Patents by Inventor Wook-Seong Lee
Wook-Seong Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210187907Abstract: Provided is an optical filter including first and second reflection layers separated from each other, a dielectric region interposed between the first and second reflection layers and in which two materials of which refractive indexes are different are alternately disposed, and a buffer layer disposed between the dielectric region and at least one of the first and second reflection layers, wherein there are at least two filter regions in which relative volume ratios of the two materials alternately disposed are different.Type: ApplicationFiled: March 8, 2021Publication date: June 24, 2021Applicant: Samsung Electronics Co., Ltd.Inventors: Kyeong Seok LEE, Gyu Weon HWANG, Won Mok KIM, In Ho KIM, Wook Seong LEE, Doo Seok JEONG
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Patent number: 10908019Abstract: Present invention provides a spectrometer including a first unit spectral filter configured to absorb or reflect light in a part of a wavelength band of a light spectrum of an incident target, a second unit spectral filter configured to absorb or reflect light in a wavelength band different from the part of the wavelength band, a first light detector configured to detect a first light spectrum passing through the first unit spectral filter, a second light detector configured to detect a second light spectrum passing through the second unit spectral filter, and a processing unit configured to perform a function of restoring a light spectrum of the target incident from spectra of light detected from the first light detector and the second light detector.Type: GrantFiled: July 31, 2017Date of Patent: February 2, 2021Assignee: Samsung Electrionics Co., Ltd.Inventors: Kyeong Seok Lee, Won Mok Kim, Gyu Weon Hwang, In Ho Kim, Wook Seong Lee, Doo Seok Jeong
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Patent number: 10697073Abstract: A method for manufacturing an electrode for hydrogen production using a tungsten carbide nanoflake may include: forming a tungsten carbide nanoflake on a nanocrystalline diamond film by means of a chemical vapor deposition process in which hydrogen plasma is applied; and increasing activity of the tungsten carbide nanoflake to a hydrogen evolution reaction by removing an oxide layer or a graphene layer from a surface of the tungsten carbide nanoflake. Since an oxide layer and/or a graphene layer of a surface of tungsten carbide is removed by means of cyclic cleaning after tungsten carbide is formed, hydrogen evolution reaction (HER) activity of the tungsten carbide may be increased, thereby enhancing utilization as a catalyst electrode.Type: GrantFiled: May 30, 2017Date of Patent: June 30, 2020Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Wook Seong Lee, Young-Jin Ko, Young Joon Baik, Jong-Keuk Park, Kyeong Seok Lee, Inho Kim, Doo Seok Jeong
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Publication number: 20190025120Abstract: Present invention provides a spectrometer including a first unit spectral filter configured to absorb or reflect light in a part of a wavelength band of a light spectrum of an incident target, a second unit spectral filter configured to absorb or reflect light in a wavelength band different from the part of the wavelength band, a first light detector configured to detect a first light spectrum passing through the first unit spectral filter, a second light detector configured to detect a second light spectrum passing through the second unit spectral filter, and a processing unit configured to perform a function of restoring a light spectrum of the target incident from spectra of light detected from the first light detector and the second light detector.Type: ApplicationFiled: July 31, 2017Publication date: January 24, 2019Applicant: Samsung Electronics Co., Ltd.Inventors: Kyeong Seok LEE, Won Mok KIM, Gyu Weon HWANG, In Ho KIM, Wook Seong LEE, Doo Seok JEONG
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Publication number: 20190018188Abstract: Provided is an optical filter including a cladding layer, a plurality of metal patterns configured to form a periodic lattice structure on the cladding layer; and an optical waveguide layer on the plurality of metal patterns. Light travels from the optical waveguide layer to the cladding layer. Provided is an optical device using the optical filter.Type: ApplicationFiled: July 31, 2017Publication date: January 17, 2019Applicant: Samsung Electronics Co., Ltd.Inventors: Kyeong Seok LEE, Gyu Weon HWANG, In Ho KIM, Won Mok KIM, Wook Seong LEE, Doo Seok JEONG
