Abstract: The embodiments of the disclosure provides a method of manufacturing an OLED panel and an OLED panel. The method includes: forming an anode electrode connected to a source electrode of a TFT and a bridge electrode connected to an auxiliary electrode on a TFT substrate; forming a plurality of metal protrusions on the bridge electrode, the surfaces of the metal protrusions having a plurality of corners; sequentially forming an electron transport layer, an electron injection layer and a cathode electrode on the bridge electrode and the metal protrusions; and applying a voltage on the auxiliary electrode or the bridge electrode to burn a portion of the electron transport layer and a portion of the electron injection layer corresponding to the corners of the metal protrusions to connect the cathode electrode and the auxiliary electrode.

Abstract: A manufacturing method for an inkjet printing AMOLED display panel is disclosed. The method includes steps of: manufacturing a TFT backplane, and manufacturing an anode on the TFT backplane; manufacturing a spacer layer for isolating the anode from a pixel definition layer on the anode; manufacturing a pixel definition layer on the TFT backplane, and the pixel definition layer covers the spacer layer; patterning the pixel definition layer to form a notch on the pixel definition layer in order to expose the spacer layer; etching the spacer layer below the notch by an etching solution; and forming an ink layer on the anode by an inkjet printing method. The invention can improve the cleanliness of the anode surface in the AMOLED display panel, reduce the residue, and make the printed light-emitting layer easier to spread evenly, prevent the AMOLED display panel from displaying abnormality.

Abstract: A method of manufacture OLED display device and an OLED display device are provided. The method of manufacture OLED display device includes following steps. Forming antireflective layer on anode layer of TFT substrate. Coating negative photoresist material layer on antireflective layer and TFT substrate. Forming pixel defining layer by exposure-and-development process to negative photoresist material layer. Because of the antireflective layer, it could effectively avoids the exposure light be reflected to negative photoresist material corresponding pixel regions by anode and causes photoresist be left on the pixel region when exposure process to the negative photoresist material, by structure of anode is a layer of silver between double indium tin oxide layers. The method of the present invention has no photoresist be left on pixel region such that the OLED emitting layer is uniform thickness and enhances quality of OLED display.

Abstract: The embodiments of the disclosure provides a method of manufacturing an OLED panel and an OLED panel. The method includes: forming an anode electrode connected to a source electrode of a TFT and a bridge electrode connected to an auxiliary electrode on a TFT substrate; forming a plurality of metal protrusions on the bridge electrode, the surfaces of the metal protrusions having a plurality of corners; sequentially forming an electron transport layer, an electron injection layer and a cathode electrode on the bridge electrode and the metal protrusions; and applying a voltage on the auxiliary electrode or the bridge electrode to burn a portion of the electron transport layer and a portion of the electron injection layer corresponding to the corners of the metal protrusions to connect the cathode electrode and the auxiliary electrode.

Abstract: The present disclosure provides a manufacturing method of an OLED display and an OLED display. Before preparing the OLED light emitting layer of the manufacturing method, respectively printing the liquid conductive material in the plurality of pixel areas of the TFT substrate and drying to remove the solvent, thereby obtaining a flat conductive layer. Together serving the conductive layer and the pixel electrode on the TFT substrate as an anode structure, and then printing the liquid OLED luminous material on each of the plurality of pixel areas of the TFT substrate and drying to form an OLED light emitting layer on the conductive layer. Due to the flat surface of the conductive layer, the thickness of the OLED light emitting layer obtained by printing on the conductive layer is uniform, so that the obtained OLED display emits light evenly, which effectively improves the display effect of the OLED display.

Abstract: The present invention provides a method for manufacturing an organic light emitting diode (OLED) display panel, the method comprises: a step S10 of providing a thin film transistor (TFT) array substrate, the TFT array substrate comprising protrusions formed on a surface of the TFT array substrate; a step S20 of forming a first planarization layer on the surface of the TFT array substrate; and a step S30 of forming a second planarization layer on a surface of the first planarization layer.

Abstract: A thin film transistor array substrate and a display panel are provided. The thin film transistor array substrate includes a substrate, a thin film transistor, a scan line, a data line and a pixel electrode. The thin film transistor includes a semiconductor member, a gate electrode, a source electrode and a drain electrode. The source electrode and the drain electrode include a first extension portion and a second extension portion, respectively. The first extension portion and the second extension portion are configured to block light that is emitted toward an electron migration channel of the thin film transistor. Thus, external light emitting toward the electron migration channel can be prevented.

