Patents by Inventor William Jack Casteel, Jr.

William Jack Casteel, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10711227
    Abstract: Composition, method and system for PVD TiN hard mask removal from 28/20 nm pattern wafers have been disclosed. The composition uses peroxide as oxidizing agent for PVD TiN hard mask removal under slightly basic conditions. The composition comprises bulky or long chain organic amines or polyalkylamine to improve removal/etching selectivity of PVD TiN vs CVD TiN. The composition further comprises long chain organic acids or amines to maintain Co compatibility.
    Type: Grant
    Filed: January 9, 2018
    Date of Patent: July 14, 2020
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Wen Dar Liu, Yi-Chia Lee, William Jack Casteel, Jr., Tianniu Chen, Rajiv Krishan Agarwal, Madhukar Bhaskara Rao
  • Patent number: 10654024
    Abstract: Disclosed are novel, as-crystallized RHO zeolite compositions with improved uniformity in morphology. These RHO compositions are useful for preparing cation-exchanged RHO zeolites that can be used as adsorbents for oxygen and/or nitrogen with improved properties. The adsorbents can be used in pressure swing adsorption processes for selectively adsorbing oxygen and/or nitrogen from feed streams such as an air stream or crude argon stream. Also disclosed are novel methods of preparing RHO zeolites with improved morphology control.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: May 19, 2020
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Elizabeth M. Seibel, William Jack Casteel, Jr., Garret Chi-Ho Lau, Roger Dean Whitley
  • Patent number: 10647950
    Abstract: A composition and method for removing copper-containing post-etch and/or post-ash residue from patterned microelectronic devices is described. The removal composition includes water, a fluoride ion source, an alkanolamine, sulfuric acid, and an organic acid. The compositions effectively remove the copper and cobalt-containing post-etch residue from the microelectronic device without damaging exposed low-k dielectric and metal interconnect materials.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: May 12, 2020
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Seiji Inaoka, William Jack Casteel, Jr., Wen Dar Liu
  • Patent number: 10646848
    Abstract: Disclosed herein are novel RHO zeolites useful as kinetically selective adsorbents for oxygen and/or nitrogen. The adsorbents can be used in pressure swing adsorption processes for selectively adsorbing oxygen and/or nitrogen from feed streams such as an air stream or crude argon stream. Also disclosed are novel methods of preparing RHO zeolites, including in particular mixed-cation RHO zeolites.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: May 12, 2020
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Magdalena M. Lozinska, Paul A. Wright, Elliott L. Bruce, William Jack Casteel, Jr., Shubhra Jyoti Bhadra, Robert Quinn, Garret Chi-Ho Lau, Erin Marie Sorensen, Roger Dean Whitley, Timothy Christopher Golden, Mohammad Ali Kalbassi
  • Publication number: 20200101438
    Abstract: Disclosed are novel, as-crystallized RHO zeolite compositions with improved uniformity in morphology. These RHO compositions are useful for preparing cation-exchanged RHO zeolites that can be used as adsorbents for oxygen and/or nitrogen with improved properties. The adsorbents can be used in pressure swing adsorption processes for selectively adsorbing oxygen and/or nitrogen from feed streams such as an air stream or crude argon stream. Also disclosed are novel methods of preparing RHO zeolites with improved morphology control.
    Type: Application
    Filed: September 28, 2018
    Publication date: April 2, 2020
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Elizabeth M. Seibel, William Jack Casteel, JR., Garret Chi-Ho Lau, Roger D. Whitley
  • Patent number: 10343139
    Abstract: Disclosed herein are new processes for adsorbing oxygen using adsorbent compositions comprising RHO zeolites kinetically selective for oxygen. The RHO zeolites can be used in pressure swing adsorption processes for separating oxygen from oxygen containing streams, such as for, but not limited to, purifying a crude argon feed stream or separating oxygen from an air feed stream.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: July 9, 2019
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Shubhra Jyoti Bhadra, Roger Dean Whitley, William Jack Casteel, Jr., Timothy Christopher Golden, Garrett Chi-Ho Lau, Erin Marie Sorensen, Robert Quinn, Magdalena M. Lozinska, Paul A. Wright, Mohammad Ali Kalbassi
  • Patent number: 10332784
    Abstract: Formulations for stripping titanium nitride hard mask and removing titanium nitride etch residue comprise an amine salt buffer, a non-ambient oxidizer, and the remaining being liquid carrier includes water and non-water liquid carrier selected from the group consisting of dimethyl sulfone, lactic acid, glycol, and a polar aprotic solvent including but not limited to sulfolanes, sulfoxides, nitriles, formamides and pyrrolidones. The formulations have a pH <4, preferably <3, more preferably <2.5. The aqueous formulations having water as liquid carrier and semi-aqueous formulation having water and non-polar aprotic solvent(s) further contain acidic fluoride. The formulations offer high titanium nitride etch rates while provide excellent compatibility towards W, AlN, AlO, and low k dielectric materials. The formulations may comprise weakly coordinating anions, corrosion inhibitors, and surfactants.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: June 25, 2019
