Patents by Inventor Yanxia Zhang

Yanxia Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180323028
    Abstract: The present invention provides an arc extinguishing structure for direct current circuit breaker, which comprises an arc extinguishing chamber (3) installed on a second casing (2), with a lateral opening (30) which opens towards the first casing (1); a gas generating hood (4) installed at a lower part inside the arc extinguishing chamber (3) and comprising two gas generating plates (41, 42) that are disposed opposite to each other, with a shield plate (43) disposed opposite to the lateral opening (30) and adjacent the second casing (2); a movable contactor (5) and a stationary contactor (6) installed inside an internal installation space (10), with the disconnecting portion between the movable contactor (5) and the stationary contactor (6) being located inside an accommodation space (40) and close to the shield plate (43), so that when the movable contactor (5) becomes disconnected from the stationary contactor (6) and an electric arc is produced, the electric arc triggers the gas generating plates (41, 42) a
    Type: Application
    Filed: May 17, 2017
    Publication date: November 8, 2018
    Inventors: Yanxia ZHANG, Li ZHANG, Zhihao ZHENG, Qianzhong CHEN
  • Patent number: 9208989
    Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.
    Type: Grant
    Filed: November 14, 2011
    Date of Patent: December 8, 2015
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Alexander Hendrik Vincent Van Veen, Yanxia Zhang, Gun Sari Mari Berglund, Pieter Kruit
  • Patent number: 9168509
    Abstract: The present disclosure provides a hydrogenation catalyst, the preparation process thereof and the application thereof in the production of 1,4-butanediol by hydrogenating dialkyl maleate and/or dialkyl succinate. The catalyst comprises Cu—Al-A-B—O, wherein A comprises at least one of Zn, Mo and W, B comprises at least one of Ba, Mn, Mg, Ti, Ce and Zr. In the process for preparing said hydrogenation catalyst, a part of Cu and A are precipitated first and the rest of Cu, Al and B are precipitated successively.
    Type: Grant
    Filed: October 30, 2012
    Date of Patent: October 27, 2015
    Assignees: China Petroleum & Chemical Corp., Fushun Research Institute of Petroleum
    Inventors: Yanxia Zhang, Shenghua Yuan, Peng Gao, Hao Zhang, Qiuhong Fu, Ri Duan
  • Patent number: 8648318
    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
    Type: Grant
    Filed: March 24, 2011
    Date of Patent: February 11, 2014
    Assignee: Mapper Lithography IP B.V.
    Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
  • Patent number: 8598545
    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
    Type: Grant
    Filed: May 1, 2012
    Date of Patent: December 3, 2013
    Assignee: Mapper Lithography IP B.V
    Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
  • Patent number: 8533346
    Abstract: The present invention provides a SIP-based network video surveillance system and method, which relates to the application field of network video surveillance. The network video surveillance method comprises the steps of: receiving a request message from a client by a call control server (CCS), the request message comprising an ID of a Premises Unit (PU) and a channel ID; forwarding the request message to a center management server (CMS) by the CCS for access authentication; transmitting the request message to the PU by the CCS after the request message passes the access authentication; responding by the PU an acknowledgement message containing video codec information to the CMS via the CCS; forwarding the acknowledgement message containing the video codec information and an access path to the client by the CMS, then establishing, by the client, a video stream connection with a network element directed by the access path on the basis of the acknowledge message.
    Type: Grant
    Filed: September 17, 2010
    Date of Patent: September 10, 2013
    Assignee: China Telecom Corporation Limited
    Inventors: Ning Cao, Ming Feng, Duguo Liang, Yanxia Zhang, Zemin Zheng
  • Publication number: 20120211677
    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
    Type: Application
    Filed: May 1, 2012
    Publication date: August 23, 2012
    Inventors: Pieter Kruit, Yanxia Zhang, Matijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
  • Publication number: 20120145915
    Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.
    Type: Application
    Filed: November 14, 2011
    Publication date: June 14, 2012
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Alexander Hendrik Vincent VAN VEEN, Yanxia ZHANG, Gun Sari Mari BERGLUND, Pieter KRUIT
  • Patent number: 8188450
    Abstract: The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: May 29, 2012
    Assignee: Mapper Lithography IP B.V.
    Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
  • Patent number: 8134135
    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: March 13, 2012
    Assignee: Mapper Lithography IP B.V.
    Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
  • Publication number: 20110168910
    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
    Type: Application
    Filed: March 24, 2011
    Publication date: July 14, 2011
    Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
  • Publication number: 20110163244
    Abstract: The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
    Type: Application
    Filed: March 17, 2011
    Publication date: July 7, 2011
    Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
  • Publication number: 20110141280
    Abstract: The present invention provides a SIP-based network video surveillance system and method, which relates to the application field of network video surveillance. The network video surveillance method comprises the steps of: receiving a request message from a client by a call control server (CCS), the request message comprising an ID of a Premises Unit (PU) and a channel ID; forwarding the request message to a center management server (CMS) by the CCS for access authentication; transmitting the request message to the PU by the CCS after the request message passes the access authentication; responding by the PU an acknowledgement message containing video codec information to the CMS via the CCS; forwarding the acknowledgement message containing the video codec information and an access path to the client by the CMS, then establishing, by the client, a video stream connection with a network element directed by the access path on the basis of the acknowledge message.
    Type: Application
    Filed: September 17, 2010
    Publication date: June 16, 2011
    Applicant: CHINA TELECOM CORPORATION LIMITED
    Inventors: Ning CAO, Ming FENG, Duguo LIANG, Yanxia ZHANG, Zemin ZHENG
  • Patent number: 7332562
    Abstract: The present invention relates to a biodegradable copolyester of high molecular weight and narrow molecular weight distribution. The copolyester has a Mw of 100,000-600,000 g/mol, and a molecular weight distribution of 1.2-3.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: February 19, 2008
    Assignees: China Petroleum & Chemical Corporation, Beijing Research Institute of Chemical Industry
    Inventors: Wei Chen, Guixiang Zhu, Xirong Chen, Jinglan Lu, Yanxia Zhang, Yifan Yan, Wei Zhang
  • Publication number: 20080023643
    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
    Type: Application
    Filed: July 23, 2007
    Publication date: January 31, 2008
    Inventors: Pieter Kruit, Yanxia Zhang, Martijn Van Bruggen, Stijn Willem Steenbrink
  • Publication number: 20060142536
    Abstract: The present invention relates to a biodegradable, random and linear copolyester of high molecular weight and narrow molecular weight distribution, and to process for preparing it and use of the same. The present copolyester has a weight-average molecular weight Mw of 100,000-600,000 g/mol, and a molecular weight distribution of 1.2-3. The copolyester is widely used in the fields of profiles, films, fibers and coatings.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 29, 2006
    Applicants: China Petroleum & Chemical Corporation, Beijing Research Institute of Chemical Industry
    Inventors: Wei Chen, Guixiang Zhu, Xirong Chen, Wei Zhang, Yifan Yan, Yanxia Zhang, Jinglan Lu