Xiaocheng Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: A lift mechanism for a glass substrate in an exposure machine is provided, which comprises a base, a lift platform mounted on the top of the base and used to lift the glass substrate, lift bars mounted on the perimeter of the base, and at least one adsorbing devices mounted above the glass substrate; the lift bars are used to lift the perimeter of the glass substrate; each of the adsorbing devices is used to adsorb the upper surface of the substrate and able to move along the vertical direction and the horizontal direction. The lift mechanism for the glass substrate comprises a lift platform, and it has good integrality and uniform temperature, which is benefit for the HVA optically aligning of the glass substrate. Furthermore, the switch between the two-part lift method and the three-part lift method will be simple and with high working efficiency.
June 25, 2013
September 25, 2014
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.