Patents by Inventor WOOK CHUNG

WOOK CHUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12323076
    Abstract: The present invention relates to an ultrasonic wave-driven triboelectric generator in which a self-gap is formed using plasma etching. The present invention relates to an ultrasonic wave-driven triboelectric generator having a polymer film as one triboelectric layer having a self-gap defined therein using plasma etching such that a surface area thereof is increased to achieve high power and miniaturization of the generator.
    Type: Grant
    Filed: October 27, 2022
    Date of Patent: June 3, 2025
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: SangWoo Kim, Young Jun Kim, Young Wook Chung, Joon Ha Hwang
  • Publication number: 20250082481
    Abstract: Disclosed is a nerve conduit. The nerve conduit includes: a conduit body which connects both sides of a severed nerve within a biological body; a triboelectric nanogenerator which includes an upper friction layer and a lower friction layer; a multilinear electrode which is located between the conduit body and the triboelectric nanogenerator, and is electrically connected to the upper and lower friction layers; and an upper encapsulation layer which is positioned above the triboelectric nanogenerator. The nerve conduit of the present disclosure can enhance nerve regeneration efficiency.
    Type: Application
    Filed: December 21, 2023
    Publication date: March 13, 2025
    Applicant: ENERGY MINING Co., Ltd.
    Inventors: Joon Ha HWANG, Young Wook CHUNG, Jang Mook JEONG, Hyun Moon PARK
  • Patent number: 12186565
    Abstract: Disclosed is an ultrasonic triboelectric generating device and an electroceutical for nerve stimulation. A metal package is provided externally, an interface design between the metal package and the ultrasonic triboelectric generating device is improved to maximize power generation efficiency by ultrasonic waves, and a high power output may be continuously provided without a battery replacement process in various frequency bands.
    Type: Grant
    Filed: February 26, 2024
    Date of Patent: January 7, 2025
    Assignee: ENERGY MINING Co., Ltd.
    Inventors: Hyun Moon Park, Young Wook Chung, Jang Mook Jeong, Joon Ha Hwang
  • Publication number: 20240395516
    Abstract: A device measuring plasma state variable including a dual probe with asymmetric area according to an embodiment may comprise a first probe and a second probe, a voltage applicator that applies a preset voltage to the first probe and the second probe, a current measuring part that measures current flowing through the first probe and the second probe and a plasma analysis part that calculates the electron temperature and density of the plasma inside a chamber based on the results measured by the current measuring part, and wherein the area of the first probe and the area of the second probe are different sizes.
    Type: Application
    Filed: September 8, 2022
    Publication date: November 28, 2024
    Applicant: IUCF-HYU(INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
    Inventors: Chin Wook CHUNG, Hyun Dong EO
  • Publication number: 20240274859
    Abstract: A secondary battery according to an embodiment of the present disclosure may include: a cell assembly in which a plurality of electrode assemblies in which a cathode sheet, a separator, and an anode sheet are wound together are stacked; and a pouch exterior material formed to surround the outer circumference of the cell assembly.
    Type: Application
    Filed: February 12, 2024
    Publication date: August 15, 2024
    Inventors: Moo Hyung LEE, Seong Kook CHOI, Min Woo KANG, Dong Hyuk KIM, Wook Ho SHIN, Sung Wook CHUNG, Kyung Yeon JO, Seong Hyun CHO, In Ung HONG
  • Publication number: 20240177972
    Abstract: Provided is a method for etching an atomic layer. The method for etching the atomic layer includes providing a substrate to a process chamber, wherein the process chamber comprises a first chamber part and a second chamber part, and the substrate is provided in the second chamber part, generating adsorption gas plasma in the first chamber part, adsorbing radicals of the adsorption gas plasma to the substrate so as to form a treatment layer, generating etching gas plasma in the first chamber part, and allowing electrons and ions of the etching gas plasma to be alternately incident into the treatment layer so as to perform desorption of the treatment layer.
    Type: Application
    Filed: November 1, 2023
    Publication date: May 30, 2024
    Applicants: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY, IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
    Inventors: Geun Young YEOM, Chin Wook CHUNG, Yun Jong JANG, Doo San KIM, Ye Eun KIM, Hong Seong GIL, Hae In KWON, Jun Young PARK, Ji Won JUNG
  • Publication number: 20240161150
    Abstract: A computer-implemented method including obtaining an identification of content cards that are eligible for display to a user. The method also can include generating a ranking for the content cards using a trained ranking function that is based at least on (i) first probability scores for the user engaging with the content cards, (ii) estimated dwell times for the user for the content cards, and (iii) card quality scores that are based at least on second probability scores for the user completing tasks within a predetermined time period after viewing the content cards. The method additionally can include ordering an arrangement of the content cards for presentment to the user based on the ranking. Other embodiments are described.