Abstract: A manufacturing method for an inkjet printing AMOLED display panel is disclosed. The method includes steps of: manufacturing a TFT backplane, and manufacturing an anode on the TFT backplane; manufacturing a spacer layer for isolating the anode from a pixel definition layer on the anode; manufacturing a pixel definition layer on the TFT backplane, and the pixel definition layer covers the spacer layer; patterning the pixel definition layer to form a notch on the pixel definition layer in order to expose the spacer layer; etching the spacer layer below the notch by an etching solution; and forming an ink layer on the anode by an inkjet printing method. The invention can improve the cleanliness of the anode surface in the AMOLED display panel, reduce the residue, and make the printed light-emitting layer easier to spread evenly, prevent the AMOLED display panel from displaying abnormality.

Abstract: The invention provides a TFT backplane and manufacturing method thereof, wherein the TFT backplane comprises a substrate (1); a gate (11) and a first metal electrode (21) formed on the substrate (1); a gate insulating layer (31) formed on the substrate (1) and covering the gate (11) and the first metal electrode (21), the gate insulating layer (31) on the first metal electrode (21) having a thickness less than thickness of the gate insulating layer (32) on the gate (11); an etch stop layer (ESL) (5) on the gate insulating layer (31) and a second metal electrode (22) on the ESL (5). Only a portion of the gate insulating layer deposited on the first metal electrode is etched away, and the first metal electrode always protects the gate insulating layer, so that the first metal electrode is not damaged by the etching gas, favorable for the final storage capacitor.

Abstract: The present disclosure provides an OLED component, a method for manufacturing the same and an OLED display. The OLED component includes a baseplate; a pixel define layer, an insulation layer and an organic light-emitting unit successively disposed on the baseplate; wherein the pixel define layer defines a light-emitting area, the organic light-emitting unit is located in the light-emitting area, and the insulation layer is arranged between the pixel define layer and the organic light-emitting unit. Therefore, the implementation of the present disclosure may prevent impurities in the pixel define layer from entering into the organic light-emitting unit.

Abstract: A thin film transistor array substrate and a display panel are provided. The thin film transistor array substrate includes a substrate, a thin film transistor, a scan line, a data line and a pixel electrode. The thin film transistor includes a semiconductor member, a gate electrode, a source electrode and a drain electrode. The source electrode and the drain electrode include a first extension portion and a second extension portion, respectively. The first extension portion and the second extension portion are configured to block light that is emitted toward an electron migration channel of the thin film transistor. Thus, external light emitting toward the electron migration channel can be prevented.

Abstract: An OLED display and manufacture method thereof are provided. The OLED display includes a TFT substrate, the TFT substrate having a plurality of light-blocked pixel isolation layers and a plurality of OLED emissive layers on a surface thereof, and each OLED emissive layer having cathode on a surface thereof. The light-blocked pixel isolation layer includes a wall portion, and the wall portion having a light-blocked portion on a surface thereof. The TFT substrate has a plurality of pixel regions surrounded by the wall portions of the light-blocked pixel isolation layers on the surface thereof. Each pixel region respectively has the OLED emissive layer therein. The OLED display and method avoid light leakage caused by the oblique light of each pixel region emitted into adjacent pixel regions while the OLED emissive layer lighting.

Abstract: The invention provides an OLED display panel and manufacturing method, wherein the method comprises: providing a TFT substrate; forming a pixel definition layer comprising a plurality of island structures on the TFT backplane; wherein the island structure comprising a first conductor and a first insulator located at a periphery of the first conductor; providing a plurality of second conductors having a pointed or angular structure on the first conductor; forming an electronic layer on the pixel definition layer; the electronic layer comprising an electron transport layer and an electron injection layer; forming a cathode layer on the electron injection layer; applying an external field to the pixel definition layer, the second conductors breaking down the electron layer so the second conductors being electrically connected to the cathode layer, the external field comprising a current or electric field. The invention solves the IR drop problem in large-sized OLED display panel.

