Abstract: The invention provides substrates with a multi-layer coating, comprising in order: i) the substrate; ii) a seed layer; ill) a barrier layer deposited via a CVD method; and iv) a functional layer deposited via a PVD method, and methods of making such coatings. The coatings of the invention have been shown to possess good resistance to corrosion.

Abstract: A substrate is coated with a multi-layer coating, comprising in order: (i) a first functional layer comprising ta-C, (ii) a second functional layer comprising ta-C, (iii) (a) a third functional layer comprising ta-C and a first intermediate layer comprising a carbide of a first element, or (b) a first intermediate layer comprising a carbide of a first element, and a second intermediate layer comprising the first element, wherein the ta-C has a hydrogen content less than 10% and an sp2 content less than 30%; wherein (i) the Young's modulus or (ii) the hardness or (iii) both the Young's modulus and the hardness independently stay the same or increase from layer to layer in (iii) (a) from the first intermediate layer to the first functional layer, or in (iii) (b) from the second intermediate layer to the first functional layer.

Abstract: The invention provides a substrate coated with a multi-layer coating, comprising in order: (a) the substrate; (b) a thermally insulating layer (e.g. Si3N4); (c) an interfacial layer (e.g. SiC); and (d) one or more layers comprising ta-C; wherein the interfacial layer promotes adhesion of the one or more layers comprising ta-C to the thermally insulating layer; and methods for producing such coatings.

Abstract: A method of continuously depositing a coating on a substrate comprises (a) depositing a first layer of ta-C on a substrate via a CVA process, said first layer having a first hardness and a first thickness of 100 mm or greater; (b) adjusting the parameters of the CVA process and depositing a second layer of ta-C on a substrate via a CVA process, said second layer having a second hardness and a second thickness of 10 mm or less, and (c) repeating the above steps to provide a coating comprising at least 5 such first layers and at least 4 such second layers, wherein the first thickness is greater than the second thickness and the first hardness is greater than the second hardness.

Abstract: This light absorbing device includes: a light reflecting layer; a dielectric layer disposed on the light reflecting layer; and a plurality of metal nanostructures disposed on the dielectric layer. A portion of each of the plurality of metal nanostructures is buried in the dielectric layer and another portion thereof is exposed to the outside.

Abstract: The present invention relates to a technical field of display, and discloses a substrate carrying apparatus. The apparatus comprises: a vertical bearing plate and an upper holding base; one side surface of the vertical bearing plate is a bearing surface, the upper holding base is provided at the upside of the bearing surface; the upper holding base is provided with a plurality of holder for holding the substrate; the left and right sides of the bearing surface are provided with a plurality of positioning clips for positioning the substrate from the left and right ends of the substrate. The substrate carrying apparatus of the present invention provides a holder on the upper holding base, and during loading of the substrate, after the substrate is transported in place by a manipulator, the substrate is held and hanged by the holder, and the substrate would not undergo a falling process, reducing the risk of substrate damage.

Abstract: Embodiments of the present application provide an apparatus for carrying a substrate by an off-line vacuum suction and a method for transporting a substrate. The apparatus includes a carrying frame provided with a clamper, a vacuum suction device and a detaching device arranged on the carrying frame, wherein the vacuum suction device is arranged to suck and fix a substrate and is connectable to and detachable from a vacuum pipeline and the detaching device is arranged to detach the vacuum suction device and the vacuum pipeline from each other while keeping the vacuum suction device to continuously suck the substrate to be transported. The apparatus and the method can improve fixing of the substrate and achieve off-line suction to the substrate.

Abstract: The present disclosure provides a roller assembly including: a support base provided with a shaft hole; and at least two circular arc segments that are detachably mounted on the support base, wherein the at least two circular arc segments constitute a roller and a vertical distance from any point on periphery of the roller to an axis of the shaft hole is larger than a vertical distance from any point on periphery of the support base to the axis of the shaft hole. The present disclosure also provides a transmission device including a roller assembly described above.

Abstract: The disclosure provides a substrate supporting pin, a substrate supporting device and a substrate access system. The substrate supporting pin is used to support a substrate and includes a rod body. A supporting end of the rod body is provided with a rotating member that is able to roll along a surface of the substrate. Compared to the prior art, the disclosure can reduce or eliminate the damage of the substrate.

Abstract: The present disclosure provides a roller assembly including: a support base provided with a shaft hole; and at least two circular arc segments that are detachably mounted on the support base, wherein the at least two circular arc segments constitute a roller and a vertical distance from any point on periphery of the roller to an axis of the shaft hole is larger than a vertical distance from any point on periphery of the support base to the axis of the shaft hole. The present disclosure also provides a transmission device including a roller assembly described above.

