Patents by Inventor Xu Shi

Xu Shi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230137731
    Abstract: A bipolar plate for a PEM hydrogen fuel cell is coated with a carbon-containing coating, the carbon-containing coating comprising in order: a) a titanium seed layer; b) a titanium nitride interfacial layer; and c) a a-C top layer, and wherein the bipolar plate is formed from stainless steel. Methods for making such coated plates are described. The a-C has a density of greater than 2.0 g/cm3, a molar hydrogen content of 5% or less, an sp2 carbon content of 40% to 80% and an sp3 carbon content of 20% to 60%. The coated plates possess good electrical conductivity and are resistant to corrosion.
    Type: Application
    Filed: July 14, 2021
    Publication date: May 4, 2023
    Applicant: Nanofilm Technologies International Limited
    Inventors: Xu SHI, Zhi TANG
  • Patent number: 11567249
    Abstract: This light absorbing device includes: a light reflecting layer; a dielectric layer disposed on the light reflecting layer; and a plurality of metal nanostructures disposed on the dielectric layer. A portion of each of the plurality of metal nanostructures is buried in the dielectric layer and another portion thereof is exposed to the outside.
    Type: Grant
    Filed: December 25, 2018
    Date of Patent: January 31, 2023
    Assignee: National University Corporation Hokkaido University
    Inventors: Hiroaki Misawa, Xu Shi, Kosei Ueno, Tomoya Oshikiri, Quan Sun, Keiji Sasaki
  • Publication number: 20220330395
    Abstract: A distributed radio frequency or microwave thawing device includes one or more thawing units. The thawing unit includes a power supply module, a radio frequency or microwave generation module, a measuring unit, a tuning module, a control unit, an antenna means and a thawing chamber. The antenna means is disposed in the thawing chamber and includes a first antenna group and a second antenna group, the first antenna group includes one or more first antennas, the second antenna group includes one or more second antennas, the first antenna and the second antenna are arranged in pairs, pairs of first antenna and second antenna are arranged in parallel and opposite to each other and form an antenna unit, a plurality of antenna units are arranged side by side. The number of each of the radio frequency or microwave generation module and the measuring unit is one or more.
    Type: Application
    Filed: June 15, 2020
    Publication date: October 13, 2022
    Applicant: DOTWIL INTELLIGENT TECHNOLOGY CO., LTD.
    Inventors: Weimin YIN, Chao GUO, Xu SHI
  • Publication number: 20220324455
    Abstract: The present application relates to the technical field of vehicle controlling technology, and provides a method and a device for gradient calculating. The method for gradient calculating includes: acquiring current operating parameters of the vehicle, wherein the current operating parameters include a current longitudinal acceleration, a current lateral acceleration, a current vehicle acceleration, and a current vehicle speed; determining a first influence value of the current lateral acceleration on the current longitudinal acceleration according to the current lateral acceleration and the current vehicle speed; determining a second influence value of the current vehicle acceleration on the current longitudinal acceleration according to the current vehicle acceleration and the current vehicle speed; correcting the current longitudinal acceleration according to the first influence value and the second influence value; and determining the gradient value based on the corrected current longitudinal acceleration.
    Type: Application
    Filed: October 14, 2020
    Publication date: October 13, 2022
    Inventors: Dexiang Zhou, Yuling Liu, Jian Zhang, Xu Shi
  • Publication number: 20220162739
    Abstract: A method of depositing a coating on a substrate comprises simultaneously depositing a first material via a CVA process and a second material via a sputtering process; also described are coatings obtained therefrom and coated substrates.
    Type: Application
    Filed: March 13, 2020
    Publication date: May 26, 2022
    Applicant: Nanofilm Technologies International Limited
    Inventors: Xu SHI, Zhi TANG, Zhang Yang RONG
  • Publication number: 20220145444
    Abstract: A cathode arc source comprises: a cathode target; a first magnetic field source located above the target; a second magnetic field source located below the target; and a third magnetic field source located between the first and second magnetic field sources and having an opposite polarity to the first magnetic field source; wherein the resultant magnetic field from the first, second and third magnetic field sources has zero field strength in a direction substantially normal to the target at a position above the target. The invention also provides methods of striking a cathode target and methods of depositing coatings which can be carried out using the cathode arc source described herein.
    Type: Application
    Filed: March 13, 2020
    Publication date: May 12, 2022
    Applicant: Nanofilm Technologies International Limited
    Inventors: Xu SHI, Ming Chu YANG, Kok How TAN
  • Publication number: 20220042178
    Abstract: The invention provides substrates with a multi-layer coating, comprising in order: i) the substrate; ii) a seed layer; ill) a barrier layer deposited via a CVD method; and iv) a functional layer deposited via a PVD method, and methods of making such coatings. The coatings of the invention have been shown to possess good resistance to corrosion.
