Patents by Inventor Wolfgang Singer

Wolfgang Singer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Catadioptric projection objective
    Publication number: 20070236674
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Application
    Filed: January 16, 2007
    Publication date: October 11, 2007
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • ILLUMINATION SYSTEM WITH ZOOM OBJECTIVE
    Publication number: 20070236784
    Abstract: Illumination systems which are designed to illuminate a field in a field plane and simultaneously illuminate a pupil plane with radiation from a light source are disclosed.
    Type: Application
    Filed: April 5, 2007
    Publication date: October 11, 2007
    Applicant: CARL ZEISS SMT AG
    Inventors: Wolfgang Singer, Jens Ossmann
  • PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS WITH NEGATIVE BACK FOCUS OF THE ENTRY PUPIL
    Publication number: 20070223112
    Abstract: The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.
    Type: Application
    Filed: March 22, 2007
    Publication date: September 27, 2007
    Applicant: CARL ZEISS SMT AG
    Inventors: Hans-Juergen Mann, Wolfgang Singer
  • Illumination System for a Microlithographic Projection Exposure Apparatus
    Publication number: 20070216887
    Abstract: An illumination system for a microlithographic projection exposure apparatus comprises a light source, a first optical unit having an exit pupil, an optical raster element positioned in or in close proximity to the exit pupil of the first optical unit and a field plane that is conjugated to the exit pupil of the first optical unit by Fourier transformation. The illumination system further comprises a second optical unit imaging the field plane into an image plane and having at its object side a homocentric entrance pupil that at least substantially coincides with the exit pupil of the first optical unit. This allows to dispense with a condenser lens that is usually required for conjugating the exit pupil to the field plane.
    Type: Application
    Filed: April 23, 2004
    Publication date: September 20, 2007
    Applicant: CARL ZEISS SMT AG
    Inventors: Wolfgang Singer, Johannes Wangler
  • Projection Lens for a Microlithographic Projection Exposure Apparatus
    Publication number: 20070188729
    Abstract: A projection lens for a EUV microlithographic projection exposure apparatus comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has a non-round aperture with an edge contour that may be configured such two rays of a light bundle disposed symmetrically with respect to a chief ray are treated equally, i.e. either both rays pass through the diaphragm aperture or both are blocked by the diaphragm.
    Type: Application
    Filed: April 23, 2007
    Publication date: August 16, 2007
    Applicant: Carl-Zeiss SMT AG
    Inventors: Hans-Jurgen Mann, Wolfgang Singer
  • Optical system for ultraviolet light
    Patent number: 7256932
    Abstract: An optical system for ultraviolet light having wavelengths ??200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength ??200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths ??200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.
    Type: Grant
    Filed: October 19, 2005
    Date of Patent: August 14, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Alexander Epple, Toralf Gruner, Wolfgang Singer
  • Illumination system with a grating element
    Patent number: 7248667
    Abstract: An illumination system, particularly for wavelengths ?100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object plane to the field plane.
    Type: Grant
    Filed: September 24, 2001
    Date of Patent: July 24, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Markus Weiss, Wolfgang Singer, Bernd Kleemann
  • Projection objective for a microlithographic projection exposure apparatus
    Publication number: 20070165198
    Abstract: A projection objective of a microlithographic projection exposure apparatus (110) is designed for immersion operation in which an immersion liquid (134) adjoins a photosensitive layer (126). The refractive index of the immersion liquid is greater than the refractive index of a medium (L5; 142; L205; LL7; LL8; LL9). that adjoins the immersion liquid on the object side of the projection objective (120; 120?; 120?). The projection objective is designed such that the immersion liquid (134) is convexly curved towards the object plane (122) during immersion operation.
    Type: Application
    Filed: December 27, 2004
    Publication date: July 19, 2007
    Applicant: CARL ZEISS SMT AG
    Inventors: Bernhard Kneer, Norbert Wabra, Toralf Gruner, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Illumination system for a microlithography projection exposure installation
    Publication number: 20070165202
    Abstract: An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.
    Type: Application
    Filed: September 13, 2004
    Publication date: July 19, 2007
    Inventors: Jess Koehler, Johannes Wangler, Markus Brotsack, Wolfgang Singer, Damian Fiolka, Manfred Maul
  • Collector having unused region for illumination systems using a wavelength ?193 nm
    Patent number: 7244954
    Abstract: There is provided a collector for illumination systems for light having a wavelength ?193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.
    Type: Grant
    Filed: October 4, 2005
    Date of Patent: July 17, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek, Frank Melzer, Johannes Wangler
  • Optical device with raster elements, and illumination system with the optical device
    Publication number: 20070146853
    Abstract: The invention relates to an optical device that includes (a) a first optical element with at least one first raster element, where the first raster element has a first axis, (b) a second optical element with at least one second raster element, where the second raster element has a second axis. The first raster element can be changed in its position relative to the second raster element, so that a distance between the first axis and the second axis is variable.
