Abstract: A device is described allowing simultaneous control of angles at which an optical beam is impinging a sample and at which radiation emitted by the sample is collected. The device comprises a first electrically addressed spatial light modulator configured to block input light and produce an excitation radiation for irradiating a sample at the predetermined incidence angle; a second electrically addressed spatial light modulator configured to produce the detection radiation corresponding to the predetermined collection angle; and at least one controller configured to control at least one of: the predetermined incidence angle by controlling the first electrically addressed spatial light modulator and the predetermined collection angle by controlling the second electrically addressed spatial light modulator. The device can be applied in the field of Raman spectroscopy for investigation, which can be used to identify tensor components of stress in silicon wafers.

Abstract: An apparatus and a method for measuring surface topography of a work-piece are described. The apparatus comprises a light emitting assembly configured to emit an emitted beam of light, the emitted beam being emitted at a plurality of wavelengths and modulated at modulating frequency, the emitted beam being directed onto a surface of a work-piece. A detector is configured to receive a reflected beam of light that includes at least a portion of the emitted beam as reflected from the surface of the work-piece. The detector is further configured to generate a signal indicative of a position of the reflected beam on the detector. A signal processing unit is configured to remove noise from the signal thus generated based on the modulating frequency to obtain a processed signal. A control unit is configured to determine topography of the surface based on the processed signal.

Abstract: The present subject matter at-least provides an apparatus for characterization of a slab of a material. The apparatus comprises a plurality of frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material at at-least one location, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the plurality of OCT probes for simultaneously actuating one or more elements in each of said OCT probes to at-least cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference-pattern with respect to each of said OCT probes to thereby determine at least one of thickness and topography of the slab of the material.

Abstract: An apparatus and a method for measuring surface topography of a work-piece are described. The apparatus comprises a light emitting assembly configured to emit an emitted beam of light, the emitted beam being emitted at a plurality of wavelengths and modulated at modulating frequency, the emitted beam being directed onto a surface of a work-piece. A detector is configured to receive a reflected beam of light that includes at least a portion of the emitted beam as reflected from the surface of the work-piece. The detector is further configured to generate a signal indicative of a position of the reflected beam on the detector. A signal processing unit is configured to remove noise from the signal thus generated based on the modulating frequency to obtain a processed signal. A control unit is configured to determine topography of the surface based on the processed signal.

Abstract: An apparatus and a method for measuring surface topography of a work-piece are described. The apparatus comprises a light emitting assembly configured to emit an emitted beam of light, the emitted beam being emitted at a plurality of wavelengths and modulated at modulating frequency, the emitted beam being directed onto a surface of a work-piece. A detector is configured to receive a reflected beam of light that includes at least a portion of the emitted beam as reflected from the surface of the work-piece. The detector is further configured to generate a signal indicative of a position of the reflected beam on the detector. A signal processing unit is configured to remove noise from the signal thus generated based on the modulating frequency to obtain a processed signal. A control unit is configured to determine topography of the surface based on the processed signal.

Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.

Abstract: A method and apparatus for determining the thickness of slabs of materials using an interferometer.