Patents by Inventor Xuemei Chen

Xuemei Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12153352
    Abstract: A focus-sensitive metrology target may be formed and read-out by a fabrication tool. A resulting overlay signal may be translated into a focus offset by comparison to a previously-determined calibration curve. One or more translated signals may be fed back to the fabrication tool for focus correction or used for prediction of on-device overlay (correction of overlay metrology results). In one embodiment, focus and overlay may be measured using a single target, where one portion of the target is formed on a first layer and includes a focus-sensitive design, and where another portion of the target is formed on a second layer and includes a relatively less focus-sensitive design. In some embodiments, a relative difference in focus response may be used to estimate an impact of focus error on device overlay and calculate non-zero offset contributions.
    Type: Grant
    Filed: October 3, 2022
    Date of Patent: November 26, 2024
    Assignee: KLA Corporation
    Inventors: Roel Gronheid, Xuemei Chen
  • Patent number: 12036292
    Abstract: Provided herein are certain compounds and imaging agents useful for detecting a disease or condition associated with protein aggregation, compositions thereof, and methods of their use.
    Type: Grant
    Filed: August 5, 2021
    Date of Patent: July 16, 2024
    Assignee: CHDI Foundation, Inc.
    Inventors: Longbin Liu, Celia Dominguez, Xuemei Chen, John E. Mangette
  • Patent number: 12040651
    Abstract: Embodiments of the present disclosure provide an energy storage system in thermal power unit coordinated frequency regulation control method, including: obtaining a status of an combined system of energy storage system and thermal power unit at a certain time point; determining a working period of the combined system according to the status of the combined system; determining a target active power of the combined system according to the working period of the combined system, and determining a target active power of the energy storage system according to the target active power of the combined system in cooperation with an active power of the thermal power unit; and correcting the target active power of the energy storage system according to a power limit and a capacity limit of the energy storage system, to obtain a final active power of the energy storage system.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: July 16, 2024
    Assignees: TSINGHUA UNIVERSITY, PEKING UNIVERSITY
    Inventors: Chao Lu, Xuemei Chen, Jie Song, Jie Liu, Jingtao Wu
  • Patent number: 11914339
    Abstract: Embodiments of the present disclosure provide a datum selection method for minimizing hole position errors in group hole machining of large components, comprising: 1) determining a type of a computer numerical control (CNC) machine tool and establishing a topological structure of the CNC machine tool; 2) establishing a theoretical postural model of a tool center point during a motion; 3) establishing a hole position error model; 4) establishing an average error model of hole positions in group hole machining; and 5) obtaining a machining datum for group holes of corresponding components. For the skeleton and skinned group hole machining of aircraft components, different principles of datum selection are provided respectively, which can effectively improve the positional accuracy of the skeleton or skinned group hole machining, at the same time provides a more scientific and reasonable approach for the datum selection in group hole machining of large components.
    Type: Grant
    Filed: August 9, 2023
    Date of Patent: February 27, 2024
    Assignee: CHENGDU AIRCRAFT INDUSTRIAL (GROUP) CO., LTD.
    Inventors: Jie Li, Dawei Liu, Zhenbo Ma, Yuanji Liu, Jiangyang Gou, Ying Xie, Chaolin Shuai, Xuemei Chen, Dawei Lu, Qingliang Chen
  • Publication number: 20230384755
    Abstract: Embodiments of the present disclosure provide a datum selection method for minimizing hole position errors in group hole machining of large components, comprising: 1) determining a type of a computer numerical control (CNC) machine tool and establishing a topological structure of the CNC machine tool; 2) establishing a theoretical postural model of a tool center point during a motion; 3) establishing a hole position error model; 4) establishing an average error model of hole positions in group hole machining; and 5) obtaining a machining datum for group holes of corresponding components. For the skeleton and skinned group hole machining of aircraft components, different principles of datum selection are provided respectively, which can effectively improve the positional accuracy of the skeleton or skinned group hole machining, at the same time provides a more scientific and reasonable approach for the datum selection in group hole machining of large components.
    Type: Application
    Filed: August 9, 2023
    Publication date: November 30, 2023
    Applicant: CHENGDU AIRCRAFT INDUSTRIAL (GROUP) CO., LTD.
    Inventors: Jie LI, Dawei LIU, Zhenbo MA, Yuanji LIU, Jiangyang GOU, Ying XIE, Chaolin SHUAI, Xuemei CHEN, Dawei LU, Qingliang CHEN
  • Patent number: 11790829
    Abstract: Provided is a data driving circuit and a display panel. The data driving circuit is configured to output a data signal for image display to multiple pixel units so as to drive the pixel units to display images. The data drive circuit includes a voltage regulating unit and multiple constant-current driving units, where the constant-current driving unit is configured to output a drive current corresponding to a data signal to at least one pixel unit. The voltage regulating unit is electrically connected to the multiple constant-current driving units and is configured to detect a driving current output by each constant-current driving unit and obtain a detection signal, and control the driving current output by each constant-current driving unit to be within a preset range according to the detection signal. The driving current output by each constant-current driving unit is adjusted.
