Abstract: The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising: a primary light source; a first optical component; a second optical component; an image plane; and an exit pupil, wherein said first optical component transforms said primary light source into a plurality of secondary light sources that are imaged by said second optical component in said exit pupil, wherein said first optical component includes a first optical element having a plurality of first raster elements that are imaged into said image plane, producing a plurality of images being superimposed, at least partially, on a field in said image plane, wherein said first optical component comprises a collector unit and a second optical element having a plurality of second raster elements, said illumination system further comprising: a first optical axis between said collector unit and said first optical element, wherein said first optical element is reflective; a second optical axis between

Abstract: The present invention relates to computerized theft and displacement control and observation, dedicated to objects which represent a certain value or importance for its owner and shall thus be observed. In particular, it relates to a wireless, particular Bluetooth-based method and system. A tight, customizable Bluetooth communication involving a positive feedback control signal from the Guardian to the observed device is established (210,220,230) reflecting the usual case. This status is left when the observed device leaves the reception area of the Guardian as the positive feedback signal misses (220,240). Then the observed device sends out (260) standardized “I am stolen” signals which can be received and evaluated fully automatically at multiple locations by respective Theft Monitors. Thus, respective measures can be undertaken to seize the device, e.g., by issuing a selective quiet alarm. (FIG.

Abstract: There is provided an illumination system, particularly for microlithography with wavelengths≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane producing a plurality of images being superimposed at least partially on a field in the image plane. The plurality of first raster elements have negative optical power.

Abstract: There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power.

Abstract: A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width &dgr;&lgr; about a central working wavelength &lgr;, wherein a relative width &dgr;&lgr;/&lgr; of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.

Abstract: The invention concerns an illumination system, particularly for microlithography with wavelengths ≦93 nm, comprising: a primary light source; a first optical component; a second optical component; an image plane; and an exit pupil; wherein said first optical component transforms said primary light source into a plurality of secondary light sources that are imaged by said second optical component in said exit pupil, wherein said first optical component includes a first optical element having a plurality of first raster elements, that are imaged into said image plane, producing a plurality of images being superimposed at least partially on a field in said image plane, wherein said plurality of first raster elements are rectangular, wherein said filed is a segment of an annulus, and wherein said second optical component includes a first field mirror with negative optical power for shaping said field to said segment of said annulus and a second field mirror with positive optical power, wherein each of a plural

Abstract: A focusing-device for the radiation from a light source, in particular a laser plasma source, has a collector mirror which collects the light from the light source at a second focus in virtual or real terms, in particular for micro-lithography using EUV radiation, and a routing unit and downstream beam formation in an illuminating system. The collector mirror can be displaced in the z-direction (optical axis) and is designed and/or mounted in such a way that the position of the second focus remains unchanged in the event of temperature changes.

Abstract: An illumination system comprises (a) a first optical element upon which a light beam impinges, where the first optical element has first raster elements that partition said light beam into light channels; (b) a second optical element that receives said light channels, where the second optical element has a second raster elements; (c) an object plane that receives said light channels via said second optical element; and (d) an exit pupil that is provided with an illumination via said object plane. The system is characterized by an assignment of a member of said first raster elements and a member of said second raster elements to each of said light channels to provide a continuous beam path from said first optical element to said object plane for each of said plurality of light channels. The assignment is changeable to provide an adjustment of said illumination in said exit pupil.

Abstract: A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0′) which is greater than the maximum lens diameter (D2) of the objective.

Abstract: A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0′) which is greater than the maximum lens diameter (D2) of the objective.

Abstract: An illumination system for wavelengths ≦193 run comprises (a) a first raster element upon which a light bundle emitted from a light source impinges, for producing a convergent light bundle having a focal point, and (b) a second raster element. The convergent light bundle impinges on the second raster element outside the focal point. There is also provided an illumination system for wavelengths ≦193 nm, comprising (a) a first plurality of raster elements upon which a light bundle emitted from a light source impinges, for producing a plurality of convergent light bundles, where a member of the first plurality of raster elements produces a member of the plurality of convergent light bundles having a focal point, and (b) a second plurality of raster elements. The member of the plurality of convergent light bundles impinges on a member of the second plurality of raster elements outside the focal point.

Abstract: The invention relates to a method for determining the non-volatile component of aerosol particles in a gas sample, especially in the exhaust gas of internal combustion engines, where the aerosol particles are deposited on an oscillating sensor (2) of at least one crystal microbalance (3), and the change in at least one oscillation parameter of the oscillating sensor is employed as measurement variable. According to the invention the oscillating sensor (2) of at least one crystal microbalance (3) is maintained at a temperature of more than 200° C. during deposition of the aerosol particles, and preferably between 250° C. and 350° C.

Abstract: There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.

Abstract: There is provided an illumination system for wavelengths of ≦193 nm. The illumination system includes an object plane, a plane conjugated to the object plane, a first collector between the object plane and the conjugated plane, and a second collector after the conjugated plane. The first collector focuses a beam bundle of rays from the object plane in the conjugated plane. At least one of the first and second collectors includes a mirror shell. The rays strike the mirror shell at an angle of incidence of less than 20° relative to a surface tangent of the mirror shell.

Abstract: A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.

Abstract: There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

Abstract: The invention relates to a multi-mirror-system for an illumination system, especially for lithography with wavelengths ≦193 nm comprising am imaging system, wherein said imaging system comprises at least a first mirror and a second mirror, an object plane, an image plane, wherein the imaging system forms an image of the object, an arc-shaped field in said image plane, whereby the radial direction of in the middle the arc-shaped field defines a scanning direction. The multi-mirror-system is characterized in that at least said first mirror and said second mirror of said imaging system are arranged in the optical path of the imaging system in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm, preferably 2 mm, most preferably 1 mm in scanning direction.

Abstract: There is provided a collector for guiding light with a wavelength of ≦193 nm onto a plane. The collector includes a first mirror shell for receiving a first ring aperture section of the light and irradiating a first planar ring section of the plane with a first irradiance, and a second mirror shell for receiving a second ring aperture section of the light and irradiating a second planar ring section of the plane with a second irradiance. The first and second mirror shells are rotationally symmetrical and concentrically arranged around a common axis of rotation, the first and second ring aperture sections do not overlap with one another, the first planar ring section substantially abuts the second planar ring section, and the first irradiance is approximately equal to the second irradiance.

Abstract: An illumination system, particularly for wavelengths ≦100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object plane to the field plane.

Abstract: The method for evaluating schlieren in glassy or crystalline optical materials includes irradiating a test sample of the optical material with light and producing a shadow image of the test sample on a projection screen. The shadow image of the test sample is received in an electronic image receiving device, such as a digital camera, and is compared with another shadow image of schlieren obtained with a comparison sample by means of interferometry. Then the optical material of the test sample is evaluated with the help of the comparison results. A suitable apparatus for performing this method is also described.