Abstract: The invention provides recombinant DNA molecules that are unique to Brassica Event MON94100 and transgenic Brassica plants, Brassica plant parts, Brassica seeds, Brassica cells, and agricultural products containing Brassica Event MON94100 as well as methods of using and detecting Brassica Event MON94100. Transgenic Brassica plants containing Brassica Event MON94100 exhibit tolerance to dicamba.

Abstract: The invention relates to novel methods and compositions for conferring tolerance to glyphosate to plants. The invention also provides glyphosate-tolerant plants, seeds, tissue, cells, and plant parts comprising modified EPSP synthases and recombinant DNA molecules encoding modified EPSP synthases, as well as methods of producing the same and the use thereof.

Abstract: The invention relates to novel methods and compositions for conferring tolerance to glyphosate to plants. The invention also provides glyphosate -tolerant plants, seeds, tissue, cells, and plant parts comprising modified EPSP synthases and recombinant DNA molecules encoding modified EPSP synthases, as well as methods of producing the same and the use thereof.

Abstract: The invention relates to novel methods and compositions for conferring tolerance to glyphosate to plants. The invention also provides glyphosate-tolerant plants, seeds, tissue, cells, and plant parts comprising modified EPSP synthases and recombinant DNA molecules encoding modified EPSP synthases, as well as methods of producing the same and the use thereof.

Abstract: Systems and techniques for persistent calibration of an electronic device configured to implement an extended reality (XR) system involve estimating and validating visual-inertial odometry (VIO) calibration parameters during an active XR session of the electronic device. Validating the estimated VIO calibration parameters involves performing a strict calibration qualification of the estimated VIO calibration parameters using a thresholding module, machine learning module, or both. An initial calibration qualification is performed concurrently with the strict calibration qualification based on VIO performance. If the estimated VIO calibration parameters pass the strict calibration qualification and initial calibration qualification, they are stored for use to calibrate the device in future XR sessions. Persistent calibration of time alignment between the inertial management unit and the image sensor of the electronic device is also performed during active XR sessions upon detection of time alignment issues.

Abstract: The invention provides recombinant DNA molecules that are unique to Brassica Event MON94100 and transgenic Brassica plants, Brassica plant parts, Brassica seeds, Brassica cells, and agricultural products containing Brassica Event MON94100 as well as methods of using and detecting Brassica Event MON94100. Transgenic Brassica plants containing Brassica Event MON94100 exhibit tolerance to dicamba.

Abstract: The invention provides recombinant DNA molecules that are unique to Brassica Event MON94100 and transgenic Brassica plants, Brassica plant parts, Brassica seeds, Brassica cells, and agricultural products containing Brassica Event MON94100 as well as methods of using and detecting Brassica Event MON94100. Transgenic Brassica plants containing Brassica Event MON94100 exhibit tolerance to dicamba.

Abstract: The invention relates to novel methods and compositions for conferring tolerance to glyphosate to plants. The invention also provides glyphosate-tolerant plants, seeds, tissue, cells, and plant parts comprising modified EPSP synthases and recombinant DNA molecules encoding modified EPSP synthases, as well as methods of producing the same and the use thereof.

Abstract: Methods for providing a privacy setting for a target user relative to relationships with a number of other users in a social network utilizing an electronic computing device are presented, the method including: causing the electronic computing device to retrieve a current privacy setting for a common profile item, where the common profile item corresponds with the target user and each of the number of other users, and where the common profile item is one of a number of common profile items; causing the electronic computing device to calculate a pseudo-common profile item sensitivity value for the common profile item based on the current privacy settings of the target user and the number of other users; causing the electronic computing device to calculate a final common profile item sensitivity value for the common profile item based on the current privacy setting.

Abstract: The invention provides recombinant DNA molecules that are unique to Brassica Event MON94100 and transgenic Brassica plants, Brassica plant parts, Brassica seeds, Brassica cells, and agricultural products containing Brassica Event MON94100 as well as methods of using and detecting Brassica Event MON94100. Transgenic Brassica plants containing Brassica Event MON94100 exhibit tolerance to dicamba.