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Publication number: 20190016091Abstract: Provided is an optical filter including first and second reflection layers separated from each other, a dielectric region interposed between the first and second reflection layers and in which two materials of which refractive indexes are different are alternately disposed, and a buffer layer disposed between the dielectric region and at least one of the first and second reflection layers, wherein there are at least two filter regions in which relative volume ratios of the two materials alternately disposed are different.Type: ApplicationFiled: July 31, 2017Publication date: January 17, 2019Applicant: Samsung Electronics Co., Ltd.Inventors: Kyeong Seok LEE, Gyu Weon HWANG, Won Mok KIM, In Ho KIM, Wook Seong LEE, Doo Seok JEONG
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Publication number: 20180038003Abstract: A method for manufacturing an electrode for hydrogen production using a tungsten carbide nanoflake may include: forming a tungsten carbide nanoflake on a nanocrystalline diamond film by means of a chemical vapor deposition process in which hydrogen plasma is applied; and increasing activity of the tungsten carbide nanoflake to a hydrogen evolution reaction by removing an oxide layer or a graphene layer from a surface of the tungsten carbide nanoflake. Since an oxide layer and/or a graphene layer of a surface of tungsten carbide is removed by means of cyclic cleaning after tungsten carbide is formed, hydrogen evolution reaction (HER) activity of the tungsten carbide may be increased, thereby enhancing utilization as a catalyst electrode.Type: ApplicationFiled: May 30, 2017Publication date: February 8, 2018Inventors: Wook Seong LEE, Young-Jin KO, Young Joon BAIK, Jong-Keuk PARK, Kyeong Seok LEE, Inho KIM, Doo Seok JEONG
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Patent number: 9840417Abstract: Disclosed is AA? graphite with a new stacking feature of graphene, and a fabrication method thereof. Graphene is stacked in the sequence of AA? where alternate graphene layers exhibiting the AA? stacking are translated by a half hexagon (1.23 ?). AA? graphite has an interplanar spacing of about 3.44 ? larger than that of the conventional AB stacked graphite (3.35 ?) that has been known as the only crystal of pure graphite. This may allow the AA? stacked graphite to have unique physical and chemical characteristics.Type: GrantFiled: November 4, 2015Date of Patent: December 12, 2017Assignee: Korea Institute of Science and TechnologyInventors: Jae-Kap Lee, So-Hyung Lee, Jae-Pyoung Ahn, Seung-cheol Lee, Wook-Seong Lee
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Patent number: 9726788Abstract: A method for fabricating a nanoantenna array may include forming a resist layer on a substrate, forming a focusing layer having a dielectric microstructure array on the resist layer, diffusing light one-dimensionally in a specific direction by using a linear diffuser, forming an anisotropic pattern on the resist layer by illuminating the light diffused by the linear diffuser on the focusing layer and the resist layer, depositing a material suitable for a plasmonic resonance onto the substrate and the resist layer on which the pattern is formed, and forming a nanoantenna array on the substrate by removing the resist layer and the material deposited on the resist layer. A light diffusing angle by the linear diffuser and a size of the dielectric microstructure are determined based on an aspect ratio of the pattern to be formed.Type: GrantFiled: April 15, 2014Date of Patent: August 8, 2017Assignee: Korea Institute of Science and TechnologyInventors: Kyeong Seok Lee, Won Mok Kim, Taek Sung Lee, Wook Seong Lee, Doo Seok Jeong, Inho Kim
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Patent number: 9482798Abstract: A plasmonic nano-color coating layer includes a composite layer including a plurality of metal particle layers and a plurality of matrix layers and having a periodic multilayer structure in which the metal particle layers and the matrix layers are alternately arranged, a dielectric buffer layer located below the composite layer, and a mirror layer located below the dielectric buffer layer, wherein the color of the plasmonic nano-color coating layer is determined based on a nominal thickness of the metal particle layer and a separation between the metal particle layers.Type: GrantFiled: March 19, 2014Date of Patent: November 1, 2016Assignee: Korea Institute of Science and TechnologyInventors: Kyeong Seok Lee, Won Mok Kim, Taek Sung Lee, Wook Seong Lee, Doo Seok Jeong, Inho Kim
