Patents by Inventor Xuerang Hu
Xuerang Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240128044Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.Type: ApplicationFiled: December 21, 2023Publication date: April 18, 2024Applicant: ASML Netherlands B.V.Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN
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Patent number: 11961697Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.Type: GrantFiled: May 5, 2023Date of Patent: April 16, 2024Assignee: ASML Netherlands B.V.Inventors: Xuerang Hu, Xuedong Liu, Weiming Ren, Zhong-Wei Chen
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Patent number: 11961698Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.Type: GrantFiled: June 10, 2021Date of Patent: April 16, 2024Assignee: ASML Netherlands B.V.Inventors: Christiaan Otten, Peter-Paul Crans, Marc Smits, Laura Del Tin, Christan Teunissen, Yang-Shan Huang, Stijn Wilem Herman Karel Steenbrink, Xuerang Hu, Qingpo Xi, Xinan Luo, Xuedong Liu
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Publication number: 20240079204Abstract: A method of detecting charged particles may include detecting beam intensity as a primary charged particle beam moves along a first direction; acquiring a secondary beam spot projection pattern as the primary charged particle beam moves along a second direction; and determining a parameter of a secondary beam spot based on the acquired secondary beam spot projection pattern. A method of compensating for beam spot changes on a detector may include acquiring a beam spot projection pattern on the detector, determining a change of the beam spot projection pattern, and adjusting a parameter of a detector cell of the detector based on the change. Another method may be provided for forming virtual apertures with respect to detector cells of a detector.Type: ApplicationFiled: December 8, 2021Publication date: March 7, 2024Applicant: ASML Netherlands B.V.Inventors: Yongxin WANG, Oleg KRUPIN, Weiming REN, Xuerang HU, Xuedong LIU
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Publication number: 20240071711Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer, a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the eclectically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.Type: ApplicationFiled: September 28, 2023Publication date: February 29, 2024Inventors: Xuerang HU, Weiming REN, Xuedong LIU, Zhong-wei CHEN
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Patent number: 11887807Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.Type: GrantFiled: January 23, 2023Date of Patent: January 30, 2024Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
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Publication number: 20240014003Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.Type: ApplicationFiled: June 30, 2023Publication date: January 11, 2024Applicant: ASML Netherlands B.V.Inventors: Shuai LI, Weiming REN, Xuedong LIU, Juying DOU, Xuerang HU, Zhongwei CHEN
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Patent number: 11854765Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.Type: GrantFiled: May 28, 2020Date of Patent: December 26, 2023Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen, Martinus Gerardus Johannes Maria Maassen
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Publication number: 20230411110Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.Type: ApplicationFiled: May 5, 2023Publication date: December 21, 2023Applicant: ASML Netherlands B.V.Inventors: Xuerang HU, Xuedong LIU, Weiming REN, Zhong-wei CHEN
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Publication number: 20230377831Abstract: A method of operating a secondary imaging system of a charged particle beam apparatus may include using an anti-scanning mode. Excitation of a component of the secondary imaging system may be adjusted synchronously with a primary scanning deflection unit. Together with an anti-scanning deflection unit performing anti-scanning, a component of the secondary imaging system, such as a lens, may be adjusted in step. As scanning and anti-scanning is performed, excitation parameters of the component may also be constantly updated.Type: ApplicationFiled: September 2, 2021Publication date: November 23, 2023Applicant: ASML Netherlands B.V.Inventors: Oleg KRUPIN, Weiming REN, Xuerang HU, Xuedong LIU
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Publication number: 20230360877Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.Type: ApplicationFiled: May 8, 2023Publication date: November 9, 2023Applicant: ASML Netherlands B.V.Inventors: Xuedong LIU, Qingpo XI, Youfei JIANG, Weiming REN, Xuerang HU, Zhongwei CHEN
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Patent number: 11804356Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.Type: GrantFiled: March 28, 2022Date of Patent: October 31, 2023Assignee: ASML Netherlands B.V.Inventors: Xuerang Hu, Weiming Ren, Xuedong Liu, Zhong-wei Chen
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Patent number: 11784024Abstract: A multi-cell detector may include a first layer having a region of a first conductivity type and a second layer including a plurality of regions of a second conductivity type. The second layer may also include one or more regions of the first conductivity type. The plurality of regions of the second conductivity type may be partitioned from one another, preferably by the one or more regions of the first conductivity type of the second layer. The plurality of regions of the second conductivity type may be spaced apart from one or more regions of the first conductivity type in the second layer. The detector may further include an intrinsic layer between the first and second layers.Type: GrantFiled: January 10, 2022Date of Patent: October 10, 2023Assignee: ASML Netherlands B.V.Inventors: Joe Wang, Yongxin Wang, Zhongwei Chen, Xuerang Hu
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Publication number: 20230317402Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.Type: ApplicationFiled: March 7, 2023Publication date: October 5, 2023Applicant: ASML Netherlands B.V.Inventors: Derk Ferdinand WALVOORT, Dmitry MUDRETSOV, Xuerang HU, Qingpo XI, Jurgen VAN SOEST, Marco Jan-Jaco WIELAND
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Publication number: 20230280293Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.Type: ApplicationFiled: February 17, 2023Publication date: September 7, 2023Applicant: ASML Netherlands B.V.Inventors: Xuerang HU, Xinan LUO, Qingpo XI, Xuedong LIU, Weiming REN
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Publication number: 20230282441Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.Type: ApplicationFiled: January 23, 2023Publication date: September 7, 2023Applicant: ASML Netherlands B.V.Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN
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Patent number: 11721521Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.Type: GrantFiled: March 17, 2022Date of Patent: August 8, 2023Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
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Patent number: 11705304Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.Type: GrantFiled: July 12, 2021Date of Patent: July 18, 2023Assignee: ASML Netherlands B.V.Inventors: Shuai Li, Weiming Ren, Xuedong Liu, Juying Dou, Xuerang Hu, Zhongwei Chen
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Patent number: 11676793Abstract: An electromagnetic compound lens may be configured to focus a charged particle beam. The compound lens may include an electrostatic lens provided on a secondary optical axis and a magnetic lens also provided on the secondary optical axis. The magnetic lens may include a permanent magnet. A charged particle optical system may include a beam separator configured to separate a plurality of beamlets of a primary charged particle beam generated by a source along a primary optical axis from secondary beams of secondary charged particles. The system may include a secondary imaging system configured to focus the secondary beams onto a detector along the secondary optical axis. The secondary imaging system may include the compound lens.Type: GrantFiled: November 8, 2019Date of Patent: June 13, 2023Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
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Patent number: RE49784Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.Type: GrantFiled: August 27, 2020Date of Patent: January 2, 2024Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen