Abstract: There is provided a liquid discharge apparatus including: driving elements; a first member including a first trace and a first IC connected to ones of the plurality of driving elements; a second member including a second trace and a second IC connected to other ones of the driving elements; and a metallic member arranged on one side with respect to the plurality of driving elements in a second direction orthogonal to the liquid discharge surface, the metallic member including: a body portion extending in the first direction while straddling over the driving elements, a first projection projected from the body portion toward the liquid discharge surface; and a second projection projected from the body portion toward the liquid discharge surface, wherein the first IC is supported by the first projection and the second IC is supported by the second projection.

Abstract: A charged particle beam writing apparatus includes a correction term calculation processing circuitry to calculate a correction term which corrects an error of a proximity effect density of a figure pattern to be written, compared against the figure pattern at design stage, a proximity effect correction dose coefficient calculation processing circuitry to calculate a proximity effect correction dose coefficient for correcting a proximity effect, by using the correction term, a dose calculation processing circuitry to calculate a dose of a charged particle beam by using the proximity effect correction dose coefficient, and a writing mechanism to write the figure pattern on a target object by using the charged particle beam whose dose is the dose calculated.

Abstract: A charged particle beam writing apparatus includes a processing circuitry configured to calculate a third proximity effect correction irradiation coefficient where at least one correction irradiation coefficient term up to k-th order term, in correction irradiation coefficient terms of from a first order term to a n-th order term for a first proximity effect correction irradiation coefficient which does not take account of a predetermined effect, are replaced by at least one correction irradiation coefficient term up to the k-th order term, for a second proximity effect correction irradiation coefficient which takes account of the predetermined effect; and a processing circuitry configured to calculate a dose by using the third proximity effect correction irradiation coefficient.

Abstract: A pump casing has two external communication holes communicating with an outside. A partition member partitioning an interior of the pump casing into a first space and a second space. The first space communicates with the two external communication holes. The partition member have two internal communication holes communicating the first space with the second space. A first rotor member is rotatably accommodated in the first space. A second rotor member is rotatably accommodated in the second space. A torque switching unit is configured to switch between transmission of a running torque selectively to the first rotor member and transmission of the running torque to both the first rotor member and the second rotor member.

Abstract: In one embodiment, a charged particle beam drawing apparatus includes a drawing unit that draws a pattern in a drawing area on a substrate and a control processing circuitry that controls the drawing unit via a process including receiving drawing data with a hierarchical correction map input to the control processing circuitry, the drawing data with the hierarchical map including a plurality of files in which division maps are respectively described in files in units of subframes, each division map including dose information associated with corresponding one of blocks of the drawing area, and the process further including generating shot data by performing a data conversion process on the drawing data, reading a division map corresponding to a block in the area to be drawn from the hierarchical correction map, calculating a dose, and controlling the drawing unit based on the shot data and the calculated dose.

Abstract: There is provided a liquid discharge apparatus including: driving elements; a first member including a first trace and a first IC connected to ones of the plurality of driving elements; a second member including a second trace and a second IC connected to other ones of the driving elements; and a metallic member arranged on one side with respect to the plurality of driving elements in a second direction orthogonal to the liquid discharge surface, the metallic member including: a body portion extending in the first direction while straddling over the driving elements, a first projection projected from the body portion toward the liquid discharge surface; and a second projection projected from the body portion toward the liquid discharge surface, wherein the first IC is supported by the first projection and the second IC is supported by the second projection.

Abstract: A light emitting device includes a base having a first lead electrode and a second lead electrode. Each of the first lead electrode and the second lead electrode includes a reflecting layer which includes silver or silver alloy plating containing a sulfur-based gloss agent. A light emitting element is provided on one side of the base and is electrically connected to the first lead electrode and the second lead electrode. The reflecting layer is on the one side of the base. A sealer includes resin and is provided on the one side of the base to seal the light emitting element and at least a part of the first lead electrode and the second lead electrode. A light-transmissive protective film includes an inorganic matter and is provided between the reflecting layer and the sealer.

