Patents by Inventor Yao Ku

Yao Ku has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9977857
    Abstract: In examples described herein, methods for via pillar placement and an integrated circuit design including a via pillar are described. In some instances, a path within an integrated circuit or proposed integrated circuit design can be identified as having negative slack. In such instances, in particular where the path includes a fanout to input pins of receivers, a via pillar can be inserted at a location prior to fanout of the path. The via pillar can be inserted, for example, proximate to the fanout, but between the fanout and an output pin of a driver that is connected to the path.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: May 22, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Yao Ku, Hung-Chih Ou, Shao-Huan Wang, Wen-Hao Chen, Ming-Tao Yu
  • Patent number: 8087975
    Abstract: The present invention relates to a composite sheet for mounting a workpiece and a method for making the same. The composite sheet includes a buffer layer and an adsorption layer. The buffer layer has a plurality of continuous pores. The adsorption layer is located on the buffer layer for adsorbing a workpiece, and the compression ratio of the buffer layer is higher than that of the adsorption layer. Thereby, due to low hardness, good adsorption effect, and high compression ratio, the composite sheet of the present invention has good buffer effect.
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: January 3, 2012
    Assignee: San Fang Chemical Industry Co., Ltd.
    Inventors: Chung-Chih Feng, I-Peng Yao, Lyang-Gung Wang, Zong-Yao Ku
  • Publication number: 20090252949
    Abstract: The present invention relates to a composite sheet for mounting a workpiece and a method for making the same. The composite sheet includes a buffer layer and an adsorption layer. The buffer layer has a plurality of continuous pores. The adsorption layer is located on the buffer layer for adsorbing a workpiece, and the compression ratio of the buffer layer is higher than that of the adsorption layer. Thereby, due to low hardness, good adsorption effect, and high compression ratio, the composite sheet of the present invention has good buffer effect.
    Type: Application
    Filed: June 4, 2009
    Publication date: October 8, 2009
    Applicant: SAN FANG CHEMICAL INDUSTRY CO., LTD.
    Inventors: Chung-Chih Feng, I-Peng Yao, Lyang-Gung Wang, Zong-Yao Ku
  • Publication number: 20080268223
    Abstract: The present invention relates to a composite sheet for mounting a workpiece and a method for making the same. The composite sheet includes a buffer layer and an adsorption layer. The buffer layer has a plurality of continuous pores. The adsorption layer is located on the buffer layer for adsorbing a workpiece, and the compression ratio of the buffer layer is higher than that of the adsorption layer. Thereby, due to low hardness, good adsorption effect, and high compression ratio, the composite sheet of the present invention has good buffer effect.
    Type: Application
    Filed: April 30, 2007
    Publication date: October 30, 2008
    Inventors: Chung-Chih Feng, I-Peng Yao, Lyang-Gung Wang, Zong-Yao Ku
  • Publication number: 20050164098
    Abstract: A method and system is disclosed for processing one or more oblique features on a mask or reticle substrate. After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed on the mask or reticle substrate with regard to either the horizontal or vertical reference direction of the predetermined reference system is determined. The mask or reticle substrate is rotated in a predetermined direction by the offset angle; and the feature on the mask or reticle substrate is processed using the predetermined reference system wherein the feature is processed in either the horizontal or vertical reference direction thereof.
    Type: Application
    Filed: January 27, 2004
    Publication date: July 28, 2005
    Inventors: Burn Lin, Ping Yang, Hong Hsieh, Yao Ku, Chin-Hsiang Lin, Chiu Yoo