Abstract: A multiple-beam-writing-apparatus includes a defect-correction-data-generation-circuit to generate defect correction data defining a dose modulation rate for correction by distributing a dose at a position of a defective beam, being always-OFF, in the multiple beams to at least one of other pixels, using a dose distribution where each position in a unit region on a target object is defined by a uniform dose, regardless of writing pattern, a dose-correction-circuit to read, for each writing pattern, the defect correction data from the storage-device, to correct the individual dose at each position according to the writing pattern concerned by a dose distribution using a value obtained by multiplying the individual dose at each position by the dose modulation rate defined in the read defect correction data, and to obtain a corrected dose, and a writing-mechanism to write the writing pattern with the multiple beams of the corrected dose.

Abstract: A metallic structure for an optical semiconductor device including a conductive base body having disposed thereon metallic layers in the following order: a nickel or nickel alloy plated layer, a gold or gold alloy plated layer, and an indium or indium alloy plated layer, wherein the indium or indium alloy plated layer has a thickness in a range of 0.002 ?m or more and 0.3 ?m or less.

Abstract: A leakage diagnosis device for an evaporative fuel treatment device includes a first vent valve, a second vent valve, and a pump. The first vent valve is configured to block a first atmospheric passage, which is a main passage of an atmospheric passage and connects a canister with an atmospheric opening. The second vent valve is configured to block a second atmospheric passage, which is a bypass passage of the first atmospheric passage and connects the canister with the atmospheric opening. The pump is provided on a side of the atmospheric opening relative to the second vent valve in the second atmospheric passage, and is configured to pressurize or depressurize the second atmospheric passage. A malfunction diagnosis device performs a malfunction diagnosis based on an output value of a pressure sensor, a current value of the pump, or an output value of an air-fuel ratio sensor.

Abstract: A metallic structure for an optical semiconductor device, including a base body having disposed thereon at least in part metallic layers in the following order; a nickel or nickel alloy plated layer, a gold or gold alloy plated layer, and a silver or silver alloy plated layer, wherein the silver or silver alloy plated layer has a thickness in a range of 0.001 ?m or more and 0.01 ?m or less.

Abstract: A multiple charged particle beam writing apparatus includes a dose-data-for-defect-position-generation-circuit to generate dose-data-for-defect which defines a dose for a defect at the defect position when the dose of the nonzero value is defined in the vicinal region, and a writing mechanism to write patterns on a sample using multiple charged particle beams, wherein, when performing the writing, a unit region where writing processing is to be performed is moved to a next unit region where a pattern was determined to exist, skipping a unit region where no pattern was determined to exist by a pattern-existence-determination-circuit, and correction is performed to reduce an excessive dose, resulting from the defective beam at any writing pass in plural writing passes of multiple writing, at another writing pass.

Abstract: A leakage diagnosis device for an evaporative fuel treatment device includes a first vent valve, a second vent valve, and a pump. The first vent valve is configured to block a first atmospheric passage, which is a main passage of an atmospheric passage and connects a canister with an atmospheric opening. The second vent valve is configured to block a second atmospheric passage, which is a bypass passage of the first atmospheric passage and connects the canister with the atmospheric opening. The pump is provided on a side of the atmospheric opening relative to the second vent valve in the second atmospheric passage, and is configured to pressurize or depressurize the second atmospheric passage. A malfunction diagnosis device performs a malfunction diagnosis based on an output value of a pressure sensor, a current value of the pump, or an output value of an air-fuel ratio sensor.

Abstract: A metallic structure for an optical semiconductor device, including a base body having disposed thereon at least in part metallic layers in the following order; a nickel or nickel alloy plated layer, a gold or gold alloy plated layer, and a silver or silver alloy plated layer, wherein the silver or silver alloy plated layer has a thickness in a range of 0.001 ?m or more and 0.01 ?m or less.

Abstract: A boss is shaped in a tubular form and is injection molded integrally with a housing that forms a flow passage. A ring member is press-fitted to an inner peripheral wall of the boss. A shaft placed on a radially inner side of the ring member is configured to be rotated about a central axis. A movable valve is coupled to a portion of the shaft and is configured to adjust a size of a cross-sectional area of a passage opening at the flow passage. Each of gate marks of the housing is a trace of a site of the housing where molten resin is injected at a time of injection molding of the housing. Each of ribs radially inwardly projects from the inner peripheral wall of the boss and is placed at a corresponding location of the boss which is between adjacent two of the gate marks.

Abstract: A multi-charged particle beam writing apparatus includes a distribution ratio calculation circuit to calculate, for the each control grid and each combination of combinations, a dose distribution ratio for each beam of at least two beams forming a combination concerned in order to distribute a dose amount, which is to be applied to a control grid concerned, to the at least two beams forming the combination concerned such that a total of distribution dose amounts having been distributed to the at least two beams forming the combination concerned is substantially equivalent to the dose amount to be applied to the control grid concerned, and a combination selection circuit to select, for the each control grid, a combination in which a dose distribution ratio for the first beam is larger than a dose distribution ratio for at least one beam remaining in the at least two beams forming the combination concerned.

Abstract: A vane pump includes a casing, a rotor, vanes, a motor, and a fixed member. The casing defines a pump chamber therein. The rotor is disposed in the casing and configured to eccentrically rotate relative to the casing. The vanes are configured to rotate together with the rotor to slidably move on an inner surface of the casing. The motor is configured to rotate the rotor. Both the motor and the casing are fixed to the fixed member. The casing has an outer side wall surface and a flange. The flange protrudes outward from the outer side wall surface at an intermediate position between both ends of the pump chamber in a rotational axis direction of the rotor. The flange is fixed to the fixed member at a plurality of positions. The fixed member has a linear expansion coefficient that is different from that of the casing.