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Publication number: 20160221156Abstract: A superhard boron carbide thin film with superior high temperature oxidation resistance has a structure in which a boron carbide layer and a silicon carbide layer are repeatedly stacked in an alternating manner. Accordingly, the high temperature oxidation resistance of the boron carbide thin film is enhanced, allowing the application as coating materials for wear resistant tools such as cutting tools.Type: ApplicationFiled: December 16, 2015Publication date: August 4, 2016Applicant: Korea Institute of Science and TechnologyInventors: Young Joon BAIK, Jong-Keuk PARK, Wook Seong LEE
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Publication number: 20160122188Abstract: Disclosed is AA? graphite with a new stacking feature of graphene, and a fabrication method thereof. Graphene is stacked in the sequence of AA? where alternate graphene layers exhibiting the AA? stacking are translated by a half hexagon (1.23 ?). AA? graphite has an interplanar spacing of about 3.44 ? larger than that of the conventional AB stacked graphite (3.35 ?) that has been known as the only crystal of pure graphite. This may allow the AA? stacked graphite to have unique physical and chemical characteristics.Type: ApplicationFiled: November 4, 2015Publication date: May 5, 2016Applicant: Korea Institute of Science and TechnologyInventors: Jae-Kap LEE, So-Hyung LEE, Jae-Pyoung AHN, Seung-cheol LEE, Wook-Seong LEE
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Patent number: 9200363Abstract: Disclosed is AA? graphite with a new stacking feature of graphene, and a fabrication method thereof. Graphene is stacked in the sequence of AA? where alternate graphene layers exhibiting the AA? stacking are translated by a half hexagon (1.23 ?). AA? graphite has an interplanar spacing of about 3.44 ? larger than that of the conventional AB stacked graphite (3.35 ?) that has been known as the only crystal of pure graphite. This may allow the AA? stacked graphite to have unique physical and chemical characteristics.Type: GrantFiled: July 30, 2009Date of Patent: December 1, 2015Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Jae-Kap Lee, So-Hyung Lee, Jae-Pyoung Ahn, Seung-Cheol Lee, Wook-Seong Lee
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Patent number: 9175387Abstract: 2-dimensional nanostructured tungsten carbide which is obtained by control of the alignment of nanostructure during growth of tungsten carbide through control of the degree of supersaturation and a method for fabricating same are disclosed. The method for fabricating 2-dimensional nanostructured tungsten carbide employs a chemical vapor deposition process wherein a hydrogen plasma is applied to prepare 2-dimensional nanostructured tungsten carbide vertically aligned on a nanocrystalline diamond film. The chemical vapor deposition process wherein the hydrogen plasma is applied includes: disposing a substrate with the nanocrystalline diamond film formed thereon on an anode in a chamber, disposing a surface-carburized tungsten cathode above and at a distance from the substrate, and applying the hydrogen plasma into the chamber.Type: GrantFiled: January 21, 2013Date of Patent: November 3, 2015Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Wook Seong Lee, Hak Joo Lee, Young Joon Baik, Jong Keuk Park
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Patent number: 9074281Abstract: Methods for fabricating uniform nanocrystalline diamond thin films with minimized voids are presented. These uniform nanocrystalline diamond thin films can be formed on any number of treated silicon oxide surfaces such as on hydrogen plasma treated surfaces of silicon oxide-coated substrates or on hydrocarbon plasma pre-treated surfaces of silicon oxide-coated substrates. It is believed that treating these surfaces results in maximizing electrostatic attraction between these treated surfaces with nanodiamond particles during a subsequent ultrasonic seeding of the nanodiamond particles onto these threated surfaces. This can result in the nanodiamond particles being substantially uniformly distributed and bound on the treated silicon oxide surface.Type: GrantFiled: March 13, 2013Date of Patent: July 7, 2015Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Wook Seong Lee, Hak Joo Lee, Young Joon Baik, Jong Keuk Park
