Patents by Inventor William R. Browne

William R. Browne has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150206760
    Abstract: A method of forming a pattern on a substrate comprises forming spaced, upwardly-open, cylinder-like structures projecting longitudinally outward of a base. Sidewall lining is formed over inner and over outer sidewalls of the cylinder-like structures, and that forms interstitial spaces laterally outward of the cylinder-like structures. The interstitial spaces are individually surrounded by longitudinally-contacting sidewall linings that are over outer sidewalls of four of the cylinder-like structures. Other embodiments are disclosed, including structure independent of method.
    Type: Application
    Filed: March 31, 2015
    Publication date: July 23, 2015
    Inventors: Vishal Sipani, Anton J. deVilliers, William R. Brown, Shane J. Trapp, Ranjan Khurana, Kevin R. Shea
  • Publication number: 20150179467
    Abstract: Some embodiments include methods of forming patterns. A first mask is formed over a material. The first mask has features extending therein and defines a first pattern. The first pattern has a first level of uniformity across a distribution of the features. A brush layer is formed across the first mask and within the features to narrow the features and create a second mask from the first mask. The second mask has a second level of uniformity across the narrowed features which is greater than the first level of uniformity. A pattern is transferred from the second mask into the material.
    Type: Application
    Filed: December 23, 2013
    Publication date: June 25, 2015
    Applicants: Micron Technology, Inc., Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: William R. Brown, Adam Olson, Kaveri Jain, Ho Seop Eom, Xue Gloria Chen, Nik Mirin, Dan Millward, Peter Trefonas, III, Phillip Dene Hustad, Jong Keun Park, Christopher Nam Lee
  • Patent number: 8999852
    Abstract: A method of forming a pattern on a substrate comprises forming spaced, upwardly-open, cylinder-like structures projecting longitudinally outward of a base. Sidewall lining is formed over inner and over outer sidewalls of the cylinder-like structures, and that forms interstitial spaces laterally outward of the cylinder-like structures. The interstitial spaces are individually surrounded by longitudinally-contacting sidewall linings that are over outer sidewalls of four of the cylinder-like structures. Other embodiments are disclosed, including structure independent of method.
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: April 7, 2015
    Assignee: Micron Technology, Inc.
    Inventors: Vishal Sipani, Anton J. deVillers, William R. Brown, Shane J. Trapp, Ranjan Khurana, Kevin R. Shea
  • Publication number: 20150091137
    Abstract: A method of forming nanostructures may include forming a block copolymer composition within a trench in a material on a substrate, wherein the block copolymer composition may comprise a block copolymer material and an activatable catalyst having a higher affinity for a first block of the block copolymer material compared to a second block of the block copolymer material; self-assembling the block copolymer composition into first domains comprising the first block and the activatable catalyst, and second domains comprising the second block; generating catalyst from the activatable catalyst in at least one portion of the first domains to produce a structure comprising catalyst-containing domains and the second domains, the catalyst-containing domains comprising the first block and the catalyst; and reacting a metal oxide precursor with the catalyst in the catalyst-containing domains to produce a metal oxide-containing structure comprising the first block and metal oxide.
    Type: Application
    Filed: September 27, 2013
    Publication date: April 2, 2015
    Applicant: Micron Technology, Inc.
    Inventors: Nicholas Hendricks, Adam L. Olson, William R. Brown, Ho Seop Eom, Xue Chen, Kaveri Jain, Scott Schuldenfrei
  • Patent number: 8956976
    Abstract: A method of processing a semiconductor substrate in forming scribe line alignment marks includes forming pitch multiplied non-circuitry features within scribe line area of a semiconductor substrate. Individual of the features, in cross-section, have a maximum width which is less than a minimum photolithographic feature dimension used in lithographically patterning the substrate. Photoresist is deposited over the features. Such is patterned to form photoresist blocks that are individually received between a respective pair of the features in the cross-section. Individual of the features of the respective pairs have a laterally innermost sidewall in the cross-section. Individual of the photoresist blocks have an opposing pair of first pattern edges in the cross-section that are spaced laterally inward of the laterally innermost sidewalls of the respective pair of the features.
    Type: Grant
    Filed: February 4, 2014
    Date of Patent: February 17, 2015
    Assignee: Micron Technology, Inc.
