Abstract: A display substrate (20) and a display device (40). The display substrate (20) comprises a base substrate (100), and a first insulating layer (301), a first conductive layer (201), a second insulating layer (302) and a second conductive layer (202) that are stacked in sequence. The first insulating layer (301) comprises a first recessed structure (G1). The first conductive layer (201) comprises a first conductive structure (21), and the first conductive structure (21) comprises a bottom surface (21a) close to the base substrate (100), a top surface (21b) away from the base substrate (100), and a first side surface (21c) located between the bottom surface (21a) and the top surface (21b).

Abstract: A keyboard may be provided that has keys overlapped by a touch sensor. The keyboard may have key sensor circuitry for monitoring switching in the keys for key press input. The keyboard may also have touch sensor circuitry such as capacitive touch sensor circuitry that monitors capacitive electrodes in the touch sensor for touch sensor input such as multitouch gesture input. The keyboard may include an outer layer of fabric that overlaps the keys. The fabric may have openings that are arranged to form alphanumeric characters. Light sources may emit light that passes through the openings and illuminates the alphanumeric characters. The touch sensor may have signal lines that are not visible through the openings. The signal lines may be transparent, may be covered by a diffuser, or may circumvent the openings so that they do not overlap.

Abstract: A method may include obtaining a feedback or a reference value of a tube voltage applied to a radiation source of a radiation device for generating radiation rays. The method may also include determining, based on the feedback or the reference value of the tube voltage, a specific value of a focusing parameter associated with a focusing device of the radiation device. The method may further include causing the focusing device to shape a focus of the radiation rays according to the determined value of the focusing parameter. The focus of the radiation rays may satisfy an operational constraint under the specific value of the focusing parameter.

Abstract: A ship cabin loading capacity measurement method and apparatus thereof, comprises: acquiring point cloud measurement data of a ship cabin; optimizing the point cloud measurement data according to a predetermined point cloud data processing rule, and generating optimized ship cabin point cloud data; calculating said ship cabin point cloud data with a predetermined loading capacity calculation rule, and getting ship cabin loading capacity data. According to the ship cabin loading capacity measurement method of the present invention, the point cloud measurement data can be acquired by a lidar, and processing the point cloud measurement data of the ship cabin with a predetermined point cloud data processing law and a computation law, and as the point cloud data processing law and the computation law can be deployed in a computer device in advance, after point cloud measurement data acquisition, loading capacity of a ship cabin can be acquired quickly and precisely.

Abstract: Provided are method and system for rapidly predicting foaming tendency of edible frying oil, including: heating the oil; immersing a polar component content detection probe into the oil to measure an initial polar component content of the oil; at a frying state, removing the detection probe from the oil, placing frying food into the oil and frying the same taking out the frying food from the oil after frying, and measuring the largest frying oil foam height and recording the same as an initial foam height; at an air introduction state, immersing the detection probe and introducing air into the oil, and continuing to introduce air and heat thereinto until the polar component content in the oil is 10%; repeating the frying state; and fitting measurements and parameters into a formula.

Abstract: Methods for pre-cleaning substrates having metal and dielectric surfaces are described. A temperature of a pedestal comprising a cooling feature on which a substrate is located is set to less than or equal to 100° C. The substrate is exposed to a plasma treatment to remove chemical residual and/or impurities from features of the substrate including a metal bottom, dielectric sidewalls, and/or a field of dielectric and/or repair surface defects in the dielectric sidewalls and/or the field of the dielectric. The plasma treatment may be an oxygen plasma, for example, a direct oxygen plasma. Processing tools and computer readable media for practicing the method are also described.

Abstract: Provided is a processing chamber configured to contain a semiconductor substrate in a processing region of the chamber. The processing chamber includes a remote plasma unit and a direct plasma unit, wherein one of the remote plasma unit or the direct plasma unit generates a remote plasma and the other of the remote plasma unit or the direct plasma unit generates a direct plasma. The combination of a remote plasma unit and a direct plasma unit is used to remove, etch, clean, or treat residue on a substrate from previous processing and/or from native oxide formation. The combination of a remote plasma unit and direct plasma unit is used to deposit thin films on a substrate.

Abstract: Systems, devices, and methods are discussed for limiting exposure of internal network operations beyond the boundary of a secure network.

Abstract: This application discloses an image content removal method, and relates to the field of computer vision. The method includes: enabling a camera application; displaying a photographing preview interface of the camera application; obtaining a first preview picture and a first reference frame picture that are captured by a camera; determining a first object in the first preview picture as a to-be-removed object; and determining to-be-filled content in the first preview picture based on the first reference frame picture, where the to-be-filled content is image content that is of a second object and that is shielded by the first object in the first preview picture. The terminal generates a first restored picture based on the to-be-filled content and the first preview picture. In this way, image content that a user does not want in a picture or a video shot by the user can be removed.

