Abstract: A wavelength conversion member includes a substrate, a phosphor layer, and a ventilated blade. The substrate is configured to rotate based on an axis. The phosphor layer is disposed on the substrate. The ventilated blade is disposed on the substrate and has a pore density between 10 ppi and 500 ppi or a volume porosity between 5% and 95%.

Abstract: A wavelength conversion member includes a substrate, a phosphor layer, and a non-ventilated blade. The substrate is configured to rotate based on an axis. The phosphor layer is disposed on the substrate. The non-ventilated blade has a roughness between 5 ?m and 1.25 mm, or a specific surface area of the non-ventilated blade exceeds a geometric area of the non-ventilated blade by more than 10%.

Abstract: A method of removing metal ions is provided, which includes contacting a metal removal composition with a solution containing metal ions for removing the metal ions from the solution, wherein the metal removal composition includes a polymer with a chemical structure of: wherein Q is a quinoline-based group, n=90˜450, o=10˜50, and p=0˜20. The metal removal composition has a type of fiber or film. In addition, the metal removal composition has a porosity of 60% to 90%.

Abstract: A copolymer includes a repeating unit corresponding to polyether sulfone and a repeating unit corresponding to vinyl monomer. The repeating unit corresponding to polyether sulfone has a repeating number of 200 to 450, and the repeating unit corresponding to vinyl monomer has a repeating number of 20 to 100. The copolymer can be blended with another polymer such as polyphenylene sulfide to form a blend.

Abstract: A method of forming a film is provided, which includes providing a sheet from a polyamide composition; and biaxial stretching of the sheet to form a film, wherein the polyamide composition includes a blend of a first polyamide and a second polyamide. The first polyamide has a repeating unit of and the second polyamide has repeating units of The second polyamide is a crystalline random copolymer. The sheet of the polyamide composition is biaxially stretched at a rate of 20 mm/sec to 100 mm/sec.

Abstract: A method of removing metal ions is provided, which includes contacting a metal removal composition with a solution containing metal ions for removing the metal ions from the solution, wherein the metal removal composition includes a polymer with a chemical structure of: wherein Q is a quinoline-based group, n=90˜450, o=10˜50, and p=0˜20. The metal removal composition has a type of fiber or film. In addition, the metal removal composition has a porosity of 60% to 90%.

Abstract: A composite film includes a fiber structure layer and a filling material layer. The fiber structure layer has a plurality of fibers and a first melting temperature. The filling material layer is disposed on the fiber structure layer and has a second melting temperature. At least one of the fibers extends into the filling material layer, and the first melting temperature is greater than the second melting temperature. Wherein the fiber structure layer includes a polymer selected from a group consisting of PI, polyurethanes (PU), polyamide, polybenzimidazole, polycarbonate, polyacrylonitrile, polyethyleneterephtalate, poly(vinylidenefluoride), poly(4-methylpentene) (TPX), and the arbitrary combinations thereof; the filling material layer includes polyolefin or polyester.

Abstract: A multilayer composite membrane consists essentially of a porous support layer, an inorganic porous layer, a polymer porous layer, and a separation layer. The inorganic porous layer consists of inorganic particles and is disposed on the porous support layer. The polymer porous layer is disposed on the inorganic porous layer. The separation layer is disposed on the polymer porous layer.

Abstract: A composite film, a manufacturing method for the same, and a battery comprising the composite film are provided. The composite film includes a first layer and a second layer on a side of the first layer. The first layer includes a first polyolefin. The first polyolefin has an orientation function of at least 0.6. The first polyolefin has a repeating unit of wherein R is an alkyl group having 2, 3, 4, or 5 carbon atoms. The second layer includes a second polyolefin. The second polyolefin has an orientation function of at least 0.5. The second polyolefin has a repeating unit of wherein A is a hydrogen or a methyl group.

Abstract: A multilayer composite membrane consists essentially of a porous support layer, an inorganic porous layer, a polymer porous layer, and a separation layer. The inorganic porous layer consists of inorganic particles and is disposed on the porous support layer. The polymer porous layer is disposed on the inorganic porous layer. The separation layer is disposed on the polymer porous layer.

Abstract: A method of forming a film is provided, which includes providing a sheet from a polyamide composition; and biaxial stretching of the sheet to form a film, wherein the polyamide composition includes a blend of a first polyamide and a second polyamide. The first polyamide has a repeating unit of and the second polyamide has repeating units of The second polyamide is a crystalline random copolymer. The sheet of the polyamide composition is biaxially stretched at a rate of 20 mm/sec to 100 mm/sec.

Abstract: A composite film, a manufacturing method for the same, and a battery comprising the composite film are provided. The composite film includes a first layer and a second layer on a side of the first layer. The first layer includes a first polyolefin. The first polyolefin has an orientation function of at least 0.6. The first polyolefin has a repeating unit of wherein R is an alkyl group having 2, 3, 4, or 5 carbon atoms. The second layer includes a second polyolefin. The second polyolefin has an orientation function of at least 0.5. The second polyolefin has a repeating unit of wherein A is a hydrogen or a methyl group.

