Patents by Inventor William Wong

William Wong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7454326
    Abstract: A machine translation (MT) system may utilize a phrase-based joint probability model. The model may be used to generate source and target language sentences simultaneously. In an embodiment, the model may learn phrase-to-phrase alignments from word-to-word alignments generated by a word-to-word statistical MT system. The system may utilize the joint probability model for both source-to-target and target-to-source translation applications.
    Type: Grant
    Filed: March 27, 2003
    Date of Patent: November 18, 2008
    Assignee: University of Southern California
    Inventors: Daniel Marcu, William Wong, Kevin Knight, Philipp Koehn
  • Publication number: 20080249760
    Abstract: Embodiments of the present invention provide a system and method for providing a translation service. The method comprises providing a translation interface accessible via a network. The translation interface receives specialized data associated with a domain from a member. A text string written in a source language is received from the member via the translation interface. A domain-based translation engine is selected. The domain-based translation engine may be associated with a source language, a target language, and a domain. The text string is translated into the target language using, at least in part, by the selected domain-based translation engine. The translated text string is transmitted to the member via the Internet. In some embodiments, a translation memory is generated based on the specialized data.
    Type: Application
    Filed: April 4, 2007
    Publication date: October 9, 2008
    Inventors: Daniel Marcu, William Wong, Felix Lung
  • Publication number: 20080201420
    Abstract: A digital media frame is provided for display of digital media data, such as digital images. The digital media frame includes a data network interface for communications via a data network such as the Internet. The digital media frame is capable of communications using an instant messaging communications protocol, through which data such as digital images can be exchanged with other devices directly and immediately. The digital media frame can also be configured and/or controlled via a web portal by transmitting configuration or control data to the digital media frame using the instant messaging communications protocol.
    Type: Application
    Filed: February 20, 2007
    Publication date: August 21, 2008
    Inventors: William Wong, Fong Ming
  • Publication number: 20080153014
    Abstract: A digital lithographic process first deposits a mask layer comprised of print patterned mask features. The print patterned mask features define gaps into which a target material may be deposited, preferably through a digital lithographic process. The target material is cured or hardened, if necessary, into target features. The mask layer is then selectively removed. The remaining target features may then be used as exposure or etch masks, physical structures such as fluid containment elements, etc. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.
    Type: Application
    Filed: March 11, 2008
    Publication date: June 26, 2008
    Applicant: PALO ALTO RESEARCH CENTER INCORPORATED
    Inventors: William Wong, Scott Limb, Michael Chabinyc, Beverly Russo, Rene A. Lujan
  • Patent number: 7384568
    Abstract: Susceptibility of darkfield etch masks (majority of the mask area is opaque) to pinhole defects, transferred pattern, non-uniformity, etc. due to ejector dropout or drop misdirection, and long duty cycles due to large-area coverage, when using digital lithography (or print patterning) is addressed by using a clear-field print pattern that is then coated with etch resist material. The printed clear field pattern is selectively removed to form an inverse pattern (darkfield) within the coated resist layer. Etching then removes selected portions of an underlying (e.g., encapsulation, conductive, etc.) layer. Removal of the mask produces a layer with large-area features with substantially reduced defects.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: June 10, 2008
    Assignee: Palo Alto Research Center Incorporated
    Inventors: William Wong, Scott Limb, Beverly Russo, Michael Chabinyc, Rene Lujan
  • Publication number: 20080104279
    Abstract: In a power supply with a data transmission module, the power supply includes a power transforming module and a data transmission module. The power transforming module is provided for converting mains electricity into an electric power applicable to electronic components and has a power input terminal connected to the mains electricity, and a power output terminal connected to the data transmission module and electronic components. A data conversion module has an end connected to a control module of a computer system and another end connected to an external data transmission interface of the power supply. In an application, an external electronic device can exchange, transmit and access data with the computer system through the external data transmission interface and a data transmission module of the power supply to expand the connection of computer peripherals. The power supply also provides an electric charging function through the external data interface.
    Type: Application
    Filed: October 11, 2007
    Publication date: May 1, 2008
    Inventor: William Wong
  • Patent number: 7365022
    Abstract: A digital lithographic process first deposits a mask layer comprised of print patterned mask features. The print patterned mask features define gaps into which a target material may be deposited, preferably through a digital lithographic process. The target material is cured or hardened, if necessary, into target features. The mask layer is then selectively removed. The remaining target features may then be used as exposure or etch masks, physical structures such as fluid containment elements, etc. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.
