Abstract: An array substrate and a fabrication method thereof, and a display device are provided. In the array substrate the pixel units includes common electrode, and the common electrodes of adjacent pixel units in the column direction is electrically connected through a first connection portion; the first signal line is located between the adjacent pixel units in the column direction. A total area of the first connection portion between the common electrodes of every two of the pixel units overlapping with the first signal line is a first overlapping area, at least one end of the first signal line is a first signal input end, and the first overlapping areas decrease as minimum distances from the first connection portions to the first signal input end increase in the row direction.

Abstract: An organic electroluminescent display panel is provided, including a pixel defining layer. The pixel defining layer includes a plurality of openings and a bank surrounding each of the plurality of openings and defining a plurality of pixel areas. The bank is composed of a hydrophilic material pattern layer and a conductive hydrophobic pattern layer which are stacked from bottom to top.

Abstract: An array substrate and a manufacturing method thereof are disclosed. The method includes: forming a first thin film transistor which includes a first semiconductor layer, a first gate electrode, a first drain electrode and a first source electrode; forming a second thin film transistor which includes a second semiconductor layer, a second gate electrode, a second drain electrode and a second source electrode; and forming a dielectric layer which spaces the first semiconductor layer apart from the second semiconductor layer; the method further includes: processing the same layer to form at least one selected from the group consisting of the first gate electrode, the first drain electrode and the first source electrode, at least one selected from the group consisting of the second gate electrode, the second drain electrode and the second source electrode, and the dielectric layer by the same layer.

Abstract: The present application discloses a display substrate having a base substrate and a pixel definition layer for defining a plurality of subpixel regions on the base substrate. The pixel definition layer has a first side and a second side opposite to each other, the second side being on a side of the first side distal to the base substrate. The pixel definition layer has a first cross-section along a plane substantially parallel to the base substrate, the first cross-section being between the first side and the second side. An orthographic projection of the first cross-section on the base substrate substantially covers orthographic projections of the first side and the second side on the base substrate.

Abstract: The present disclosure provides a conductive wire structure, a manufacturing method thereof, an array substrate and a display device. The conductive wire structure includes a first conductive wire and a second conductive wire on a first plane, wherein a connection end of the first conductive wire is spaced apart from a connection end of the second conductive wire by a gap so as to discharge charges accumulated on the first conductive wire and the second conductive wire through the gap; an electrical connector connected to the connection end of the first conductive wire and the connection end of the second conductive wire, respectively, wherein a part of the electrical connector is located on a second plane different from the first plane.

Abstract: An array substrate and a manufacturing method thereof, a display panel and a display device are provided. The array substrate includes a plurality of pixel units, at least some of which respectively having a reflective region provided with a reflective layer in a concave-convex shape, wherein a first insulating layer is disposed on a light reflecting side of the reflective layer, and a surface of the first insulating layer adjacent to the reflective layer is in a concave-convex shape conforming to the concave-convex shape of the reflective layer, and a surface of the first insulating layer away from the reflective layer is a planar surface; the at least some of the pixel units further respectively comprise a first electrode and a second electrode which are oppositely disposed in different layers and are spaced apart from each other, and the first electrode is disposed on a side of the first insulating layer away from the reflective layer.

Abstract: The present disclosure is related to an optical film. The optical film may include a substrate and a planarization layer. A plurality of cavities may be on a surface of the substrate. A cross-sectional area of each of the cavities parallel to a bottom surface thereof may increase along a direction away from the bottom surface. The planarization layer may be on the surface of the substrate having the cavities. A refractive index of the planarization layer may be larger than that of the substrate.

Abstract: A method of manufacturing a via hole, a method of manufacturing an array substrate and an array substrate are provided. The method of manufacturing an via hole includes: providing a base substrate; forming an insulation layer on the base substrate; etching the insulation layer by using a first etching process to forma groove in the insulation layer; performing an ion implantation process with ions on a portion of the insulation layer exposed by the groove to form an ion implantation region; and etching a portion of the insulation layer in the ion implantation region by using a second etching process to form a via hole penetrating the insulation layer.

Abstract: The present disclosure provides a display substrate, a manufacturing method thereof, and a display device. The method includes: forming a pixel definition layer transitional pattern on a base substrate, the pixel definition layer transitional pattern being provided at a lateral surface with an undercut; forming a common layer, which is broken at the undercut, on the base substrate; removing the undercut to obtain a pattern of a pixel definition layer; and forming a cathode on the base substrate.

Abstract: Provided is a display substrate including: a base substrate, and a light-emitting device and an encapsulating structure which are disposed on the base substrate in sequence in a direction away from the base substrate, wherein the encapsulating structure includes an organic scattering layer and an inorganic barrier layer disposed on at least one side of the organic scattering layer, and the organic scattering layer has bubble structures therein. By arranging an organic scattering layer in the encapsulating structure, the optical coupling efficiency of the display substrate is improved while the encapsulating effect of the encapsulating structure is ensured.