    Inventors: William R. Brown, David Kewley, Adam Olson
  • Publication number: 20140353803
    Abstract: Methods of forming features are disclosed. One method comprises forming a resist over a pool of acidic or basic material on a substrate structure, selectively exposing the resist to an energy source to form exposed resist portions and non-exposed resist portions, and diffusing acid or base of the acidic or basic material from the pool into proximal portions of the resist. Another method comprises forming a plurality of recesses in a substrate structure. The plurality of recesses are filled with a pool material comprising acid or base. A resist is formed over the pool material and the substrate structure and acid or base is diffused into adjacent portions of the resist. The resist is patterned to form openings in the resist. The openings comprise wider portions distal to the substrate structure and narrower portions proximal to the substrate structure. Additional methods and semiconductor device structures including the features are disclosed.
    Type: Application
    Filed: August 12, 2014
    Publication date: December 4, 2014
    Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue Chen, Anton J. deVilliers
  • Patent number: 8815752
    Abstract: Methods of forming features are disclosed. One method comprises forming a resist over a pool of acidic or basic material on a substrate structure, selectively exposing the resist to an energy source to form exposed resist portions and non-exposed resist portions, and diffusing acid or base of the acidic or basic material from the pool into proximal portions of the resist. Another method comprises forming a plurality of recesses in a substrate structure. The plurality of recesses are filled with a pool material comprising acid or base. A resist is formed over the pool material and the substrate structure and acid or base is diffused into adjacent portions of the resist. The resist is patterned to form openings in the resist. The openings comprise wider portions distal to the substrate structure and narrower portions proximal to the substrate structure. Additional methods and semiconductor device structures including the features are disclosed.
    Type: Grant
    Filed: November 28, 2012
    Date of Patent: August 26, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue Chen, Anton J. deVilliers
  • Publication number: 20140162457
    Abstract: A method of forming a pattern on a substrate comprises forming spaced, upwardly-open, cylinder-like structures projecting longitudinally outward of a base. Sidewall lining is formed over inner and over outer sidewalls of the cylinder-like structures, and that forms interstitial spaces laterally outward of the cylinder-like structures. The interstitial spaces are individually surrounded by longitudinally-contacting sidewall linings that are over outer sidewalls of four of the cylinder-like structures. Other embodiments are disclosed, including structure independent of method.
    Type: Application
    Filed: December 12, 2012
    Publication date: June 12, 2014
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Vishal Sipani, Anton J. deVillers, William R. Brown, Shane J. Trapp, Ranjan Khurana, Kevin R. Shea
  • Publication number: 20140154886
    Abstract: A method of processing a semiconductor substrate in forming scribe line alignment marks includes forming pitch multiplied non-circuitry features within scribe line area of a semiconductor substrate. Individual of the features, in cross-section, have a maximum width which is less than a minimum photolithographic feature dimension used in lithographically patterning the substrate. Photoresist is deposited over the features. Such is patterned to form photoresist blocks that are individually received between a respective pair of the features in the cross-section. Individual of the features of the respective pairs have a laterally innermost sidewall in the cross-section. Individual of the photoresist blocks have an opposing pair of first pattern edges in the cross-section that are spaced laterally inward of the laterally innermost sidewalls of the respective pair of the features.
    Type: Application
    Filed: February 4, 2014
    Publication date: June 5, 2014
    Applicant: Micron Technology, Inc.
    Inventors: William R. Brown, David Kewley, Adam Olson
  • Publication number: 20140145311
    Abstract: Methods of forming features are disclosed. One method comprises forming a resist over a pool of acidic or basic material on a substrate structure, selectively exposing the resist to an energy source to form exposed resist portions and non-exposed resist portions, and diffusing acid or base of the acidic or basic material from the pool into proximal portions of the resist. Another method comprises forming a plurality of recesses in a substrate structure. The plurality of recesses are filled with a pool material comprising acid or base. A resist is formed over the pool material and the substrate structure and acid or base is diffused into adjacent portions of the resist. The resist is patterned to form openings in the resist. The openings comprise wider portions distal to the substrate structure and narrower portions proximal to the substrate structure. Additional methods and semiconductor device structures including the features are disclosed.
