Patents by Inventor Xi Chu
Xi Chu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11967169Abstract: A capacitive fingerprint sensor is configured to be integrated in a display. The capacitive fingerprint sensor includes a plurality of transmitter electrodes. Each respective transmitter electrode including at least one transmitter conductor formed in a first metal layer of a sensor stack and disposed between pixels of a display. The capacitive fingerprint sensor further includes a plurality of receiver electrodes. Each respective receiver electrode including at least one receiver conductor formed in a second metal layer of a sensor stack and disposed between pixels of the display. The receiver electrodes have an orientation different from the transmitter electrodes.Type: GrantFiled: September 22, 2022Date of Patent: April 23, 2024Assignee: Synaptics IncorporatedInventors: Xi Chu, Guozhong Shen
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Publication number: 20230174382Abstract: The present application provides a method, a equipment and a system for producing a silicon-containing products by using a silicon sludge which is produced by a diamond wire cutting silicon material. The method of the present application mainly utilizes a high oxide layer on the surface of a silicon waste particle produced during diamond wire cutting. The characteristics are such that the surface oxide disproportionates with adjacent internal elemental silicon to form silicon monoxide to be removed in a vapor to achieve a physical chemical reaction with a metal, a halogen gas, a hydrogen halide gas or hydrogen to form a high value-added silicon-containing products. The process realizes the large-scale, high-efficiency, energy-saving, continuous and low-cost complete recycling of diamond-wire cutting silicon waste.Type: ApplicationFiled: September 12, 2022Publication date: June 8, 2023Inventor: Xi Chu
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Publication number: 20230095731Abstract: A capacitive fingerprint sensor is configured to be integrated in a display. The capacitive fingerprint sensor includes a plurality of transmitter electrodes. Each respective transmitter electrode including at least one transmitter conductor formed in a first metal layer of a sensor stack and disposed between pixels of a display. The capacitive fingerprint sensor further includes a plurality of receiver electrodes. Each respective receiver electrode including at least one receiver conductor formed in a second metal layer of a sensor stack and disposed between pixels of the display. The receiver electrodes have an orientation different from the transmitter electrodes.Type: ApplicationFiled: September 22, 2022Publication date: March 30, 2023Inventors: Xi Chu, Guozhong Shen
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Patent number: 11440805Abstract: The present application provides a system and method for producing a silicon-containing product by using a silicon sludge, which is produced by a cutting silicon material with a diamond wire. The method utilizes a high oxide layer on the surface of a silicon waste particle produced during diamond wire cutting. The surface oxide undergoes a disproportionation reaction with adjacent internal elemental silicon to form silicon monoxide, which is removed in a vapor to achieve a physical chemical reaction with a metal, a halogen gas, a hydrogen halide gas or hydrogen to form silicon-containing products of higher added value. The process realizes the large-scale, high-efficiency, energy-saving, continuous and low-cost complete recycling of silicon waste produced by diamond wire cutting of silicon material.Type: GrantFiled: March 27, 2018Date of Patent: September 13, 2022Inventor: Xi Chu
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Patent number: 11176859Abstract: A method comprises acquiring measured luminance levels at a measurement point of a display area for a plurality of test images displayed in the display area, and estimating one or more luminance levels at one or more corresponding luminance estimation points of the display area using the measured luminance levels. The method further comprises determining, based on the one or more estimated luminance levels, a correction parameter using the estimated one or more luminance levels.Type: GrantFiled: March 24, 2020Date of Patent: November 16, 2021Assignee: Synaptics IncorporatedInventors: Masao Orio, Joseph Kurth Reynolds, Xi Chu, Takashi Nose, Hirobumi Furihata
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Patent number: 11145246Abstract: Aspects described herein include a method and associated processing system for a display having a plurality of pixels. The method comprises driving, using display circuitry, a plurality of pixels of a display device to display one or more test patterns. The display device is integrated into a manufactured input device. The method further comprises receiving field-set mura compensation data that is based on one or more images of the plurality of pixels. The one or more images are acquired responsive to displaying the one or more test patterns. The method further comprises writing the field-set mura compensation data to a memory of the input device. The field-set mura compensation data replaces or is stored along with factory-set mura compensation data.Type: GrantFiled: August 26, 2019Date of Patent: October 12, 2021Assignee: Synaptics IncorporatedInventors: Xi Chu, Joseph Kurth Reynolds
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Publication number: 20210304649Abstract: A method comprises acquiring measured luminance levels at a measurement point of a display area for a plurality of test images displayed in the display area, and estimating one or more luminance levels at one or more corresponding luminance estimation points of the display area using the measured luminance levels. The method further comprises determining, based on the one or more estimated luminance levels, a correction parameter using the estimated one or more luminance levels.Type: ApplicationFiled: March 24, 2020Publication date: September 30, 2021Inventors: Masao ORIO, Joseph Kurth REYNOLDS, Xi CHU, Takashi NOSE, Hirobumi FURIHATA
