The liquid trap can be emptied and replaced, resulting in the removal of the condensed liquid. The chamber exit lines are protected from condensation build up.

Abstract: A device and method for alignment of substrates on a substrate support, such as a heated chuck. An alignment ring may be placed over the substrate support to maintain placement and alignment during processing, such as plasma processing. The aligned substrate may then be accessed by a robotic arm, as it is in a pre-determined location. Alignment rings of different interior diameters may be used for different substrate sizes. The alignment rings may be inserted onto and removed from the process oven containing the substrate support through the substrate access port, without the need to fully open the process chamber.

Abstract: A process for the drying, and subsequent imidization, of polyimide precursors which minimizes or eliminates voids and which minimizes or eliminates discoloration. The process uses a sequential set of descending pressure operations that allow for time efficient processing of wafers. The set of descending pressure operations are interspersed with evacuation processes using heated gasses, which combine heating and byproduct evacuation. The process results in layers with reduced or eliminated voiding, discoloration, and solvent retention.

Abstract: The present disclosure is directed to a phototherapeutic apparatus for focused UVB radiation and vitamin D synthesis and associated systems methods. In one embodiment a phototherapeutic apparatus can include a housing at least partially defining an irradiation zone, and an ultraviolet (UV) radiation source carried by the housing. The irradiation zone can be configured to accommodate at least a portion of a human patient. The phototherapeutic apparatus can further include a filter between the UV radiation source and the irradiation zone. The filter can be configured to at least substantially remove UV radiation outside of a predetermined spectrum centered at about 297 nm and having a bandwidth of at most 10 nm.

Abstract: A process for the drying, and subsequent imidization, of polyimide precursors which minimizes or eliminates voids and which minimizes or eliminates discoloration. The process uses a sequential set of descending pressure operations that allow for time efficient processing of wafers. The set of descending pressure operations are interspersed with evacuation processes using heated gasses, which combine heating and byproduct evacuation. The process results in layers with reduced or eliminated voiding, discoloration, and solvent retention.

Abstract: The present disclosure is directed to a phototherapeutic apparatus for focused UVB radiation and vitamin D synthesis and associated systems methods. In one embodiment a phototherapeutic apparatus can include a housing at least partially defining an irradiation zone, and an ultraviolet (UV) radiation source carried by the housing. The irradiation zone can be configured to accommodate at least a portion of a human patient. The phototherapeutic apparatus can further include a filter between the UV radiation source and the irradiation zone. The filter can be configured to at least substantially remove UV radiation outside of a predetermined spectrum centered at about 297 nm and having a bandwidth of at most 10 nm.

Abstract: The present disclosure is directed to systems and methods for targeted UVB phototherapy for treating autoimmune disorders and other indications. In one embodiment, a phototherapeutic system can include a radiation source configured to emit light. At least 75% of the light emitted by the radiation source can have a target wavelength range with a bandwidth between 298 nm and 307 nm. The phototherapeutic system can also include a controller operably connected to the radiation source and configured to determine a dosage for a phototherapy session. Dosage can correspond to a product of the intensity of the radiation source and an exposure time of the radiation source, and may have an upper bound less than 1 minimal erythema dose (MED). Delivery of the dose of phototherapy can stimulate an immune response to treat an autoimmune disorder.

Abstract: A process for the drying, and subsequent imidization, of polyimide precursors which minimizes or eliminates voids and which minimizes or eliminates discoloration. The process uses a sequential set of descending pressure operations that allow for time efficient processing of wafers. The set of descending pressure operations are interspersed with evacuation processes using heated gasses, which combine heating and byproduct evacuation. The process results in layers with reduced or eliminated voiding, discoloration, and solvent retention.

Abstract: A process for the drying, and subsequent imidization, of polyimide precursors which minimizes or eliminates voids and which minimizes or eliminates discoloration. The process uses a sequential set of descending pressure operations that allow for time efficient processing of wafers. The set of descending pressure operations are interspersed with evacuation processes using heated gasses, which combine heating and byproduct evacuation. The process results in layers with reduced or eliminated voiding, discoloration, and solvent retention.