    Type: Application
    Filed: November 28, 2012
    Publication date: May 29, 2014
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue Chen, Anton J. deVilliers
  • Patent number: 8695149
    Abstract: Tooth cleaning devices. An embodiment of a tooth cleaning device includes: an elongated head sized to fit in an oral cavity. The elongated head having a first surface and a neck extending from the head. A first tooth cleaning element having a plurality of upstanding wiping members extends upward from below the first surface and extends radially outward from a center of the first tooth cleaning element. Each upstanding wiping member has a free outermost edge that extends upwards substantially from the first surface to the top of the wiping member. A plurality of upstanding arcuate shaped second tooth cleaning elements secured to the head and located outboard of the first tooth cleaning element are also provided. In addition, a plurality of upstanding third tooth cleaning elements are secured to the head and border an edge of the first surface. The third tooth cleaning elements have a circular cross-sectional area.
    Type: Grant
    Filed: April 1, 2011
    Date of Patent: April 15, 2014
    Assignee: Braun GmbH
    Inventors: Phillip M. Braun, William R. Brown, Jr., Alexander T. Chenvainu, Thomas A. Christman
  • Patent number: 8673780
    Abstract: A method of processing a semiconductor substrate in forming scribe line alignment marks includes forming pitch multiplied non-circuitry features within scribe line area of a semiconductor substrate. Individual of the features, in cross-section, have a maximum width which is less than a minimum photolithographic feature dimension used in lithographically patterning the substrate. Photoresist is deposited over the features. Such is patterned to form photoresist blocks that are individually received between a respective pair of the features in the cross-section. Individual of the features of the respective pairs have a laterally innermost sidewall in the cross-section. Individual of the photoresist blocks have an opposing pair of first pattern edges in the cross-section that are spaced laterally inward of the laterally innermost sidewalls of the respective pair of the features.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: March 18, 2014
    Assignee: Micron Technology, Inc.
    Inventors: William R. Brown, David A. Kewley, Adam Olson
  • Publication number: 20130309605
    Abstract: Methods of forming resist features, resist patterns, and arrays of aligned, elongate resist features are disclosed. The methods include addition of a compound, e.g., an acid or a base, to at least a lower surface of a resist to alter acidity of at least a segment of one of an exposed, acidic resist region and an unexposed, basic resist region. The alteration, e.g., increase or decrease, in the acidity shifts an acid-base equilibrium to either encourage or discourage development of the segment. Such “chemical proximity correction” techniques may be used to enhance the acidity of an exposed, acidic resist segment, to enhance the basicity of an unexposed, basic resist segment, or to effectively convert an exposed, acidic resist segment to an unexposed, basic resist segment or vice versa. Thus, unwanted line breaks, line merges, or misalignments may be avoided.
    Type: Application
    Filed: May 18, 2012
    Publication date: November 21, 2013
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Kaveri Jain, Adam L. Olson, William R. Brown, Lijing Gou, Ho Seop Eom, Anton J. deVilliers
  • Publication number: 20130161180
    Abstract: Embodiments of a system and method for a solar water still that receives a flow of water from a raw, non-potable water source and removes impurities from the water are disclosed. An exemplary solar water still system receives the raw water, distributes the raw water along an interior surface heated by exposure to the sun such that a portion of the distributed raw water evaporates into a space contained within the system, provides for the water vapor to contact a surface of an inner component cooled by the raw water source, and collects purified condensate resulting from the water vapor having come in contact with the cool surface of the inner component.
    Type: Application
    Filed: December 17, 2012
    Publication date: June 27, 2013
    Inventor: William R. Brown
  • Publication number: 20120227201
    Abstract: A toothbrush is disclosed. The toothbrush includes a head; a base member supported by a neck; a support member having a plurality of holes therein; a resilient cushion member disposed, at least in part, between the base member and the support member, the cushion member being fixed to the support member; at least one center bristle tuft extending from the support member; and two or more outer bristle tufts located at least partially around the at least one center bristle tuft. The center bristle tuft has a first shaped cross section and the outer bristle tufts have a second shaped cross section. The first shaped cross section is different from the second shaped cross section. Applying a force to the center bristle tuft and/or the outer bristle tufts causes the center bristle tuft and/or the outer bristle tufts to deflect into the resilient cushion member.