    Type: Grant
    Filed: June 14, 2023
    Date of Patent: October 17, 2023
    Assignee: HKC CORPORATION LIMITED
    Inventors: Luhong Zhou, Ruidi Ran, Xuemei Chen, Rongrong Li
  • Publication number: 20230312404
    Abstract: A microcrystalline glass product. The microcrystalline glass product includes the following components in percentage by weight: SiO2: 45-70%; Al2O3: 8-18%; Li2O: 10-25%; ZrO2: 5-15%; P2O5: 2-10%; and Y2O3: greater than 0 but less than or equal to 8%. Through reasonable component design, the microcrystalline glass and the microcrystalline glass product have excellent mechanical and optical properties and are suitable for electronic devices or display devices.
    Type: Application
    Filed: September 26, 2021
    Publication date: October 5, 2023
    Applicant: CDGM GLASS CO., LTD
    Inventors: Baoping YUAN, Tianlai YU, Sai LI, Tao JIANG, Xuemei CHEN, Yong SU, Xiaobing NIE, Zhenyu LIU
  • Publication number: 20230295035
    Abstract: A microcrystalline glass and microcrystalline glass product with excellent mechanical properties, microcrystalline glass product, the components of which, expressed in weight percent, contain: SiO2: 65˜80%; Al2O3: below 5%; Li2O: 10˜25%; ZrO2: 5˜15%; P2O5: 1˜8%. Through the reasonable component design, the microcrystalline glass product has excellent mechanical properties.
    Type: Application
    Filed: January 4, 2022
    Publication date: September 21, 2023
    Applicant: CDGM GLASS CO., LTD
    Inventors: Baoping YUAN, Sai LI, Tao JIANG, Xuemei CHEN, Tianlai YU, Yong SU
  • Publication number: 20230174413
    Abstract: The present invention provides a microcrystalline glass and microcrystalline glass product with excellent mechanical properties, microcrystalline glass product, the components of which, expressed in weight percent, contain: SiO2: 65 ?80%; AI2O3: below 5%; Li2O: 10 ?25%; ZrO2: 5 ?15%; P2O5: 1 ?8%. Through the reasonable component design, the microcrystalline glass product obtained by the present invention have excellent mechanical properties.
    Type: Application
    Filed: January 31, 2023
    Publication date: June 8, 2023
    Applicant: CDGM GLASS CO., LTD
    Inventors: Baoping YUAN, Sai LI, Tao JIANG, Xuemei CHEN, Tianlai YU, Yong SU
  • Publication number: 20230104647
    Abstract: Provided in this disclosure are methods for the synthesis of substituted 2-arylcyclopropylamines and 2-heteroarylcyclopropylamines and related compounds. Also provided are methods for reduction of thioesters to aldehydes, and methods for reductive amination of cyclopropylamines.
    Type: Application
    Filed: June 15, 2022
    Publication date: April 6, 2023
    Inventors: Amy E. TAPPER, Cassandra CELATKA, Arthur Glenn ROMERO, John M. MCCALL, Toni CHANCELLOR, Jian-Xie CHEN, Xuemei CHEN, He ZHAO, Betina BIOLATTO, Elisabeth C.A. BROT, Zhihua LI, Xiaoming LIAO
  • Publication number: 20230037093
    Abstract: A focus-sensitive metrology target may be formed and read-out by a fabrication tool. A resulting overlay signal may be translated into a focus offset by comparison to a previously-determined calibration curve. One or more translated signals may be fed back to the fabrication tool for focus correction or used for prediction of on-device overlay (correction of overlay metrology results). In one embodiment, focus and overlay may be measured using a single target, where one portion of the target is formed on a first layer and includes a focus-sensitive design, and where another portion of the target is formed on a second layer and includes a relatively less focus-sensitive design. In some embodiments, a relative difference in focus response may be used to estimate an impact of focus error on device overlay and calculate non-zero offset contributions.
    Type: Application
    Filed: October 3, 2022
    Publication date: February 2, 2023
    Inventors: Roel Gronheid, Xuemei Chen
  • Patent number: 11548808
    Abstract: The present invention provides a microcrystalline glass product. The microcrystalline glass product includes the following components in percentage by weight: SiO2: 45-70%; Al2O3: 8-18%; Li2O: 10-25%; ZrO2: 5-15%; P2O5: 2-10%; and Y2O3: greater than 0 but less than or equal to 8%. Through reasonable component design, the microcrystalline glass and the microcrystalline glass product obtained in the present invention have excellent mechanical and optical properties and are suitable for electronic devices or display devices.
    Type: Grant
    Filed: December 14, 2021
    Date of Patent: January 10, 2023
    Assignee: CDGM GLASS CO., LTD.
