Patents by Inventor Wojciech J. Walecki
Wojciech J. Walecki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11163144Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.Type: GrantFiled: January 12, 2021Date of Patent: November 2, 2021Assignee: APPLEJACK 199 L.P.Inventors: Mihail Mihaylov, Wojciech J Walecki, Jae Ryu
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Patent number: 11112234Abstract: The present subject matter at least provides an apparatus for inspecting a slab of material including a passivation layer. The apparatus includes a frequency-domain optical-coherence tomography (OCT) probe configured to irradiate the slab of material, and detect radiation reflected from the slab of material. The apparatus also includes a spectral-analysis module configured to analyze at least an interference pattern with respect to the OCT probe to thereby determine a thickness of the slab of the material. The apparatus also includes a thin-film gauge configure to determine a thickness of the passivation layer such that the determined thickness of the slab of material may be adjusted baes on the thickness of the passivation layer.Type: GrantFiled: January 13, 2020Date of Patent: September 7, 2021Assignee: APPLEJACK 199 L.P.Inventor: Wojciech J Walecki
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Patent number: 11105611Abstract: A method and apparatus for non-contact measurement of stress in a thin-film deposited on a substrate is disclosed. The method may include positioning a substrate on a plurality of support-elements, the substrate having a thin-film deposited thereupon. A first-polynomial may be defined for representing a surface of the substrate that is in contact with the support elements. A second-polynomial may be determined based on an optimization determination of potential-energy acting upon the substrate. A finite-order polynomial may be created by calculating a product of the first and second polynomials to represent a shape of the surface of the substrate as a model of the surface. Thereafter, stress in the substrate may be determined based on fitting the model of the surface with a measured topographical data of the surface.Type: GrantFiled: May 15, 2018Date of Patent: August 31, 2021Assignee: APPLEJACK 199 L.P.Inventors: Wojciech J Walecki, Wei-Chun Hung, Raphael Morency
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Patent number: 11073372Abstract: The present subject matter at least provides an apparatus for characterization of a slab of a material. The apparatus comprises two or more frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the OCT probes for simultaneously actuating elements in each of the OCT probes to cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference pattern with respect to each of the OCT probes to thereby determine at least one of thickness and topography of the slab of the material. Further, in some embodiments, the slab of material may include a passivation layer. The apparatus may be configured to determine a thickness of the passivation layer.Type: GrantFiled: January 13, 2020Date of Patent: July 27, 2021Assignee: APPLEJACK 199 L.P.Inventor: Wojciech J Walecki
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Publication number: 20210132355Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.Type: ApplicationFiled: January 12, 2021Publication date: May 6, 2021Inventors: Mihail MIHAYLOV, Wojciech J. WALECKI, Jae RYU
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Patent number: 10935777Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.Type: GrantFiled: September 17, 2019Date of Patent: March 2, 2021Assignee: APPLEJACK 199 L.P.Inventors: Mihail Mihaylov, Wojciech J Walecki, Jae Ryu
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Publication number: 20200320724Abstract: The present subject matter at-least provides a system for measurement of topography of specular surfaces. The system comprises a set of indexed light-sources and a controller configured to drive the set of light-sources for irradiating a specular-surface by sequentially illuminating a plurality of sub-sets of the light-sources in accordance with a pre-defined encoding criteria. Further, at least one camera is provided to capture reflected light-radiation from the specular-surface and thereby generate a plurality of images in accordance with the sequential-illumination, such that each of the generated-image corresponds to a particular sub-set of illuminated light sources.Type: ApplicationFiled: April 14, 2020Publication date: October 8, 2020Inventors: Wojciech J WALECKI, Wei-Chun HUNG
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Publication number: 20200182607Abstract: According to an aspect of one or more embodiments, the present subject matter describes an apparatus for inspecting a slab of a material. The apparatus comprises a first and second low-coherence sensor configured to irradiate a first and second side of a slab of material with first light having a first polarization and second light having a second polarization, and thereafter configured to detect a reflection. A first polarizer is configured to allow reflected first light having the first polarization to pass through, and reject a second-light cross-talk portion having the second polarization. A second polarizer is configured to allow reflected second light having the second polarization to pass through, and reject a first-light cross-talk portion having the first polarization. Further, a computing-system is configured to receive signals representing the reflected first light and the reflected second light; and analyze the reflected first light and the reflected second light.Type: ApplicationFiled: February 18, 2020Publication date: June 11, 2020Inventor: Wojciech J. WALECKI