Abstract: In one embodiment, a multi-beam writing method is for irradiating each of pixels defined on a substrate, placed on a stage, with each beam of a multi-beam to form a pattern. The method includes obtaining a position correction amount of the pattern by each of a plurality of sub-arrays into which an array of the multi-beam is divided at least in a predetermined direction, based on the positional deviation amount of each beam of each of the sub-arrays, which obtained by dividing an array of the multi-beam at least in the predetermined direction, calculating an dose of the each beam irradiated to each pixel for shifting the position of the pattern drawn for each of the sub-arrays based on the position correction, and performing multi-writing using at least a portion of each two or more of the sub-arrays with the calculated dose.

Abstract: A substrate processing apparatus 10 applies pressure to a substrate 2 which is an object to be pressurized arranged on an upper jig plate 44. The substrate processing apparatus 10 includes a lower jig plate 46 arranged below the upper jig plate 44, an installation base 47 provided on the lower jig plate 46 and the substrate 2 is arranged; and the installation base is temporarily fixed to the installation base 47 in a deformable manner.

Abstract: Provided is a substrate processing apparatus capable applying a uniform load to an object to be pressurized. The substrate processing apparatus includes a lower jig plate 46 for arranging a substrate 2 which is an object to be pressurized, an upper jig plate 44 applying pressure to the substrate 2 arranged to the lower jig plate 46, and a support member 45 supporting the lower jig plate 46 and providing a support force to the lower jig plate 46 in accordance with a in-plane distribution of a load applied to the lower jig plate 46.

Abstract: A substrate processing apparatus 10 having a lower jig plate 46 for arranging a substrate 2 as an object to be pressurized, a support member 45 including an installation portion 52 for installing columnar members 50 supporting the lower jig plate 46, in which the columnar members 50 are placed to the installation portion 52 in accordance with a in-plane distribution of a load applied to the lower jig plate 46.

Abstract: In one embodiment, a coverage calculating method is for calculating a coverage of a pattern in each of pixel regions obtained by dividing a writing region onto which the pattern is to be written by irradiation with a charged particle beam. Each of the pixel regions has a predetermined size. The method includes generating a plurality of first pixel regions by virtually dividing the writing region, the first pixel regions each having a first size, calculating a coverage of a pattern in the first pixel region, generating a plurality of second pixel regions by virtually dividing the first pixel region, the second pixel regions each having a second size smaller than the first size, selecting a second pixel region approximating a pattern shape in the first pixel region, and calculating a coverage in the selected second pixel region.

Abstract: The object of the present invention is to suitably control a charging state of a human body all the time. A charging amount detection device 13 is worn by a human body and measures the surface potential of the human body. A static electricity control device 12 is worn by a human body and generates and discharges ions to the human body and thereby controls the static electricity on the human body. A mobile terminal 11 sets a control pattern of the static electricity on the human body that is suitable for a condition such as temperature and humidity for the static electricity control device 12 via short-range wireless communication. The static electricity control device 12 uses the set control pattern to perform feedback control of the static electricity on the human body by using the surface potential of the human body measured by the charging amount detection device 13.

Abstract: A leakage diagnosis device for an evaporative fuel treatment device includes a first vent valve, a second vent valve, and a pump. The first vent valve is configured to block a first atmospheric passage, which is a main passage of an atmospheric passage and connects a canister with an atmospheric opening. The second vent valve is configured to block a second atmospheric passage, which is a bypass passage of the first atmospheric passage and connects the canister with the atmospheric opening. The pump is provided on a side of the atmospheric opening relative to the second vent valve in the second atmospheric passage, and is configured to pressurize or depressurize the second atmospheric passage. A malfunction diagnosis device performs a malfunction diagnosis based on an output value of a pressure sensor, a current value of the pump, or an output value of an air-fuel ratio sensor.

Abstract: A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.

Abstract: A multi-charged particle beam writing apparatus includes a beam forming mechanism to form multi-charged-particle-beams, a block region forming circuit to form plural block regions from an irradiation region of the multi-charged-particle-beams formed by combining plural sub-regions each surrounded by a beam, being different from each other, and plural other beams adjacent to the beam in the multi-charged-particle-beams, and a writing mechanism to perform, using the multi-charged-particle-beams, multiple writing such that irradiation of each block region of the plural block regions is at least performed by any one of writing processing of the multiple writing, and such that each writing processing of the multiple writing is performed to write a writing region of a target object in a manner of covering the writing region without overlapping by, using one of the plural block regions, irradiation of the one of the plural block regions.

Abstract: [Object] Provided are a stamp tool whose transport head can be easily shared, a transport device capable of allowing the stamp tool to easily pick up an transport object element disposed on a surface of a substrate from the substrate and transporting the element without being left on the substrate side, and an element array manufacturing method using the same. [Solution] A stamp tool 10 includes a stamp layer 12 allowing an element 32r as an transport object element to detachably adhere thereto, a support plate 14 to which the stamp layer 12 is fixed, and an adapter plate 16 having a mounting surface 16a, the support plate 14 being replaceably attached thereto, and a transport head 22 being allowed to be detachably attached thereon.