Abstract: The present disclosure provides a compound having a STING agonistic activity, which may be expected to be useful as an agent for the prophylaxis or treatment of STING-related diseases. The present disclosure relates to a compound represented by the formula (I): wherein each symbol is as defined in the description, or a salt thereof.

Abstract: In one embodiment, a multi-beam writing method is for irradiating each of pixels defined on a substrate, placed on a stage, with each beam of a multi-beam to form a pattern. The method includes obtaining a position correction amount of the pattern by each of a plurality of sub-arrays into which an array of the multi-beam is divided at least in a predetermined direction, based on the positional deviation amount of each beam of each of the sub-arrays, which obtained by dividing an array of the multi-beam at least in the predetermined direction, calculating an dose of the each beam irradiated to each pixel for shifting the position of the pattern drawn for each of the sub-arrays based on the position correction, and performing multi-writing using at least a portion of each two or more of the sub-arrays with the calculated dose.

Abstract: Provided is a substrate processing apparatus capable applying a uniform load to an object to be pressurized. The substrate processing apparatus includes a lower jig plate 46 for arranging a substrate 2 which is an object to be pressurized, an upper jig plate 44 applying pressure to the substrate 2 arranged to the lower jig plate 46, and a support member 45 supporting the lower jig plate 46 and providing a support force to the lower jig plate 46 in accordance with a in-plane distribution of a load applied to the lower jig plate 46.

Abstract: A substrate processing apparatus 10 having a lower jig plate 46 for arranging a substrate 2 as an object to be pressurized, a support member 45 including an installation portion 52 for installing columnar members 50 supporting the lower jig plate 46, in which the columnar members 50 are placed to the installation portion 52 in accordance with a in-plane distribution of a load applied to the lower jig plate 46.

Abstract: A substrate processing apparatus 10 applies pressure to a substrate 2 which is an object to be pressurized arranged on an upper jig plate 44. The substrate processing apparatus 10 includes a lower jig plate 46 arranged below the upper jig plate 44, an installation base 47 provided on the lower jig plate 46 and the substrate 2 is arranged; and the installation base is temporarily fixed to the installation base 47 in a deformable manner.

Abstract: In one embodiment, a coverage calculating method is for calculating a coverage of a pattern in each of pixel regions obtained by dividing a writing region onto which the pattern is to be written by irradiation with a charged particle beam. Each of the pixel regions has a predetermined size. The method includes generating a plurality of first pixel regions by virtually dividing the writing region, the first pixel regions each having a first size, calculating a coverage of a pattern in the first pixel region, generating a plurality of second pixel regions by virtually dividing the first pixel region, the second pixel regions each having a second size smaller than the first size, selecting a second pixel region approximating a pattern shape in the first pixel region, and calculating a coverage in the selected second pixel region.

Abstract: The object of the present invention is to suitably control a charging state of a human body all the time. A charging amount detection device 13 is worn by a human body and measures the surface potential of the human body. A static electricity control device 12 is worn by a human body and generates and discharges ions to the human body and thereby controls the static electricity on the human body. A mobile terminal 11 sets a control pattern of the static electricity on the human body that is suitable for a condition such as temperature and humidity for the static electricity control device 12 via short-range wireless communication. The static electricity control device 12 uses the set control pattern to perform feedback control of the static electricity on the human body by using the surface potential of the human body measured by the charging amount detection device 13.

Abstract: A leakage diagnosis device for an evaporative fuel treatment device includes a first vent valve, a second vent valve, and a pump. The first vent valve is configured to block a first atmospheric passage, which is a main passage of an atmospheric passage and connects a canister with an atmospheric opening. The second vent valve is configured to block a second atmospheric passage, which is a bypass passage of the first atmospheric passage and connects the canister with the atmospheric opening. The pump is provided on a side of the atmospheric opening relative to the second vent valve in the second atmospheric passage, and is configured to pressurize or depressurize the second atmospheric passage. A malfunction diagnosis device performs a malfunction diagnosis based on an output value of a pressure sensor, a current value of the pump, or an output value of an air-fuel ratio sensor.

Abstract: A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.

Abstract: [Object] Provided are a stamp tool whose transport head can be easily shared, a transport device capable of allowing the stamp tool to easily pick up an transport object element disposed on a surface of a substrate from the substrate and transporting the element without being left on the substrate side, and an element array manufacturing method using the same. [Solution] A stamp tool 10 includes a stamp layer 12 allowing an element 32r as an transport object element to detachably adhere thereto, a support plate 14 to which the stamp layer 12 is fixed, and an adapter plate 16 having a mounting surface 16a, the support plate 14 being replaceably attached thereto, and a transport head 22 being allowed to be detachably attached thereon.

Abstract: A multi-charged particle beam writing apparatus includes a beam forming mechanism to form multi-charged-particle-beams, a block region forming circuit to form plural block regions from an irradiation region of the multi-charged-particle-beams formed by combining plural sub-regions each surrounded by a beam, being different from each other, and plural other beams adjacent to the beam in the multi-charged-particle-beams, and a writing mechanism to perform, using the multi-charged-particle-beams, multiple writing such that irradiation of each block region of the plural block regions is at least performed by any one of writing processing of the multiple writing, and such that each writing processing of the multiple writing is performed to write a writing region of a target object in a manner of covering the writing region without overlapping by, using one of the plural block regions, irradiation of the one of the plural block regions.