Abstract: A multi charged particle beam writing apparatus includes a modulation rate data calculation processing circuitry to calculate, for each pixel being a unit region, a modulation rate of a beam to a pixel concerned and each modulation rate of a beam to at least one pixel at a periphery of the pixel concerned, and a corrected-dose calculation processing circuitry to calculate, for the each pixel, a corrected dose by adding a multiplied value obtained by multiplying the modulation rate of the pixel concerned in a modulation rate map by beam dose to the pixel concerned, and a multiplied value obtained by multiplying the modulation rate of the pixel concerned which becomes one of the at least one pixel at the periphery with respect to another pixel defined for the position of the pixel concerned by a beam dose to the another pixel.

Abstract: The vane pump has a pump chamber, in which a first inner plate and a second inner plate are movably accommodated at each of axial ends of a rotor. In a case that an electric motor is arranged at a lower side of the vane pump, the first inner plate is moved in a direction to the second inner plate by a force of gravity, so that the first inner plate is brought into contact with a first axial end of the rotor. As a result, an upper side axial open end of each pumping room, which is respectively defined by multiple vanes, is closed by the first inner plate. An amount of air leaking from one of the pumping rooms to the other pumping rooms can be reduced.

Abstract: A method for generating writing data to be input to a writing apparatus, which writes a figure pattern on a target object by using a charged particle beam, includes generating the writing data, based on a data format that sequentially defines figure information on a figure pattern, and dose information which is defined before or after the figure information and indicates one of a dose and a dose modulation rate for modulating a dose, for a position of each of corner points of the figure pattern.

Abstract: A multiple charged particle beam lithography apparatus includes a weighting coefficient operation unit to operate a plurality of weighting coefficients that assign weights to doses of a plurality of different beams used for multiple pattern writing for each pixel of pixels, the each pixel being used as an irradiation unit region per beam of multiple charged particle beams; a dose operation processing circuitry to operate doses of the plurality of different beams weighted by using a corresponding weighting coefficient among the plurality of weighting coefficients for each of the pixels; and a writing mechanism that writes a pattern on a target object using the multiple charged particle beams such that corresponding pixels are irradiated with the plurality of different beams of the doses weighted respectively.

Abstract: A charged particle beam writing apparatus includes a correction term calculation processing circuitry to calculate a correction term which corrects an error of a proximity effect density of a figure pattern to be written, compared against the figure pattern at design stage, a proximity effect correction dose coefficient calculation processing circuitry to calculate a proximity effect correction dose coefficient for correcting a proximity effect, by using the correction term, a dose calculation processing circuitry to calculate a dose of a charged particle beam by using the proximity effect correction dose coefficient, and a writing mechanism to write the figure pattern on a target object by using the charged particle beam whose dose is the dose calculated.

Abstract: A charged particle beam writing apparatus includes a storage unit to store each pattern data of plural figure patterns arranged in each of plural small regions made by virtually dividing a writing region of a target workpiece to be written on which resist being coated. The charged particle beam writing apparatus further including an assignment unit to assign each pattern data of each figure pattern to be arranged in each of the plural small regions concerned, and a writing unit to write, for each of plural groups, each figure pattern in each of the plural small regions concerned by using a charged particle beam.

Abstract: A fuel vapor leakage detection device performs a fuel vapor leakage detection method to detect a clogging of passages in an evaporated fuel processing system by (i) switching a switching valve after measuring a first reference pressure, (ii) determining whether a detected pressure equals atmospheric pressure after opening a purge valve, (iii) recording the detected pressure after closing the purge valve, and (iv) switching the switching valve to depressurize an atmospheric system and to determine whether a current detection value of the pressure sensor is the same as the first reference pressure. Then, a second reference pressure is measured for comparison with the first reference pressure, to determine whether the evaporation system is clogged. In such manner, leakage and the clogging of the passages in an evaporated fuel processing system may be detected.

