Patents by Inventor Yasuhiro Fukumoto

Yasuhiro Fukumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180269084
    Abstract: Disclosed is a substrate treating apparatus including a treatment container, a pin, a seal housing, a seal member, and an exhaust port. The treatment container includes an opening. The pin is disposed between an interior of the treatment container and an exterior of the treatment container through the opening, and is configured to reciprocate along an axis thereof. The seal housing is disposed in the exterior of the treatment container. The seal housing is in close contact with the treatment container around the opening, and accommodates a part of the pin. The seal member is in close contact with an inner peripheral surface of the seal housing, and in close contact with an outer peripheral surface of the pin so as to be slidable relative to the pin. The exhaust port is in connection with the seal housing in a communicated manner.
    Type: Application
    Filed: February 26, 2018
    Publication date: September 20, 2018
    Inventors: Yasuhiro FUKUMOTO, Yuji TANAKA, Tomohiro MATSUO, Takeharu ISHII
  • Publication number: 20180253011
    Abstract: Vacuum ultraviolet rays are emitted to a surface to be processed of a substrate to be processed by a light source. During an emission period in which the vacuum ultraviolet rays are emitted from the light source to the substrate, part of the vacuum ultraviolet rays is received by an illuminometer, and illuminance of the received vacuum ultraviolet rays is measured. A light receiving surface of the illuminometer is located at a constant height that is based on the surface to be processed of the substrate during the emission period of the vacuum ultraviolet rays. An exposure amount of the substrate is calculated based on the illuminance measured by the illuminometer. Emission of the vacuum ultraviolet rays from the light source to the substrate is stopped based on the calculated exposure amount of the substrate.
    Type: Application
    Filed: February 21, 2018
    Publication date: September 6, 2018
    Inventors: Tomohiro MATSUO, Yasuhiro FUKUMOTO, Takafumi OKI, Masaya ASAI, Masahiko HARUMOTO, Yuji TANAKA, Chisayo NAKAYAMA
  • Publication number: 20180253012
    Abstract: An atmosphere in a processing chamber in which a substrate is stored is discharged by a suction device. At a time point at which oxygen concentration in the processing chamber is lowered to predetermined exposure starting concentration, emission of vacuum ultraviolet rays from a light source to the substrate is started. The emission of the vacuum ultraviolet rays to the substrate is stopped at a time point at which the exposure amount of the substrate increases to a predetermined set exposure amount. The exposure starting concentration is defined in advance to be higher than 1% and lower than oxygen concentration in the air, and is defined in advance such that ozone generated from oxygen atoms by the emission of the vacuum ultraviolet rays do not damage the film on the surface to be processed of the substrate.
    Type: Application
    Filed: February 22, 2018
    Publication date: September 6, 2018
    Inventors: Tomohiro MATSUO, Yasuhiro FUKUMOTO, Takafumi OKI, Masaya ASAI, Masahiko HARUMOTO, Yuji TANAKA, Chisayo NAKAYAMA
  • Publication number: 20180230599
    Abstract: Disclosed is a substrate treating method for performing a heat treatment of a substrate having a treated film formed thereon in a heat treating space of a heat treating chamber. The method includes an exhaust step of performing exhaust of gas within the heat treating space, an inert gas supply step of supplying inert gas into the heat treating space, and a heat treating step of performing the heat treatment of the substrate in the heat treating space.
    Type: Application
    Filed: December 26, 2017
    Publication date: August 16, 2018
    Inventors: Yuji TANAKA, Chisayo NAKAYAMA, Masahiko HARUMOTO, Masaya ASAI, Yasuhiro FUKUMOTO, Tomohiro MATSUO, Takeharu ISHII
  • Publication number: 20180231895
    Abstract: Disclosed is a substrate treating method for treating a substrate with a directed self-assembly material applied thereto. The substrate treating method includes a heating step and a cooling step. The heating step includes heating the substrate to perform phase separation of the directed self-assembly material by maintaining an interior of a treatment container in a non-oxidizing gas atmosphere and placing the substrate at a heating position. The cooling step includes cooling the substrate by maintaining the interior of the treatment container in the non-oxidizing gas atmosphere, placing the substrate at a cooling position further away from the heating unit than the heating position, supplying non-oxidizing gas into the treatment container, and exhausting gas within the treatment container.
