Abstract: A deep-ocean relocation system includes a transport vehicle (glider) and a quad riser assembly for transporting waste for disposal at abyssal depths. The transport vehicle is either self-powered or towed by a host vehicle, and travels at the water surface or underwater to the disposal site. At the disposal site, the transport vehicle, which is primarily constructed of a space-frame matrix that is positively buoyant in sea water, descends to abyssal depths along a helical glide path, discharges its waste cargo, and thereafter ascends. The quad riser assembly includes a floating platform and at least two riser lines extending from the platform down to abyssal depths. Waste is discharged through at least one of the riser lines to the abyssal depths, while at least one other riser line is used to draw water from the abyssal depths to generate a slurry with the waste material. The waste is thus thermally habituated prior to disposal.

Abstract: A semiconductor material is overlayed with sequentially stacked layers including a protective layer, an affinity layer having an affinity for a second implant blocking material comprising tungsten, a first implant blocking layer and a masking layer having a first pattern. A portion of the first blocking layer not being masked is removed to expose a first portion of the affinity layer and a first dopant is implanted into the underlying semiconductor through the exposed first portion of the affinity layer. The mask is removed to expose the first blocking layer and a second blocking layer is formed from the second blocking material over the exposed first portion of the affinity layer but not over the exposed first blocking layer. The first blocking layer is removed to expose a second portion of the affinity layer which constitutes a second pattern. A second dopant is implanted into the underlying semiconductor through the exposed second portion of the affinity layer.

Abstract: A new class of monoepoxyethylenecyclohexyl compounds useful as acid scavengers and corrosion inhibitors in functional fluid compositions.

Abstract: Functional fluid compositions comprising a major amount of a base stock material which is an ester or amide of an acid phosphorus, a di- or tricarboxylic acid ester, an ester of a polyhydric compound or mixtures thereof, optionally minor amounts of other base stock materials or base stock modifiers such as viscosity index improvers, cavitation damage inhibitors, and lubricity agents, and an additive amount of an acid scavenger and corrosion inhibitor which is a monoepoxy substituted cyclohexane such as C.sub.1-4 alkyl-3,4-epoxycyclohexane. The compositions are particularly useful as aircraft hydraulic fluids.

Abstract: A new class of monoepoxyendooxycyclohexyl compounds useful as acid scavengers and corrosion inhibitors in functional fluid compositions.

Abstract: Functional fluid compositions comprising a major amount of a base stock material which is an ester or amide of an acid phosphorus, a di- or tricarboxylic acid ester, an ester of a polyhydric compound or mixtures thereof, optionally minor amounts of other base stock materials or base stock modifiers such as viscosity index improvers, cavitation damage inhibitors, and lubricity agents, and an additive amount of an acid scavenger and corrosion inhibitor which is a monoepoxy norbornyl carboxylate such as C.sub.1.sub.-4 alkyl-5,6-epoxynorbornane carboxylate. The compositions are particularly useful as aircraft hydraulic fluids.