Abstract: A stamp tool holding device capable of holding a stamp tool while keeping a stamp surface of the stamp tool clean, a stamp tool positioning device that easily positions a stamp tool with respect to a transport head, a multi-element transfer device for efficiently transferring a transport object element such as an element using a stamp tool, and a method of manufacturing an element array using the same, wherein the stamp tool holding device has an installation stage on which a stamp tool is detachably installed. The installation stage has an installation surface on which a housing recess for accommodating a stamp layer of the stamp tool is formed, and a suction hole capable of detachably adsorbing a part of the stamp tool located around the stamp layer is formed on the installation surface.

Abstract: A multi-charged particle beam writing apparatus includes a circuit to allocate an additional dose to a position inside a writing target pattern in order to change a first dose distribution by an excessive dose, generated on the target object by applying, in the multi-charged particle beams, an excessive dose defective beam, to a second dose distribution whose center is located inside the writing target pattern and for which beam irradiation canceling out the excessive dose and being in a range of the first dose distribution exists; and a circuit to perform correction by subtracting an increased dose amount, generated at the center of the second dose distribution because of the additional dose being allocated, from a dose with which one of the center of the second dose distribution and a vicinity of the center of the second dose distribution is irradiated.

Abstract: An element array pressurizing device has a pressurizing plate having a pressurizing unit that pressurizes an element array comprising a plurality of elements disposed on a mounting substrate. The pressurizing unit has a plate-shaped hard material for which a surface precision is higher than that of a surface of the pressurizing plate.

Abstract: A leakage diagnostic device diagnoses leakage of evaporated fuel in an evaporative fuel treatment device. The evaporative fuel treatment device purges evaporated fuel, which is generated in a fuel tank and adsorbed on a canister, to an intake passage. The leakage diagnostic device includes a vent valve that blocks a first atmospheric passage, which connects the canister with an atmospheric opening, and a pump that pressurizes and depressurizes a second atmospheric passage, which is a bypass passage of the first atmospheric passage. The malfunction diagnostic device diagnoses malfunction of the leakage diagnostic device based on an output value of a pressure sensor that detects pressure in a passage connected to the canister.

Abstract: A multiple charged particle beam writing apparatus includes a margined block region generation circuit to generate plural margined block regions each formed by adding a margin region to the periphery of each block region of plural block regions obtained by dividing the writing region of the target object, a detection circuit to detect a defective beam in multiple charged particle beams, a specifying circuit to specify, for each defective beam detected, a position irradiated with the defective beam, and an affiliation determination circuit to determine a margined block region, in the plural margined block regions, to which the position irradiated with the defective beam belongs, based on conditions set according to a sub-block region, in plural sub-block regions acquired by dividing the margined block region, in which the position irradiated with the defective beam in the multiple charged particle beams is located.

Abstract: A method of manufacturing a metal structure for an optical semiconductor device, including a treatment step (1) of immersing in and/or applying the solution containing a polyallylamine polymer a base body, the base body including an outermost layer at a portion or entire surfaces of the base body, the outermost layer including a plating of at least one selected from the group consisting of gold, silver, a gold alloy, and a silver alloy, so as to manufacture the metal structure for an optical semiconductor device having an increased adhesion to a resin material.

Abstract: In one embodiment, a charged particle beam writing method includes virtually dividing a writing region of the substrate into a plurality of first mesh regions in a first mesh size, calculating an area density of the pattern for each of the plurality of first mesh regions to generate first mesh data, converting a mesh size of the first mesh data into a second mesh size greater than the first mesh size to generate second mesh data, performing a convolution operation between the second mesh data and a proximity effect correction kernel to generate third mesh data, converting a mesh size of the third mesh data into the first mesh size to generate fourth mesh data, performing a convolution operation between the first mesh data and a middle range effect correction kernel to generate fifth mesh data, and adding the fourth mesh data and the fifth mesh data together to calculate an irradiation amount of the charged particle beam for each of the plurality of first mesh regions.

Abstract: There is provided a liquid discharge head including: a communication plate having a plurality of descenders in respective communication with a plurality of nozzles, a pressure chamber plate being stacked on the communication plate and having a plurality of pressure chambers, a piezoelectric element arranged in a position overlapping with the pressure chambers in a stacking direction, and a discharge common channel extending in an array direction and being in communication with the plurality of pressure chambers. The discharge common channel includes: a first discharge portion formed in the communication plate; and a second discharge portion formed in the pressure chamber plate and in communication with the first discharge portion, the second discharge portion reaching as high as to a surface of the pressure chambers at the side of the piezoelectric element along the stacking direction.

Abstract: An actuator device includes: an actuator including piezoelectric elements arranged in a first direction and first contacts arranged in the first direction; a protector including a first wall opposed to the piezoelectric elements and a second wall coupled to the first wall and joined to a region of the actuator at which the first contacts are disposed; first connection terminals disposed on the first; and first through electrodes formed in the second wall to bring the first contacts and the first connection terminals into conduction with each other. A distance between two of the first through electrodes which respectively correspond to two of the piezoelectric elements which are adjacent to each other in the first direction is greater than a distance in the first direction between the two of the piezoelectric elements which are adjacent to each other in the first direction.