Patents by Inventor Xinlin Wang

Xinlin Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180373418
    Abstract: The system, method, and computer program product described herein provide unified real-time rule analytics to users through the use of an analytics logic editor that allows a user to construct an analytic logic rule unit that may be used on both edge and cloud devices. The user may select a data source, transform, rule condition, and action using an interface of the analytics logic editor to construct an analytics logic rule unit that may be deployed to both edge and cloud devices in real-time without the need to separately program each device. The analytics logic rule unit may be installed and executed by the edge and cloud device in real-time.
    Type: Application
    Filed: June 21, 2017
    Publication date: December 27, 2018
    Inventors: Yao Liang Chen, Sheng Huang, Yun Jie Qiu, Xinlin Wang, Xiao Min Xu, Chao Hua Zhang
  • Publication number: 20180373419
    Abstract: The system, method, and computer program product described herein provide unified real-time rule analytics to users through the use of an analytics logic editor that allows a user to construct an analytic logic rule unit that may be used on both edge and cloud devices. The user may select a data source, transform, rule condition, and action using an interface of the analytics logic editor to construct an analytics logic rule unit that may be deployed to both edge and cloud devices in real-time without the need to separately program each device. The analytics logic rule unit may be installed and executed by the edge and cloud device in real-time.
    Type: Application
    Filed: November 20, 2017
    Publication date: December 27, 2018
    Inventors: Yao Liang Chen, Sheng Huang, Yun Jie Qiu, Xinlin Wang, Xiao Min Xu, Chao Hua Zhang
  • Patent number: 10144275
    Abstract: Embodiments for environmental control of a vehicle by a processor. An environmental change in the vehicle is predictively anticipated by monitoring at least one environmental factor over time. In response to the predicted environmental change, a physical change is caused in a constituent portion of an assembly inclusive of an external surface of the vehicle, which when activated compensates for the predicted environmental change.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: December 4, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Cynthia H. Gaddis, Kelly Malone, Xinlin Wang
  • Publication number: 20180208116
    Abstract: The disclosure is directed to methods and systems for modifying a vehicle periphery. These methods and systems include receiving a notification that an attachment is placed on the vehicle, detecting, with one or more sensors located in or on the vehicle, the location and size of the attachment on the vehicle, forming an attachment periphery of the attachment's size and location, forming a representation of the attachment periphery relative to the vehicle periphery and monitoring, with the one or more sensors, the surroundings of the vehicle to determine if an obstacle is within a predetermined distance of the attachment periphery or the vehicle periphery.
    Type: Application
    Filed: January 26, 2017
    Publication date: July 26, 2018
    Inventors: Heidi Lagares-Greenblatt, Jenny S. Li, Xinlin Wang
  • Publication number: 20180196403
    Abstract: Disclosed aspects relate to food freshness management. A freshness triggering event may be identified for a food item. The freshness triggering event may indicate that a criterion related to the food item has been achieved. A food freshness management action may be determined. The food freshness management action may be determined to respond to the freshness triggering event for the food item. The food freshness management action may be initiated. The food freshness management action may be carried-out with respect to the freshness triggering event for the food item.
    Type: Application
    Filed: September 9, 2017
    Publication date: July 12, 2018
    Inventors: Heidi Lagares-Greenblatt, Jenny S. Li, Pamela A. Nesbitt, Xinlin Wang
  • Publication number: 20180196401
    Abstract: Disclosed aspects relate to food freshness management. A freshness triggering event may be identified for a food item. The freshness triggering event may indicate that a criterion related to the food item has been achieved. A food freshness management action may be determined. The food freshness management action may be determined to respond to the freshness triggering event for the food item. The food freshness management action may be initiated. The food freshness management action may be carried-out with respect to the freshness triggering event for the food item.
    Type: Application
    Filed: January 7, 2017
    Publication date: July 12, 2018
    Inventors: Heidi Lagares-Greenblatt, Jenny S. Li, Pamela A. Nesbitt, Xinlin Wang
  • Publication number: 20180150511
    Abstract: A computer-implemented method of processing a data query, includes in an edge device, processing a subquery of the data query, storing first statistical data on the subquery, and analyzing the first statistical data to optimize a parameter for processing subqueries.
    Type: Application
    Filed: November 29, 2016
    Publication date: May 31, 2018
    Inventors: Yao Liang CHEN, Lance Warren FEAGAN, Sheng HUANG, Yun Jie QIU, Xinlin WANG, Yu WANG, Xiao Min XU
  • Publication number: 20180065453
    Abstract: Embodiments for environmental control of a vehicle by a processor. An environmental change in the vehicle is predictively anticipated by monitoring at least one environmental factor over time. In response to the predicted environmental change, a physical change is caused in a constituent portion of an assembly inclusive of an external surface of the vehicle, which when activated compensates for the predicted environmental change.
