Abstract: A process for making an optical transducer that includes depositing a lower molecular weight first layer and a higher molecular weight second layer. E-beam radiation is applied to the first and second layers which are developed to form an aperture. The aperture includes a resist protrusion in the second layer. The resist protrusion protrudes outward beyond the first layer. Metal is evaporated through the aperture to form the optical transducer. The resist protrusion defines a shape of a concave metal transducer corner.

Abstract: A method of fabricating a device includes: providing a substrate having a patterned surface, depositing a first-level self-assembled material on at least a portion of the patterned surface, wherein the position and/or orientation of the first-level self-assembled material is directed by the patterned surface, to form a first nanostructure pattern, and depositing a second-level self-assembled material on at least a portion of the first nanostructure pattern to form an array of nanostructures of the second-level self-assembled material. An apparatus fabricated using the method is also provided.

Abstract: The formation of a device using block copolymer lithography is provided. The formation of the device includes forming a block copolymer structure. The block copolymer structure includes a first polymer and a second polymer. The block copolymer structure also includes a first component deposited between adjacent blocks of the first polymer and a second component deposited between adjacent blocks of the second polymer. A template is developed by removing either the first and second polymers or the first and second components from the block copolymer structure. The formation of the device also includes lithographically patterning the device utilizing the block copolymer structure template. The device may be a data storage medium.

Abstract: A method for forming a magnetic write pole with a trapezoidal cross-section is described. The method consists of first forming a magnetic seedlayer on a base followed by depositing a removable material layer on the seedlayer, and then a resist layer on the removable material layer. A trench is then formed in the resist, and the resist is heated to cause the cross-sectional profile of the trench to assume a trapezoidal shape. The resist is then capped with another resist layer and further heated to cause the width of the trapezoidal trench to become narrower. The cap layer and removable material layer at the bottom of the trench are then removed and the trench filled with magnetic material by electroplating. The resist and seedlayer external to the trench are finally removed to form a write pole with a trapezoidal cross-section.

Abstract: Patterned thin films comprise regions of relatively low thermal conductivity material separated by regions of relatively high thermal conductivity material. The low thermal conductivity regions may be provided in the form of cylinders or cuboids which are arranged in a continuous matrix of the high thermal conductivity material. The thin film may be used as thermal control layers in data recording media such as heat assisted magnetic recording media.

Abstract: A lithography process for manufacturing bit-island storage mediums that results in improved resolution and uniformity between bit-islands. The lithography process includes applying a resist coating polymer to a surface of a substrate. Selected areas of the resist coating polymer are then exposed to an energy source, wherein each selected area is exposed to the energy source multiple times to provide a time-averaged exposure of the selected areas that reduces errors caused by noise associated with the energy source. After exposure of the resist coating to the energy source, a selective developer solution is applied to the resist coating to develop the fully exposed regions of the resist coating while leaving undeveloped the partially exposed regions of the resist coating. A polymer reflow material is applied to the developed resist pattern and heated to a selected temperature.

Abstract: A data storage medium is provided according to the present invention for magnetic recording. The data storage medium includes a substrate having a locking pattern etched therein defining patterned regions. The patterned regions are chemically modified by depositing a self-assembled monolayer therein. A first layer of nanoparticles is provided in the patterned regions on top of the self-assembled monolayer and is chemically bonded to the substrate via the self-assembled monolayer. The first layer of nanoparticles is chemically modified using functional surfactant molecules applied thereto, such that a second layer of nanoparticles may be formed on top of the first layer and chemically bonded thereto via the functional surfactant molecules. Additional layers of nanoparticles may be applied by chemically modifying the top layer of nanoparticles utilizing the functional surfactant molecules and applying a further layer of nanoparticles thereto.

Abstract: Patterned thin films comprise regions of relatively low thermal conductivity material separated by regions of relatively high thermal conductivity material. The low thermal conductivity regions may be provided in the form of cylinders or cuboids which are arranged in a continuous matrix of the high thermal conductivity material. The thin film may be used as thermal control layers in data recording media such as heat assisted magnetic recording media.

Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.

Abstract: A component for use in a disc drive includes a component substrate having a substrate surface. A self-assembled image layer is formed over the substrate surface. The self-assembled image layer includes a developed region defining a feature with a developed width. Each component also includes a feature layer that is self-assembled over the image layer. The feature layer is joined by a self-assembly process to the developed region. The feature layer has a feature width that is limited to the developed width.

Abstract: A lithography method for plating sub-100 nm narrow trenches, including providing a thin undercoat dissolution layer intermediate a seed layer and a resist layer, wherein the undercoat dissolution layer is relatively completely cleared off the seed layer by the developer solution such that the sides of the narrow trench will be generally vertical, particularly at the base of the narrow trench, thus facilitating plating the narrow trench with a high magnetic moment material.

Abstract: A method of fabricating a device comprising: depositing a self-assembled monolayer on a substrate; depositing a layer of surfactant coated nanostructured materials onto the self-assembled monolayer; and irradiating the layer of surfactant coated nanostructured materials and the self-assembled monolayer to bond nanostructured materials in the layer of surfactant coated nanostructured materials to the self-assembled monolayer. The method can be used to produce immobilized layers and/or patterned layers of nanostructured materials. Devices fabricated according to the method are also included.

Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.

Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.

Abstract: A data storage medium is provided according to the present invention for magnetic recording. The data storage medium includes a substrate having a locking pattern etched therein defining patterned regions. The patterned regions are chemically modified by depositing a self-assembled monolayer therein. A first layer of nanoparticles is provided in the patterned regions on top of the self-assembled monolayer and is chemically bonded to the substrate via the self-assembled monolayer. The first layer of nanoparticles is chemically modified using functional surfactant molecules applied thereto, such that a second layer of nanoparticles may be formed on top of the first layer and chemically bonded thereto via the functional surfactant molecules. Additional layers of nanoparticles may be applied by chemically modifying the top layer of nanoparticles utilizing the functional surfactant molecules and applying a further layer of nanoparticles thereto.

Abstract: A component for use in a disc drive includes a component substrate having a substrate surface. A self-assembled image layer is formed over the substrate surface. The self-assembled image layer includes a developed region defining a feature with a developed width. Each component also includes a feature layer that is self-assembled over the image layer. The feature layer is joined by a self-assembly process to the developed region. The feature layer has a feature width that is limited to the developed width.

Abstract: A magnetic material structure is provided according to the present invention that is capable of being lithographically patterned for various uses, such as, but not limited to, magnetic read/write devices. The magnetic material structure includes a layer of magnetic material provided on a wafer or other substrate, a layer of non-magnetic material provided on top of the layer of magnetic material, and a layer of soft magnetic material provided on top of the layer of non-magnetic material. The magnetic material which is to be patterned will have a magnetic field component normal to a plane of the layer of magnetic material. To minimize the effect this normal magnetic field component will have on electrons as they impinge the structure surface during e-beam lithography, the soft magnetic material has a high-plane permeability sufficient to divert the normal magnetic field component of the magnetic material into a plane of the layer of soft magnetic material.

Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.

Abstract: A lithography method for plating sub-100 nm narrow trenches, including providing a thin undercoat dissolution layer intermediate a seed layer and a resist layer, wherein the undercoat dissolution layer is relatively completely cleared off the seed layer by the developer solution such that the sides of the narrow trench will be generally vertical, particularly at the base of the narrow trench, thus facilitating plating the narrow trench with a high magnetic moment material