Abstract: A chipset with a near-data processing (NDP) engine, which uses the NDP engine to perform a command transformation and thereby to generate an input and output (I/O) command to operate a peripheral device connected to the chipset. The chipset further has a traffic control module. A Remote Direct Memory Access (RDMA) packet comes from a remote computer system and is received by the chipset to operate the peripheral device. The traffic control module directs the RDMA packet to the NDP engine to be transformed into the I/O command. The NDP engine is provided to cope with the RDMA packet.

Abstract: The invention introduces a method for accelerating compression, performed by configuration logic of a compression accelerator, containing: obtaining an input parameter from a processor core; obtaining a configuration setting from a compression parameter table according to the input parameter; configuring hardware coupled between a first buffer and a second buffer to form a data transmission path according to the input parameter, wherein the first buffer stores raw data; and transmitting the configuration setting to devices on the data transmission path for processing the raw data to generate compressed data and storing the compressed data in the second buffer.

Abstract: The invention introduces a method for accelerating compression, performed in a compression accelerator, including: repeatedly executing a loop for determining the longest matched-length between a first string and a second string. Each iteration of the loop includes: obtaining n successive characters from the first string as a source string, wherein n is greater than 1; comparing each character of the source string with all characters of the second string, so as to generate n first-match-results corresponding to the n successive characters of the source string respectively; generating a second-match-result according to the n first-match-results; and determining whether a continuous match of the n successive characters is presented according to the second-match-result. If so, n is added to the matched length and the next iteration of the loop is continued to execute. Otherwise, a matched length is updated and output and the loop is exited.

Abstract: The invention introduces a method for accelerating hash-based compression, performed in a compression accelerator, comprising: fetching a string to be compressed from a data buffer; storing instances corresponding to the string in an intermediary buffer; issuing a hash request to a hash matcher for each instance, issuing a data request to an LSM (longest string matcher) according to a first reply sent by the hash matcher, and updating a state, a match length and a match offset of the instance according to a second reply sent by the LSM; and outputting the result to a formatter according to the state, the match length and the match offset of each instance in the original order of the associated substrings that appeared in the string.

Abstract: A simultaneous information and energy transfer method and system with a guard interval signal are provided. The method comprises the steps of generating, by a transmitting terminal, a controllable guard interval signal according to the current energy demand and environment conditions for channel transmission. The system comprises a transmitting terminal configured to generate a controllable guard interval signal. In the system and method, the guard interval time is fully utilized to transfer a guard interval signal with controllable amount of energy, which not only prevents intersymbol interference, but also provides controllable energy signals within the guard interval time at the same time, thus improving the energy transfer performance of the system and reducing the probability that the receiving terminal is unable to operate normally due to energy shortage. The present invention can be widely applied to a variety of simultaneous wireless information and energy transfer systems.

Abstract: The invention introduces a method for accelerating hash-based compression, performed in a compression accelerator, comprising: receiving, by a plurality of hash functions, a plurality of substrings from an FSM (Finite-State Machine) in parallel; mapping, by each hash function, the received substring to a hash index and directing a selector to connect to one of a plurality of match paths according to the hash index; transmitting, by a matcher of each connected match path, a no-match message to the FSM when determining that a hash table does not contain the received substring; and transmitting, by the matcher of each connected match path, a match message and a match offset of the hash table to the FSM when determining that the hash table contains the received substring, wherein the match offset corresponds to the received substring.

Abstract: The present invention relates to the design, synthesis, and biological study of multi-targeted Ubenimex pro-drug derivative. More particularly, provided in the present invention is a compound as shown by general structural formula (I) (wherein the definition of R is shown in the description). The derivative is a multi-targeted compound obtained by binding an aminopeptidase (APN/CD13) inhibitor, Ubenimex, with some anti-tumor drugs already on the market through an ester bond or amide bond, and is suitable for use as an anti-tumor drug for the treating various malignant tumors, and is especially suitable for treating various solid tumors.

Abstract: A fuel ball detecting method and system with a self-diagnosis function are provided. The method includes: exciting a first detecting coil and a second detecting coil of a fuel ball sensor disposed outside a pipeline; obtaining a first voltage signal U1 from the first detecting coil and a second voltage signal U2 from the second detecting coil; processing U1 and U2 by differential amplification, band pass filtering, phase sensitive detection and low pass filtering by a signal processor to obtain a fuel ball waveform signal U0; determining whether the fuel ball passes the pipeline according to U0 by a single chip microcomputer; determining whether the first and the second detecting coils, the signal processor and the single chip microcomputer work normally; outputting a result showing whether the fuel ball passes the pipeline, when the first and the second detecting coils, the signal processor and the single chip microcomputer work normally.