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: William Jack Casteel, Jr., Seiji Inaoka, Wen Dar Liu, Tianniu Chen
  • Patent number: 10301580
    Abstract: A composition for cleaning integrated circuit substrates, the composition comprising: water; an oxidizer comprising an ammonium salt of an oxidizing species; a corrosion inhibitor comprising a primary alkylamine having the general formula: R?NH2, wherein R? is an alkyl group containing up to about 150 carbon atoms and will more often be an aliphatic alkyl group containing from about 4 to about 30 carbon atoms; optionally, a water-miscible organic solvent; optionally, an organic acid; optionally, a buffer species; optionally, a fluoride ion source; and optionally, a metal chelating agent.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: May 28, 2019
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Wen Dar Liu, Yi-Chia Lee, Tianniu Chen, William Jack Casteel, Jr., Seiji Inaoka, Gene Everad Parris
  • Patent number: 10252242
    Abstract: An adsorbent for removing CO2 from a gas mixture, the adsorbent comprising alumina and a carbonate compound where the carbonate to alumina IR absorbance intensity ratio is reduced by washing the adsorbent with water. The disclosure also describes a method of making adsorbent particles, process for removing CO2 from a gas mixture using the adsorbent, and an adsorption unit using the adsorbent.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: April 9, 2019
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Garret Chi-Ho Lau, Erin Marie Sorensen, Fred William Taylor, Timothy Christopher Golden, Robert Quinn, William Jack Casteel, Jr.
  • Publication number: 20190091651
    Abstract: Disclosed herein are new processes for adsorbing oxygen using adsorbent compositions comprising RHO zeolites kinetically selective for oxygen. The RHO zeolites can be used in pressure swing adsorption processes for separating oxygen from oxygen containing streams, such as for, but not limited to, purifying a crude argon feed stream or separating oxygen from an air feed stream.
    Type: Application
    Filed: September 28, 2017
    Publication date: March 28, 2019
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Shubhra Jyoti Bhadra, Roger Dean Whitley, William Jack Casteel, JR., Timothy Christopher Golden, Garrett Chi-Ho Lau, Erin Marie Sorensen, Robert Quinn, Magdalena M. Lozinska, Paul A. Wright, Mohammad Ali Kalbassi
  • Publication number: 20190091652
    Abstract: Disclosed herein are novel RHO zeolites useful as kinetically selective adsorbents for oxygen and/or nitrogen. The adsorbents can be used in pressure swing adsorption processes for selectively adsorbing oxygen and/or nitrogen from feed streams such as an air stream or crude argon stream. Also disclosed are novel methods of preparing RHO zeolites, including in particular mixed-cation RHO zeolites.
    Type: Application
    Filed: September 28, 2017
    Publication date: March 28, 2019
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Magdalena M. Lozinska, Paul A. Wright, Elliott L. Bruce, William Jack Casteel, JR., Shubhra Jyoti Bhadra, Robert Quinn, Garret Chi-Ho Lau, Erin Marie Sorensen, Roger Dean Whitley, Timothy Christopher Golden, Mohammad Ali Kalbassi
  • Publication number: 20180264432
    Abstract: An adsorbent for removing CO2 from a gas mixture, the adsorbent comprising alumina and a carbonate compound where the carbonate to alumina IR absorbance intensity ratio is reduced by washing the adsorbent with water. The disclosure also describes a method of making adsorbent particles, process for removing CO2 from a gas mixture using the adsorbent, and an adsorption unit using the adsorbent.
    Type: Application
    Filed: March 17, 2017
    Publication date: September 20, 2018
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Garret Chi-Ho Lau, Erin Marie Sorensen, Fred William Taylor, Timothy Christopher Golden, Robert Quinn, William Jack Casteel, JR.
  • Publication number: 20180264433
    Abstract: An adsorbent for removing CO2 from a gas mixture, the adsorbent comprising alumina and a carbonate compound where the carbonate to alumina IR absorbance intensity ratio is reduced by washing the adsorbent with water. The disclosure also describes a method of making adsorbent particles, process for removing CO2 from a gas mixture using the adsorbent, and an adsorption unit using the adsorbent.
    Type: Application
    Filed: February 23, 2018
    Publication date: September 20, 2018
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Garret Chi-Ho Lau, Erin Marie Sorensen, Fred William Taylor, Timothy Christopher Golden, Robert Quinn, William Jack Casteel, JR.
