Patents by Inventor Xiuling Li

Xiuling Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200280374
    Abstract: A method for underwater acoustic communication includes steps of S1: capturing a synchronization signal using a replica correlation operation; S2: performing time reversal forward shift processing and time reversal backward shift processing, respectively, on the synchronization signal to obtain a forward shift time reversal coefficient and a backward shift time reversal coefficient; S3: performing a convolution operation of the forward shift time reversal coefficient and the backward shift time reversal coefficient, respectively, with a subsequently captured information sequence to obtain a forward shift time reversal output and a backward shift time reversal output; S4: processing the forward shift time reversal output and the backward shift time reversal output, respectively, with a forward shift equalizer and a backward shift equalizer to obtain two sets of equalizer outputs; and S5: selecting one of the two sets of equalizer outputs with a smaller error for data decoding to obtain a desired signal.
    Type: Application
    Filed: February 27, 2020
    Publication date: September 3, 2020
    Applicant: Xiamen University
    Inventors: Feng TONG, Siyuan ZHENG, Bin LI, Xiuling CAO
  • Patent number: 10748781
    Abstract: A method of catalyst-assisted chemical etching with a vapor-phase etchant has been developed. In one approach, a semiconductor substrate including a patterned titanium nitride layer thereon is heated, and an oxidant and an acid are evaporated to form a vapor-phase etchant comprising an oxidant vapor and an acid vapor. The semiconductor substrate and the patterned titanium nitride layer are exposed to the vapor-phase etchant during the heating of the semiconductor substrate. The vapor-phase etchant diffuses through the patterned titanium nitride layer, and titanium nitride-covered regions of the semiconductor substrate are etched. Thus, an etched semiconductor structure is formed.
    Type: Grant
    Filed: March 22, 2019
    Date of Patent: August 18, 2020
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Xiuling Li, Dane J. Sievers, Lukas Janavicius, Jeong Dong Kim
  • Patent number: 10741705
    Abstract: An optoelectronic device with an antireflective surface comprises a semiconductor substrate having a textured surface including a plurality of surface protrusions and/or indentations. A first electrode is in contact with the semiconductor substrate and spaced apart from a second electrode that is also in contact with the semiconductor substrate. The textured surface is fabricated by inverse metal-assisted chemical etching, and thus the semiconductor substrate is substantially devoid of ion-induced defects.
    Type: Grant
    Filed: July 13, 2018
    Date of Patent: August 11, 2020
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Xiuling Li, Jeong Dong Kim, Munho Kim
  • Publication number: 20190378890
    Abstract: A rolled-up electromagnetic component for on-chip applications comprises: a multilayer sheet in a rolled configuration comprising at least one turn about a longitudinal axis; a core defined by a first turn of the rolled configuration; and a soft magnetic material disposed within the core, where the multilayer sheet comprises a conductive pattern layer on a strain-relieved layer. A method of making a rolled-up electromagnetic component for on-chip applications includes forming a rolled-up device comprising: a multilayer sheet in a rolled configuration having at least one turn about a longitudinal axis, where the multilayer sheet comprises a conductive pattern layer on a strain-relieved layer; and a core defined by a first turn of the rolled configuration. The method further includes introducing a soft magnetic material into the core.
    Type: Application
    Filed: June 7, 2019
    Publication date: December 12, 2019
    Inventors: Xiuling Li, Wen Huang, Zhendong Yang, Mark D. Kraman, Jimmy Ni, Zihao Ou, Qian Chen, J. Gary Eden
  • Patent number: 10490328
    Abstract: An array of rolled-up power inductors for on-chip applications comprises at least two rolled-up power inductors connected in series and formed from a stack of multilayer sheets. The array includes a first rolled-up power inductor comprising a first multilayer sheet in a rolled configuration about a first longitudinal axis and second rolled-up power inductor comprising a second multilayer sheet in a rolled configuration about a second longitudinal axis. The first and second rolled-up power inductors are laterally spaced apart. The first multilayer sheet comprises a first patterned conductive layer on a first strain-relieved layer, and the second multilayer sheet comprises a second patterned conductive layer on a second strain-relieved layer. Prior to roll-up of the second and first multilayer sheets, the second multilayer sheet is disposed on the first multilayer sheet, and a through-thickness first via connects the second patterned conductive layer with the first patterned conductive layer.