    Type: Application
    Filed: September 2, 2016
    Publication date: March 8, 2018
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Cynthia H. GADDIS, Kelly MALONE, Xinlin WANG
  • Publication number: 20180053197
    Abstract: Embodiments include method, systems and computer program products for normalizing user responses to events. Aspects include receiving, by a processor, an indication of a level of satisfaction associated with an interaction by a user; receiving, by the processor, user data for the user; analyzing the user data to generate a normalized value of emotions of the user; and applying the normalized value to the indication of the level of satisfaction to generate a normalized level of satisfaction of the user associated with the interaction by the user.
    Type: Application
    Filed: August 18, 2016
    Publication date: February 22, 2018
    Inventors: YUK L. CHAN, HEIDI LAGARES-GREENBLATT, JENNY S. LI, DEEPTI M. NAPHADE, XINLIN WANG
  • Publication number: 20180011881
    Abstract: A method for augmenting a review. The method includes accessing a review database and a particular review of an object. Providing a reviewer profile including a plurality of reviewer attributes and analyzing the reviewer attributes to determine a rationale for the review.
    Type: Application
    Filed: July 11, 2016
    Publication date: January 11, 2018
    Inventors: Yuk L. Chan, Heidi Lagares-Greenblatt, Jenny S. Li, Deepti M. Naphade, Xinlin Wang
  • Publication number: 20170366627
    Abstract: A system for executing action feedback is provided. The system includes a wearable device that includes a sensor for monitoring a user and generation of user data based on the monitoring, a first networked device coupled to a network and controllable by the user for taking an action and a second networked device coupled to the network. The second networked device is configured to determine whether the user data suggests that the user is experiencing a personal condition of concern and is taking an action with respect to the first networked device and to interrupt a taking of a portion of the action based on the portion of the action being compromised by at least one of the personal condition of concern and characteristics of social networks of the user.
    Type: Application
    Filed: June 20, 2016
    Publication date: December 21, 2017
    Inventors: Yuk Lung Chan, Heidi Lagares-Greenblatt, Jenny S. Li, Xinlin Wang
  • Publication number: 20170131954
    Abstract: One or more information for printing associated with one or more users is determined. One or more printers having one or more physical media associated with the one or more printers is determined. A first indication is received from a user of the one or more users to print the one or more information associated with the user. An order of the one or more information to be printed on the one or more physical media is determined. The order minimizes the usage of space on the one or more physical media.
    Type: Application
    Filed: November 6, 2015
    Publication date: May 11, 2017
    Inventors: Heidi Lagares-Greenblatt, Jenny S. Li, Xinlin Wang
  • Patent number: 9385131
    Abstract: A conductive strap structure in lateral contact with a top semiconductor layer is formed on an inner electrode of a deep trench capacitor. A cavity overlying the conductive strap structure is filled a dielectric material to form a dielectric capacitor cap having a top surface that is coplanar with a topmost surface of an upper pad layer. A semiconductor mandrel in lateral contact with the dielectric capacitor cap is formed. The combination of the dielectric capacitor cap and the semiconductor mandrel is employed as a protruding structure around which a fin-defining spacer is formed. The semiconductor mandrel is removed, and the fin-defining spacer is employed as an etch mask in an etch process that etches a lower pad layer and the top semiconductor layer to form a semiconductor fin that laterally wraps around the conductive strap structure. An access finFET is formed employing two parallel portions of the semiconductor fin.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: July 5, 2016
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Felix Beaudoin, Stephen M. Lucarini, Xinhui Wang, Xinlin Wang
  • Patent number: 8962417
    Abstract: A semiconductor structure including a p-channel field effect transistor (pFET) device located on a surface of a silicon germanium (SiGe) channel is provided in which the junction profile of the source/drain region is abrupt. The abrupt source/drain junctions for pFET devices are provided by forming an N- or C-doped Si layer directly beneath a SiGe channel layer which is located above a Si substrate. A structure is provided in which the N- or C-doped Si layer (sandwiched between the SiGe channel layer and the Si substrate) has approximately the same diffusion rate for a p-type dopant as the overlying SiGe channel layer. Since the N- or C-doped Si layer and the overlying SiGe channel layer have substantially the same diffusivity for a p-type dopant and because the N- or C-doped Si layer retards diffusion of the p-type dopant into the underlying Si substrate, abrupt source/drain junctions can be formed.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: February 24, 2015
    Assignee: International Business Machines Corporation
    Inventors: Kern Rim, William K. Henson, Yue Liang, Xinlin Wang
  • Publication number: 20150037947
    Abstract: A conductive strap structure in lateral contact with a top semiconductor layer is formed on an inner electrode of a deep trench capacitor. A cavity overlying the conductive strap structure is filled a dielectric material to form a dielectric capacitor cap having a top surface that is coplanar with a topmost surface of an upper pad layer. A semiconductor mandrel in lateral contact with the dielectric capacitor cap is formed. The combination of the dielectric capacitor cap and the semiconductor mandrel is employed as a protruding structure around which a fin-defining spacer is formed. The semiconductor mandrel is removed, and the fin-defining spacer is employed as an etch mask in an etch process that etches a lower pad layer and the top semiconductor layer to form a semiconductor fin that laterally wraps around the conductive strap structure. An access finFET is formed employing two parallel portions of the semiconductor fin.