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Publication number: 20200149866Abstract: The present subject matter at least provides an apparatus for characterization of a slab of a material. The apparatus comprises two or more frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the OCT probes for simultaneously actuating elements in each of the OCT probes to cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference pattern with respect to each of the OCT probes to thereby determine at least one of thickness and topography of the slab of the material. Further, in some embodiments, the slab of material may include a passivation layer. The apparatus may be configured to determine a thickness of the passivation layer.Type: ApplicationFiled: January 13, 2020Publication date: May 14, 2020Inventor: Wojciech J WALECKI
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Publication number: 20200149867Abstract: The present subject matter at least provides an apparatus for inspecting a slab of material including a passivation layer. The apparatus includes a frequency-domain optical-coherence tomography (OCT) probe configured to irradiate the slab of material, and detect radiation reflected from the slab of material. The apparatus also includes a spectral-analysis module configured to analyze at least an interference pattern with respect to the OCT probe to thereby determine a thickness of the slab of the material. The apparatus also includes a thin-film gauge configure to determine a thickness of the passivation layer such that the determined thickness of the slab of material may be adjusted baes on the thickness of the passivation layer.Type: ApplicationFiled: January 13, 2020Publication date: May 14, 2020Inventor: Wojciech J. WALECKI
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Patent number: 10621739Abstract: The present subject matter at-least provides a system for measurement of topography of specular surfaces. The system comprises a set of indexed light-sources and a controller configured to drive the set of light-sources for irradiating a specular-surface by sequentially illuminating a plurality of sub-sets of the light-sources in accordance with a pre-defined encoding criteria. Further, at least one camera is provided to capture reflected light-radiation from the specular-surface and thereby generate a plurality of images in accordance with the sequential-illumination, such that each of the generated-image corresponds to a particular sub-set of illuminated light sources.Type: GrantFiled: March 27, 2018Date of Patent: April 14, 2020Assignee: APPLEJACK 199 L.P.Inventors: Wojciech J Walecki, Wei-Chun Hung
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Patent number: 10563975Abstract: According to an aspect of one or more embodiments, the present subject matter describes an apparatus for inspecting a slab of a material. The apparatus comprises a first and second low-coherence sensor configured to irradiate a first and second side of a slab of material with first light having a first polarization and second light having a second polarization, and thereafter configured to detect a reflection. A first polarizer is configured to allow reflected first light having the first polarization to pass through, and reject a second-light cross-talk portion having the second polarization. A second polarizer is configured to allow reflected second light having the second polarization to pass through, and reject a first-light cross-talk portion having the first polarization. Further, a computing-system is configured to receive signals representing the reflected first light and the reflected second light; and analyze the reflected first light and the reflected second light.Type: GrantFiled: July 25, 2018Date of Patent: February 18, 2020Assignee: APPLEJACK 199 L.P.Inventor: Wojciech J Walecki
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Patent number: 10551163Abstract: The present subject matter at-least provides an apparatus for characterization of a slab of a material. The apparatus comprises a plurality of frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material at at-least one location, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the plurality of OCT probes for simultaneously actuating one or more elements in each of said OCT probes to at-least cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference pattern with respect to each of said OCT probes to thereby determine at least one of thickness and topography of the slab of the material.Type: GrantFiled: February 15, 2019Date of Patent: February 4, 2020Assignee: APPLEJACK 199 L.P.Inventor: Wojciech J Walecki
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Publication number: 20200033578Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.Type: ApplicationFiled: September 17, 2019Publication date: January 30, 2020Inventors: Mihail MIHAYLOV, Wojciech J WALECKI, Jae RYU