Abstract: The present invention relates to a negative-type photoresist composition for thick film, comprising: (A) 20 to 50 wt % of an alkali-soluble resin which is polymerized from a plurality of kinds of monomers, wherein the monomers includes compounds represented by formulas (1A) and (1B), and based on the weight ratio of the monomers to the alkali-soluble resin, the sum of the formula (1A) compound and the formula (1B) compound are 20 to 60%, and X of the formula (1A) and (1B) may be independently H, methyl or ethyl. (B) 10 to 30 wt % of crosslinker which can be a bisphenol fluorene derivative monomer having at least one ethylenically unsaturated double bond; (C) 5 to 15 wt % of photo initiator; and (D) residual solvent. The present invention also relates to use of the above-mentioned negative-type photoresist compound for thick film.

Abstract: The present invention relates to a silicone containing encapsulant composition. One embodiment of the encapsulant composition comprises (a) 30˜60 weight % of an epoxy resin; (b) 30˜60 weight % of an acid anhydride curing agent; (c) 0.1˜30 weight % of a Carbinol function silicone resin which can form a homogeneous mixture with (a) and (b) described above; and (d) 0.1˜5 weight % of a reactive UV absorber or HALS; and reactive anti-oxidant and/or phosphor containing flame retardant. The encapsulant composition can be used for a solid state light emitting device to achieve low internal stress and better -anti-yellowing performance.

Abstract: The present invention provides a positive photosensitive resin composition, including an alkali soluble phenolic resin; an alkali soluble acrylic resin; and a photosensitive compound having quinone diazide. The positive photosensitive resin composition is applicable to a semi-additive process for forming tiny and fine wirings.

Abstract: A developer composition with low metal corrosiveness is provided. The developer composition includes 1 to 10 weight parts of tetraalkylammonium hydroxide; 0.01 to 3 weight parts of a metal corrosion inhibiting agent; 0.1 to 5 weight parts of a pH control agent; 0.1 to 5 weight parts of a surfactant; and water in balance. The developer composition of the present invention has a metal corrosion prevents corrosiveness to metals such as aluminum and copper during a resist development.

Abstract: The present invention relates to a polymerizable water-soluble or alcohol-soluble ultraviolet absorber, which is represented by the following formula (I): wherein R1 is H or C1˜5 alkyl; R2 is H, Cl, Br or I; R3 is H or methyl; and m each is an integer in the range from 3 to 12. The above-mentioned compounds are suitable for copolymerizing with one or more monomers to form copolymers so that the UV-light resistance of the copolymer can be efficiently promoted. For example, the polymer made by copolymerizing the above-mentioned compound with acrylate monomers can be applied to the production of optical medical materials, especially contact lenses or intraocular lenses.

Abstract: The present invention relates to a silicone containing encapsulant composition. One embodiment of the encapsulant composition comprises (a) 30˜60 weight % of an epoxy resin; (b) 30˜60 weight % of an acid anhydride curing agent; (c) 0.1˜30 weight % of a Carbinol function silicone resin which can form a homogeneous mixture with (a) and (b) described above; and (d) 0.1˜5 weight % of a reactive UV absorber or HALS; and reactive anti-oxidant and/or phosphor containing flame retardant. The encapsulant composition can be used for a solid state light emitting device to achieve low internal stress and better-anti-yellowing performance.

Abstract: A detergent composition is disclosed, which comprises: (A) an alkali metal hydroxyl compound in an amount of 0.1 to 20 parts by weight; (B) a nonionic surfactant represented by the following formula (I) in an amount of 0.1 to 30 parts by weight: wherein R1 is hydrogen or methyl; R2 is hydrogen or methyl; n is an integer from 0 to 10; and m is an integer from 4 to 20; (C) an anionic surfactant in an amount of 0.1 to 10 parts by weight; (D) a chelating agent in an amount of 0.1 to 20 parts by weight; (E) an additive in an amount of 0.1 to 20 parts by weight; and (F) water of remaining parts based on 100 parts by weight of the detergent composition.

Abstract: The present invention relates to a polymerizable water-soluble or alcohol-soluble ultraviolet absorber, which is represented by the following formula (I): wherein R1 is H or C1˜5 alkyl; R2 is H, Cl, Br or I; R3 is H or methyl; and m each is an integer in the range from 3 to 12. The above-mentioned compounds are suitable for copolymerizing with one or more monomers to form copolymers so that the UV-light resistance of the copolymer can be efficiently promoted. For example, the polymer made by copolymerizing the above-mentioned compound with acrylate monomers can be applied to the production of optical medical materials, especially contact lenses or intraocular lenses.