Abstract: A system and method are provided to determine at least one of equivalent isotropic radiated power (EIRP) or effective isotropic sensitivity (EIS) of an antenna under test (AUT) in a test chamber, the AUT including an antenna array with an array phase center that is offset from a center of a quiet zone of the test chamber. The method includes performing a local beam peak direction scan of an antenna pattern of the AUT using a probe antenna located at laterally offset positions at a near-field distance from the AUT to determine a beam peak direction; performing EIRP and/or EIS near-field measurements of the AUT in the determined beam peak direction using the probe antenna located at near-field distances from the AUT in a radial direction; deriving a far-field equivalent of the EIRP and/or EIS near-field measurement along the determined beam peak direction; and deriving the beam peak direction of the AUT.

Abstract: Provided are an image segmentation method and apparatus, a device, and a storage medium. The image segmentation method includes: fusing a visual feature corresponding to an original image with a text feature corresponding to a description language to obtain a multimodal feature, where the description language is used for specifying a target object to be segmented in the original image; determining a visual region of the target object according to an image corresponding to the multimodal feature and recording an image corresponding to the visual region as a response heat map; and determining a segmentation result of the target object according to the image corresponding to the multimodal feature and the response heat map.

Abstract: A system and method are provided to determine at least one of equivalent isotropic radiated power (EIRP) or effective isotropic sensitivity (EIS) of an antenna under test (AUT) in a test chamber, the AUT including an antenna array with an array phase center that is offset from a center of a quiet zone of the test chamber. The method includes performing a local beam peak direction scan of an antenna pattern of the AUT using a probe antenna located at laterally offset positions at a near-field distance from the AUT to determine a beam peak direction; performing EIRP and/or EIS near-field measurements of the AUT in the determined beam peak direction using the probe antenna located at near-field distances from the AUT in a radial direction; deriving a far-field equivalent of the EIRP and/or EIS near-field measurement along the determined beam peak direction; and deriving the beam peak direction of the AUT.

Abstract: A driving device is provided. The driving device includes a boost inductor and a resonance circuit. The boost inductor receives a first power via a first terminal of the boost inductor in a first mode and provides a second power via a second terminal of the boost inductor. The resonance circuit stores a stored electric energy from the second power in the first mode, so that the boost inductor does not provide the second power in the second mode and drives a transducer by the stored electric energy in the first mode and the second mode.

Abstract: A process of overlay offset measurement includes providing a substrate; forming a first pattern layer with a predetermined first pattern on the substrate; forming a first photoresist layer on the substrate and the first pattern layer; forming a second photoresist layer on the first photoresist layer; forming a second pattern layer with a predetermined second pattern on the second photoresist layer; patterning the second photoresist layer to form a trench having a predetermined third pattern being substantially aligned with the predetermined first pattern of the first pattern layer; and performing overlay offset measurement according to the second pattern layer and the trench.

Abstract: A test system for testing a device under test includes: a signal processor configured to generate a plurality of independent signals and to apply first fading channel characteristics to each of the independent signals to generate a plurality of first faded test signals; a test system interface configured to provide the plurality of first faded test signals to one or more signal input interfaces of the device under test (DUT); a second signal processor configured to apply second fading channel characteristics to a plurality of output signals of the DUT to generate a plurality of second faded test signals, wherein the second fading channel characteristics are derived from the first fading channel characteristics; and one or more test instruments configured to measure at least one performance characteristic of the DUT from the plurality of second faded test signals.

Abstract: A process of overlay offset measurement includes providing a substrate; forming a first pattern layer with a predetermined first pattern on the substrate; forming a first photoresist layer on the substrate and the first pattern layer; forming a second photoresist layer on the first photoresist layer; forming a second pattern layer with a predetermined second pattern on the second photoresist layer; patterning the second photoresist layer to form a trench having a predetermined third pattern being substantially aligned with the predetermined first pattern of the first pattern layer; and performing overlay offset measurement according to the second pattern layer and the trench.

Abstract: Described herein is a fabric care composition including at least one hydrophobically modified polyalkyleneimine as dye fixative polymer. Also described herein is a method for providing an improved color care effect during washing or treatment of colored fabric, the method including use of the hydrophobically modified polyalkyleneimine as dye fixative polymer.

Abstract: A sensor device provided in the disclosure includes a sensor substrate, a first transparent layer, a collimator layer, and a lens. The first transparent layer is disposed on the sensor substrate, wherein the first transparent layer defines an alignment structure. The collimator layer is disposed on the first transparent layer. The lens is disposed on the collimator layer.

Abstract: A liquid crystal display includes a first substrate, a pixel array, a first pad, a dielectric layer, a filling pattern, a first conductor, a second substrate and a liquid crystal layer. The first substrate has a display area and a pad area located outside the display area. The pixel array is disposed on the display area. The first pad is disposed on the pad area. The dielectric layer has a first opening overlapped with the first pad. The filling pattern is disposed within the first opening of the dielectric layer. The filling pattern has through holes, and the through holes of the filling pattern are overlapped with the first pads. The first conductor is disposed in the first opening of the dielectric layer, and is electrically connected to the first pad via the through holes of the filling pattern.