    Type: Application
    Filed: December 28, 2017
    Publication date: August 16, 2018
    Inventors: Yasuhiro FUKUMOTO, Yuji TANAKA, Tomohiro MATSUO, Takeharu ISHII
  • Publication number: 20180231894
    Abstract: Disclosed is a substrate treating method for performing a heat treatment of a substrate having a treated film formed thereon in a heat treating space of a heat treating chamber. The method includes an exhaust step of exhausting gas within the heat treating space formed by a cover enclosing surroundings of a heat treating plate; an inert gas supply step of supplying inert gas from an upper portion of the heat treating space into the heat treating space and supplying inert gas into a gap between an outer peripheral surface of the heat treating plate and an inner wall of the cover; and a heat treating step of performing the heat treatment of the substrate in the heat treating space. The heat treating step is performed after the exhaust step and the inert gas supply step.
    Type: Application
    Filed: December 28, 2017
    Publication date: August 16, 2018
    Inventors: Yasuhiro FUKUMOTO, Yuji TANAKA, Takeharu ISHII, Tomohiro MATSUO
  • Publication number: 20180230598
    Abstract: Disclosed is a substrate treating method for performing a heat treatment of a substrate in a heat treating space. The method includes a loading step of loading the substrate on support pins, an exhaust step of exhausting gas within the heat treating space, an inert gas supply step of supplying inert gas into the heat treating space, an under-substrate space gas discharging step of discharging gas within an under-substrate space between the substrate and the top face of the heat treating plate, and a heat treating step of retracting the support pins into the heat treating plate, and performing the heat treatment of the substrate placed on the top face of the heat treating plate in the heat treating space.
    Type: Application
    Filed: December 26, 2017
    Publication date: August 16, 2018
    Inventors: Yuji TANAKA, Chisayo NAKAYAMA, Masahiko HARUMOTO, Masaya ASAI, Yasuhiro FUKUMOTO, Tomohiro MATSUO, Takeharu ISHII
  • Publication number: 20180033660
    Abstract: An upper plate on which a substrate is placed is cooled or heated by a thermal processor. The temperature of the thermal processor is adjusted by a temperature adjuster. The temperature of the upper plate is detected. A control value that is to be applied to the temperature adjuster in order to maintain the temperature of the upper plate at a set value is calculated as a control arithmetic value on the basis of the detected temperature. When the control arithmetic value decreases to a value less than a second threshold value, a first control that applies the control arithmetic value to the temperature adjuster is performed. When the control arithmetic value increases to a value not less than a first threshold value, a second control that applies a control set value higher than the control arithmetic value to the temperature adjuster is performed.
    Type: Application
    Filed: November 17, 2015
    Publication date: February 1, 2018
    Inventors: Toru MOMMA, Yasuhiro FUKUMOTO, Koji NISHI, Shigehiro GOTO, Kenichiro JO, Atsushi TANAKA
  • Patent number: 9746398
    Abstract: An automated analyzer is offered which can dilute an analyte repeatedly without contamination due to carry-over and thus can yield reliable analysis results. The analyzer has an analyte turntable for holding analyte containers in which analyte is stored, a dilution turntable for holding dilution containers for storing a diluent, a dilution probe for aliquotting a liquid between two containers held on these two turntables, respectively, a diluent vessel for storing a diluent, and a diluent supply mechanism for supplying the diluent into the diluent vessel. The dilution probe has a function of aliquotting the diluent stored in the diluent vessel into the dilution containers held on the dilution turntable. The diluent vessel has a diluent discharging mechanism for discharging the diluent from inside the diluent vessel.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: August 29, 2017
    Assignee: JEOL Ltd.
    Inventors: Takashi Tamagawa, Yasuhiro Fukumoto
  • Publication number: 20160281235
    Abstract: Substrate treating apparatus including a cover that covers a substrate on a plate. The cover undersurface is substantially horizontal and adjacent to a surface of the substrate. Through a gas flow path, a treatment gas is supplied to the substrate. The gas flow path includes a swirl chamber, a diameter contraction chamber, and a diameter expansion chamber. In the swirl chamber, the treatment gas flows around the central axis. The diameter contraction chamber is disposed below and in communication with the swirl chamber, and has an inner diameter that decreases from its upper end toward its lower end. The diameter expansion chamber is disposed below and in communication with the diameter contraction chamber, and has an inner diameter that increases from its upper end toward its lower end. The lower end of the diameter expansion chamber includes an opening on the undersurface of the cover.