    Type: Grant
    Filed: September 14, 2017
    Date of Patent: November 26, 2019
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Xiuling Li, Wen Huang
  • Publication number: 20190322995
    Abstract: A method for fermentation-production of a pentanediamine, comprising: culturing a cell expressing a lysine decarboxylase to obtain a whole cell fermentation broth comprising a pentanediamine; and extracting the pentanediamine from the whole cell fermentation broth, and striping the whole cell fermentation broth of carbon dioxide contained therein before adding a strong base. The method greatly increases a production volume of the pentanediamine.
    Type: Application
    Filed: May 16, 2017
    Publication date: October 24, 2019
    Applicant: Ningxia EPPEN Biotech Co., Ltd
    Inventors: Jiyin MA, Tingyi WEN, Shuwen LIU, Yong LIANG, Daihuan LI, Yun ZHANG, Xiuling SHANG, Chunguang ZHAO, Xiaowei GUO, Gang MENG
  • Patent number: 10374105
    Abstract: An optoelectronic device includes an etched body comprising a buried metal contact layer on a top surface of a semiconductor structure, which comprises one or more semiconductor layers. The buried metal contact layer includes an arrangement of holes therein. A plurality of nanopillar structures protrude from the top surface of the semiconductor structure and pass through the arrangement of holes. Each nanopillar structure is surrounded at a base thereof by a portion of the buried metal contact layer. When the etched body is exposed to incident radiation having a wavelength in the range from about 300 nm to about 10 microns, at least about 50% of the incident radiation is transmitted through the etched body at a peak transmission wavelength ?max.
    Type: Grant
    Filed: July 1, 2016
    Date of Patent: August 6, 2019
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Xiuling Li, Daniel M. Wasserman, Xiang Zhao
  • Publication number: 20190221438
    Abstract: A method of catalyst-assisted chemical etching with a vapor-phase etchant has been developed. In one approach, a semiconductor substrate including a patterned titanium nitride layer thereon is heated, and an oxidant and an acid are evaporated to form a vapor-phase etchant comprising an oxidant vapor and an acid vapor. The semiconductor substrate and the patterned titanium nitride layer are exposed to the vapor-phase etchant during the heating of the semiconductor substrate. The vapor-phase etchant diffuses through the patterned titanium nitride layer, and titanium nitride-covered regions of the semiconductor substrate are etched. Thus, an etched semiconductor structure is formed.
    Type: Application
    Filed: March 22, 2019
    Publication date: July 18, 2019
    Inventors: Xiuling Li, Dane J. Sievers, Lukas Janavicius, Jeong Dong Kim
  • Patent number: 10347497
    Abstract: A method of catalyst-assisted chemical etching with a vapor-phase etchant has been developed. In one approach, a semiconductor substrate including a patterned titanium nitride layer thereon is heated, and an oxidant and an acid are evaporated to form a vapor-phase etchant comprising an oxidant vapor and an acid vapor. The semiconductor substrate and the patterned titanium nitride layer are exposed to the vapor-phase etchant during the heating of the semiconductor substrate. The vapor-phase etchant diffuses through the patterned titanium nitride layer, and titanium nitride-covered regions of the semiconductor substrate are etched. Thus, an etched semiconductor structure is formed.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: July 9, 2019
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Xiuling Li, Jeong Dong Kim
  • Patent number: 10276942
    Abstract: A wireless communication device includes an array of helical antennas on a substrate. Each helical antenna comprises a strain-relieved sheet with a conductive strip thereon, where the strain-relieved sheet and the conductive strip are in a rolled configuration about a longitudinal axis. The conductive strip is oriented at an angle ? with respect to a rolling direction so as to comprise a helical configuration about the longitudinal axis with a non-zero helix angle ?. The array exhibits a maximum gain of at least about 10 dB at a working frequency of at least about 0.1 THz.
