Abstract: A method for detecting a patter offset amount of exposed regions comprises forming at least one pair of conductive detecting marks with a predetermined position relationship by a patterning process including two exposing processes; detecting an electrical characteristic of the at least one pair conductive detecting marks, if the detected electrical characteristic does not meet a predetermined position relationship, it is determined that the pattern offset amount of the exposed regions in two exposure steps is not qualified; and if the detected electrical characteristic meets the predetermined position relationship, it is determined that the pattern offset amount of the exposed regions in two exposure steps is qualified.

Abstract: An embodiment of the disclosed technology provides a method for preventing electrostatic breakdown during the manufacturing process of the array substrate. The method comprises: when forming a conductive pattern of a substrate, connecting conductive lines for forming the conductive pattern with a closed conductive ring on a same layer as the conductive lines in a peripheral region of the substrate, and wherein when electrostatic charges are generated over the metal line, the electrostatic charges are led to the closed conductive ring.

Abstract: A TFT-LCD array substrate, a manufacturing method thereof and a liquid crystal display panel are provided in the invention. The TFT-LCD array substrate comprises a plurality of first gate lines and a plurality of first data lines, and a plurality of pixel regions are defined by intersecting the first gate lines and the first data lines with each other. A first pixel electrode and a first TFT are formed in each of the pixel regions, and a second TFT and a second pixel electrode are further comprised in each of the pixel regions. The second TFT is connected with the second pixel electrode, the first pixel electrode and the second pixel electrode form the voltage difference to drive the reversion of the liquid crystal molecules, and the first TFT and the second TFT are turned on or off simultaneously.

Abstract: Projection apparatus for projecting a radiation spot on a working plane includes a plurality of stacks of diode-laser bars. Each stack provides a beam of laser radiation. The diode-laser bars in each stack are arranged one above another in the fast-axis direction of the diode-laser bars. A corresponding plurality of beam-expanders expands the beam from the corresponding diode-laser bar stack in the slow-axis direction of the diode laser bars only. A focusing lens collects the slow-axis expanded beams and projects the slow-axis expanded beams into the working plane to form the radiation spot.

Abstract: An embodiment provides a thin film transistor liquid crystal display (TFT-LCD) array substrate comprising a substrate and multilayer array patterns formed on the substrate, and a detecting mark, which is used to detect the size or alignment deviation of one array pattern among the multilayer array patterns and provided in a region of the substrate where the multilayer array patterns are not provided. The detecting mark comprises a detecting area and a detecting pattern which is provided in the same layer as the array pattern to be detected, the detecting pattern is located within the detecting area, and the detecting pattern has transmissivity or reflectivity different from that of the remaining area in the detecting area other than the detecting pattern.

Abstract: A mask plate comprises a light transmitting region; a light absorbing region; and a light reflecting region provided in the light absorbing region on one side of the mask plate. An exposing method using the mask plate comprises placing a first substrate coated with a first photosensitive resist layer under and parallel to the mask plate; having first light vertically strike on an upper surface of the mask plate from above, pass through the light transmitting region of the mask plate, and strike on the first photosensitive resist layer; placing a second substrate coated with a second photosensitive resist layer under and parallel to the mask plate; and having second light reflected by the lens device onto the surface of the mask plate where the light reflecting region is provided, then reflected by the light reflecting region and strike on the second photosensitive resist layer.

Abstract: An exposure apparatus comprises: a loading stage for supporting a substrate; a mask plate parallel to the loading stage and above the loading stage, the mask plate including a light transmitting region and a light absorbing region on its lower surface, a light reflecting region being provided in the light absorbing region; a lens device provided between the mask plate and the loading stage; a first illumination light source, light from which vertically striking on the upper surface of the mask plate from above, passing through the mask plate and striking on the loading stage via the lens device; a light reflecting device provided in the lens device; and a second illumination light source, light from which being reflected onto the lower surface of the mask plate by the light reflecting device located in the lens device, the light being reflected by the light reflecting region on the lower surface of the mask plate and striking on the loading stage via the lens device.