  • Publication number: 20180251711
    Abstract: Composition, method and system for PVD TiN hard mask removal from 28/20 nm pattern wafers have been disclosed. The composition uses peroxide as oxidizing agent for PVD TiN hard mask removal under slightly basic conditions. The composition comprises bulky or long chain organic amines or polyalkylamine to improve removal/etching selectivity of PVD TiN vs CVD TiN. The composition further comprises long chain organic acids or amines to maintain Co compatibility.
    Type: Application
    Filed: January 9, 2018
    Publication date: September 6, 2018
    Applicant: Versum Materials US, LLC
    Inventors: Wen Dar Liu, Yi-Chia Lee, William Jack Casteel, JR., Tianniu Chen, Rajiv Krishan Agarwal, Madhukar Bhaskara Rao
  • Patent number: 9976111
    Abstract: Composition, method and system for PVD TiN hard mask removal from 28/20 nm pattern wafers have been disclosed. The composition uses peroxide as oxidizing agent for PVD TiN hard mask removal under slightly basic conditions. The composition comprises bulky or long chain organic amines or polyalkylamine to improve removal/etching selectivity of PVD TiN vs CVD TiN. The composition further comprises long chain organic acids or amines to maintain Co compatibility.
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: May 22, 2018
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Wen Dar Liu, Yi-Chia Lee, William Jack Casteel, Jr., Tianniu Chen, Rajiv Krishan Agarwal, Madhukar Bhaskara Rao
  • Patent number: 9976037
    Abstract: Treatment compositions and methods of treating the surface of a substrate by using the treatment composition, and a semiconductor or MEMS substrate having the treatment composition thereon.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: May 22, 2018
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Seiji Inaoka, William Jack Casteel, Jr., Raymond Nicholas Vrtis, Kathleen Esther Theodorou, Tianniu Chen, Mark Richard Brown
  • Publication number: 20180105774
    Abstract: A composition and method for removing copper-containing post-etch and/or post-ash residue from patterned micro-electronic devices is described. The removal composition includes water, a fluoride ion source, an alkanolamine, sulfuric acid, and an organic acid. The compositions effectively remove the copper and cobalt-containing post-etch residue from the microelectronic device without damaging exposed low-k dielectric and metal interconnect materials.
    Type: Application
    Filed: March 31, 2016
    Publication date: April 19, 2018
    Inventors: Seiji INAOKA, William Jack CASTEEL, Jr., Wen Dar LIU
  • Patent number: 9925514
    Abstract: An adsorbent having a composition comprising at least 90% chabazite where the chabazite is a single phase chabazite having an Si/Al ratio of 1.2 to 1.8, the chabazite includes a mixture of at least two types of cations, and each of the at least two types of cations are in a molar ratio relative to Al of at least 0.05.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: March 27, 2018
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Charles Gardner Coe, Christopher Robert Bongo, Geoffrey John Ochs, Marissa Ann Bonanno, Garret Chi-Ho Lau, William Jack Casteel, Jr., Qiao Zhao, Roger Dean Whitley, Erin Marie Sorensen
  • Patent number: 9873833
    Abstract: Etching compositions and method of using the etching compositions comprising potassium hydroxide; one or more than one additional alkaline compounds selected from the group consisting of TEAH, TMAF and NH4OH; and water; or etching compositions comprising one or more than one inorganic alkali basic hydroxides selected from the group consisting of potassium hydroxide, cesium hydroxide, sodium hydroxide, rubidium hydroxide, or lithium hydroxide; optionally one or more than one additional alkaline compounds; water; and optionally one or more corrosion inhibitors; wherein the composition preferentially etches silicon present on a substrate as compared to silicon dioxide present on said substrate.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: January 23, 2018
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Gene Everad Parris, William Jack Casteel, Jr., Tianniu Rick Chen
  • Patent number: 9755269
    Abstract: The disclosure relates to new compositions comprising an, B12FxH12?x? anion that may be prepared chemically or electrochemically by oxidation of B12FxH12?x2? salts. This anion can be generated electrochemically in a voltammetry experiment, or by chemically by treatment of the (2?) anions with powerful oxidants such as XeF2 or NO2(+) salts. The new compositions can be used as 1 electron chemical oxidants and in electrochemical cells such as lithium ion batteries where their formation at elevated potential can serve to limit the upper limit of voltage during the overcharge of such a cell.
    Type: Grant
    Filed: November 25, 2008
    Date of Patent: September 5, 2017
    Assignee: Air Products and Chemicals, Inc.
    Inventors: William Jack Casteel, Jr., Sergei Vladimirovich Ivanov, Krishnakumar Jambunathan, Wade Hampton Bailey, III