    Type: Application
    Filed: November 10, 2023
    Publication date: May 16, 2024
    Applicant: Social Finance, Inc. dba SoFi
    Inventors: Wook Chung, Gagandeep Malhotra, Somas Thyagaraja, Vijay Venkatraman, Mason Sun
  • Publication number: 20230386788
    Abstract: Provided is an etching method. The etching method includes loading a substrate into a process chamber, wherein the process chamber includes a first chamber part and a second chamber part, and the substrate is loaded into the second chamber part, supplying high-density gas plasma to the first chamber part, supplying ultra-low electron temperature plasma to the second chamber part using at least a portion of the high-density gas plasma, adsorbing radicals of the ultra-low electron temperature plasma to a surface of the substrate, and applying a bias to the substrate to accelerate at least one of ions or electrons of the ultra-low electron temperature plasma so as to collide with the substrate.
    Type: Application
    Filed: November 28, 2022
    Publication date: November 30, 2023
    Applicant: IUCF-HYU(Industry-University Cooperation Foundation Hanyang University)
    Inventors: Chin-Wook CHUNG, Jiwon JUNG
  • Publication number: 20230197604
    Abstract: A semiconductor device is provided. The semiconductor device includes: a first interlayer insulating film defining a lower wiring trench; a lower wiring structure including a first lower barrier film which extends along sidewalls of the lower wiring trench, and a lower filling film which is on the first lower barrier film; a second interlayer insulating film on the first interlayer insulating film, the second interlayer insulating film defining an upper wiring trench which exposes at least part of the lower wiring structure; and an upper wiring structure provided in the upper wiring trench and connected to the lower wiring structure. An upper surface of the first lower barrier film is closer to a bottom surface of the lower wiring trench than each of an upper surface of the first interlayer insulating film and an upper surface the lower filling film. The upper surface of the first lower barrier film is concave.
    Type: Application
    Filed: June 21, 2022
    Publication date: June 22, 2023
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: John Soo KIM, Min Wook CHUNG, Kyoung Suk KIM, Soo Kyung KIM, Won Suk LEE, Jong Jin LEE
  • Publication number: 20230135593
    Abstract: The present invention relates to an ultrasonic wave-driven triboelectric generator in which a self-gap is formed using plasma etching. The present invention relates to an ultrasonic wave-driven triboelectric generator having a polymer film as one triboelectric layer having a self-gap defined therein using plasma etching such that a surface area thereof is increased to achieve high power and miniaturization of the generator.
    Type: Application
    Filed: October 27, 2022
    Publication date: May 4, 2023
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: SangWoo KIM, Young Jun KIM, Young Wook CHUNG, Joon Ha HWANG
  • Patent number: 11617723
    Abstract: The present invention aims to dramatically increase the effect of hepatic arterial chemoembolization by developing human serum albumin-based nanoparticles, which are bioproteins that effectively carry Adriamycin in place of Adriamycin, an anticancer agent used in hepatic arterial chemoembolization. The human serum albumin nanoparticles carrying the Adriamycin not only intensively infiltrate the drug effectively into the cells but also have a synergistic effect that can induce a long-term therapeutic effect by utilizing the effect of continuous drug release from the particles.
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: April 4, 2023
    Assignees: SOGANG UNIVERSITY RESEARCH FOUNDATION, SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION, IMGT CO, LTD.
    Inventors: Hyun Cheol Kim, Jin Wook Chung, Eun Ah Jung
  • Publication number: 20230093932
    Abstract: A triboelectric energy generating device including: a first triboelectric layer made of a conductive material; a second triboelectric layer made of the ferroelectric composite, wherein the second triboelectric layer faces and is spaced apart from a friction face of the first triboelectric layer; and an outer wall surrounding at least a portion of each of the first triboelectric layer and the second triboelectric layer. The ferroelectric composite includes a polymer matrix and ferroelectric particles dispersed in the polymer matrix. When the ultrasonic wave is applied to the device, the first triboelectric layer and the second triboelectric layer repeatedly contact and are spaced from each other to generate the triboelectric energy. When the ultrasonic wave is applied to the device, an electric field is generated to maintain a polarized state of the ferroelectric particles to maintain an output of the triboelectric energy.
    Type: Application
    Filed: September 23, 2022
    Publication date: March 30, 2023
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: SangWoo KIM, Young Jun KIM, Bo Sung KIM, Young Wook CHUNG, Joon Ha HWANG
  • Publication number: 20220410965
    Abstract: A rear wheel steering control system and method for vehicles may gradually perform rear wheel steering at a gentle ramp-up slope, compared to a conventional rear wheel steering control system and method, for a predetermined time period when the ignition of a vehicle is turned on in the state in which a front wheel steering angle is generated, to prevent rear wheels from being rapidly steered and to eliminate a sense of difference felt by a driver due to rapid rear wheel steering.