    Inventors: Baoping Yuan, Tianlai Yu, Sai Li, Tao Jiang, Xuemei Chen, Yong Su, Xiaobing Nie, Zhenyu Liu
  • Publication number: 20220339302
    Abstract: Provided herein are certain isoindolinone compounds and imaging agents useful for detecting a disease or condition associated with protein aggregation, compositions thereof, and methods of their use.
    Type: Application
    Filed: April 7, 2022
    Publication date: October 27, 2022
    Inventors: Longbin Liu, Celia Dominguez, Jonathan Bard, Christopher John Brown, Xuemei Chen, Daniel Clark-Frew, Matthew Robert Mills, Peter David Johnson, Elise Gadouleau
  • Patent number: 11460783
    Abstract: A focus-sensitive metrology target may be formed and read-out by a fabrication tool. A resulting overlay signal may be translated into a focus offset by comparison to a previously-determined calibration curve. One or more translated signals may be fed back to the fabrication tool for focus correction or used for prediction of on-device overlay (correction of overlay metrology results). In one embodiment, focus and overlay may be measured using a single target, where one portion of the target is formed on a first layer and includes a focus-sensitive design, and where another portion of the target is formed on a second layer and includes a relatively less focus-sensitive design. In some embodiments, a relative difference in focus response may be used to estimate an impact of focus error on device overlay and calculate non-zero offset contributions.
    Type: Grant
    Filed: January 7, 2021
    Date of Patent: October 4, 2022
    Assignee: KLA Corporation
    Inventors: Roel Gronheid, Xuemei Chen
  • Patent number: 11390590
    Abstract: Provided in this disclosure are methods for the synthesis of substituted 2-arylcyclopropylamines and 2-heteroarylcyclopropylamines and related compounds. Also provided are methods for reduction of thioesters to aldehydes, and methods for reductive animation of cyclopropylamines.
    Type: Grant
    Filed: August 16, 2017
    Date of Patent: July 19, 2022
    Assignee: Imago Biosciences, Inc.
    Inventors: Amy E. Tapper, Cassandra Celatka, Arthur Glenn Romero, John M. McCall, Toni Chancellor, Jian-Xie Chen, Xuemei Chen, He Zhao, Betina Biolatto, Elisabeth C. A. Brot, Zhihua Li, Xiaoming Liao
  • Publication number: 20220212979
    Abstract: A glass with high thermal expansion coefficient and excellent thermal shock resistance, wherein the glass includes the following components by mole percentage: 55-80% of SiO2; 0-10% of B2O3; 0-10% of Al2O3; 2-20% of ZnO; 0-15% of MgO; and no more than 30% of Li2O+Na2O+K2O. Through the reasonable proportioning of components, the glass has high thermal expansion coefficient and excellent thermal shock resistance at the same time. The glass is suitable for chemical strengthening, and the glass product obtained after chemical strengthening has large surface stress and large depth of stress layer.
    Type: Application
    Filed: April 2, 2020
    Publication date: July 7, 2022
    Applicant: CDGM GLASS CO., LTD
    Inventors: Lulu MAO, Xuemei CHEN, Bo KUANG, Liangzhen HAO
  • Publication number: 20220214625
    Abstract: A focus-sensitive metrology target may be formed and read-out by a fabrication tool. A resulting overlay signal may be translated into a focus offset by comparison to a previously-determined calibration curve. One or more translated signals may be fed back to the fabrication tool for focus correction or used for prediction of on-device overlay (correction of overlay metrology results). In one embodiment, focus and overlay may be measured using a single target, where one portion of the target is formed on a first layer and includes a focus-sensitive design, and where another portion of the target is formed on a second layer and includes a relatively less focus-sensitive design. In some embodiments, a relative difference in focus response may be used to estimate an impact of focus error on device overlay and calculate non-zero offset contributions.
    Type: Application
    Filed: January 7, 2021
    Publication date: July 7, 2022
    Applicant: KLA Corporation
    Inventors: Roel Gronheid, Xuemei Chen
  • Publication number: 20220204389
    Abstract: The present invention provides a microcrystalline glass product. The microcrystalline glass product includes the following components in percentage by weight: SiO2: 45-70%; Al2O3: 8-18%; Li2O: 10-25%; ZrO2: 5-15%; P2O5: 2-10%; and Y2O3: greater than 0 but less than or equal to 8%. Through reasonable component design, the microcrystalline glass and the microcrystalline glass product obtained in the present invention have excellent mechanical and optical properties and are suitable for electronic devices or display devices.
    Type: Application
    Filed: December 14, 2021
    Publication date: June 30, 2022
    Inventors: Baoping YUAN, Tianlai YU, Sai LI, Tao JIANG, Xuemei CHEN, Yong SU, Xiaobing NIE, Zhenyu LIU
  • Patent number: D1002587
    Type: Grant
    Filed: December 29, 2021
    Date of Patent: October 24, 2023
    Inventor: Xuemei Chen
  • Patent number: D1028509
    Type: Grant
    Filed: August 10, 2022
    Date of Patent: May 28, 2024
    Inventor: Xuemei Chen