Abstract: In a semiconductor memory device including resistance change memory devices, when a resistance change memory device is in standby mode, the two terminals of the resistance change memory device, i.e., a bit line and a source line, are set at a precharge potential Vp by a bit-line precharge circuit and a source-line precharge circuit, respectively. At the time of a set operation, the bit line is set to a set voltage Vd, which is higher than the precharge potential Vp, by a bit-line write bias generation circuit, while the source line is grounded by a source-line write bias generation circuit. At the time of a reset operation, in contrast to the set operation, the bit line is grounded, while the source line is set to the set voltage Vd. At the time of a data-read operation, the source line is grounded by a read bias generation circuit, while the potential of the bit line is kept at the precharge potential Vp, for example.

Abstract: A system LSI includes an input/output section and a logic circuit section. The input/output section includes an I/O power source cell having a supply voltage higher than a power source for the logic circuit section and a plurality of I/O cells in each of which an I/O power source line is provided for supplying source power from the I/O power source cell. The logic circuit section includes an I/O power consuming circuit which uses the I/O power source cell as a power source. The I/O power consuming circuit is connected to a line leading from an I/O power source line in at least one of the plurality of I/O cells.

Abstract: A circuit includes a plurality of stages each including a MOS transistor and a capacitor of which one end is connected to one of a drain and a source of the MOS transistor. The plurality of stages are connected with each other by cascade connection of the MOS transistors. A gate of the MOS transistor is connected electrically to one of the drain and the source thereof in each stage, and a substrate for at least one pair of adjacent MOS transistors are connected electrically to one of the drain and the source of one of the pair. The back bias effect is suppressed, and the layout area is reduced. Further, a plurality of booster capacitors connected in series are provided in succeeding stages, thereby suppressing degradation of breakdown voltage of each capacitor.

Abstract: A nonvolatile semiconductor memory device for storing data by accumulating charge in a floating gate includes a plurality of MOS transistors sharing the floating gate. In the device, a PMOS is used for coupling during writing and an n-type depletion MOS (DMOS) is used for coupling during erasure. Coupling of channel inversion capacitance by the PMOS is used for writing and coupling of depletion capacitance by the n-type DMOS is used for erasure, thereby increasing the erase speed without increase of area, as compared to a conventional three-transistor nonvolatile memory element.

Abstract: Electrical fuse blocks (100) of a plurality of stages are provided each of which includes a plurality of electrical fuse cores (101). The electrical fuse block (100) includes a program shift register block (103) made up of shift registers (107) which are disposed for the respective electrical fuse cores (101), sequentially transmit program enable signal FPGI, and output the program enable signal FPGI to the NMOS transistors (105) of the electrical fuse cores (101). When performing programming according to programming decision signal PBn, the program shift register block (103) transmits the program enable signal FPGI. When not performing programming, the program shift register block (103) skips the program enable signal FPGI.

Abstract: A semiconductor device including: a silicon pillar having a high-resistivity region and first and second highly doped regions sandwiching the high-resistivity region therebetween, the high-resistivity region having an impurity concentration of 1017 cm−3 or less; an insulator surrounding the high-resistivity region; and a conductor surrounding the insulator, wherein the conductor is made of a material which permits a voltage applied to the conductor to control an electric current flowing between the first and second highly doped regions and which has a work function bringing the high-resistivity region to a perfect depletion condition during the flow of the electric current between the first and second highly doped regions.