    Type: Application
    Filed: April 8, 2022
    Publication date: December 29, 2022
    Applicants: Hyundai Motor Company, Kia Corporation
    Inventors: Jun Wook OH, Rae Wook CHUNG
  • Patent number: 11420978
    Abstract: The present invention relates to a method for synthesizing a 3-phenyl-2,8-dihydropyrano[2,3-f]chromene derivative, which may be usefully used for synthesizing a pyranochromenyl phenol derivative, and when the derivative is used, the 3-phenyl-2,3,4,8,9,10-hexahydropyrano[2,3-f]chromene derivative may be effectively prepared.
    Type: Grant
    Filed: April 3, 2019
    Date of Patent: August 23, 2022
    Inventors: Sang Ku Yoo, Jin Wook Chung, In Geun Jo, Ji Young Kim, Jeong Ho Im, Ku Suk Kang, Jin Young Kim
  • Publication number: 20220246407
    Abstract: The present invention relates to a substrate processing apparatus and a substrate processing method. A substrate processing apparatus according to an embodiment of the present invention includes a chamber; a susceptor located inside the chamber to support a substrate to be processed; a first plasma control plate located in an upper area of a space inside the chamber; a second plasma control plate located below the first plasma control plate while being spaced apart from the first plasma control plate by a predetermined distance; and a plasma control power source connected to the first plasma control plate and the second plasma control plate.
    Type: Application
    Filed: April 1, 2020
    Publication date: August 4, 2022
    Applicant: IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
    Inventors: Chin Wook CHUNG, Moo Young LEE
  • Patent number: 11332475
    Abstract: The present invention relates to pyranochromenylphenol derivatives having different efficacies depending on the direction of optical activity and a pharmaceutical composition including the same, and in the pyranochromenylphenol derivatives, an R-enantiomer has excellent anti-diabetic efficacy by suppressing a rise in blood sugar and an S-enantiomer has excellent anti-obesity efficacy by suppressing an increase in body weight.
    Type: Grant
    Filed: December 8, 2020
    Date of Patent: May 17, 2022
    Inventors: Sang Ku Yoo, Jin Wook Chung, In Geun Jo, Ji Young Kim, Jeong Ho Im, Ku Suk Kang, Jin Young Kim
  • Patent number: 11108725
    Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media, for posting messages on a social messaging platform. One of the methods includes providing a message composition interface; receiving a user request to include a promotion with a composed message; in response to the request, processing the content of the composed message and the user's profile on the social messaging platform to determine one or more social signals; computing an engagement score for each user in a pool of users, wherein the engagement score for each user indicates the likelihood that the user will engage with the message; selecting candidate users from the pool of users; selecting a plurality of target users from the candidate users based on a promotion value and the respective engagement scores; and posting the message on the platform including adding the message to a message stream associated with the selected target users.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: August 31, 2021
    Assignee: Twitter, Inc.
    Inventors: Wook Chung, Jennifer Nakamura, Kiryl Lashuk
  • Publication number: 20210094967
    Abstract: The present invention relates to pyranochromenylphenol derivatives having different efficacies depending on the direction of optical activity and a pharmaceutical composition including the same, and in the pyranochromenylphenol derivatives, an R-enantiomer has excellent anti-diabetic efficacy by suppressing a rise in blood sugar and an S-enantiomer has excellent anti-obesity efficacy by suppressing an increase in body weight.
    Type: Application
    Filed: December 8, 2020
    Publication date: April 1, 2021
    Inventors: SANG KU YOO, JIN WOOK CHUNG, IN GEUN JO, Jl YOUNG KIM, JEONG HO IM, KU SUK KANG, JIN YOUNG KIM
  • Patent number: 10947250
    Abstract: The present invention relates to a method for synthesizing a 3-phenyl-2,3,4,8,9,10-hexahydropyrano[2,3-f]chromene derivative and an optical isomer thereof, and an intermediate Compound which may be used for the synthesis method, and when the method and the intermediate Compound are used, the 3-phenyl-2,3,4,8,9,10-hexahydropyrano[2,3-f]chromene derivative and the optical isomer thereof may be effectively synthesized.
    Type: Grant
    Filed: March 3, 2020
    Date of Patent: March 16, 2021
    Inventors: Sang Ku Yoo, Jin Wook Chung, In Geun Jo, Ji Young Kim, Jeong Ho Im, Ku Suk Kang, Jin Young Kim
  • Publication number: 20210074514
    Abstract: The present invention relates to a substrate treating apparatus. According to one embodiment of the present invention, a substrate treating apparatus comprises: a chamber; a susceptor located at an inner side of the chamber to support a substrate subject to a process; an electrode plate having a pre-set area and located at an upper area inside the chamber; an RF power supply providing power for plasma generation and connected to the susceptor; and a plasma control member located on a branched conducting wire branching from a conducting wire, through which the RF power supply is connected to the susceptor, and grounded.
    Type: Application
    Filed: September 3, 2020
    Publication date: March 11, 2021
    Applicant: IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
    Inventors: Chin-Wook CHUNG, Yeong-Min LIM