Abstract: The present invention relates to htSNPs for determining a genotype of cytochrome P450 1A2 (CYP1A2), 2A6 (CYP2A6) and 2D6 (CYP2D6), PXR and UDP-glucuronosyltransferase Ia (UGT1A) genes and a gene chip using the same, and more particularly, to a selection method of htSNPs for determining a haplotype of human CYP1A2, CYP2A6, CYP2D6, PXR and UGT1A genes, a method of determining a genotype of the genes by using the htSNPs and a gene chip therefor.

Abstract: The present invention relates to a clothing treating apparatus. The clothing treating apparatus includes a cabinet, a clothing holding unit in the cabinet for holding clothing, and a steam generator for generating steam or superheated steam to supply to the clothing holding space, thereby permitting to remove rumples from the clothing and microbes from the clothing possible to remain thereon.

Abstract: A laundry treatment machine and a washing method therefor are provided. The laundry treatment machine may discharge fluid by driving a drainage device, while rotating a drum during a time period between a plurality of rinsing operations. The rotation speed of the drum may be controlled to be lower than a reference speed, which is the rotation speed of the drum when laundry is not uniformly distributed in the drum, and thus, eccentricity of the laundry is high.

Abstract: A laundry treatment machine and a washing method therefor are provided During a rinsing operation, the laundry treatment machine may rotate a drum while supplying fluid into the drum. In addition, the laundry treatment machine may control a fluid circulation device to circulate the fluid, and thus, to spray the circulated fluid into the drum during the rotation of the drum. The drum realizes at least one of first through fourth motions. The laundry treatment machine may perform various rinsing operations in consideration of the fluid level in a tub.

Abstract: A washing machine and washing method therefor are provided. The washing method may include applying a first directional torque to a drum so that laundry in the drum is rotated in a first direction and lifted to a maximum height greater than half a height of the drum, braking the drum so that the laundry is dropped, applying a second directional torque to the drum so that the dropped laundry is rotated in a second direction and lifted to a maximum height greater than half a height of the drum, and braking the drum so that the laundry is dropped.

Abstract: A washing machine and washing method therefor are provided. In the washing method, in which a drum of a drum type washing machine is rotated in a first direction, the method includes applying a first directional torque to the drum so that laundry in the drum is rotated and lifted; braking the drum so that the laundry is dropped; and then again applying the first directional torque to the drum so that the dropped laundry is rotated and lifted again.

Abstract: Disclosed is a passive matrix-addressable memory apparatus. The passive matrix-addressable memory apparatus comprises: a plurality of first electrode lines horizontally arranged with respect to each other; a plurality of second electrode lines disposed orthogonal to the plurality of first electrode lines to be horizontally arranged with respect to each other; a memory unit formed between the plurality of first electrode lines and the plurality of second electrode lines, and containing an electrically polarizable material exhibiting hysteresis; and a switch unit. The switch unit comprises: first electrodes of a cantilever structure respectively formed between the memory unit and the plurality of first electrode lines to be electrically connected to the plurality of first electrode lines; and second electrodes electrically connected to the memory unit to be spaced apart from the first electrodes to face the first electrodes.

Abstract: Disclosed therein is a case for fast food. The case for fast food includes: a case for fast food comprising: upper and lower cases made of eatable grain material, each of the upper and lower cases having a space for holding fast food therein; and a joining part formed on one of the upper and lower cases to join the upper and lower cases with each other, the joining part partially covering the other one of the upper and lower cases so that the upper and lower cases are joined with each other. Since the case holds fast food therein as it is, the case can prevent the fillings inside of the fast food from being split out to thereby maintain the fast food's clean and simple outward appearance, and allow a consumer to eat the fast food easily and conveniently.

Abstract: A wafer transfer apparatus may include a robot arm unit configured to be operated by a driving means, a blade configured to support a wafer and having a fix finger at a first end, and a clamping member attached to the robot arm. The clamping arm may also include a movable finger configured to hold a peripheral edge of the wafer, and a moving pusher attached to the movable finger and configured to guide the movable finger and the wafer on the blade towards the fix finger.

Abstract: A wafer spin chuck and an etcher using the same are provided. According to an aspect of the present invention, there is provide a wafer spin chuck device comprising: a spin body which spins a wafer; and a stationary body which holds the spin body and is under the spin body with a space between the spin body and the stationary body, wherein the stationary body includes a blocking unit which blocks the space with a fluid.

Abstract: Provided is a spin head for supporting a substrate. The spin head includes a rotatable body, and chuck pins protruding upward from the body and configured to support an edge of a substrate placed at the body when the body is rotated. Each of the chuck pins includes a vertical rod vertically disposed at the body, and a support rod extending from a side of the vertical rod and configured to make contact with the edge of the substrate placed at the body when the body is rotated. When the substrate is rotated, the vertical rod is spaced apart from the edge of the substrate. The contact portion includes a streamlined side surface. The support rod includes a contact portion. The contact portion tapers toward the end of the support rod when viewed from the top of the support rod.