Abstract: The invention provides a TFT backplane and manufacturing method thereof, wherein the TFT backplane comprises a substrate (1); a gate (11) and a first metal electrode (21) formed on the substrate (1); a gate insulating layer (31) formed on the substrate (1) and covering the gate (11) and the first metal electrode (21), the gate insulating layer (31) on the first metal electrode (21) having a thickness less than thickness of the gate insulating layer (32) on the gate (11); an etch stop layer (ESL) (5) on the gate insulating layer (31) and a second metal electrode (22) on the ESL (5). Only a portion of the gate insulating layer deposited on the first metal electrode is etched away, and the first metal electrode always protects the gate insulating layer, so that the first metal electrode is not damaged by the etching gas, favorable for the final storage capacitor.

Abstract: The present invention provides a method for manufacturing an organic light emitting diode (OLED) display panel, the method comprises: a step S10 of providing a thin film transistor (TFT) array substrate, the TFT array substrate comprising protrusions formed on a surface of the TFT array substrate; a step S20 of forming a first planarization layer on the surface of the TFT array substrate; and a step S30 of forming a second planarization layer on a surface of the first planarization layer.

Abstract: A method for manufacturing a LTPS TFT substrate is provided. Buffer layers are respectively provided in a drive TFT area and a display TFT area and have different thicknesses, such that the thickness of the buffer layer in the drive TFT area is larger than the thickness of the buffer layer in the display TFT area so that different temperature grades are formed in a crystallization process of poly-silicon to achieve control of the grain diameters of crystals. A poly-silicon layer that is formed in the drive TFT area in the crystallization process has a large lattice dimension to increase electron mobility thereof. Fractured crystals can be formed in a poly-silicon layer of the display TFT area in the crystallization process for ensuring the uniformity of the grain boundary and increasing the uniformity of electrical current. Accordingly, the electrical property demands for different TFTs can be satisfied.

Abstract: The present invention provides an OLED substrate and a manufacture method thereof. In the manufacture method of the OLED substrate of the present invention, by configuring the silicon film on the top surface of the pixel definition layer to make the top surface possess the excellent hydrophobic characteristic, the OLED material mistakenly sprayed onto the silicon film of the top surface does not stay on the silicon film but quickly falls into the pixel region of the substrate when the OLED material is ink jet printed in the pixel regions of the substrate to effectively prevent the issue that the OLED material stays on the top surface of the pixel definition layer or even slides into the adjacent pixel region to result in color mixing. In the OLED substrate, the color purity of the OLED light emitting layer is high and there is no problem of color mixing.

Abstract: An OLED display and manufacture method thereof are provided. The OLED display includes a TFT substrate, the TFT substrate having a plurality of light-blocked pixel isolation layers and a plurality of OLED emissive layers on a surface thereof, and each OLED emissive layer having cathode on a surface thereof. The light-blocked pixel isolation layer includes a wall portion, and the wall portion having a light-blocked portion on a surface thereof. The TFT substrate has a plurality of pixel regions surrounded by the wall portions of the light-blocked pixel isolation layers on the surface thereof. Each pixel region respectively has the OLED emissive layer therein. The OLED display and method avoid light leakage caused by the oblique light of each pixel region emitted into adjacent pixel regions while the OLED emissive layer lighting.

Abstract: A method of manufacturing an OLED panel and an OLED panel are provided. The method includes forming an anode connected to a source of a TFT, and a strap electrode connected to an auxiliary electrode on a TFT substrate. A sharp shaped corner is formed on the strap electrode, therefore an area of the electron transport layer and the electron injection layer corresponding to the sharp shaped corner have a thinner thickness. By applying a voltage between the auxiliary electrode and the cathode, the electron transport layer and the electron injection layer corresponding to the sharp shaped corner are punctured, the cathode is directly connected to the strap electrode and further conducted to the auxiliary electrode, resulting in a signal is inputted to the cathode through the auxiliary electrode during display. The problem of uneven display of the OLED panel due to the IR drop of the cathode is improved.

Abstract: The present invention provides an OLED substrate and a manufacture method thereof. In the manufacture method of the OLED substrate of the present invention, by configuring the silicon film on the top surface of the pixel definition layer to make the top surface possess the excellent hydrophobic characteristic, the OLED material mistakenly sprayed onto the silicon film of the top surface does not stay on the silicon film but quickly falls into the pixel region of the substrate when the OLED material is ink jet printed in the pixel regions of the substrate to effectively prevent the issue that the OLED material stays on the top surface of the pixel definition layer or even slides into the adjacent pixel region to result in color mixing. In the OLED substrate, the color purity of the OLED light emitting layer is high and there is no problem of color mixing.