    Type: Grant
    Filed: January 18, 2017
    Date of Patent: April 30, 2019
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Xiuling Li, Wen Huang, Paul J. Froeter
  • Publication number: 20190092812
    Abstract: The present invention concerns cyclic compounds, compositions comprising the cyclic compounds, linkers, a method of preparing a carrying agent:cyclic compound adduct, a method for treating disorders such as proliferation disorders (e.g., malignancies), bone deficiency diseases, and autoimmune diseases, and a method for suppressing the growth of, or inducing apoptosis in, cells (e.g., malignant cells).
    Type: Application
    Filed: July 2, 2018
    Publication date: March 28, 2019
    Inventors: Lori Hazlehurst, Christoph Rader, Xiuling Li, Mark McLaughlin
  • Publication number: 20190031754
    Abstract: The disclosure provides antibodies, antibody fragments or antigen-binding fragments, as well as related antibody drug conjugates (ADCs) and chimeric antigen receptors (CARs), that specifically recognize human ROR2, Also provided in the disclosure are methods of using such antibodies in various diagnostic and therapeutic applications,
    Type: Application
    Filed: January 20, 2017
    Publication date: January 31, 2019
    Inventors: Christoph Rader, Haiyong Peng, Xiuling Li
  • Publication number: 20190019901
    Abstract: An optoelectronic device with an antireflective surface comprises a semiconductor substrate having a textured surface including a plurality of surface protrusions and/or indentations. A first electrode is in contact with the semiconductor substrate and spaced apart from a second electrode that is also in contact with the semiconductor substrate. The textured surface is fabricated by inverse metal-assisted chemical etching, and thus the semiconductor substrate is substantially devoid of ion-induced defects.
    Type: Application
    Filed: July 13, 2018
    Publication date: January 17, 2019
    Inventors: Xiuling Li, Jeong Dong Kim, Munho Kim
  • Patent number: 10134599
    Abstract: A method of metal-assisted chemical etching comprises forming an array of discrete metal features on a surface of a semiconductor structure, where each discrete metal feature comprises a porous metal body with a plurality of pores extending therethrough and terminating at the surface of the semiconductor structure. The semiconductor structure is exposed to an etchant, and the discrete metal features sink into the semiconductor structure as metal-covered surface regions are etched. Simultaneously, uncovered surface regions are extruded through the pores to form anchoring structures for the discrete metal features. The anchoring structures inhibit detouring or delamination of the discrete metal features during etching. During continued exposure to the etchant, the anchoring structures are gradually removed, leaving an array of holes in the semiconductor structure.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: November 20, 2018
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Xiuling Li, Jeong Dong Kim, Munho Kim, Lingyu Kong
  • Patent number: 10011635
    Abstract: The present invention concerns cyclic compounds, compositions comprising the cyclic compounds, linkers, a method of preparing a carrying agent:cyclic compound adduct, a method for treating disorders such as proliferation disorders (e.g., malignancies), bone deficiency diseases, and autoimmune diseases, and a method for suppressing the growth of, or inducing apoptosis in, cells (e.g., malignant cells).