Abstract: A laser projection apparatus includes a laser source, a light modulating device, a projection lens, and a circuit system. The circuit system is configured to control the laser source to emit laser beams of at least N primary colors. N is an integer greater than or equal to 3. The circuit system structure includes a display control circuit and a laser source driving circuit. The display control circuit is configured to output N PWM signals and three enable signals. The laser source driving circuit is electrically connected to the display control circuit, and is configured to receive N PWM signals and three enable signals, so as to drive laser chips of corresponding colors to emit laser beams of the at least N colors.

Abstract: A discharge unit is connected to a power pad, a ground pad, and an I/O pad, and can discharge an electrostatic charge when an electrostatic pulse appears on any of the power pad, the ground pad, and the I/O pad. The discharge unit includes a first discharge unit and a second discharge unit, the first discharge unit is connected to the second discharge unit, the power pad, and the I/O pad, and the second discharge unit is connected to the ground pad and the I/O pad. The first discharge unit and/or the second discharge unit can discharge electrostatic charges on different pads, respectively.

Abstract: Methods for reducing resistivity of metal gapfill include depositing a conformal layer in an opening of a feature and on a field of a substrate with a first thickness of the conformal layer of approximately 10 microns or less, depositing a non-conformal metal layer directly on the conformal layer at a bottom of the opening and directly on the field using an anisotropic deposition process. A second thickness of the non-conformal metal layer on the field and on the bottom of the feature is approximately 30 microns or greater. And depositing a metal gapfill material in the opening of the feature and on the field where the metal gapfill material completely fills the opening without any voids.

Abstract: A method and apparatus for forming tungsten features in semiconductor devices is provided. The method includes exposing a top opening of a feature formed in a substrate to a physical vapor deposition (PVD) process to deposit a tungsten liner layer within the feature. The PVD process is performed in a first processing region of a first processing chamber and the tungsten liner layer forms an overhang portion, which partially obstructs the top opening of the feature. The substrate is transferred from the first processing region of the first processing chamber to a second processing region of a second processing chamber without breaking vacuum. The overhang portion is exposed to nitrogen-containing radicals in the second processing region to inhibit subsequent growth of tungsten along the overhang portion. The feature is exposed to a tungsten-containing precursor gas to form a tungsten fill layer over the tungsten liner layer within the feature.

Abstract: A method includes creating a deduplicated universal share (US) of data objects, which in turn includes receiving a US of the data objects, deduplicating the US, wherein deduplicating the US includes: hashing segments of the US to generate respective US segment fingerprints; comparing US segment fingerprints to fingerprints for respective segments held in deduplication storage in order to identify segments in the deduplication storage that equate to the US segments, respectively, of the US; storing identifiers that directly or indirectly identify locations, respectively, of the segments, respectively, in the deduplication storage that equate to the US segments, respectively, of the US. After creating the deduplicated universal share, a deduplicated backup of the US is created without reassembling the US from segments held in the deduplication storage, the creating the deduplicated backup including: creating a list that comprises copies of the stored identifiers, and storing the list.

Abstract: Embodiments of the present disclosure provide a positioning method and apparatus, a device, and a storage medium, the method is applied to a wearable display device, where the wearable display device includes a display host and a peripheral, the display host and/or the peripheral are used for projecting a structure light image onto an object in a real environment, and the method includes: acquiring an image obtained by the display host shooting the object, and an image obtained by the peripheral shooting the object; and determining, according to image obtained by shooting and the structure light image, a pose of the peripheral relative to the display host.

Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.

Abstract: The present invention provides a method for preparing an antibacterial and low-adhesion cross-linked polyvinyl alcohol coating. A simple two-step method is adopted, wherein polyfunctional isocyanate is first used to strongly cross-link with the hydroxyl group of polyvinyl alcohol, and then a compound with low surface energy such as mono-hydroxyl silicone oil or the like is received in to effectively reduce the surface energy of the surface of the coating; and two structure-function relationships are efficiently synergistic through effective strong cross-linking and regulation of the compound with low surface energy within the system, enabling the strongly cross-linked polyethylene coating to have excellent performance of water adhesion resistance and oil adhesion resistance, and good performance of bacterial adhesion resistance, which is expected to be applied in the fields of materials for antifouling and self-cleaning, liquid transportation and implantation in animal body.

Abstract: A half via hole structure, a method for manufacturing the same, an array substrate, and a display panel are provided. The half via hole structure includes: a spacer layer arranged on an underlaying substrate; a passivation layer arranged on the spacer layer and provided with a first via hole, an orthographic projection of the first via hole on the underlaying substrate being within that of the spacer layer on the underlaying substrate; a first conductive layer arranged on the spacer layer and having a width smaller than a diameter of the first via hole; an insulating layer arranged between the spacer layer and the passivation layer and provided with a second via hole; and a second conductive layer arranged on the passivation layer and overlapped with the first conductive layer through the first via hole.

Abstract: A lighting apparatus includes a first light source, a second light source, a first reflective cup, a second reflective cup, a base housing and a driver. The first light source is used for emitting a first light. The second light source is used for emitting a second light. The first reflective cup is used for limiting the first light in a first scope. The second reflective cup is used for limiting the second light in a second scope. The base housing is used for disposing the first reflective cup and the second reflective cup. The driver selectively provides a first driving current to the first light source and a second driving current to the second light source.