Abstract: A sensor device provided in the disclosure includes a sensor substrate, a first transparent layer, a collimator layer, and a lens. The first transparent layer is disposed on the sensor substrate, wherein the first transparent layer defines an alignment structure. The collimator layer is disposed on the first transparent layer. The lens is disposed on the collimator layer.

Abstract: A method of fabricating a sensor device including at least the following steps is provided. An optical film stack is formed on a sensor substrate, wherein the sensor substrate includes a sensor region and a pad region beside the sensor region, and the optical film stack covers the sensor region while exposes the pad region. A releasing pattern is formed on the pad region. A lens material layer is formed on the sensor substrate to cover the releasing pattern and the optical film stack. The releasing pattern is removed from the sensor substrate to expose the pad region by patterning the lens material layer to form a lens on the optical film stack.

Abstract: A patterned light guide structure includes a transparent substrate with a first side and with a second side, an anti-reflective layer directly attached to the first side, a first light-shielding layer directly disposed on the anti-reflective layer, a second light-shielding layer directly disposed on the second side, and a protecting layer directly disposed on the first light-shielding layer to keep the first light-shielding layer from any deteriorating damage.

Abstract: A system and method are provided to determine equivalent isotropic radiated power (EIRP), effective isotropic sensitivity (EIS) and/or signal quality of a DUT in a test chamber, where the DUT has an AUT that has beam-forming capability and is offset from a center of a quiet zone of the test chamber. The method includes establishing a connection with the DUT using a far-field probe antenna in a far-field of the test chamber relative to the AUT so that the AUT forms a beam in a beam peak direction towards the far-field probe antenna; locking the beam of the AUT in the beam peak direction to prevent subsequent beam forming; and performing a near-field measurement of the EIRP, the EIS and/or the signal quality of the AUT with the beam locked in the beam peak direction using a near-field probe antenna in a near-field of the test chamber.

Abstract: A test system includes: a signal processor configured to generate a plurality of orthogonal baseband sequences; a signal generator configured to supply the plurality of orthogonal baseband sequences to a corresponding plurality of RF transmitters of a device under test (DUT), wherein the RF transmitters each employ the corresponding orthogonal baseband sequence to generate a corresponding RF signal on a corresponding channel among a plurality of channels of the DUT such that the RF transmitters output a plurality of orthogonal RF signals at a same time; a combiner network configured to combine the plurality of orthogonal RF signals and to output a single signal under test; and a single channel measurement instrument configured to receive the single signal under test and to measure independently therefrom at least one characteristic of each of the RF transmitters. Orthogonal RF test signals may be used similarly to test RF receivers of the DUT.

Abstract: A sensor device provided in the disclosure includes a sensor substrate, a first transparent layer, a collimator layer, and a lens. The first transparent layer is disposed on the sensor substrate, wherein the first transparent layer defines an alignment structure. The collimator layer is disposed on the first transparent layer. The lens is disposed on the collimator layer.

Abstract: A process of overlay offset measurement includes providing a substrate; forming a first pattern layer with a predetermined first pattern on the substrate; forming a first photoresist layer on the substrate and the first pattern layer; forming a second photoresist layer on the first photoresist layer; forming a second pattern layer with a predetermined second pattern on the second photoresist layer; patterning the second photoresist layer to form a trench having a predetermined third pattern being substantially aligned with the predetermined first pattern of the first pattern layer; and performing overlay offset measurement according to the second pattern layer and the trench.

Abstract: A method of fabricating a sensor device including at least the following steps is provided. An optical film stack is formed on a sensor substrate, wherein the sensor substrate includes a sensor region and a pad region beside the sensor region, and the optical film stack covers the sensor region while exposes the pad region. A releasing pattern is formed on the pad region. A lens material layer is formed on the sensor substrate to cover the releasing pattern and the optical film stack. The releasing pattern is removed from the sensor substrate to expose the pad region by patterning the lens material layer to form a lens on the optical film stack.

Abstract: A driving device is provided. The driving device includes a boost inductor and a resonance circuit. The boost inductor receives a first power via a first terminal of the boost inductor in a first mode and provides a second power via a second terminal of the boost inductor. The resonance circuit stores a stored electric energy from the second power in the first mode, so that the boost inductor does not provide the second power in the second mode and drives a transducer by the stored electric energy in the first mode and the second mode.

Abstract: A method is provided for testing an antenna array of a DUT using a probe antenna, the antenna array including multiple antenna elements. The method includes providing a correction table that includes predetermined correction data of differences between far field antenna patterns from different positions in a far field of the antenna array and a middle field antenna pattern from a position in a middle field of the antenna array, where the middle field satisfies near field criteria for the antenna array and satisfies far field criteria for each antenna element in the antenna array; measuring an antenna pattern at a first position in the middle field of the antenna array; retrieving predetermined correction data from the correction table corresponding to a second position located in the far field of the antenna array; and translating the measured antenna pattern to the far field by adding the retrieved predetermined correction data.