    Type: Grant
    Filed: January 20, 2006
    Date of Patent: April 29, 2008
    Assignee: Palo Alto Research Center Incorporated
    Inventors: William Wong, Scott Limb, Michael Chabinyc, Beverly Russo, Rene A. Lujan
  • Patent number: 7356210
    Abstract: A variable optical attenuator multiplexer having at least one thermal isolating optical joint. The variable optical attenuator multiplexer including a plurality of planar lightwave circuit components, such as, for example a combination of an array waveguide grating, a variable optical attenuator, and/or a power monitor. The planar lightwave circuit components are joined with an optical adhesive. The components may be thermally isolated by the formation of a widened space or gap between the component joints, and/or by creating a trench in the optical adhesive.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: April 8, 2008
    Assignee: Intel Corporation
    Inventors: William Wong, Tsung-Ein Tsai, Ping Qu
  • Patent number: 7352573
    Abstract: A power supply unit (PSU) has walls which define an internal volume of the PSU. A metal sheet forming left and right side walls and an upper wall is provided with plural perforations on each of those walls. The perforations are circular in shape, and formed in a regular grid pattern. The perforations are formed by punching the metal sheet before it is bent into shape. The perforations in the housing of the PSU allow hotspots to be carried through the walls of the housing of the PSU, following which the hotspots are unable to damage internal components of the PSU. This allows the use of reduced flow rate fans.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: April 1, 2008
    Assignee: High Performance Enterprise Public Limited Company
    Inventor: William Wong
  • Publication number: 20080056656
    Abstract: Various types of holey fiber provide optical propagation. In various embodiments, for example, a large core holey fiber comprises a cladding region formed by large holes arranged in few layers. The number of layers or rows of holes about the large core can be used to coarse tune the leakage losses of the fundamental and higher modes of a signal, thereby allowing the non-fundamental modes to be substantially eliminated by leakage over a given length of fiber. Fine tuning of leakage losses can be performed by adjusting the hole dimension and/or the hole spacing to yield a desired operation with a desired leakage loss of the fundamental mode. Resulting holely fibers have a large hole dimension and spacing, and thus a large core, when compared to traditional fibers and conventional fibers that propagate a single mode. Other loss mechanisms, such as bend loss and modal spacing can be utilized for selected modes of operation of holey fibers. Other embodiments are also provided.
    Type: Application
    Filed: September 6, 2007
    Publication date: March 6, 2008
    Inventors: Liang Dong, Donald Harter, William Wong
  • Publication number: 20080003994
    Abstract: A system and a method are provided for managing network activation with a carrier and registration with a service provider. In one example, the method determines a network activation status. If the network is not activated, a utility is used to perform the activation. Further, the status of registration with a provider is determined. If not registered, a request is sent to a server of the service provider for a registration file configured to gather user registration information. The registration file is then received from the server. The registration file is executed on the personal computer. Data gathered by the registration file is then returned to the service provider's server to complete the registration procedures.
    Type: Application
    Filed: July 6, 2007
    Publication date: January 3, 2008
    Applicant: Palm, Inc.
    Inventors: Craig Skinner, William Wong, Brian Kuhn
  • Patent number: 7298615
    Abstract: A media centre computing device includes a housing, and a mains-powered personal computer motherboard including a main processor with a heatsink disposed at or near to one edge of the motherboard and connectors disposed at an adjacent edge of the motherboard, the motherboard being secured in the housing with the connectors contacting the rear face of the housing and the main processor being disposed adjacent a first side face of the housing and in the proximity of a first vent formed therein. The device also includes a power supply secured to the housing and proximate to rear and second side faces of the housing, and a fixed mass-storage device and a removable memory media drive located one above the other in the volume between the power supply and the front face of the housing. Media being transportable to and from the removable memory media drive though an aperture in the front face of the housing.
    Type: Grant
    Filed: May 26, 2005
    Date of Patent: November 20, 2007
    Assignee: High Performance Enterprise Public Limited Company
    Inventor: William Wong
  • Publication number: 20070250699
    Abstract: Evidence gathering and analysis from networked machines can be automated and made policy-based. In one embodiment, the present invention includes, a networked machine receiving an instruction from a server to execute a pre-recorded action sequence designed to capture evidence data. The machine can annotate the captured evidence data with meta-data, and send the annotated evidence data to the server. The server can then perform analysis on the collected evidence data and present the evidence data and the analysis to an administrator.