    Type: Application
    Filed: October 17, 2014
    Publication date: February 5, 2015
    Inventors: Felix Beaudoin, Stephen M. Lucarini, Xinhui Wang, Xinlin Wang
  • Publication number: 20140273381
    Abstract: A semiconductor structure including a p-channel field effect transistor (pFET) device located on a surface of a silicon germanium (SiGe) channel is provided in which the junction profile of the source/drain region is abrupt. The abrupt source/drain junctions for pFET devices are provided by forming an N- or C-doped Si layer directly beneath a SiGe channel layer which is located above a Si substrate. A structure is provided in which the N- or C-doped Si layer (sandwiched between the SiGe channel layer and the Si substrate) has approximately the same diffusion rate for a p-type dopant as the overlying SiGe channel layer. Since the N- or C-doped Si layer and the overlying SiGe channel layer have substantially the same diffusivity for a p-type dopant and because the N- or C-doped Si layer retards diffusion of the p-type dopant into the underlying Si substrate, abrupt source/drain junctions can be formed.
    Type: Application
    Filed: March 15, 2013
    Publication date: September 18, 2014
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Kern Rim, William K. Henson, Yue Liang, Xinlin Wang
  • Patent number: 8836044
    Abstract: An improved SRAM and fabrication method are disclosed. The method comprises use of a nitride layer to encapsulate PFETs and logic NFETs, protecting the gates of those devices from oxygen exposure. NFETs that are used in the SRAM cells are exposed to oxygen during the anneal process, which alters the effective work function of the gate metal, such that the threshold voltage is increased, without the need for increasing the dopant concentration, which can adversely affect issues such as mismatch due to random dopant fluctuation, GIDL and junction leakage.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: September 16, 2014
    Assignee: International Business Machines Corporation
    Inventors: Xinlin Wang, Xiangdong Chen, Haining S. Yang
  • Patent number: 8697521
    Abstract: An improved SRAM and fabrication method are disclosed. The method comprises use of a nitride layer to encapsulate PFETs and logic NFETs, protecting the gates of those devices from oxygen exposure. NFETs that are used in the SRAM cells are exposed to oxygen during the anneal process, which alters the effective work function of the gate metal, such that the threshold voltage is increased, without the need for increasing the dopant concentration, which can adversely affect issues such as mismatch due to random dopant fluctuation, GIDL and junction leakage.
    Type: Grant
    Filed: January 21, 2010
    Date of Patent: April 15, 2014
    Assignee: International Business Machines Corporation
    Inventors: Xinlin Wang, Xiangdong Chen, Haining S. Yang
  • Patent number: 8659054
    Abstract: A semiconductor structure including a p-channel field effect transistor (pFET) device located on a surface of a silicon germanium (SiGe) channel is provided in which the junction profile of the source region and the drain region is abrupt. The abrupt source/drain junctions for pFET devices are provided in this disclosure by forming an N- or C-doped Si layer directly beneath a SiGe channel layer which is located above a Si substrate. A structure is thus provided in which the N- or C-doped Si layer (sandwiched between the SiGe channel layer and the Si substrate) has approximately the same diffusion rate for a p-type dopant as the overlying SiGe channel layer. Since the N- or C-doped Si layer and the overlying SiGe channel layer have substantially the same diffusivity for a p-type dopant and because the N- or C-doped Si layer retards diffusion of the p-type dopant into the underlying Si substrate, abrupt source/drain junctions can be formed.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: February 25, 2014
    Assignee: International Business Machines Corporation
    Inventors: Kern Rim, William K. Henson, Yue Liang, Xinlin Wang
  • Publication number: 20130320423
    Abstract: A conductive strap structure in lateral contact with a top semiconductor layer is formed on an inner electrode of a deep trench capacitor. A cavity overlying the conductive strap structure is filled a dielectric material to form a dielectric capacitor cap having a top surface that is coplanar with a topmost surface of an upper pad layer. A semiconductor mandrel in lateral contact with the dielectric capacitor cap is formed. The combination of the dielectric capacitor cap and the semiconductor mandrel is employed as a protruding structure around which a fin-defining spacer is formed. The semiconductor mandrel is removed, and the fin-defining spacer is employed as an etch mask in an etch process that etches a lower pad layer and the top semiconductor layer to form a semiconductor fin that laterally wraps around the conductive strap structure. An access finFET is formed employing two parallel portions of the semiconductor fin.
    Type: Application
    Filed: May 31, 2012
    Publication date: December 5, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Felix Beaudoin, Stephen M. Lucarini, Xinhui Wang, Xinlin Wang