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Publication number: 20210107799Abstract: The present application provides a method, a equipment and a system for producing a silicon-containing products by using a silicon sludge which is produced by a diamond wire cutting silicon material. The method of the present application mainly utilizes a high oxide layer on the surface of a silicon waste particle produced during diamond wire cutting. The characteristics are such that the surface oxide disproportionates with adjacent internal elemental silicon to form silicon monoxide to be removed in a vapor to achieve a physical chemical reaction with a metal, a halogen gas, a hydrogen halide gas or hydrogen to form a high value-added silicon-containing products. The process realizes the large-scale, high-efficiency, energy-saving, continuous and low-cost complete recycling of diamond-wire cutting silicon waste.Type: ApplicationFiled: March 27, 2018Publication date: April 15, 2021Inventor: Xi Chu
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Patent number: 10950821Abstract: Methods of encapsulating an environmentally sensitive device. The methods involve temporarily laminating a flexible substrate to a rigid support using a reversible adhesive for processing, reversing the reversible adhesive, and removing the device from the rigid support.Type: GrantFiled: December 17, 2019Date of Patent: March 16, 2021Assignee: Samsung Display Co., Ltd.Inventors: Xi Chu, Steve Shi Lin, Gordon L. Graff
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Publication number: 20210065622Abstract: Aspects described herein include a method and associated processing system for a display having a plurality of pixels. The method comprises driving, using display circuitry, a plurality of pixels of a display device to display one or more test patterns. The display device is integrated into a manufactured input device. The method further comprises receiving field-set mura compensation data that is based on one or more images of the plurality of pixels. The one or more images are acquired responsive to displaying the one or more test patterns. The method further comprises writing the field-set mura compensation data to a memory of the input device. The field-set mura compensation data replaces or is stored along with factory-set mura compensation data.Type: ApplicationFiled: August 26, 2019Publication date: March 4, 2021Inventors: Xi CHU, Joseph Kurth REYNOLDS
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Publication number: 20200119309Abstract: Methods of encapsulating an environmentally sensitive device. The methods involve temporarily laminating a flexible substrate to a rigid support using a reversible adhesive for processing, reversing the reversible adhesive, and removing the device from the rigid support.Type: ApplicationFiled: December 17, 2019Publication date: April 16, 2020Inventors: Xi Chu, Steve Shi Lin, Gordon L. Graff
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Patent number: 10576438Abstract: The present disclosure provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber is also equipped with an internal gas distributor; a preheating unit; and an external exhaust gas processing unit connected between the preheating unit and a gas inlet. The reaction chamber is further equipped with a surface finishing unit, a heating unit, and a dynamics-generating unit. The reaction occurs through decomposition of silicon-containing gas in a densely stacked, high purity granular silicon layer reaction bed in relative motion, and uses the exhaust gas for heating. The present invention achieves a large-scale, efficient, energy-saving, continuous, low-cost production of high purity silicon granules.Type: GrantFiled: September 2, 2017Date of Patent: March 3, 2020Inventor: Xi Chu
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Publication number: 20170361292Abstract: The present disclosure provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber is also equipped with an internal gas distributor; a preheating unit; and an external exhaust gas processing unit connected between the preheating unit and a gas inlet. The reaction chamber is further equipped with a surface finishing unit, a heating unit, and a dynamics-generating unit. The reaction occurs through decomposition of silicon-containing gas in a densely stacked, high purity granular silicon layer reaction bed in relative motion, and uses the exhaust gas for heating. The present invention achieves a large-scale, efficient, energy-saving, continuous, low-cost production of high purity silicon granules.Type: ApplicationFiled: September 2, 2017Publication date: December 21, 2017Inventor: Xi Chu
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Patent number: 9839940Abstract: A tool for depositing multilayer coatings onto a substrate. The tool includes a housing defining a vacuum chamber connected to a vacuum source, deposition stations each configured to deposit a layer of multilayer coating on the substrate, a curing station, and a contamination reduction device. At least one of the deposition stations is configured to deposit an inorganic layer, while at least one other deposition station is configured to deposit an organic layer. In one tool configuration, the substrate may travel back and forth through the tool as many times as needed to achieve the desired number of layers of multilayer coating. In another, the tool may include numerous housings adjacently spaced such that the substrate may make a single unidirectional pass. The contamination reduction device may be configured as one or more migration control chambers about at least one of the deposition stations, and further includes cooling devices, such as chillers, to reduce the presence of vaporous layer precursors.Type: GrantFiled: October 9, 2013Date of Patent: December 12, 2017Assignee: Samsung Display Co., Ltd.Inventors: Charles C. Bonham, Paul E. Burrows, Xi Chu, Gordon Lee Graff, Mark Edward Gross, Peter Maclyn Martin, Lorenza Moro, Kenneth Jeffrey Nelson, John Chris Pagano, Mac R. Zumhoff