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Publication number: 20200033114Abstract: According to an aspect of one or more embodiments, the present subject matter describes an apparatus for inspecting a slab of a material. The apparatus comprises a first and second low-coherence sensor configured to irradiate a first and second side of a slab of material with first light having a first polarization and second light having a second polarization, and thereafter configured to detect a reflection. A first polarizer is configured to allow reflected first light having the first polarization to pass through, and reject a second-light cross-talk portion having the second polarization. A second polarizer is configured to allow reflected second light having the second polarization to pass through, and reject a first-light cross-talk portion having the first polarization. Further, a computing-system is configured to receive signals representing the reflected first light and the reflected second light; and analyze the reflected first light and the reflected second light.Type: ApplicationFiled: July 25, 2018Publication date: January 30, 2020Inventor: Wojciech J. WALECKI
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Patent number: 10533841Abstract: An apparatus and a method for measuring surface topography of a work-piece are described. The apparatus comprises a light emitting assembly configured to emit an emitted beam of light, the emitted beam being emitted at a plurality of wavelengths and modulated at modulating frequency, the emitted beam being directed onto a surface of a work-piece. A detector is configured to receive a reflected beam of light that includes at least a portion of the emitted beam as reflected from the surface of the work-piece. The detector is further configured to generate a signal indicative of a position of the reflected beam on the detector. A signal processing unit is configured to remove noise from the signal thus generated based on the modulating frequency to obtain a processed signal. A control unit is configured to determine topography of the surface based on the processed signal.Type: GrantFiled: February 8, 2019Date of Patent: January 14, 2020Assignee: APPLEJACK 199 L.P.Inventor: Wojciech J. Walecki
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Publication number: 20190353475Abstract: A method and apparatus for non-contact measurement of stress in a thin-film deposited on a substrate is disclosed. The method may include positioning a substrate on a plurality of support-elements, the substrate having a thin-film deposited thereupon. A first-polynomial may be defined for representing a surface of the substrate that is in contact with the support elements. A second-polynomial may be determined based on an optimization determination of potential-energy acting upon the substrate. A finite-order polynomial may be created by calculating a product of the first and second polynomials to represent a shape of the surface of the substrate as a model of the surface. Thereafter, stress in the substrate may be determined based on fitting the model of the surface with a measured topographical data of the surface.Type: ApplicationFiled: May 15, 2018Publication date: November 21, 2019Inventors: Wojciech J. WALECKI, Wei-Chun HUNG, Raphael Morency
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Publication number: 20190304110Abstract: The present subject matter at-least provides a system for measurement of topography of specular surfaces. The system comprises a set of indexed light-sources and a controller configured to drive the set of light-sources for irradiating a specular-surface by sequentially illuminating a plurality of sub-sets of the light-sources in accordance with a pre-defined encoding criteria. Further, at least one camera is provided to capture reflected light-radiation from the specular-surface and thereby generate a plurality of images in accordance with the sequential-illumination, such that each of the generated-image corresponds to a particular sub-set of illuminated light sources.Type: ApplicationFiled: March 27, 2018Publication date: October 3, 2019Inventors: Wojciech J WALECKI, Wei-Chun HUNG
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Patent number: 10416430Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.Type: GrantFiled: October 18, 2017Date of Patent: September 17, 2019Assignee: APPLEJACK 199 L.P.Inventors: Wojciech J Walecki, Mihail Mihaylov, Jae Ryu
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Publication number: 20190277622Abstract: The present subject matter at-least provides an apparatus for characterization of a slab of a material. The apparatus comprises a plurality of frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material at at-least one location, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the plurality of OCT probes for simultaneously actuating one or more elements in each of said OCT probes to at-least cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference pattern with respect to each of said OCT probes to thereby determine at least one of thickness and topography of the slab of the material.Type: ApplicationFiled: February 15, 2019Publication date: September 12, 2019Inventor: Wojciech J. WALECKI