Abstract: This invention is a new CMOS voltage booster (20) having an output which can be used in memories to boost the word line voltage above VDD or other voltage boosting applications. One key idea in this CMOS booster is to use a NMOS FET (MN1) to charge the boosting capacitor (C1) to VDD at the end of each memory access and to use a PMOS FET (MP1, MP2) to keep the voltage at the output at VDD during standby. By using this combination, the word line rise time, the size of the booster, and the power consumption during access are significantly reduced. The gate of the NMOS FET is boosted above VDD+Vthn by a small capacitor (C2) to charge the word line boosting capacitor to VDD at the end of each memory access. The small capacitor (C2) is pre-charged to VDD by a NMOSFET (MN2) whose gate is connected to the word line boosting capacitor. The gate of the PMOS FET is shorted to its source to turn it off during boosting.

Abstract: This invention is a new CMOS voltage booster (20) having an output which can be used in memories to boost the word line voltage above VDD or other voltage boosting applications. One key idea in this CMOS booster is to use a NMOS FET (MN1) to charge the boosting capacitor (C1) to VDD at the end of each memory access and to use a PMOS FET (MP1, MP2) to keep the voltage at the output at VDD during standby. By using this combination, the word line rise time, the size of the booster, and the power consumption during access are significantly reduced. The gate of the NMOS FET is boosted above VDD+Vthn by a small capacitor (C2) to charge the word line boosting capacitor to VDD at the end of each memory access. The small capacitor (C2) is pre-charged to VDD by a NMOSFET (MN2) whose gate is connected to the word line boosting capacitor. The gate of the PMOS FET is shorted to its source to turn it off during boosting.

Abstract: This invention is a new CMOS voltage booster (20) having an output which can be used in memories to boost the word line voltage above VDD or other voltage boosting applications. The CMOS booster includes a NMOS FET (MN1) to charge a boosting capacitor (C1) to VDD at the end of each memory access and includes a PMOS FET (MP1, MP2) to keep the voltage at the output at VDD during standby. By using this combination, the word line rise time, the size of the booster, and the power consumption during access are significantly reduced. The gate of the NMOS FET (MN1) is boosted above VDD+Vthn by a small capacitor (C2) to charge the word line boosting capacitor to VDD at the end of each memory access. The small capacitor (C2) is pre-charged to VDD by a NMOSFET (MN2) whose gate is connected to the word line boosting capacitor. The gate of each PMOS FET (MP1, MP2) is shorted to its source to turn if off during boostenig. Transistor (MP3) facilitates boosting the NMOS FET (MN1) above VDD.

Abstract: This invention is a new CMOS voltage booster (20) having an output which can be used in memories to boost the word line voltage above VDD or other voltage boosting applications. The CMOS booster includes a NMOS FET (MN1) to charge a boosting capacitor (C1) to VDD at the end of each memory access and includes a PMOS FET (MP1, MP2) to keep the voltage at the output at VDD during standby. By using this combination, the word line rise time, the size of the booster, and the power consumption during access are significantly reduced. The gate of the NMOS FET (MN1) is boosted above VDD+Vthn by a small capacitor (C2) to charge the word line boosting capacitor to VDD at the end of each memory access. The small capacitor (C2) is pre-charged to VDD by a NMOSFET (MN2) whose gate is connected to the word line boosting capacitor. The gate of each PMOS FET (MP1, MP2) is shorted to ists source to turn if off during boostenig. Ttransistor (MP3) facilitates boosting the NMOS FET (MN1) above VDD.

Abstract: A bit-line shielding technique for a ferroelectric memory logically divides the bit-lines in the array into two groups. When the bit-lines in one of the groups are accessed, the bit-lines in the other group are not accessed and thus can be grounded to electrically shield the bit-lines being accessed. Each group of bit-lines is coupled to the drains of a group of pre-charge devices at the bottom of the array. The sources of the pre-charge devices are grounded. The word lines are arranged so that only the bit-lines in one of the groups are accessed at a time.

Abstract: An implementation of 1T/1C nonvolatile ferroelectric RAMS without using any reference cells—the polarization state in a memory cell is determined by applying two consecutive plate pulses on the ferroelectric capacitor in the memory cell, preamplifying the bit line voltages corresponding to these two plate pulses, and comparing the preamplified voltages. The two consecutive plate pulses have the same polarity.