Abstract: There is provided a method of manufacturing a semiconductor device, including: transferring a substrate to a module having a first process chamber and a second process chamber; reading a recipe program depending on a type and a number of the substrate; and processing the substrate according to the recipe program, wherein in the act of processing the substrate, a first data indicating a state of the first process chamber and a second data indicating a state of the second process chamber are respectively detected, and a comparison between the first data and a previously-acquired first reference data and a comparison between the second data and a previously-acquired second reference data are displayed on a display screen.

Abstract: A substrate processing apparatus includes: a plurality of modules configured to process a substrate; a transfer chamber adjoining the modules; a transfer part configured to transfer the substrate to one of the modules; a reception part configured to receive process information of the substrate; a detection part configured to detect quality information of the respective modules; a table in which the process information corresponds to the quality information; a memory part configured to store the table; and a controller configured to compare the process information received by the reception part with the quality information detected by the detection part using the table, configured to select one of the modules corresponding to the process information, and configured to instruct the transfer part to transfer the substrate to the selected module.

Abstract: A substrate processing apparatus includes: a plurality of modules configured to process a substrate; a transfer chamber adjoining the modules; a transfer part configured to transfer the substrate to one of the modules; a reception part configured to receive process information of the substrate; a detection part configured to detect quality information of the respective modules; a table in which the process information corresponds to the quality information; a memory part configured to store the table; and a controller configured to compare the process information received by the reception part with the quality information detected by the detection part using the table, configured to select one of the modules corresponding to the process information, and configured to instruct the transfer part to transfer the substrate to the selected module.

Abstract: A substrate processing apparatus includes a substrate heating part, a power supply part and a control device. The control device measures a temperature of the substrate while controlling the substrate heating part such that the temperature of the substrate reaches a first control temperature higher than the target temperature using power supplied by the power supply part. The device measures the temperature of the substrate for a second control temperature lower than the target temperature, and selects the power ratio value providing the best temperature uniformity in the plane of the substrate and a temperature average value for the selected power ratio value from a result of the measurement. The device calculates a control temperature and the power ratio value for the target temperature based on the selected temperature average value and the power ratio value for each of the first and second control temperature.

Abstract: To provide a substrate processing apparatus, including a control unit that performs control to transfer a prescribed substrate into each chamber, wherein when error is detected during transfer of the substrate, the control unit performs control to: specify a place where the error is generated; select a fallback operation table according to a processing status of the substrate, which is the table defining a processing content for each part of the substrate processing apparatus including the place where the error is generated; and transfer the substrate based on the selected fallback operation table.

Abstract: Provided is a substrate processing apparatus which may update an accumulated film thickness of each dummy substrate when a dummy substrate carrier is reloaded. The substrate processing apparatus includes: a process chamber where a plurality of substrates including a dummy substrate are processed; a substrate receiving unit whereon a dummy substrate carrier accommodating at least the dummy substrate is placed; a memory unit configured to store a film thickness of the dummy substrate in the dummy substrate carrier when the dummy substrate carrier is unloaded from the substrate receiving unit; and a management unit configured to update the film thickness of the dummy substrate in the dummy substrate carrier based on the film thickness stored in the memory unit when the dummy substrate carrier is reloaded onto the substrate receiving unit.