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Patent number: 9751066Abstract: The present invention provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber is also equipped with an internal gas distributor; a heating unit; an external exhaust gas processing unit connected between a preheating unit and a gas inlet. The reaction chamber is further equipped with a surface finishing unit, a heating unit and a dynamics generating unit. The reaction is through decomposition of silicon containing gas in densely stacked high purity granular silicon layer reaction bed in relative motion, and to use remaining heat of exhaust gas for reheating. The present invention is to achieve a large scale, efficient, energy saving, continuous, low cost production of high purity silicon granules.Type: GrantFiled: August 17, 2013Date of Patent: September 5, 2017Assignee: Sunnyside Technologies, IncInventor: Xi Chu
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Patent number: 9662625Abstract: The present invention provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber is also equipped with an internal gas distributor; a heating unit; an external exhaust gas processing unit connected between a preheating unit and a gas inlet. The reaction chamber is further equipped with a surface finishing unit, a heating unit and a dynamics generating unit. The reaction is through decomposition of silicon-containing gas in densely stacked high purity granular silicon layer reaction bed in relative motion, and to use remaining heat of exhaust gas for reheating. The present invention achieves a large scale, efficient, energy saving, continuous, low cost production of high purity silicon granules.Type: GrantFiled: August 17, 2013Date of Patent: May 30, 2017Inventor: Xi Chu
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Publication number: 20150353363Abstract: The invention provides methods and systems for producing large size diamonds. The methods include using carbon containing gases and supplementary gases to form reaction zones that are suitable for diamonds to grow; controlling the temperatures that are suitable for diamonds to grow; and keeping the small size seeds in motion in the reaction zones to form large size diamonds. The method provides controlling the high temperature endurable small size seeds at suitable temperatures for diamonds to grow and keep them in motion in the reaction zones. The invention also provides systems that allow all the surfaces of the high temperature endurable small size seeds continually extend to form diamonds, then to form large size diamonds. The invention provides a large-scale, low cost production of large size diamonds.Type: ApplicationFiled: May 21, 2015Publication date: December 10, 2015Inventor: Xi Chu
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Publication number: 20150191000Abstract: Methods of encapsulating an environmentally sensitive device. The methods involve temporarily laminating a flexible substrate to a rigid support using a reversible adhesive for processing, reversing the reversible adhesive, and removing the device from the rigid support.Type: ApplicationFiled: March 26, 2015Publication date: July 9, 2015Inventors: Xi Chu, Steve Shi Lin, Gordon L. Graff
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Patent number: 9067797Abstract: The invention provides methods and systems for producing large size diamonds. The methods include using carbon containing gases and supplementary gases to form reaction zones that are suitable for diamonds to grow; controlling the temperatures that are suitable for diamonds to grow; and keeping the small size seeds in motion in the reaction zones to form large size diamonds. The method provides controlling the high temperature endurable small size seeds at suitable temperatures for diamonds to grow and keep them in motion in the reaction zones. The invention also provides systems that allow all the surfaces of the high temperature endurable small size seeds continually extend to form diamonds, then to form large size diamonds. The invention provides a large-scale, low cost production of large size diamonds.Type: GrantFiled: April 27, 2010Date of Patent: June 30, 2015Inventor: Xi Chu
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Patent number: 8900366Abstract: A tool for depositing multilayer coatings onto a substrate. In one configuration, the tool includes a includes an in-line organic material deposition station operating under at least one of a pressure or temperature controlled environment. In another, it further is of a hybrid design that incorporates both in-line and cluster tool features. In this latter configuration, at least one of the deposition stations is configured to deposit an inorganic layer, while at least one other deposition station is configured to deposit an organic layer. The tool is particularly well-suited to depositing multilayer coatings onto discrete substrates, as well as to encapsulating environmentally-sensitive devices placed on the flexible substrate.Type: GrantFiled: April 22, 2005Date of Patent: December 2, 2014Assignee: Samsung Display Co., Ltd.Inventors: Martin Philip Rosenblum, Xi Chu, Lorenza Moro, Kenneth Jeffrey Nelson, Paul Burrows, Mark E. Gross, Mac R. Zumhoff, Peter M. Martin, Charles C. Bonham, Gordon L. Graff