Patents by Inventor Yao-Ting Wang

Yao-Ting Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phase shifting circuit manufacture method and apparatus
    Patent number: 6228539
    Abstract: A method and apparatus for creating a phase shifting mask and a structure mask for shrinking integrated circuit designs. One embodiment of the invention includes using a two mask process. The first mask is a phase shift mask and the second mask is a single phase structure mask. The phase shift mask primarily defines regions requiring phase shifting. The single phase structure mask primarily defines regions not requiring phase shifting. The single phase structure mask also prevents the erasure of the phase shifting regions and prevents the creation of undesirable artifact regions that would otherwise be created by the phase shift mask. Both masks are derived from a set of masks used in a larger minimum dimension process technology.
    Type: Grant
    Filed: January 12, 1999
    Date of Patent: May 8, 2001
    Assignee: Numerical Technologies, Inc.
    Inventors: Yao-Ting Wang, Yagyensh Pati
  • Phase shifting circuit manufacture method and apparatus
    Publication number: 20010000240
    Abstract: A method and apparatus for creating a phase shifting mask and a structure mask for shrinking integrated circuit designs. One embodiment of the invention includes using a two mask process. The first mask is a phase shift mask and the second mask is a single phase structure mask. The phase shift mask primarily defines regions requiring phase shifting. The single phase structure mask primarily defines regions not requiring phase shifting. The single phase structure mask also prevents the erasure of the phase shifting regions and prevents the creation of undesirable artifact regions that would otherwise be created by the phase shift mask. Both masks are derived from a set of masks used in a larger minimum dimension process technology.
    Type: Application
    Filed: December 7, 2000
    Publication date: April 12, 2001
    Inventors: Yao-Ting Wang, Yagyensh Pati
  • Phase shifting circuit manufacture method and apparatus
    Patent number: 5858580
    Abstract: A method and apparatus for creating a phase shifting mask and a structure mask for shrinking integrated circuit designs. One embodiment of the invention includes using a two mask process. The first mask is a phase shift mask and the second mask is a single phase structure mask. The phase shift mask primarily defines regions requiring phase shifting. The single phase structure mask primarily defines regions not requiring phase shifting. The single phase structure mask also prevents the erasure of the phase shifting regions and prevents the creation of undesirable artifact regions that would otherwise be created by the phase shift mask. Both masks are derived from a set of masks used in a larger minimum dimension process technology.
    Type: Grant
    Filed: September 17, 1997
    Date of Patent: January 12, 1999
    Assignee: Numerical Technologies, Inc.
    Inventors: Yao-Ting Wang, Yagyensh C. Pati