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: July 3, 2018
    Assignees: H. LEE MOFFITT CANCER CENTER AND RESEARCH INSTITUTE, INC., UNIVERSITY OF SOUTH FLORIDA, MODULATION THERAPEUTICS, THE SCRIPPS RESEARCH INSTITUTE
    Inventors: Lori Hazlehurst, Christoph Rader, Xiuling Li, Mark McLaughlin
  • Patent number: 10003317
    Abstract: A tubular resonant filter comprises a multilayer sheet in a rolled configuration comprising multiple turns about a longitudinal axis, where the multilayer sheet includes a strain-relieved layer, a patterned first conductive layer on the strain-relieved layer, an insulating layer on the patterned first conductive layer, and a patterned second conductive layer on the insulating layer and the patterned first conductive layer. The patterned first and second conductive layers and the insulating layer are interrelated to form a rolled-up inductor connected to a rolled-up capacitor on the strain-relieved layer.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: June 19, 2018
    Assignee: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
    Inventors: Xiuling Li, Moyang Li, Wen Huang
  • Publication number: 20180090336
    Abstract: A method of catalyst-assisted chemical etching with a vapor-phase etchant has been developed. In one approach, a semiconductor substrate including a patterned titanium nitride layer thereon is heated, and an oxidant and an acid are evaporated to form a vapor-phase etchant comprising an oxidant vapor and an acid vapor. The semiconductor substrate and the patterned titanium nitride layer are exposed to the vapor-phase etchant during the heating of the semiconductor substrate. The vapor-phase etchant diffuses through the patterned titanium nitride layer, and titanium nitride-covered regions of the semiconductor substrate are etched. Thus, an etched semiconductor structure is formed.
    Type: Application
    Filed: September 22, 2017
    Publication date: March 29, 2018
    Inventors: Xiuling Li, Jeong Dong Kim
  • Publication number: 20180075956
    Abstract: An array of rolled-up power inductors for on-chip applications comprises at least two rolled-up power inductors connected in series and formed from a stack of multilayer sheets. The array includes a first rolled-up power inductor comprising a first multilayer sheet in a rolled configuration about a first longitudinal axis and second rolled-up power inductor comprising a second multilayer sheet in a rolled configuration about a second longitudinal axis. The first and second rolled-up power inductors are laterally spaced apart. The first multilayer sheet comprises a first patterned conductive layer on a first strain-relieved layer, and the second multilayer sheet comprises a second patterned conductive layer on a second strain-relieved layer. Prior to roll-up of the second and first multilayer sheets, the second multilayer sheet is disposed on the first multilayer sheet, and a through-thickness first via connects the second patterned conductive layer with the first patterned conductive layer.
    Type: Application
    Filed: September 14, 2017
    Publication date: March 15, 2018
    Inventors: Xiuling Li, Wen Huang
  • Publication number: 20170243751
    Abstract: A method of metal-assisted chemical etching comprises forming an array of discrete metal features on a surface of a semiconductor structure, where each discrete metal feature comprises a porous metal body with a plurality of pores extending therethrough and terminating at the surface of the semiconductor structure. The semiconductor structure is exposed to an etchant, and the discrete metal features sink into the semiconductor structure as metal-covered surface regions are etched. Simultaneously, uncovered surface regions are extruded through the pores to form anchoring structures for the discrete metal features. The anchoring structures inhibit detouring or delamination of the discrete metal features during etching. During continued exposure to the etchant, the anchoring structures are gradually removed, leaving an array of holes in the semiconductor structure.
    Type: Application
    Filed: February 24, 2017
    Publication date: August 24, 2017
    Inventors: Xiuling Li, Jeong Dong Kim, Munho Kim, Lingyu Kong
  • Publication number: 20170207522
    Abstract: A wireless communication device includes an array of helical antennas on a substrate. Each helical antenna comprises a strain-relieved sheet with a conductive strip thereon, where the strain-relieved sheet and the conductive strip are in a rolled configuration about a longitudinal axis. The conductive strip is oriented at an angle ? with respect to a rolling direction so as to comprise a helical configuration about the longitudinal axis with a non-zero helix angle ?. The array exhibits a maximum gain of at least about 10 dB at a working frequency of at least about 0.1 THz.
    Type: Application
    Filed: January 18, 2017
    Publication date: July 20, 2017
    Inventors: Xiuling Li, Wen Huang, Paul J. Froeter