    Type: Application
    Filed: November 10, 2006
    Publication date: June 28, 2007
    Inventors: Wolfgang Singer, Johannes Wangler, Markus Deguenther, Birgit Kuerz, Christoph Menke
  • Illumination system particularly for microlithography
    Publication number: 20070120072
    Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
    Type: Application
    Filed: January 3, 2007
    Publication date: May 31, 2007
    Applicant: Carl Zeiss SMT AG
    Inventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
  • Projection lens for a microlithographic projection exposure apparatus
    Patent number: 7221516
    Abstract: A projection lens for a EUV microlithographic projection exposure apparatus comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has a non-round aperture with an edge contour that may be configured such two rays of a light bundle disposed symmetrically with respect to a chief ray are treated equally, i.e. either both rays pass through the diaphragm aperture or both are blocked by the diaphragm.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: May 22, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Hans-Jürgen Mann, Wolfgang Singer
  • Masks, lithography device and semiconductor component
    Publication number: 20070082272
    Abstract: The invention relates to masks comprising a multilayer coating of a specified period thickness distribution such as those used in lithography devices for producing semiconductor components. One problem of projection optics concerns pupil apodization which leads to imaging defects. The invention provides that the period thickness in the mask plane is selected so that it is greater than the period thickness ideal for maximum reflectivity. As a result, not only does the apodization over the pupil become more symmetric but the intensity variation also becomes smaller overall.
    Type: Application
    Filed: September 17, 2003
    Publication date: April 12, 2007
    Inventors: Hans-Jürgen Mann, Martin Lowisch, Wolfgang Singer
  • Lighting system, particularly for use in extreme ultraviolet (EUV) lithography
    Patent number: 7196841
    Abstract: A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths ?193 nm is provided with a light source, an object plane, an exit pupil, a first optical element having first screen elements for producing light channels, and with a second optical element having second screen elements. A screen element of the second optical element is assigned to each light channel that is formed by one of the first screen elements of the first optical element. The screen elements of the first optical element and of the second optical element can be configured or arranged so that they produce, for each light channel, a continuous beam course from the light source up to the object plane. The angles of the first screen elements of the first optical element can be adjusted in order to modify a tilt.
    Type: Grant
    Filed: April 8, 2003
    Date of Patent: March 27, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Frank Melzer, Wolfgang Singer
  • Oblique mirror-type normal-incidence collector system for light sources, particularly euv plasma discharge sources
    Publication number: 20070058244
    Abstract: There is provided a collector system. The collector system includes a first collector mirror and a second collector mirror. The first collector mirror receives EUV light from a light source at a first aperture angle via a first beam path, and reflects the EUV light at a second aperture angle along a second beam path. The first aperture angle is larger than or substantially equal to the second aperture angle. The second mirror receives the EUV light from the first mirror at the second aperture angle. The collector is an oblique mirror type normal incidence mirror collector system.
    Type: Application
    Filed: August 27, 2003
    Publication date: March 15, 2007
    Inventor: Wolfgang Singer
  • Illumination system for microlithography
    Publication number: 20070058274
    Abstract: The present invention relates to an illumination system for microlithography, especially for wavelengths ?193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity, characterized in that a filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.
    Type: Application
    Filed: April 13, 2004
    Publication date: March 15, 2007
    Applicant: Carl Zeiss SMT AG
    Inventors: Wolfgang Singer, Joachim Wietzorrek, Joachim Hainz, Gabriele Weirauch, Manfred Maul
  • Illumination system particularly for microlithography
    Patent number: 7186983
    Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
    Type: Grant
    Filed: August 17, 2004
    Date of Patent: March 6, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
  • Illumination system with field mirrors for producing uniform scanning energy
    Publication number: 20070030948
    Abstract: This invention relates to an illumination system for scanning lithography especially for wavelengths ?193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.
    Type: Application
    Filed: October 13, 2006
    Publication date: February 8, 2007
    Applicant: Carl Zeiss SMT AG
    Inventors: Wolfgang Singer, Joachim Hainz, Hans-Joachim Frasch, Johannes Wangler, Joachim Wietzorrek, Jorg Schultz
  • ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20070024836
    Abstract: An Illumination system for a microlithographic projection exposure apparatus has a light source and a first optical raster element that is positioned in or in close proximity to a first plane. The first plane is conjugated to a pupil plane of the illumination system by Fourier transformation. A second optical raster element is positioned in or in close proximity to the pupil plane. A third optical raster element is positioned in or in close proximity to a second plane that is also conjugated to the pupil plane by Fourier transformation. The third optical raster element, which can be a diffractive optical element, introduces an additional degree of design freedom for the modification of the angular distribution of the projection light bundle.
    Type: Application
    Filed: July 28, 2006
    Publication date: February 1, 2007
    Applicant: CARL ZEISS SMT AG
    Inventors: Wolfgang Singer, Johannes Wangler