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Publication number: 20150146180Abstract: A method for fabricating a nanoantenna array may include forming a resist layer on a substrate, forming a focusing layer having a dielectric microstructure array on the resist layer, diffusing light one-dimensionally in a specific direction by using a linear diffuser, forming an anisotropic pattern on the resist layer by illuminating the light diffused by the linear diffuser on the focusing layer and the resist layer, depositing a material suitable for a plasmonic resonance onto the substrate and the resist layer on which the pattern is formed, and forming a nanoantenna array on the substrate by removing the resist layer and the material deposited on the resist layer. A light diffusing angle by the linear diffuser and a size of the dielectric microstructure are determined based on an aspect ratio of the pattern to be formed.Type: ApplicationFiled: April 15, 2014Publication date: May 28, 2015Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Kyeong Seok LEE, Won Mok KIM, Taek Sung LEE, Wook Seong LEE, Doo Seok JEONG, Inho KIM
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Publication number: 20150116856Abstract: A plasmonic nano-color coating layer includes a composite layer including a plurality of metal particle layers and a plurality of matrix layers and having a periodic multilayer structure in which the metal particle layers and the matrix layers are alternately arranged, a dielectric buffer layer located below the composite layer, and a mirror layer located below the dielectric buffer layer, wherein the color of the plasmonic nano-color coating layer is determined based on a nominal thickness of the metal particle layer and a separation between the metal particle layers.Type: ApplicationFiled: March 19, 2014Publication date: April 30, 2015Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Kyeong Seok LEE, Won Mok KIM, Taek Sung LEE, Wook Seong LEE, Doo Seok JEONG, Inho KIM
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Patent number: 8973526Abstract: A plasma deposition apparatus includes a cathode assembly including a cathode disk and a water-coolable cathode holder supporting the cathode disk, an anode assembly including a water-coolable anode holder, a substrate mounted on the anode holder to serve as an anode, and a substrate holder mounting and supporting the substrate, and a reactor for applying a potential difference between opposing surfaces of the cathode assembly and the anode assembly under a vacuum state to form plasma of a raw gas. The cathode disk comes into thermal contact with the cathode holder using at least one of a self weight and a vacuum absorption force so as to permit thermal expansion of the cathode disk.Type: GrantFiled: December 10, 2007Date of Patent: March 10, 2015Assignee: Korea Institute of Science and TechnologyInventors: Wook Seong Lee, Young Joon BaiK, Jong-Keuk Park, Gyu Weon Hwang, Jeung-hyun Jeong
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Patent number: 8852406Abstract: A method for producing a cubic boron nitride (cBN) thin film includes depositing cBN onto nanocrystalline diamond having controlled surface irregularity characteristics to improve the adhesion at the interface of cBN/nanocrystalline diamond, while incorporating hydrogen to a reaction gas upon the synthesis of cBN and controlling the feed time of hydrogen, so that harmful reactions occurring on a surface of nanocrystalline diamond and residual stress applied to cBN may be inhibited. Also, a cBN thin film structure is obtained by the method. The cBN thin film is formed on the nanocrystalline diamond thin film by using a physical vapor deposition process, wherein a reaction gas supplied when the deposition of a thin film occurs is a mixed gas of argon (Ar) with nitrogen (N2), and hydrogen (H2) is added to the reaction gas at a time after the deposition of a thin film occurs.Type: GrantFiled: January 18, 2013Date of Patent: October 7, 2014Assignee: Korea Institute of Science and TechnologyInventors: Young Joon Baik, Jong Keuk Park, Wook Seong Lee
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Publication number: 20140255286Abstract: A method for manufacturing a cubic boron nitride (c-BN) thin film includes: applying a pulse-type bias voltage to a substrate; and forming the cubic boron nitride thin film by bombarding the substrate with ions using the pulse-type bias voltage. To control the compressive residual stress of the cubic boron nitride thin film, ON/OFF time ratio of the pulse-type bias voltage may be controlled. The compressive residual stress that is applied to the thin film can be minimized by using the pulse-type voltage as a negative bias voltage applied to the substrate. In addition, the deposition of the c-BN thin film can be performed in a low ion energy region by increasing the ion/neutral particle flux ratio through the control of the ON/OFF time ratio of the pulse-type voltage.Type: ApplicationFiled: May 28, 2013Publication date: September 11, 2014Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Young Joon BAIK, Jong-Keuk PARK, Wook Seong LEE