Abstract: A thin film transistor, a manufacturing method thereof, and a method for manufacturing an array substrate are provided. The method for manufacturing the thin film transistor includes: forming an active layer film on a base; and forming a source electrode and a drain electrode of the thin film transistor using a conductive photoresist.

Abstract: A package structure of an organic electroluminescent device and a manufacture method thereof, and a display device are provided. The package structure of the organic electroluminescent device includes a base substrate; an organic electroluminescent unit disposed on the base substrate; and a first inorganic protection layer, disposed on the organic electroluminescent unit. The first inorganic protection layer is provided with a first opening penetrating the first protection layer along a thickness direction, and the first opening is filled with a first organic material.

Abstract: The present disclosure provides in some embodiments a thin film transistor, a display substrate, a display device and manufacturing methods thereof. The method for manufacturing the thin film transistor includes: forming an active layer having a first groove structure and a second groove structure, the first groove structure and the second groove structure being separated from each other; and depositing a conductive layer into the first groove structure and the second groove structure to form a first electrode and a second electrode of the thin film transistor.

Abstract: A thin film transistor, a method for manufacturing the same, an array substrate and a display device are provided. The method for manufacturing a thin film transistor includes: providing a substrate; forming an active layer and a light shielding layer covering the active layer on the substrate by a patterning process, the light shielding layer being formed of a photoresist material; and forming a source-drain electrode layer and a passivation layer covering the source-drain electrode layer.

Abstract: A thin film transistor and a method for manufacturing the same, an array substrate, and a display device are provided in embodiments of the disclosure. The method for manufacturing a thin film transistor in embodiments of the disclosure forms a plurality of strip-shaped protrusions on a substrate by a patterning process before forming structures of various layers of the thin film transistor, and then forms sequentially a gate electrode, a gate insulating layer, an active layer, a source-drain electrode on the plurality of strip-shaped protrusions; in other words, the thin film transistor is prepared, whose channels are aligned with and shaped to be similar to the plurality of strip-shaped protrusions, in a widthwise direction thereof.

Abstract: The present application discloses a display panel. The display panel includes a first substrate; and a second substrate facing the first substrate. The first substrate includes a base substrate and a passivation layer on the base substrate. The passivation layer includes a base portion and a protruding portion on a side of the base portion distal to the base substrate. The protruding portion is in a peripheral area of the display panel and encloses a display area of the display panel.

Abstract: Provided are a device and a method for detecting flatness of a surface of a display panel. The device comprises: a bearing platform for bearing a display panel; an image acquisition unit that moves in a detection plane parallel to a bearing surface of the bearing platform and is used for focusing detection points preset in a surface of the display panel facing the image acquisition unit in a direction perpendicular to the bearing surface of the bearing platform, and sending a focal length to a data processing unit; and a data processing unit used for calculating a distance of each of the detection points from the detection plane according to the focal length, and then determining the flatness of the surface of the display panel. The damage and pollution to the display panel may be avoided according to the device and method of the present invention.

Abstract: A vacuum evaporation coating equipment, includes an evaporation source; a carrier for mounting a substrate to be coated; a plurality of masks connected to each other which are disposed between the evaporation source and the carrier; and a driving mechanism. The plurality of masks form at least two sets of correction masks; a driving mechanism is connected to each set of the correction masks and configured for driving one of the at least two sets of correction masks to be located within an evaporation stroke of material of the evaporation source.

Abstract: The present disclosure provides a poly-silicon TFT, its manufacturing method, an array substrate and its manufacturing method. The method for manufacturing the poly-silicon TFT includes a step of, subsequent to the formation of an amorphous-silicon active layer and a source electrode of the TFT, applying an electrical signal to the source electrode, so as to maintain the source electrode at a predetermined temperature for a predetermined time period, thereby to crystallize the amorphous active layer into a poly-silicon active layer due to heat generated by the source electrode and transferred to the amorphous active layer.

Abstract: The present disclosure provides an OLED packaging structure and a manufacturing method thereof, and a display device comprising the packaging structure. The OLED packaging structure comprises a first substrate, an OLED disposed on the surface of the first substrate, and a packaging layer covering the OLED, wherein the packaging layer comprises a heat dissipation layer.

Abstract: The present disclosure provides an insulation machine platform, a substrate-contact type apparatus, and a static electricity elimination method. The insulation machine platform includes: a machine platform body including at least one vent hole, and at least one static electricity elimination device; the at least one vent hole corresponds to the at least one static electricity elimination device being located at a position corresponding to the at least one vent hole, respectively, wherein the machine platform body has a supporting surface, underneath which the static electricity elimination device is located, for receiving a substrate. The substrate-contact type apparatus includes the insulation machine platform.

Abstract: Provided are a device and a method for detecting flatness of a surface of a display panel. The device comprises: a bearing platform for bearing a display panel; an image acquisition unit that moves in a detection plane parallel to a bearing surface of the bearing platform and is used for focusing detection points preset in a surface of the display panel facing the image acquisition unit in a direction perpendicular to the bearing surface of the bearing platform, and sending a focal length to a data processing unit; and a data processing unit used for calculating a distance of each of the detection points from the detection plane according to the focal length, and then determining the flatness of the surface of the display panel. The damage and pollution to the display panel may be avoided according to the device and method of the present invention.

Abstract: The present disclosure provides a poly-silicon TFT, its manufacturing method, an array substrate and its manufacturing method. The method for manufacturing the poly-silicon TFT includes a step of, subsequent to the formation of an amorphous-silicon active layer and a source electrode of the TFT, applying an electrical signal to the source electrode, so as to maintain the source electrode at a predetermined temperature for a predetermined time period, thereby to crystallize the amorphous active layer into a poly-silicon active layer due to heat generated by the source electrode and transferred to the amorphous active layer.

Abstract: The present invention relates to the field of display technology, and provides a display substrate, its manufacturing method, and a display device. The method comprises a step of forming a pattern of a barrier layer and a pattern of a first electrode. The step of forming the pattern of the barrier layer and the pattern of the first electrode comprises: forming a barrier layer film and a first electrode film sequentially; and forming the pattern of the barrier layer and the pattern of the first electrode by a single patterning process.

Abstract: The present disclosure provides an insulation machine platform, a substrate-contact type apparatus, and a static electricity elimination method. The insulation machine platform includes: a machine platform body including at least one vent hole, and at least one static electricity elimination device; the at least one vent hole corresponds to the at least one static electricity elimination device being located at a position corresponding to the at least one vent hole, respectively, wherein the machine platform body has a supporting surface, underneath which the static electricity elimination device is located, for receiving a substrate. The substrate-contact type apparatus includes the insulation machine platform.

Abstract: An optical touch screen and a display device are disclosed. The optical touch screen (200) comprises an optical touch panel (210) and a first sensor (220) and a second sensor (230). The optical touch panel (210) comprises a first optical transmission channel (211) and a second optical transmission channel (212) which are intersected with each other. The first sensor (220) is disposed on at least one end of the first optical transmission channel (211) and configured to receive light emitted by the first optical transmission channel (211). The second sensor (230) is disposed on at least one end of the second optical transmission channel (212) and configured to receive light emitted by the second optical transmission channel (212). The optical touch screen and the display device can improve the positioning accuracy of the touch position.