Abstract: An organic electroluminescent display panel includes: a first electrode, a pixel defining layer, an organic light emitting functional layer and a second electrode provided on a substrate; a conductive layer and a protection layer provided at a side of the second electrode away from the substrate, the conductive layer and the protection layer being provided in a single layer, a surface of the protection layer away from the substrate being parallel to that of the second electrode away from the substrate, the conductive layer being provided between the protection layer and the second electrode and in contact with the second electrode, the protection layer including a first portion provided in the pixel regions and a second portion provided on the conductive layer, and a sum of a thickness of the second portion and a thickness of the conductive layer being approximately equal to a thickness of the first portion.

Abstract: The present application discloses a display substrate having a base substrate and a pixel definition layer for defining a plurality of sub pixel regions on the base substrate. The pixel definition layer has a first side and a second side opposite to each other, the second side being on a side of the first side distal to the base substrate. The pixel definition layer has a first cross-section along a plane substantially parallel to the base substrate, the first cross-section being between the first side and the second side. An orthographic projection of the first cross-section on the base substrate substantially covers orthographic projections of the first side and the second side on the base substrate.

Abstract: An organic electroluminescent display panel is provided, including a pixel defining layer. The pixel defining layer includes a plurality of openings and a bank surrounding each of the plurality of openings and defining a plurality of pixel areas. The bank is composed of a hydrophilic material pattern layer and a conductive hydrophobic pattern layer which are stacked from bottom to top.

Abstract: The present disclosure discloses a display substrate, a production method thereof and a display device. The display substrate includes: a base substrate, a pixel defining layer located on the base substrate, and an organic functional layer located on the pixel defining layer, where the pixel defining layer has opening areas for defining light emitting areas of respective sub-pixels, and contains photo-induced deforming particles; and the organic functional layer covers the opening areas and includes a plurality of parts corresponding to the respective sub-pixels one by one, and the plurality of parts are spaced from each other.

Abstract: Disclosed are an array substrate and a manufacturing method therefor, a display panel and a display device, which are used for enabling a viewer to see a uniform reflective effect at various viewing angles, improving the display effect. The array substrate manufacturing method comprises: sequentially forming, on a passivation layer, a reflective layer and a transparent conductive layer, the reflective layer being electrically connected, by means of a via hole penetrating through the passivation layer, to a source electrode or a drain electrode of the thin film transistor, and the transparent conductive layer comprising several metal ions; performing reduction process on the transparent conductive layer, so that the metal ions are reduced, and a metal particle layer is formed; and performing patterning process on the transparent conductive layer and the reflective layer on which the steps above are completed, so as to form a pixel electrode.

Abstract: A method of manufacturing a via hole, a method of manufacturing an array substrate and an array substrate are provided. The method of manufacturing an via hole includes: providing a base substrate; forming an insulation layer on the base substrate; etching the insulation layer by using a first etching process to forma groove in the insulation layer; performing an ion implantation process with ions on a portion of the insulation layer exposed by the groove to form an ion implantation region; and etching a portion of the insulation layer in the ion implantation region by using a second etching process to form a via hole penetrating the insulation layer.

Abstract: A method for manufacturing an array substrate, including: forming a semiconductor material film on a substrate, the method further including: forming a metal film covering the semiconductor material film; and performing a single patterning process on the metal film and the semiconductor material film to form an active layer, a semiconductor material remained pattern and a first electrode of a storage capacitor. The semiconductor material remained pattern is in a same layer as the active layer; and the first electrode of the storage capacitor is formed of the metal film and is on a side, away from the substrate, of the semiconductor material remained pattern. An array substrate and a display device are also provided.

Abstract: An array substrate and a fabrication method thereof, and a display device are provided. In the array substrate the pixel units includes common electrode, and the common electrodes of adjacent pixel units in the column direction is electrically connected through a first connection portion; the first signal line is located between the adjacent pixel units in the column direction. A total area of the first connection portion between the common electrodes of every two of the pixel units overlapping with the first signal line is a first overlapping area, at least one end of the first signal line is a first signal input end, and the first overlapping areas decrease as minimum distances from the first connection portions to the first signal input end increase in the row direction.

Abstract: Disclosed are a thin film transistor, a method for fabricating the same, an array substrate, and a display device. The method of this disclosure includes: fabricating an anti-etching layer pattern on an active layer, wherein the anti-etching layer pattern is doped with an electrically conductive medium; etching away an area of the active layer, which is not covered with the anti-etching layer pattern, to form an active layer pattern, and reserving the anti-etching layer pattern; and fabricating a source and a drain of the thin film transistor.

Abstract: A method for manufacturing a display substrate includes a step of forming a pattern of a barrier layer and a pattern of a first electrode. The step of forming the pattern of the barrier layer and the pattern of the first electrode includes: forming a barrier layer film and a first electrode film sequentially; and forming the pattern of the barrier layer and the pattern of the first electrode by a single patterning process.