Abstract: The present invention relates to the design, synthesis, and biological study of multi-targeted Ubenimex pro-drug derivative. More particularly, provided in the present invention is a compound as shown by general structural formula (I) (wherein the definition of R is shown in the description). The derivative is a multi-targeted compound obtained by binding an aminopeptidase (APN/CD13) inhibitor, Ubenimex, with some anti-tumor drugs already on the market through an ester bond or amide bond, and is suitable for use as an anti-tumor drug for the treating various malignant tumors, and is especially suitable for treating various solid tumors.

Abstract: The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. Self-aligned assist pattern (SAP) is derived from original design layout in an automated manner using geometric Boolean operations based on some predefined design rules, and are included in the mask layout for efficient self-alignment of various sub-layouts of the target pattern during a multiple patterning lithography process. SAP can be of any shape and size, and can have continuous features (e.g., a ring), or discontinuous (e.g., bars not connected to each other) features. An end-to-end multiple patterning lithography using spacer and SAP may use positive tone lithography, and/or negative tone lithography for line and/or space printing.

Abstract: The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. Self-aligned assist pattern (SAP) is derived from original design layout in an automated manner using geometric Boolean operations based on some predefined design rules, and are included in the mask layout for efficient self-alignment of various sub-layouts of the target pattern during a multiple patterning lithography process. SAP can be of any shape and size, and can have continuous features (e.g., a ring), or discontinuous (e.g., bars not connected to each other) features. An end-to-end multiple patterning lithography using spacer and SAP may use positive tone lithography, and/or negative tone lithography for line and/or space printing.

Abstract: Photodiode-based bi-directional reflectance distribution function (BRDF) measurement is described. Multiple photodiodes are distributed approximately symmetrically at a fixed distance from a surface to be measured. One or more of the photodiodes are directed to emit light, while readings are gathered from the other photodiodes that are not emitting light. The readings are processed based on previously measured calibration data to generate BRDF values.

Abstract: Photodiode-based bi-directional reflectance distribution function (BRDF) measurement is described. Multiple photodiodes are distributed approximately symmetrically at a fixed distance from a surface to be measured. One or more of the photodiodes are directed to emit light, while readings are gathered from the other photodiodes that are not emitting light. The readings are processed based on previously measured calibration data to generate BRDF values.

Abstract: A lithography process model is generated to account for asymmetric printing of a feature of a target pattern to help better predict how the target pattern will print. The process model for one embodiment may be generated based on data generated from measurements of spacings between symmetrically defined features of printed test patterns to help predict edge offsets of the feature relative to the target pattern when printed and/or to help predict a dimension of the feature when printed. The process model may be used to help design, manufacture, and/or inspect a mask to help print the target pattern more accurately and therefore help manufacture an integrated circuit (IC), for example, that more accurately matches its intended layout.

Abstract: One embodiment of the invention provides a system that facilitates optical proximity correction for alternating aperture phase shifting designs. During operation, the system receives a layout, which includes a complementary mask and a phase shifting mask. A subset of trim features on the complementary mask that are designed to protect the dark areas left unexposed by the phase shifting mask are adjusted first using a rules-based optical proximity correction process. This is then supplemented by a model-based correction to the phase shifters, Additionally, the portions of the trim that are co-extensive with the original layout can be corrected, e.g. at the time of the correction of the complementary mask using either rule or model based corrections.

Abstract: A lithography process model is generated to account for asymmetric printing of a feature of a target pattern to help better predict how the target pattern will print. The process model for one embodiment may be generated based on data generated from measurements of spacings between symmetrically defined features of printed test patterns to help predict edge offsets of the feature relative to the target pattern when printed and/or to help predict a dimension of the feature when printed. The process model may be used to help design, manufacture, and/or inspect a mask to help print the target pattern more accurately and therefore help manufacture an integrated circuit (IC), for example, that more accurately matches its intended layout.

Abstract: One embodiment of the invention provides a system that facilitates optical proximity correction for alternating aperture phase shifting designs. During operation, the system receives a layout, which includes a complementary mask and a phase shifting mask. A subset of trim features on the complementary mask that are designed to protect the dark areas left unexposed by the phase shifting mask are adjusted first using a rules-based optical proximity correction process. This is then supplemented by a model-based correction to the phase shifters, Additionally, the portions of the trim that are co-extensive with the original layout can be corrected, e.g. at the time of the correction of the complementary mask using either rule or model based corrections.

Abstract: A method for monitoring process parameters in a multiple step process for an article molded from a plastic material containing at least two constituents to determine propensity for adhesion of a subsequently applied coating includes imaging at least one region of the article to examine surface morphology and analyzing the surface morphology to identify one of the constituents. In a preferred embodiment, the method is applied to monitor a manufacturing process for a molded plastic bumper to determine adhesion propensity of a subsequently applied adhesion promoter or paint based on surface morphology of the component. Analysis of the surface morphology includes identifying the presence of rubber globules near the surface layer or skin.