    Type: Application
    Filed: March 24, 2016
    Publication date: September 29, 2016
    Inventors: Yasuhiro FUKUMOTO, Koji NISHI, Toru MOMMA, Shigehiro GOTO, Atsushi TANAKA, Kenichiro JO
  • Patent number: 9260606
    Abstract: Provided are a silicone rubber sponge that forms an elastic layer of a pressure roller of an image-forming apparatus, and that has a high mechanical strength so as to be used in a high-speed image-forming apparatus or a color image-forming apparatus, and a rubber-covered roller including the silicone rubber sponge. The silicone rubber sponge is produced by mixing expanded resin microballoons with a low-molecular-weight silicone rubber to prepare a compound A, mixing a high-molecular-weight silicone rubber with the compound A to prepare a silicone rubber compound, and heating the silicone rubber compound at a temperature lower than a softening point of the resin microballoons to cure the silicone rubbers.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: February 16, 2016
    Assignees: SUMITOMO ELECTRIC INDUSTRIES, LTD., SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Shingo Nakajima, Jun Sugawara, Yasuhiro Fukumoto, Naoki Onmori
  • Patent number: 9201333
    Abstract: Provided is a heat-shrinkable resin tube for forming a resin layer on a rotary member for an image forming part, such as a charging roller, a developing roller, or a transfer roller, a rotary member for support, or a rotary member for paper discharge in an image forming apparatus, in which a maximum depth of at least one linear scratch on a surface of the heat-shrinkable resin tube is 0.8 ?m or less. A maximum length of the at least one linear scratch may be 1 mm or less, the resin tube may have a thickness of 100 ?m or less, and the at least one linear scratch may extend in a direction parallel to an axial direction of the resin tube or in a direction tilted by 20° or less with respect to the axial direction.
    Type: Grant
    Filed: January 19, 2012
    Date of Patent: December 1, 2015
    Assignee: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Yasuhiro Fukumoto, Hong-Phuc Nguyen
  • Publication number: 20150309060
    Abstract: An automated analyzer is offered which can dilute an analyte repeatedly without contamination due to carry-over and thus can yield reliable analysis results. The analyzer has an analyte turntable for holding analyte containers in which analyte is stored, a dilution turntable for holding dilution containers for storing a diluent, a dilution probe for aliquotting a liquid between two containers held on these two turntables, respectively, a diluent vessel for storing a diluent, and a diluent supply mechanism for supplying the diluent into the diluent vessel. The dilution probe has a function of aliquotting the diluent stored in the diluent vessel into the dilution containers held on the dilution turntable. The diluent vessel has a diluent discharging mechanism for discharging the diluent from inside the diluent vessel.
    Type: Application
    Filed: March 23, 2015
    Publication date: October 29, 2015
    Inventors: Takashi Tamagawa, Yasuhiro Fukumoto
  • Patent number: 8911576
    Abstract: A fluororesin coating layer fusion-bonded directly to a base member or to a rubber layer on a base member can be formed by conducting heating for a significantly short time. A fluororesin-coated roller or belt that has a fluororesin coating layer with few defects and a rubber layer underneath whose thermal deterioration is suppressed is provided. The production method therefor include a step of inserting a base member or a rubber-coated base member including a base member and at least a rubber layer on the outer peripheral surface of the base member into an empty space of a thermally shrinkable fluororesin tube; a preliminary shrinking step conducted according to need; a pressure fusion-bonding step of bringing the base member or rubber-coated base member into contact with a hot plate surface heated to a temperature in a range of 250° C. to 400° C.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: December 16, 2014
    Assignee: Sumitomo Electric Fine Polymer, Inc.
    Inventors: Hiromi Kamimura, Masahiro Habuka, Shingo Harada, Yasuhiro Fukumoto
  • Patent number: 8828514
    Abstract: Provided are a fluororesin tube that has substantially no scratches formed during manufacturing, and a rotary member for a fixing device, the rotary member obtained by using the fluororesin tube. The fluororesin tube is a heat-shrinkable fluororesin tube that covers a rotary member for a fixing device, such as a fixing roller or a pressure roller, to form an outermost layer of the rotary member, wherein a maximum depth of a linear scratch on a surface of the fluororesin tube is 0.8 ?m or less. In one embodiment, the length of the linear scratch is 1 mm or less, and the thickness of the fluororesin tube is 100 ?m or less.
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: September 9, 2014
    Assignee: Sumitomo Electric Fine Polymer, Inc.