    Type: Application
    Filed: April 20, 2006
    Publication date: October 25, 2007
    Inventors: Jean-Francois Dube, William Wong
  • Publication number: 20070235410
    Abstract: Susceptibility of darkfield etch masks (majority of the mask area is opaque) to pinhole defects, transferred pattern, non-uniformity, etc. due to ejector dropout or drop misdirection, and long duty cycles due to large-area coverage, when using digital lithography (or print patterning) is addressed by using a clear-field print pattern that is then coated with etch resist material. The printed clear field pattern is selectively removed to form an inverse pattern (darkfield) within the coated resist layer. Etching then removes selected portions of an underlying (e.g., encapsulation, conductive, etc.) layer. Removal of the mask produces a layer with large-area features with substantially reduced defects.
    Type: Application
    Filed: March 31, 2006
    Publication date: October 11, 2007
    Inventors: William Wong, Scott Limb, Beverly Russo, Michael Chabinyc, Rene Lujan
  • Patent number: 7280730
    Abstract: Various types of holey fiber provide optical propagation. In various embodiments, for example, a large core holey fiber comprises a cladding region formed by large holes arranged in few layers. The number of layers or rows of holes about the large core can be used to coarse tune the leakage losses of the fundamental and higher modes of a signal, thereby allowing the non-fundamental modes to be substantially eliminated by leakage over a given length of fiber. Fine tuning of leakage losses can be performed by adjusting the hole dimension and/or the hole spacing to yield a desired operation with a desired leakage loss of the fundamental mode. Resulting holey fibers have a large hole dimension and spacing, and thus a large core, when compared to traditional fibers and conventional fibers that propagate a single mode. Other loss mechanisms, such as bend loss and modal spacing can be utilized for selected modes of operation of holey fibers. Other embodiments are also provided.
    Type: Grant
    Filed: May 13, 2004
    Date of Patent: October 9, 2007
    Assignee: Imra America, Inc.
    Inventors: Liang Dong, Donald J. Harter, William Wong
  • Publication number: 20070221610
    Abstract: A method to pattern films into dimensions smaller than the printed pixel mask size. A printed mask is deposited on a thin film on a substrate. The second mask layer is selectively deposited onto the film, but not to the printed mask. A third mask is then printed onto the substrate to pattern a portion of the second mask. Certain solvents are then used to remove the printed mask but not the mask layer on the thin film. The mask layer is then used to form a pattern on the thin film in combination with etching. The features formed in the thin film are smaller than the smallest dimension of the printed mask. The coated mask layer can be a self-assembled mono-layer or other material that selectively binds to the thin film.
    Type: Application
    Filed: March 24, 2006
    Publication date: September 27, 2007
    Inventors: Eugene Chow, William Wong, Michael Chabinyc, Jeng Lu, Ana Arias
  • Publication number: 20070221611
    Abstract: A process for fabricating fine features such as small gate electrodes on a transistor. The process involves the jet-printing of a mask and the plating of a metal to fabricate sub-pixel and standard pixel size features in one layer. Printing creates a small sub-pixel size gap mask for plating a fine feature. A second printed mask may be used to protect the newly formed gate and etch standard pixel size lines connecting the small gates.
    Type: Application
    Filed: March 24, 2006
    Publication date: September 27, 2007
    Inventors: Eugene Chow, William Wong, Michael Chabinyc, Ana Arias
  • Publication number: 20070172774
    Abstract: A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask, and the underlying layer overdeveloped or overetched to undercut the print patterned mask. The mask may be removed and the underlying structure used an etch mask or as a final structure. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.
    Type: Application
    Filed: January 20, 2006
    Publication date: July 26, 2007
    Inventors: Scott Limb, William Wong, Steven Ready, Michael Chabinyc
  • Publication number: 20070172969
    Abstract: A digital lithographic process first deposits a mask layer comprised of print patterned mask features. The print patterned mask features define gaps into which a target material may be deposited, preferably through a digital lithographic process. The target material is cured or hardened, if necessary, into target features. The mask layer is then selectively removed. The remaining target features may then be used as exposure or etch masks, physical structures such as fluid containment elements, etc. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.
    Type: Application
    Filed: January 20, 2006
    Publication date: July 26, 2007
    Inventors: William Wong, Scott Limb, Michael Chabinyc, Beverly Russo, Rene Lujan
  • Publication number: 20070167200
    Abstract: A system and method for initiating and realizing communication via a multi-mode system is disclosed. The method and system include realizing a preferred mode of communication. A signal indicating the preferred mode of communication is transmitted and followed by a response signal in the preferred mode. In response, the multi-mode system is adapted to provide for communication in the preferred mode.
    Type: Application
    Filed: January 17, 2006
    Publication date: July 19, 2007
    Inventors: William Wong, Christopher Oesterling