Abstract: The replaying of work across a database servers includes: receiving a global time by each of a plurality of replay dispatchers; calculating, for each given replay dispatcher, a time offset using a local time for the given replay dispatcher and the global time; receiving, for each given replay dispatcher, a replay workload comprising a plurality of replay records and a global replay start time, wherein each of the plurality of replay records comprises an expected wait time; calculating, for each given replay dispatcher, a wait time for each given replay record based on the expected wait time for the given replay record, the global replay start time, and the time offset for the given replay dispatcher; and submitting, for each given replay dispatcher, the replay records to a target database server for processing in an order according to the calculated wait times.

Abstract: A method for substrate processing includes producing a magnetic field by a magnetron across the full width of a sputtering surface of a target in a first direction. The magnetron can produce two erosion grooves separated by a distance S on the sputtering surface. The method includes moving the magnetron continuously at a first speed by the distance S in a first segment along a linear travel path. The linear travel path is along a second direction perpendicular to the first direction. The method includes continuously sputtering a material off the sputtering surface and depositing the material on the substrate during the first segment, and moving the magnetron by the distance S in a second segment along the linear travel path at a second speed higher than the first speed without sputtering the material off the sputtering surface or sputtering materials off at significant lower rate.

Abstract: A substrate processing system includes a first load lock, a process chamber having a first opening to allow an exchange of a substrate between the first load lock and the first process chamber, first rollers in the process chamber; and second rollers in the first load lock, wherein the first rollers and the second rollers are configured to transport a substrate thereon through the first opening between the first load lock and the process chamber. At least some of the first rollers and the second rollers are idler rollers.

Abstract: A vacuum processing system includes a vacuum chamber that can contain a workpiece therein, a deposition source unit that provides a material to be deposited on the workpiece in vacuum, and a cooling module in thermal contact with the deposition source unit. The cooling module includes one or more holding wells that can contain a cooling liquid. The cooling module can cool the deposition source unit by a loss of latent heat during the evaporation of the cooling liquid.

Abstract: A multi junction photovoltaic device includes lower pn junction layers comprising silicon and upper pn junction layers formed over the lower pn junction layers. The upper pn junction layers include a CdTe layer, wherein the upper pn junction layers are electrically serially connected to the lower pn junction layers. The upper pn junction layers can convert a first portion of photons into a first electric voltage. The lower pn junction layers can convert a second portion of photons into a second electric voltage lower than the first electric voltage.

Abstract: A vacuum processing system includes a vacuum chamber in connection with a vacuum pump that can exhaust air or vapor in the vacuum chamber, and a container in the vacuum chamber configured to contain one or more work pieces therein and to receive a heat-exchange liquid that comes into contact with the one or more work pieces to allow heat exchange with the one or more work pieces. The vacuum pump can exhaust at least a portion of the vapor evaporated from the heat-exchange liquid on the work pieces or in the container. A deposition source unit can provide material to be deposited on the one or more work pieces in vacuum. The one or more work pieces can be brought a predetermined temperature by the heat-exchange liquid.

Abstract: A deposition system includes a chamber, a plurality of targets in a center region in the chamber and a plurality of substrates in the chamber. The targets are sequentially positioned when viewed in a first direction. At least one of the targets includes a sputtering surface facing outward. The substrates are sequentially positioned when viewed in the first direction. At least one of the substrates includes a deposition surface configured to receive material sputtered off the sputtering surface.

Abstract: A plasma-enhanced substrate processing system includes a magnetic-field generation unit that can create a substantially uniform magnetic field along an axial direction in a spatial region, a processing chamber in the spatial region, and a first planar source unit that provides a deposition material. The magnetic field can produce a plasma gas in the processing chamber, which enables the deposition material to be deposited on a substrate.

Abstract: A target assembly for material deposition includes a first target piece having a first sputtering surface and comprising a first target material that is to be sputtered off the first sputtering surface and to deposit on a substrate. The target assembly also includes a second target piece juxtaposed to the first target piece. The second target piece comprises a second sputtering surface and a second target material that can be sputtered off the second sputtering surface and to deposit on the substrate. The first target piece and the second target piece are configured to be switched in positions and/or orientations after a period of sputtering operations.

Abstract: A deposition system includes a chamber, a plurality of targets in a center region in the chamber and a plurality of substrates in the chamber. The targets are sequentially positioned when viewed in a first direction. At least one of the targets includes a sputtering surface facing outward. The substrates are sequentially positioned when viewed in the first direction. At least one of the substrates includes a deposition surface configured to receive material sputtered off the sputtering surface.