Abstract: To provide a ceramic heater capable of reducing temperature uniformity at the periphery of through holes such as insertion holes and vacuum suction holes, thereby protecting the wafer against thermal shocks and having improved controllability for temperature control parts such as thermocouples and temperature fuse. Further, a ceramic heater capable of uniform resin curing is provided. A heat generation body 14 is disposed on the surface or inside of the ceramic substrate 12. Further, corners for the insertion holes 16, the recesses 18 and the vacuum suction holes 20 of the ceramic substrate 12 are chamfered.

Abstract: The present invention provides a ceramic heater having better anti thermal shock property. A ceramic substrate 12 is formed by providing heat generation bodies 14a and 14b on the surface of a green sheet made from a slurry containing powdered ceramics, sandwiching the green sheet with other green sheets from both upper and lower sides and then laminating and pressing the compiled green sheets. At least some of the heat generation bodies 14a and 14b are disposed on a level P1b offset from a level P1a of other heat generation bodies in the direction of thickness of the ceramic substrate 12.

Abstract: A hot plate unit for heating semiconductor wafers. The hot plate unit includes a case, a hot plate, a seal element, and a holding ring. The seal element is made of a heat insulative material and is arranged between the case and the hot plate. The hot plate is clamped between the holding ring and the seal element. Screws for fastening the holding ring do not contact the hot plate.

Abstract: An exposure device controls the exposure of an image in a video camera using a vibration control system. The gain of an iris, which receives the image, the gain of an AGC amplifier, which amplifies the sensed image and the gain of an electronic shutter, which controls the speed at which images are sensed; are controlled by driving the iris in a first range indicative of an object illuminance when a hand vibration correcting operation is performed, driving the AGC amplifier in a second range indicative of the object illuminance, and driving the shutter in a third range indicative of the object illuminance.

Abstract: An exposing apparatus comprises: a lens group to fetch a light from an object; an iris to adjust a light amount from the lens group; an image pickup device to convert the light which passed through the iris into the electric signal; a detecting circuit to detect a luminance signal level from an output signal from the image pickup device; a reference level signal setting circuit to set an exposure control reference value to control the iris; an exposure control reference value modulating circuit to modulate the exposure control reference value when the iris is controlled; and a control circuit to set the exposure control reference value in correspondence to the luminance signal level when an output level of the detecting circuit is larger than a set value.

Abstract: An exposing apparatus comprises: a lens group to fetch a light from an object; an iris to adjust a light amount from the lens group; an image pickup device to convert the light which passed through the iris into the electric signal; a detecting circuit to detect a luminance signal level from an output signal from the image pickup device; a reference level signal setting circuit to set an exposure control reference value to control the iris; an exposure control reference value modulating circuit to modulate the exposure control reference value when the iris is controlled; and a control circuit to set the exposure control reference value in correspondence to the luminance signal level when an output level of the detecting circuit is larger than a set value.