Abstract: A tank passage communicates a canister housing with a fuel tank. A purge passage communicates the canister housing with an intake air system. An atmospheric air passage communicates the canister housing with an atmosphere. A valve housing accommodating a valve element is located in a recessed portion defined with a first inner wall and a second inner wall. A seal member is located on a radially outside of the valve housing to seal the recessed portion. The first inner wall has a first opening to communicate the canister housing with the recessed portion. The second inner wall has a second opening to communicate the recessed portion with the atmospheric air passage. The first opening or the second opening is defined around a valve seat. The valve element is seated on and lifted from the valve seat to control communication between the canister housing and the atmospheric air passage.

Abstract: A apparatus includes a unit to operate a first dose of a beam corrected for a proximity effect for each of second mesh regions of a second mesh size obtained by dividing the first mesh size by a product of a natural number and a number of passes, by using a dose model using a dose threshold; a unit to operate a representative temperature rising due to heat transfer originating from irradiation of the beam by using a dose for an applicable pass of the first dose and a unit to operate a polynomial having a term obtained by multiplying a dose modulation coefficient based on the representative temperature by a pattern area density as an element, and a dose that makes a difference between a value obtained by operating the polynomial and the dose threshold within a tolerance is used.

Abstract: An inspection method of pattern writing data includes creating an area map of a figure pattern written on a target object for each modulation rate for modulating a dose by using modulation rate data to modulate the dose in a case that a plurality of figure patterns is written on the target object by using a charged particle beam, and layout data in which the plurality of figure patterns is defined; converting the layout data into pattern writing data to be input into a lithography apparatus; and inspecting an amount of electric charge for each predetermined region by using the area map when a pattern is written on the target object by using the pattern writing data.

Abstract: A beam writing apparatus includes a unit to obtain a specific value by calculating an integer by dividing a total irradiation time by a multiplied value of a region number and a repeating times number, and by multiplying the integer by the repeating times number, to add the repeating times number to the specific value when a region is in the multiple writing unit regions and is not a specific region and when a region number of the multiple writing unit region, defined excluding the specific region, is below or equal to a value obtained by dividing the total irradiation time by the multiplied value of the region number and the repeating times number, to obtain a first remainder, and dividing the first remainder by the repeating times number, and to treat an added value of the repeating times number and the specific value, as a total irradiation time.

Abstract: A liquid discharge apparatus includes: a flow passage structure; and a piezoelectric actuator which is joined to the flow passage structure, the piezoelectric actuator including: a first piezoelectric layer; a second piezoelectric layer; a plurality of first electrodes which are arranged on an upper surface of the first piezoelectric layer; a second electrode which is arranged between the first piezoelectric layer and the second piezoelectric layer; a first conductive pattern which is arranged in an area disposed on an outer side of the plurality of first electrodes on the upper surface of the first piezoelectric layer; a conducting portion which is arranged in a through-hole penetrating through the first piezoelectric layer, the through-hole being formed in the first conductive pattern; and a second conductive pattern which is arranged between the through-hole and the plurality of first electrodes on the upper surface of the first piezoelectric layer.

Abstract: A liquid discharge apparatus includes: a flow passage structure; and a piezoelectric actuator which is joined to the flow passage structure, the piezoelectric actuator including: a first piezoelectric layer; a second piezoelectric layer; a plurality of first electrodes which are arranged on an upper surface of the first piezoelectric layer; a second electrode which is arranged between the first piezoelectric layer and the second piezoelectric layer; a first conductive pattern which is arranged in an area disposed on an outer side of the plurality of first electrodes on the upper surface of the first piezoelectric layer; a conducting portion which is arranged in a through-hole penetrating through the first piezoelectric layer, the through-hole being formed in the first conductive pattern; and a second conductive pattern which is arranged between the through-hole and the plurality of first electrodes on the upper surface of the first piezoelectric layer.