    Type: Application
    Filed: April 3, 2012
    Publication date: September 13, 2012
    Applicant: Braun GmbH
    Inventors: William R. Brown, JR., Thomas Christman, Georges Driesen, Thomas Fritsch, Michael Roberts, Armin Schwarz-Hartmann
  • Patent number: 8166601
    Abstract: A head for an electric toothbrush includes a support member having a plurality of holes extending completely therethrough. A plurality of tufts of bristles each extends through one of the holes. A first brushing end of each tuft projects from a first side of the support member. Each tuft is prevented from being withdrawn from its hole when a tensile force is applied to the first end of each tuft along a long axis of the tuft. A resilient cushion is positioned adjacent a second side of the support member such that a second end of each tuft can contact the cushion. When a compressive force is applied to the first end of each tuft along the long axis of each tuft, each tuft can move in its hole in a first direction into the cushion. When the compressive force is removed the cushion causes each tuft to move in its hole in a second direction substantially opposite the first direction.
    Type: Grant
    Filed: January 14, 2008
    Date of Patent: May 1, 2012
    Assignee: Braun GmbH
    Inventors: William R. Brown, Jr., Thomas Christman, Georges Driesen, Thomas Fritsch, Michael Roberts, Armin Schwarz-Hartmann
  • Patent number: 8143365
    Abstract: This invention provides articles made by reaction injection molding and spray coatings, and processes for forming such articles and coatings. The coatings and articles are polyureas or polyurea-urethanes. The ingredients used to form the coatings and articles comprise at least (A) an aromatic polyisocyanate and (B) a mixture formed from components comprised of (i) at least one polyol and/or at least one polyetheramine, (ii) an aromatic primary diamine, and (iii) an aliphatic secondary diamine which has about twelve to about forty carbon atoms and in which the having amino hydrocarbyl groups are secondary or tertiary hydrocarbyl groups.
    Type: Grant
    Filed: January 9, 2008
    Date of Patent: March 27, 2012
    Assignee: Albemarle Corporation
    Inventors: William R. Brown, Paul L. Wiggins, John Y. Lee
  • Publication number: 20120025468
    Abstract: A target system having a base, a stationary member inclined from the base and having a cap, a rotating tube having a cap and positioned over the stationary tube, a bearing between the caps of the stationary member and the rotating tube to permit substantially free rotation of the rotating tube, and a plurality of target sides secured to the rotating tube, with impact of a fired round onto one of the target sides initiating movement of the rotating tube relative to the stationary member.
    Type: Application
    Filed: October 5, 2011
    Publication date: February 2, 2012
    Applicant: EOD TECHNOLOGY, INC.
    Inventors: Kerry L. Kreiman, Mark C. Englert, William R. Brown, JR., Donald Ray Buttrey, Matthew G. Hughs
  • Patent number: 8091894
    Abstract: A target system having a base, a stationary member inclined from the base and having a cap, a rotating tube having a cap and positioned over the stationary tube, a bearing between the caps of the stationary member and the rotating tube to permit substantially free rotation of the rotating tube, and a plurality of target sides secured to the rotating tube, with impact of a fired round onto one of the target sides initiating movement of the rotating tube relative to the stationary member.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: January 10, 2012
    Assignee: BOD Technology, Inc.
    Inventors: Kerry L. Kreiman, Mark C. Englert, William R. Brown, Jr., Donald Ray Buttrey, Matthew G. Hughs
  • Publication number: 20110287630
    Abstract: A method of processing a semiconductor substrate in forming scribe line alignment marks includes forming pitch multiplied non-circuitry features within scribe line area of a semiconductor substrate. Individual of the features, in cross-section, have a maximum width which is less than a minimum photolithographic feature dimension used in lithographically patterning the substrate. Photoresist is deposited over the features. Such is patterned to form photoresist blocks that are individually received between a respective pair of the features in the cross-section. Individual of the features of the respective pairs have a laterally innermost sidewall in the cross-section. Individual of the photoresist blocks have an opposing pair of first pattern edges in the cross-section that are spaced laterally inward of the laterally innermost sidewalls of the respective pair of the features.
    Type: Application
    Filed: August 2, 2011
    Publication date: November 24, 2011
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: William R. Brown, David Kewley, Adam Olson