Abstract: Disclosed is a washing machine, which prevents solidification of liquid detergent by rapidly recovering the liquid detergent left in a liquid detergent supply passage and a liquid detergent supply pump by forming a negative pressure differential by use of the liquid detergent supply pump for a set period of time after the supply of liquid detergent is finished.

Abstract: A facility for cleaning substrates such as semiconductor wafers includes a loading/unloading part, an aligning part where wafers are repositioned from a horizontal state to a vertical state, a cleaning part performing etchant-treating, rinsing, and drying processes for wafers and having a plurality of process chamber stacked, and an interface part where a transfer bath is disposed to transfer wafers between the process chambers. When the wafers are transferred between the process chamber, the transfer bath is filled with deionized water (DI water) to prevent their exposure to the air. Wafers drawn out of the loading/unlading part are repositioned from a horizontal state to a vertical state and are transferred to a first process chamber being one of the process chambers to be subjected to a part of processes.

Abstract: A washing machine is disclosed. The washing machine includes a drum body provided with through holes for allowing air or wash water to enter or exit the drum body, and a seam extending in a longitudinal direction of the drum body such that at least a portion of the seam has an inclination with respect to a central axis of the drum body.

Abstract: The present invention is directed to a wafer transfer apparatus having cylinder-driving movable fingers. The wafer transfer apparatus a robot arm unit whose operation is controlled by driving means, a blade on which a wafer is placed, and a clamping member for locating the wafer placed on the blade in position while fixing the wafer. The blade is installed at the end of the robot arm unit, and-the clamping is installed at the blade.

Abstract: Disclosed herein are a high-sensitivity method and apparatus for monitoring the concentration or inflow of impurities in circulating water of a circulating water system, which can remarkably improve the measurement sensitivity by converting carbonate ions of low conductivity into chlorine or sulfate ions of increased conductivity, and which can measure the inflow of air or organic substances and the amount of inflow in a simple and efficient manner in real-time. The method of the present invention comprises the steps of: increasing a content of strong acids in sample water and thus increasing equivalent conductivity of the impurities, by utilizing cation exchange resin together with anion exchange resin, in which cations of the sample water are adsorbed on the cation exchange resin to form strong acids while weakly acidic anions of low dissociation degree in the sample water are adsorbed on the anion exchange resin to form strong acids; and measuring the increased conductivity of the impurities.

Abstract: The present invention includes an apparatus for manufacturing a semiconductor having a position amending device, an elevating device, a nozzle, a nozzle moving device and a flat zone alignment device. A wafer is transferred into the apparatus for manufacturing a semiconductor and placed at the right position to be exactly located at a center of the chuck. In addition, the flat zone alignment device aligns the flat zone to face one direction. The nozzle may be moved to easily adjust an etching width of an edge of the wafer and to etch the flat zone thereof so it is etched to a uniform etching width about the edge of the wafer.

Abstract: Disclosed is a method for manufacturing cathode electrodes of electroluminescent display device capable of forming cathode electrodes of fine patterns. The disclosed comprises the steps of: forming an anode electrode on a transparent insulating substrate; forming an insulating partition having a stripe structure to cross with the anode electrode and define a pixel formation area on the substrate; forming an organic film pixel separated with a predetermined distance, with the insulating partition interposed; depositing a cathode metal layer on the surface of the resulting structure; and forming a cathode electrode exposing a predetermined part of the insulating partition by performing etching processes on the cathode metal layer using laser.

Abstract: An organic source boat structure for organic electro-luminescent display fabricating apparatus is provided to form an organic layer having uniform thickness. The organic source boat structure comprises: a plurality of host cells having a plurality of evaporation holes for evaporation of host organic source; a plurality of dopant cells alternatively arranged to the plurality of host cells, having a plurality of evaporation holes for evaporation of dopant organic source; a contamination control plate arranged between the host cells and the dopant cells; and a side cover to stably support the host cells and the dopant cells.

Abstract: Disclosed is a method for manufacturing an organic electroluminescence device, which decreases the surface resistance at side edges of pixels and increases the uniformity of the pixels, thereby reducing degradation of the device, increasing the life of the device, and improving the displaying sharpness of the device. According to the method, at first, a transparent metal film is deposited on a transparent substrate. Then, the transparent metal film is wet-etched to form anodes respectively having a transverse section whose side profiles are tapered at an angle between 70 and 90 degrees. Thereafter, an organic layer is formed on the anodes and on the substrate, and then cathodes are formed on the organic layer.