Abstract: An array substrate comprises: a base substrate; a display area comprising gate lines and data lines formed on the base substrate, wherein a pixel electrode and a first thin film transistor are formed in each of pixel units defined by the gate lines and the data lines which are crossed with each other, and the gate lines comprises a first gate line and a second gate line; and a dummy area which is at the periphery of the display area, which comprises a second thin film transistor and a connecting structure for each gate line, wherein the first gate line and the second gate line are connected with each other through the second thin film transistor and the connecting structure for the first gate line.

Abstract: A method of manufacturing a thin film transistor liquid crystal display (TFT-LCD) array substrate comprises: forming a gate line and a gate electrode on a base substrate, and then depositing a gate insulating layer on the base substrate; forming an active layer, a data line, a source electrode, and a drain electrode on the gate insulating layer, and removing the gate insulating layer in the region other than the regions of the active layer, the data line, the source electrode and the drain electrode; forming a first via hole, a second via hole and a third via hole in a photoresist layer by an exposing and developing process; and forming a pixel electrode, a first connection electrode and a second connection electrode on the photosensitive resin layer. The pixel electrode is connected with the drain electrode through the third via hole.

Abstract: A method of manufacturing a color filter substrate, performed by: preparing a color mask including a cyan transparent layer, a fuchsine transparent layer and a yellow transparent layer; preparing a color sensitive material substrate including a red sensitive emulsion cyan layer, a green sensitive emulsion fuchsine layer and a blue sensitive emulsion yellow layer; exposing the color sensitive material substrate using the color mask; and performing processes of development, bleaching, fixation and stabilization on the color sensitive material substrate.

Abstract: Projection apparatus for projecting a radiation spot on a working plane includes a plurality of stacks of diode-laser bars. Each stack provides a beam of laser radiation. The diode-laser bars in each stack are arranged one above another in the fast-axis direction of the diode-laser bars. A corresponding plurality of beam-expanders expands the beam from the corresponding diode-laser bar stack in the slow-axis direction of the diode laser bars only. A focusing lens collects the slow-axis expanded beams and projects the slow-axis expanded beams into the working plane to form the radiation spot.

Abstract: A gumming device and method can reduce or avoid generation of air bubbles between layers thereby improving quality and manufacturing efficiency of TFT LCD. The gumming device comprises a nozzle, a gum feeding mechanism connected with the nozzle and a nozzle moving mechanism. Wherein at least two rows of gum injection holes are included in the nozzle, and the two adjacent rows of gum injection holes are separated by a spacer. The gumming method comprises that the nozzle is moved on the substrate by the nozzle moving mechanism, and each row of gum injection holes in the nozzle is successively opened in a direction opposite to the moving direction of nozzle for applying gum. The gumming device is used for applying multilayer gum.

Abstract: An embodiment of the disclosed technology provides a method for preventing electrostatic breakdown during the manufacturing process of the array substrate. The method comprises: when forming a conductive pattern of a substrate, connecting conductive lines for forming the conductive pattern with a closed conductive ring on a same layer as the conductive lines in a peripheral region of the substrate, and wherein when electrostatic charges are generated over the metal line, the electrostatic charges are led to the closed conductive ring.

Abstract: The present invention discloses a mask pattern transferring device and a method of preparing a mask pattern transferring device. The mask pattern transferring device comprises: a magnetization head disposed on a magnetization head carrying device, for magnetizing composite powders each comprising a core of ferromagnetic metal and an outer resin film; a rotary roller formed of a non-ferromagnetic material, for adsorbing the composite powders magnetized by the magnetization head; a demagnetization head disposed at a downstream of the magnetization head in the rotating direction of the rotary roller, for demagnetizing the magnetized composite powders adsorbed by the rotary roller; and a collecting container, the outer edge of which is tangent with one side of the rotary roller, and which is disposed at the downstream of the magnetization head along the periphery of the rotary roller to collect the demagnetized composite powders.