    Type: Application
    Filed: December 17, 2019
    Publication date: February 10, 2022
    Applicant: Nanofilm Technologies International Limited
    Inventors: Xu SHI, Zhi TANG
  • Publication number: 20220033975
    Abstract: A substrate is coated with a multi-layer coating, comprising in order: (i) a first functional layer comprising ta-C, (ii) a second functional layer comprising ta-C, (iii) (a) a third functional layer comprising ta-C and a first intermediate layer comprising a carbide of a first element, or (b) a first intermediate layer comprising a carbide of a first element, and a second intermediate layer comprising the first element, wherein the ta-C has a hydrogen content less than 10% and an sp2 content less than 30%; wherein (i) the Young's modulus or (ii) the hardness or (iii) both the Young's modulus and the hardness independently stay the same or increase from layer to layer in (iii) (a) from the first intermediate layer to the first functional layer, or in (iii) (b) from the second intermediate layer to the first functional layer.
    Type: Application
    Filed: November 7, 2019
    Publication date: February 3, 2022
    Applicant: Nanofilm Technologies International Limited
    Inventors: Xu SHI, Zhi TANG
  • Publication number: 20220002861
    Abstract: The invention provides a substrate coated with a multi-layer coating, comprising in order: (a) the substrate; (b) a thermally insulating layer (e.g. Si3N4); (c) an interfacial layer (e.g. SiC); and (d) one or more layers comprising ta-C; wherein the interfacial layer promotes adhesion of the one or more layers comprising ta-C to the thermally insulating layer; and methods for producing such coatings.
    Type: Application
    Filed: November 7, 2019
    Publication date: January 6, 2022
    Applicant: Nanofilm Technologies International Limited
    Inventor: Xu SHI
  • Publication number: 20210348261
    Abstract: A method of continuously depositing a coating on a substrate comprises (a) depositing a first layer of ta-C on a substrate via a CVA process, said first layer having a first hardness and a first thickness of 100 mm or greater; (b) adjusting the parameters of the CVA process and depositing a second layer of ta-C on a substrate via a CVA process, said second layer having a second hardness and a second thickness of 10 mm or less, and (c) repeating the above steps to provide a coating comprising at least 5 such first layers and at least 4 such second layers, wherein the first thickness is greater than the second thickness and the first hardness is greater than the second hardness.
    Type: Application
    Filed: October 8, 2019
    Publication date: November 11, 2021
    Applicant: Nanofilm Technologies International Limited
    Inventors: Xu SHI, Ming Chu YANG
  • Publication number: 20210294009
    Abstract: This light absorbing device includes: a light reflecting layer; a dielectric layer disposed on the light reflecting layer; and a plurality of metal nanostructures disposed on the dielectric layer. A portion of each of the plurality of metal nanostructures is buried in the dielectric layer and another portion thereof is exposed to the outside.
    Type: Application
    Filed: December 25, 2018
    Publication date: September 23, 2021
    Applicant: National University Corporation Hokkaido University
    Inventors: Hiroaki MISAWA, Xu SHI, Kosei UENO, Tomoya OSHIKIRI, Quan SUN, Keiji SASAKI
  • Patent number: 10138547
    Abstract: The present invention relates to a technical field of display, and discloses a substrate carrying apparatus. The apparatus comprises: a vertical bearing plate and an upper holding base; one side surface of the vertical bearing plate is a bearing surface, the upper holding base is provided at the upside of the bearing surface; the upper holding base is provided with a plurality of holder for holding the substrate; the left and right sides of the bearing surface are provided with a plurality of positioning clips for positioning the substrate from the left and right ends of the substrate. The substrate carrying apparatus of the present invention provides a holder on the upper holding base, and during loading of the substrate, after the substrate is transported in place by a manipulator, the substrate is held and hanged by the holder, and the substrate would not undergo a falling process, reducing the risk of substrate damage.
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: November 27, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Jun Liu, Xu Shi, Dongqing Li
  • Patent number: 10120215
    Abstract: Embodiments of the present application provide an apparatus for carrying a substrate by an off-line vacuum suction and a method for transporting a substrate. The apparatus includes a carrying frame provided with a clamper, a vacuum suction device and a detaching device arranged on the carrying frame, wherein the vacuum suction device is arranged to suck and fix a substrate and is connectable to and detachable from a vacuum pipeline and the detaching device is arranged to detach the vacuum suction device and the vacuum pipeline from each other while keeping the vacuum suction device to continuously suck the substrate to be transported. The apparatus and the method can improve fixing of the substrate and achieve off-line suction to the substrate.
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: November 6, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Xu Shi, Zhilong Xu, Jun Liu, Xiaojun Wang, Dongqing Li, Shutong Huang, Wei Chen, Lei Zhang
  • Patent number: 10087015
    Abstract: The present disclosure provides a roller assembly including: a support base provided with a shaft hole; and at least two circular arc segments that are detachably mounted on the support base, wherein the at least two circular arc segments constitute a roller and a vertical distance from any point on periphery of the roller to an axis of the shaft hole is larger than a vertical distance from any point on periphery of the support base to the axis of the shaft hole. The present disclosure also provides a transmission device including a roller assembly described above.