    Inventors: Yasuhiro Fukumoto, Hong-Phuc Nguyen
  • Patent number: 8801883
    Abstract: A method for producing a fixing-unit member including a base, a rubber elastic layer, and a PFA layer includes a step of forming a primer layer by applying a primer containing a low-melting fluorocarbon resin to the outer circumferential surface of a rubber roller having the rubber elastic layer on the outer circumferential surface of the base; a step of sheathing the rubber roller with a thermally shrinkable tube formed by diametrically expanding a PFA tube so as to have an inner diameter more than the outer diameter of the rubber roller; a step of forming the PFA layer from the thermally shrinkable tube by heating the thermally shrinkable tube so as to be thermally shrunken and fused with the rubber roller; and a reheating step of heating the PFA layer to a temperature equal to or higher than the melting point of the PFA contained in the PFA layer.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: August 12, 2014
    Assignee: Sumitomo Electric Fine Polymer, Inc.
    Inventors: Yasuhiro Fukumoto, Hiromi Kamimura, Shingo Harada, Naoki Yokota
  • Publication number: 20130178348
    Abstract: Provided are a silicone rubber sponge that forms an elastic layer of a pressure roller of an image-forming apparatus, and that has a high mechanical strength so as to be used in a high-speed image-forming apparatus or a color image-forming apparatus, and a rubber-covered roller including the silicone rubber sponge. The silicone rubber sponge is produced by mixing expanded resin microballoons with a low-molecular-weight silicone rubber to prepare a compound A, mixing a high-molecular-weight silicone rubber with the compound A to prepare a silicone rubber compound, and heating the silicone rubber compound at a temperature lower than a softening point of the resin microballoons to cure the silicone rubbers.
    Type: Application
    Filed: June 27, 2012
    Publication date: July 11, 2013
    Applicants: SUMITOMO ELECTRIC FINE POLYMER, INC., SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Shingo Nakajima, Jun Sugawara, Yasuhiro Fukumoto, Naoki Onmori
  • Publication number: 20120315068
    Abstract: Provided are a fluororesin tube that has substantially no scratches formed during manufacturing, and a rotary member for a fixing device, the rotary member obtained by using the fluororesin tube. The fluororesin tube is a heat-shrinkable fluororesin tube that covers a rotary member for a fixing device, such as a fixing roller or a pressure roller, to form an outermost layer of the rotary member, wherein a maximum depth of a linear scratch on a surface of the fluororesin tube is 0.8 ?m or less. In one embodiment, the length of the linear scratch is 1 mm or less, and the thickness of the fluororesin tube is 100 ?m or less.
    Type: Application
    Filed: December 22, 2010
    Publication date: December 13, 2012
    Applicant: SUMITOMO ELECTRIC FINE POLYMER INC
    Inventors: Yasuhiro Fukumoto, Hong-Phuc Nguyen
  • Publication number: 20120298250
    Abstract: Provided are a method and an apparatus for producing a heat-shrinkable tube. An apparatus 100 includes a pair of pinch rollers 105 that can be moved along a feeding path of a tube 101 and that can be opened and closed with the feeding path therebetween, an air vent 104 that supplies air from an end of the tube 101 to the inside of the tube, a pair of pinch rollers 106 that is arranged closer to the air vent 104 than the pinch rollers 105 and that can be opened and closed with the feeding path therebetween, and a control unit 114 that adjusts inflation of the tube by supplying air in the tube while the pinch rollers 105 are closed and the pinch rollers 106 are opened, then closing the pinch rollers 106, and changing a distance between the pinch rollers 105 and the pinch rollers 106.
    Type: Application
    Filed: December 22, 2010
    Publication date: November 29, 2012
    Applicant: Sumitomo Electric Fine Polymer, Inc.
    Inventors: Yasuhiro Fukumoto, Hong-Phuc Nguyen, Kazuaki Ikeda, Masanobu Inoue
  • Publication number: 20120225232
    Abstract: Provided is a heat-shrinkable resin tube for forming a resin layer on a rotary member for an image forming part, such as a charging roller, a developing roller, or a transfer roller, a rotary member for support, or a rotary member for paper discharge in an image forming apparatus, in which a maximum depth of at least one linear scratch on a surface of the heat-shrinkable resin tube is 0.8 ?m or less. A maximum length of the at least one linear scratch may be 1 mm or less, the resin tube may have a thickness of 100 ?m or less, and the at least one linear scratch may extend in a direction parallel to an axial direction of the resin tube or in a direction tilted by 20° or less with respect to the axial direction.
    Type: Application
    Filed: January 19, 2012
    Publication date: September 6, 2012
    Applicant: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Yasuhiro FUKUMOTO, Hong-Phuc NGUYEN