Abstract: An array substrate comprises a first metal layer in which first signal lines are disposed; a second metal layer in which second signal lines are disposed; an insulation layer provided between the first and second metal layers. A repairing line is provided in edge regions of the second metal layer and insulated from the second signal lines, and the repairing line comprises a first longitudinal portion, a second longitudinal portion and a transverse portion, the first longitudinal portion is electrically connected to the second longitudinal portion by the transverse portion. A projection of the first longitudinal portion in a plane of the first metal layer intersects with one end of each of the first signal lines, and a projection of the second longitudinal portion in the plane of the first metal layer intersects with the other end of each of the first signal lines.

Abstract: A method for detecting a patter offset amount of exposed regions comprises forming at least one pair of conductive detecting marks with a predetermined position relationship by a patterning process including two exposing processes; detecting an electrical characteristic of the at least one pair conductive detecting marks, if the detected electrical characteristic does not meet a predetermined position relationship, it is determined that the pattern offset amount of the exposed regions in two exposure steps is not qualified; and if the detected electrical characteristic meets the predetermined position relationship, it is determined that the pattern offset amount of the exposed regions in two exposure steps is qualified.

Abstract: An exposure apparatus comprises: a loading stage for supporting a substrate; a mask plate parallel to the loading stage and above the loading stage, the mask plate including a light transmitting region and a light absorbing region on its lower surface, a light reflecting region being provided in the light absorbing region; a lens device provided between the mask plate and the loading stage; a first illumination light source, light from which vertically striking on the upper surface of the mask plate from above, passing through the mask plate and striking on the loading stage via the lens device; a light reflecting device provided in the lens device; and a second illumination light source, light from which being reflected onto the lower surface of the mask plate by the light reflecting device located in the lens device, the light being reflected by the light reflecting region on the lower surface of the mask plate and striking on the loading stage via the lens device.

Abstract: An array substrate comprises: a base substrate; a display area comprising gate lines and data lines formed on the base substrate, wherein a pixel electrode and a first thin film transistor are formed in each of pixel units defined by the gate lines and the data lines which are crossed with each other, and the gate lines comprises a first gate line and a second gate line; and a dummy area which is at the periphery of the display area, which comprises a second thin film transistor and a connecting structure for each gate line, wherein the first gate line and the second gate line are connected with each other through the second thin film transistor and the connecting structure for the first gate line.

Abstract: An embodiment provides a thin film transistor liquid crystal display (TFT-LCD) array substrate comprising a substrate and multilayer array patterns formed on the substrate, and a detecting mark, which is used to detect the size or alignment deviation of one array pattern among the multilayer array patterns and provided in a region of the substrate where the multilayer array patterns are not provided. The detecting mark comprises a detecting area and a detecting pattern which is provided in the same layer as the array pattern to be detected, the detecting pattern is located within the detecting area, and the detecting pattern has transmissivity or reflectivity different from that of the remaining area in the detecting area other than the detecting pattern.

Abstract: A method comprises steps of: forming successively a first conductive pattern, a first insulating layer, a second conductive pattern, and a second insulating layer on a base substrate; patterning the second insulating layer and the first insulating layer with a double-tone mask, forming at least a half lap joint via hole in the second insulating layer, and forming at least a full lap joint via hole in both the first insulating layer and the second insulating layer, wherein the second conductive pattern corresponds to a part of the half lap joint via hole, and the first conductive pattern corresponds to the whole of the full lap joint via hole; forming a third conductive pattern and a fourth conductive pattern on the base substrate wherein the third conductivity pattern is formed on the surface of the second conductivity pattern and the first insulating layer through the half lap joint via hole, and the fourth conductive pattern is formed on the surface of the first conductive pattern through the full lap joint