    Type: Grant
    Filed: June 18, 2015
    Date of Patent: October 2, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Zhilong Xu, Xu Shi
  • Publication number: 20180158715
    Abstract: The disclosure provides a substrate supporting pin, a substrate supporting device and a substrate access system. The substrate supporting pin is used to support a substrate and includes a rod body. A supporting end of the rod body is provided with a rotating member that is able to roll along a surface of the substrate. Compared to the prior art, the disclosure can reduce or eliminate the damage of the substrate.
    Type: Application
    Filed: September 16, 2015
    Publication date: June 7, 2018
    Inventors: Xiaojun WANG, Xu SHI, Zhilong XU, Dagang LIU, Dongqing LI, Jianfan XU
  • Publication number: 20180065813
    Abstract: The present disclosure provides a roller assembly including: a support base provided with a shaft hole; and at least two circular arc segments that are detachably mounted on the support base, wherein the at least two circular arc segments constitute a roller and a vertical distance from any point on periphery of the roller to an axis of the shaft hole is larger than a vertical distance from any point on periphery of the support base to the axis of the shaft hole. The present disclosure also provides a transmission device including a roller assembly described above.
    Type: Application
    Filed: June 18, 2015
    Publication date: March 8, 2018
    Inventors: Zhilong XU, Xu SHI
  • Publication number: 20170307912
    Abstract: Embodiments of the present application provide an apparatus for carrying a substrate by an off-line vacuum suction and a method for transporting a substrate. The apparatus includes a carrying frame provided with a clamper, a vacuum suction device and a detaching device arranged on the carrying frame, wherein the vacuum suction device is arranged to suck and fix a substrate and is connectable to and detachable from a vacuum pipeline and the detaching device is arranged to detach the vacuum suction device and the vacuum pipeline from each other while keeping the vacuum suction device to continuously suck the substrate to be transported. The apparatus and the method can improve fixing of the substrate and achieve off-line suction to the substrate.
    Type: Application
    Filed: October 15, 2015
    Publication date: October 26, 2017
    Inventors: Xu Shi, Zhilong Xu, Jun Liu, Xiaojun Wang, Dongqing Li, Shutong Huang, Wei Chen, Lei Zhang
  • Publication number: 20160362779
    Abstract: The present invention relates to a technical field of display, and discloses a substrate carrying apparatus. The apparatus comprises: a vertical bearing plate and an upper holding base; one side surface of the vertical bearing plate is a bearing surface, the upper holding base is provided at the upside of the bearing surface; the upper holding base is provided with a plurality of holder for holding the substrate; the left and right sides of the bearing surface are provided with a plurality of positioning clips for positioning the substrate from the left and right ends of the substrate. The substrate carrying apparatus of the present invention provides a holder on the upper holding base, and during loading of the substrate, after the substrate is transported in place by a manipulator, the substrate is held and hanged by the holder, and the substrate would not undergo a falling process, reducing the risk of substrate damage.
    Type: Application
    Filed: April 18, 2016
    Publication date: December 15, 2016
    Inventors: Jun Liu, Xu Shi, Dongqing Li
  • Publication number: 20130180845
    Abstract: A filter for filtering macro-particles from a plasma beam, having a bended duct for carriage of the plasma beam, the bended duct comprising an intermediate portion connected at one end to an inlet portion having a longitudinal axis disposed on an inlet plane and at another opposite end to an outlet portion having a longitudinal axis disposed on an outlet plane. The inlet portion allows the plasma beam containing macro-particles to travel toward the intermediate portion in an incident direction and the outlet portion allows the plasma beam to travel from the intermediate portion in an emergent direction. The intermediate portion is configured to deviate the incident direction to the emergent direction at an angle of more than 90° and thereby remove macro-particles from the plasma beam as it passes through the intermediate portion. The inlet plane and outlet plane are disposed at an offset angle from each other.
    Type: Application
    Filed: September 30, 2011
    Publication date: July 18, 2013
    Applicant: Nanofilm Technologies International Pte Ltd
    Inventors: Xu Shi, Hao Wei
  • Publication number: 20110186420
    Abstract: A process of depositing a coating on a substrate, the method comprising the steps of: (a) depositing material on a substrate by performing a cathodic Vacuum arc (CVA) deposition step; and (b) depositing material on a substrate by performing at least one of a chemical vapour deposition (CVD) step and a physical Vapour deposition (PVD) step that excludes CVA deposition, Wherein the thickness of the material deposited in step (b) is greater than the thickness of the material deposited in step (a).
    Type: Application
    Filed: June 9, 2009
    Publication date: August 4, 2011
    Applicant: NANOFILM TECHNOLOGIES INTERNATIONAL PTE LTD
    Inventor: Xu Shi