Abstract: Embodiments of the present application provide an apparatus for carrying a substrate by an off-line vacuum suction and a method for transporting a substrate. The apparatus includes a carrying frame provided with a clamper, a vacuum suction device and a detaching device arranged on the carrying frame, wherein the vacuum suction device is arranged to suck and fix a substrate and is connectable to and detachable from a vacuum pipeline and the detaching device is arranged to detach the vacuum suction device and the vacuum pipeline from each other while keeping the vacuum suction device to continuously suck the substrate to be transported. The apparatus and the method can improve fixing of the substrate and achieve off-line suction to the substrate.

Abstract: The present invention relates to a technical field of display, and discloses a substrate carrying apparatus. The apparatus comprises: a vertical bearing plate and an upper holding base; one side surface of the vertical bearing plate is a bearing surface, the upper holding base is provided at the upside of the bearing surface; the upper holding base is provided with a plurality of holder for holding the substrate; the left and right sides of the bearing surface are provided with a plurality of positioning clips for positioning the substrate from the left and right ends of the substrate. The substrate carrying apparatus of the present invention provides a holder on the upper holding base, and during loading of the substrate, after the substrate is transported in place by a manipulator, the substrate is held and hanged by the holder, and the substrate would not undergo a falling process, reducing the risk of substrate damage.

Abstract: A filter for filtering macro-particles from a plasma beam, having a bended duct for carriage of the plasma beam, the bended duct comprising an intermediate portion connected at one end to an inlet portion having a longitudinal axis disposed on an inlet plane and at another opposite end to an outlet portion having a longitudinal axis disposed on an outlet plane. The inlet portion allows the plasma beam containing macro-particles to travel toward the intermediate portion in an incident direction and the outlet portion allows the plasma beam to travel from the intermediate portion in an emergent direction. The intermediate portion is configured to deviate the incident direction to the emergent direction at an angle of more than 90° and thereby remove macro-particles from the plasma beam as it passes through the intermediate portion. The inlet plane and outlet plane are disposed at an offset angle from each other.

Abstract: A process of depositing a coating on a substrate, the method comprising the steps of: (a) depositing material on a substrate by performing a cathodic Vacuum arc (CVA) deposition step; and (b) depositing material on a substrate by performing at least one of a chemical vapour deposition (CVD) step and a physical Vapour deposition (PVD) step that excludes CVA deposition, Wherein the thickness of the material deposited in step (b) is greater than the thickness of the material deposited in step (a).

Abstract: The present invention is directed to a process for producing an image on a substrate and a substrate having an image deposited thereon using the aforementioned processes.

Abstract: A method of depositing a coating on a substrate, the method comprising the steps of: (a) depositing material on a substrate by performing a cathodic vacuum arc (CVA) deposition step; and (b) depositing material on a substrate by performing a physical vapor deposition (PVD) step that excludes CVA deposition wherein the thickness of the material deposited in step (a) is greater than the thickness of material deposited in step (b).

Abstract: An arc deposition apparatus comprises an evacuatable chamber and means for positioning at least two targets in the chamber, wherein a first one of the at least two targets is positionable in an operative position and another of the at least two targets is positionable in a standby position. An electrical power supply is provided for supplying electrical power to the target held in the operative position to form an arc on an emission surface of the operative target. Means are provided for preparing an emission surface of the target positioned in the standby position to have a predetermined morphology. Alternatively, or in conjunction with the surface preparing means, means are provided for inspecting whether the emission surface of the target positioned in the standby position has a predetermined morphology. Preferably, the positioning means is configured to interchange the at least two targets at a predetermined time.

Abstract: A cutting tool comprising a body, a cutting edge on at least one part of said body and a plasma deposited carbon coating layer provided on said cutting edge that is substantially free of macro-particles.

Abstract: The present disclosure teaches that PIPKI? binds cadherins and adaptor protein ?-subunits and mediates trafficking of cadherins to and from the plasma membrane. Thus, the present invention relates to a method for identifying agents which modulate the trafficking or binding activities of a PIPKI?. A method for diagnosing and prognosing a cancer derived from epithelial cells by detecting the amount and subcellular location of PIPKI? is also provided as is a method for preventing or treating a disease or condition involving PIPK? activity or cadherin localization.

Abstract: A method of forming a metal coating comprising the steps of: (a) generating an arc at a metal target to create metal ions in a chamber that is under vacuum or has an inert atmosphere; (b) depositing the metal ions on a substrate to form a metal layer thereon; and (c) controlling an amount of gas in the chamber to form a primary metal-gas compound layer on said metal layer and a secondary metal-gas compound layer on said primary metal-gas compound layer, wherein said primary and secondary metal-gas compound layers have different gas atom contents.